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    Low dielectric constant material and method of processing by CVD
    2.
    发明授权
    Low dielectric constant material and method of processing by CVD 有权
    低介电常数材料和通过CVD处理的方法

    公开(公告)号：US06716770B2

    公开(公告)日：2004-04-06

    申请号：US09863150

    申请日：2001-05-23

    申请人： Mark Leonard O'Neill ,  Brian Keith Peterson ,  Jean Louise Vincent ,  Raymond Nicholas Vrtis

    发明人： Mark Leonard O'Neill ,  Brian Keith Peterson ,  Jean Louise Vincent ,  Raymond Nicholas Vrtis

    IPC分类号： C23C1640

    CPC分类号： H01L21/02131 ,  C03C3/045 ,  C03C14/008 ,  C23C16/30 ,  C23C16/401 ,  H01L21/02203 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/3122 ,  H01L21/3127 ,  H01L21/316 ,  H01L21/31633

    摘要： Organofluorosilicate glass films contain both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species. Preferred films are represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic % y is from 10 to 50 atomic %, x is from 1 to 30 atomic %, z is from 0.1 to 15 atomic %, and x/z is optionally greater than 0.25, wherein substantially none of the fluorine is bonded to the carbon. A CVD method includes: (a) providing a substrate within a vacuum chamber; (b) introducing into the vacuum chamber gaseous reagents including a fluorine-providing gas, an oxygen-providing gas and at least one precursor gas selected from an organosilane and an organosiloxane; and (c) applying energy to the gaseous reagents in the chamber to induce reaction of the gaseous reagents and to form the film on the substrate.

    摘要翻译： 有机氟硅酸盐玻璃膜含有有机物质和无机氟，不含大量的碳氟化合物。 优选的膜由式SivOwCxHyFz表示，其中v + w + x + y + z = 100％，v为10至35原子％，w为10至65原子％，y为10至50原子％，x 为1〜30原子％，z为0.1〜15原子％，x / z任选大于0.25，基本上没有氟与碳键合。 CVD方法包括：（a）在真空室内提供衬底; （b）在真空室中引入气体试剂，其中包括提供供气的气体，供氧气体和至少一种选自有机硅烷和有机硅氧烷的前体气体; 和（c）向室中的气态试剂施加能量以诱导气态试剂的反应并在基底上形成膜。

    Low loss silicon oxynitride optical waveguide, a method of its manufacture and an optical device
    6.
    发明申请
    Low loss silicon oxynitride optical waveguide, a method of its manufacture and an optical device 审中-公开
    低损耗氮氧化硅光波导，其制造方法和光学器件

    公开(公告)号：US20070147766A1

    公开(公告)日：2007-06-28

    申请号：US10579244

    申请日：2004-11-10

    申请人： Kent Mattsson ,  Lars Nielsen

    发明人： Kent Mattsson ,  Lars Nielsen

    IPC分类号： G02B6/00

    CPC分类号： C03C3/045 ,  C03C17/3435

    摘要： The invention relates to an optical waveguide for guiding light in a predefined wavelength range, the optical waveguide comprising core and cladding regions for confining light, the core and/or cladding region or regions being formed on a substrate and comprising material of the stoichiometric composition SiaOxNyXzH. The invention further relates to a method of manufacturing an optical waveguide, an optical waveguide obtainable by the method and an optical device comprising such a waveguide. The object of the present invention is to provide an optical waveguide with low optical loss due to a reduced hydrogen bond-originated absorption. The problem is solved in that X is selected from the group of elements B, Al, P, S, As, Sb and combinations thereof, and the ratio y/z is larger than 1. This has the advantage that a low optical absorption in the waveguide may be achieved, possibly over a broad wavelength range. Further, a relatively low annealing temperature may be used yielding a relatively low induced strain whereby a low birefringence may be achieved. The optical waveguide may e.g. be manufactured by PECVD, which is ideal for the further processing of low loss waveguides. Waveguides according to the invention show superior transmission characterized with losses below 0.05 dB/cm between 900 nm and 1600 nm. In particular the absorption due to the second overtone of the Si:N—H vibration may be lowered to a value below the detection level. The invention may e.g. be used for the optical communications systems, in particular for branching components (e.g. splitters) and components for wavelength division multiplexing (WDM) systems, e.g. telecommunication systems, fibre-to-the-home, etc.

    摘要翻译： 本发明涉及一种用于引导预定波长范围的光的光波导，该光波导包括用于限制光的芯和包层区域，在基底上形成的芯和/或包层区域或区域包括化学计量组成Si的材料 一个或多个，一个或多个，一个或多个。 本发明还涉及一种制造光波导的方法，通过该方法获得的光波导和包括这种波导的光学装置。 本发明的目的是提供一种由于氢键起始吸收降低而导致光损耗低的光波导。 解决的问题是X选自元素B，Al，P，S，As，Sb及其组合，y / z比大于1.这具有以下优点： 可以在宽波长范围内实现波导。 此外，可以使用相对低的退火温度，产生相对低的诱导应变，由此可以实现低双折射。 光波导可以例如。 由PECVD制造，是进一步处理低损耗波导的理想选择。 根据本发明的波导显示出在900nm和1600nm之间的损耗低于0.05dB / cm的优良传输。 特别地，由于Si：N-H振动的第二泛音引起的吸收可能降低到低于检测水平的值。 本发明可以例如 用于光通信系统，特别是用于分支组件（例如，分离器）和用于波分复用（WDM）系统的组件，例如， 电信系统，光纤到户等

