公开(公告)号：US20040031288A1

公开(公告)日：2004-02-19

申请号：US10219745

申请日：2002-08-15

Applicant: CeramOptec Industries, Inc.

Inventor： Leonid M. Blinov

IPC: C03B037/075

CPC classification number: C03C3/045 ,  C03B37/01426 ,  C03B2201/24 ,  C03C13/046 ,  H05H1/46 ,  H05H2001/4622

Abstract: A device and method is disclosed for manufacturing optical fiber preforms utilizing microwave plasma assisted chemical vapor deposition. Precursor gas is introduced to the face of a vertically mounted dielectric rod, and a plasma is struck by means of simultaneous excitation of an E01 type wave and an H type wave with rotating linear polarization. The silica rod is positioned so that its face is at the bottom of the tube. Precursor gas is delivered from a position below the face of the silica rod, and microwave energy, which travels through the rod to the rod face, is delivered from a source positioned above the rod. With this configuration, a uniformly dense plasma localized on the face of the rod can simultaneously deposit both a pure or doped core and a doped cladding. It is also useful for creating waveguides, preform cores for use as substrates in creating optical fiber preforms, capillaries and ceramic rods.

Abstract translation: 公开了一种利用微波等离子体辅助化学气相沉积制造光纤预制件的装置和方法。 前体气体被引入垂直安装的介质棒的表面，并且通过同时激发E01型波和具有旋转线性极化的H型波来撞击等离子体。 硅胶棒被定位成使其表面位于管的底部。 前体气体从二氧化硅棒的表面下方的位置输送，并且将通过该杆传播到杆面的微波能量从位于杆上方的源输送。 利用这种构造，位于棒表面上的均匀致密的等离子体等离子体可以同时沉积纯或掺杂的芯和掺杂的包层。 它也可用于创建波导，预制核心用作创建光纤预制件，毛细管和陶瓷棒的基板。

公开(公告)号：US06449420B1

公开(公告)日：2002-09-10

申请号：US10068968

申请日：2002-02-07

Applicant: Ikerionwu Asiegbu Akwani ,  Robert Alan Bellman ,  Thomas Paul Grandi ,  Paul Arthur Sachenik

Inventor： Ikerionwu Asiegbu Akwani ,  Robert Alan Bellman ,  Thomas Paul Grandi ,  Paul Arthur Sachenik

IPC: G02B600

CPC classification number: C01B21/0821 ,  C01P2006/32 ,  C01P2006/60 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/24 ,  C03B2201/31 ,  C03C3/045 ,  C03C3/111 ,  C03C2201/24 ,  C03C2201/31 ,  Y10T428/265

Abstract: A composition represented by the formula Si1−xGexO2(1−y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5×10−6°C−1 to about 5.0×10−6° C.−1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.

Abstract translation: 由式Si1-xGexO2（1-y）N1.33y表示的组合物，其中x为约0.05至约0.6，y为约0.14至约0.74，表现出非常适合用于制造液晶基光学波导的性能 设备。 特别地，组合物对于波长1550nm的光具有约1.6至约1.8的折射率，和/或约2.5×10-6℃-1至约5.0×10-3的热膨胀系数， 6℃-1。 组合物还具有固有的低氢含量和高的氢渗透性，其允许通过热退火更好的氢去除以提供与替代材料相比表现出低的光损耗和更好的蚀刻性能的材料。

公开(公告)号：US5766291A

公开(公告)日：1998-06-16

申请号：US731595

申请日：1996-10-16

Applicant: Tatsuhiro Sato ,  Akira Fujinoki

Inventor： Tatsuhiro Sato ,  Akira Fujinoki

IPC: C03B20/00 ,  C03B8/04 ,  C03B19/06 ,  C03B19/14 ,  C03B32/00 ,  C03B19/01 ,  C03B19/09 ,  C03B37/00 ,  C03C15/00

CPC classification number: C03B32/00 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1453 ,  C03B20/00 ,  C03B2201/24

Abstract: A porous silica body with a density of 0.1 g/cm.sup.3 to 0.5 g/cm.sup.3 and a density variation of less than 30% is subjected to a first heat-treatment in an ammonia-containing atmosphere, a second heat-sintering in non-oxidizing atmosphere, and further heat-treatment at a temperature in the range of 1400.degree. C. to 2000.degree. C. under an increased pressure of 500 kg/cm.sup.2 or more in a non-oxidizing atmosphere.

Abstract translation: 密度为0.1g / cm 3至0.5g / cm 3，密度变化小于30％的多孔二氧化硅体在含氨气氛中进行第一次热处理，在非氧化性中进行第二次热烧结 在非氧化性气氛中，在500kg / cm 2以上的压力下，在1400〜2000℃的温度范围内进一步进行热处理。

公开(公告)号：US5192351A

公开(公告)日：1993-03-09

申请号：US812130

申请日：1991-12-17

Applicant: Akshay Mathur ,  Lenwood D. Pye

Inventor： Akshay Mathur ,  Lenwood D. Pye

IPC: C03B19/12

CPC classification number: C03B19/12 ,  C03B2201/24 ,  C03B2201/34 ,  Y10S65/90 ,  Y10S65/901

Abstract: A substantially dehydroxylated glass is formed by impregnating a dry porous silica gel with a nitrogen-containing organic compound in an organic solvent capable of solubilizing that compound. The impregnated gel is then sintered in a non-oxidizing atmosphere to form a substantially dehydroxylated, fully-densified silica glass. The gel is typically formed by a sol-gel process. The nitrogen-containing organic compound can be guanidine compounds, urea, or mixtures thereof.

Abstract translation: 通过在含有能够溶解该化合物的有机溶剂中用含氮有机化合物浸渍干燥的多孔硅胶来形成基本上脱羟基化的玻璃。 然后将浸渍的凝胶在非氧化气氛中烧结以形成基本上脱羟基化的完全致密化的二氧化硅玻璃。 凝胶通常通过溶胶 - 凝胶法形成。 含氮有机化合物可以是胍化合物，脲或其混合物。

公开(公告)号：US4911742A

公开(公告)日：1990-03-27

申请号：US314325

申请日：1989-02-23

Applicant: Richard T. Newbould ,  Susan J. Piggs ,  Stephen J. Wilson

Inventor： Richard T. Newbould ,  Susan J. Piggs ,  Stephen J. Wilson

IPC: C03B37/10 ,  C03B37/014 ,  C03B37/029 ,  C03C25/22 ,  G02B6/00 ,  G02B6/44

CPC classification number: C03C25/22 ,  C03B37/029 ,  C03B2201/24 ,  C03B2201/58 ,  Y10S65/90

Abstract: In order to eliminate the effect of water attack on silica optical fibres, the fibres are provided with a surface layer of silicon nitride or silicon oxynitride. The method proposed comprises direct nitridation. This may be achieved by adding a nitriding atmosphere to the drawing furnace gases, or to the reactive gases (TiCl.sub.4 and SiCl.sub.4) incorporated in the flame of an oxyhydrogen torch for the formation of a compressive silica/titania layer on an optical fibre by a glass soot deposition and sintering process.

Abstract translation: 为了消除水侵蚀对二氧化硅光纤的影响，纤维被提供有氮化硅或氮氧化硅的表面层。 所提出的方法包括直接氮化。 这可以通过将氮化气氛添加到拉制炉气体中，或者加入到氢氧焰炬的火焰中的反应性气体（TiCl 4和SiCl 4）以通过玻璃在光纤上形成压缩二氧化硅/二氧化钛层来实现 烟灰沉积和烧结过程。