    Low dielectric constant material and method of processing by CVD
    8.
    发明申请
    Low dielectric constant material and method of processing by CVD 失效
    低介电常数材料和通过CVD处理的方法

    公开(公告)号：US20030162034A1

    公开(公告)日：2003-08-28

    申请号：US10317807

    申请日：2002-12-12

    发明人： Mark Leonard O'Neill ,  Aaron Scott Lukas ,  Mark Daniel Bitner ,  Jean Louise Vincent ,  Raymond Nicholas Vrtis ,  Brian K. Peterson

    IPC分类号： B32B009/00 ,  C03C003/062 ,  C03C003/112

    CPC分类号： C03C3/04 ,  C03C3/045 ,  C03C14/00 ,  C03C14/008 ,  C23C16/30 ,  C23C16/401 ,  H01L21/02131 ,  H01L21/02203 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02337 ,  H01L21/3122 ,  H01L21/3127 ,  H01L21/316 ,  H01L21/31629 ,  H01L21/31633 ,  Y10T428/31663

    摘要： Organofluorosilicate glass films contain both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species. Preferred films are represented by the formula SivOwCxHyFz, where vnullwnullxnullynullznull100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic % y is from 10 to 50 atomic %, x is from 1 to 30 atomic %, z is from 0.1 to 15 atomic %, and x/z is optionally greater than 0.25, wherein substantially none of the fluorine is bonded to the carbon. In one embodiment there is provided a CVD method that includes: providing a substrate within a vacuum chamber; introducing into the vacuum chamber gaseous reagents including a fluorine-providing gas, an oxygen-providing gas and at least one precursor gas selected from an organosilane and an organosiloxane; and applying energy to the gaseous reagents in the chamber to induce reaction of the gaseous reagents and to form the film on the substrate.

    摘要翻译： 有机氟硅酸盐玻璃膜含有有机物质和无机氟，不含大量的碳氟化合物。 优选的膜由式SivOwCxHyFz表示，其中v + w + x + y + z = 100％，v为10至35原子％，w为10至65原子％，y为10至50原子％，x 为1〜30原子％，z为0.1〜15原子％，x / z任选大于0.25，基本上没有氟与碳键合。 在一个实施例中，提供了一种CVD方法，其包括：在真空室内提供衬底; 向真空室中引入包含供氟气体，供氧气体和选自有机硅烷和有机硅氧烷的至少一种前体气体的气态试剂; 并向腔室中的气态试剂施加能量以诱导气态试剂的反应并在衬底上形成膜。

    Silicon carboxide composite reinforced with ceramic fibers having a surface enriched in boron nitride
    10.
    发明授权
    Silicon carboxide composite reinforced with ceramic fibers having a surface enriched in boron nitride 失效
    用具有富含氮化硼的表面的陶瓷纤维增强的硅羧化合物复合物

    公开(公告)号：US5955194A

    公开(公告)日：1999-09-21

    申请号：US489424

    申请日：1995-06-12

    申请人： Scott Sager Campbell

    发明人： Scott Sager Campbell

    IPC分类号： C03C3/04 ,  C03C14/00 ,  C04B35/80 ,  C04B41/45 ,  C03B29/00 ,  B32B9/00

    CPC分类号： C04B35/806 ,  C03C14/002 ,  C03C3/045 ,  C04B35/803 ,  C04B41/4584 ,  C03C2214/03 ,  C03C2214/20 ,  Y10S501/905 ,  Y10T428/2916 ,  Y10T428/2929 ,  Y10T428/2933 ,  Y10T428/2949

    摘要： An improved fiber reinforced glass composite includes a boron-containing refractory fiber having its surface enriched with boron nitride in a matrix of a black glass ceramic having the empirical formula SiCxOy where x ranges from about 0.5 to about 2.0, preferably 0.9 to 1.6 and y ranges from about 0.5 to 3.0, preferably 0.7 to 1.8. Preferably the black glass ceramic is derived from cyclosiloxane or non-cyclic siloxane monomers containing a vinyl group attached to silicon and/or a hydride-silicon group. The boron nitride-containing fiber is the product of treating the boron-containing fiber with ammonia at a temperature between about 1100.degree. C. and 1250.degree. C. Fibrous failure rather than brittle failure under stress can be obtained.

    摘要翻译： 改进的纤维增强玻璃复合材料包括其表面富含氮化硼的含硼耐火纤维，其具有经验式为SiC x O y的黑色玻璃陶瓷的基体，其中x为约0.5至约2.0，优选为0.9至1.6，y范围为 约0.5至3.0，优选0.7至1.8。 优选地，黑色玻璃陶瓷衍生自环硅氧烷或含有连接到硅和/或氢化物 - 硅基团的乙烯基的非环状硅氧烷单体。 含氮化硼的纤维是在约1100℃至1250℃的温度下用氨处理含硼纤维的产物。可以获得纤维失效而不是应力下的脆性破坏。