公开(公告)号：US20110001816A1

公开(公告)日：2011-01-06

申请号：US12736157

申请日：2009-03-19

Applicant: Isao Yonekura ,  Hidemitsu Hakii

Inventor： Isao Yonekura ,  Hidemitsu Hakii

IPC: H04N7/18

CPC classification number: G01B15/04 ,  G01B2210/56 ,  G01N23/00 ,  G06T7/0006 ,  G06T7/13 ,  G06T2207/10061 ,  G06T2207/10152 ,  G06T2207/30148 ,  G21K7/00 ,  H01J2237/221 ,  H01J2237/2611 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A microstructure inspection method which inspects an angle of a sidewall of a sample microstructure pattern, the method including: taking SEM photographs of the sample microstructure pattern under plural SEM conditions; measuring a width of a white band at an edge portion of the sample microstructure pattern in the SEM photographs; and calculating the angle of the sidewall of the sample microstructure pattern on the basis of an amount of change in the width of the white band due to the change between the plural SEM conditions.

Abstract translation: 一种微观结构检查方法，其检查样品微观结构图案的侧壁的角度，所述方法包括：在多个SEM条件下取样品微结构图案的SEM照片; 在SEM照片中测量样品微结构图案的边缘部分处的白色带宽; 并且基于由于多个SEM条件之间的变化引起的白带宽度的变化量，计算样品微结构图案的侧壁的角度。

公开(公告)号：US20110001046A1

公开(公告)日：2011-01-06

申请号：US12735887

申请日：2009-02-23

Applicant: Kanetada Nagamine

Inventor： Kanetada Nagamine

IPC: G01N23/22

CPC classification number: G01N23/22 ,  G01B15/04 ,  G01N33/383

Abstract: The invention provides a nondestructive inspection apparatus and nondestructive inspection method for inspecting the inside of a surface layer of a composite structure using cosmic-ray muons. The nondestructive inspection apparatus is to inspect the inside of the surface layer of a composite structure 11 using cosmic-ray muons 12 incoming substantially in the horizontal direction with being spin polarized by a given amount in the incoming direction, and has positron/electron amount detecting means 13 for detecting a positron/electron amount reflection-emitted having a characteristic time constant in the direction opposite to the incoming direction of the cosmic-ray muons 12 by the decay of the cosmic-ray muons 12 stopping inside the composite structure 11, and radiography data processing means 14, 15, 16 for data-processing a state of the second substance 11-2 different from the first substance 11-1 of the surface layer existing inside the surface layer of the composite structure 11 as radiography to output, from the positron/electron amount detected in the positron/electron detecting means 13.

Abstract translation: 本发明提供了一种用于使用宇宙射线μ子检查复合结构的表面层的内部的非破坏性检查装置和非破坏性检查方法。 非破坏性检查装置是使用基本上沿水平方向输入的宇宙射线管子12检查复合结构体11的表面层的内部，在入射方向上被自旋极化一定量，并且具有正电子/电子量检测 用于通过停止在复合结构11内的宇宙射线μ子12的衰减来检测具有与宇宙射线μ子12的入射方向相反的方向的特征时间常数的正电子/电子量反射发射的装置13，以及 用于数据处理与复合结构11的表层内存在的表层的第一物质11-1不同的第二物质11-2的状态的放射线照相数据处理装置14,15,16，作为放射线照相输出， 在正电子/电子检测装置13中检测到的正电子/电子量。

公开(公告)号：US07663103B2

公开(公告)日：2010-02-16

申请号：US11726966

申请日：2007-03-23

Applicant: Masayuki Kuribara ,  Jun Matsumoto

Inventor： Masayuki Kuribara ,  Jun Matsumoto

IPC: G01N23/225

CPC classification number: G01B15/04 ,  G01N23/225 ,  H01J2237/24535 ,  H01J2237/24578 ,  H01J2237/248 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.

Abstract translation: 线宽测量调整方法，用于当用于测量线宽度的第一和第二电子束强度分布由分别通过在第一放大倍率下用电子束扫描第一照射距离获得的二次电子的强度分布图像产生时， 通过在第二倍率下用电子束扫描第二照射距离，包括以第二倍率调整电子束的第二电子束强度分布的步骤，使得第二电子束强度分布等于第一电子束强度分布 的电子束。 可以通过在产生电子束强度分布时增加或减少第二照射距离来调节第二电子束强度分布。

公开(公告)号：US20080310754A1

公开(公告)日：2008-12-18

申请号：US11818876

申请日：2007-06-15

Applicant: Morteza Safai ,  Gary E. Georgeson ,  Talion Edwards ,  John W. Finlayson

Inventor： Morteza Safai ,  Gary E. Georgeson ,  Talion Edwards ,  John W. Finlayson

IPC: G06K9/40

CPC classification number: G01C11/00 ,  G01B15/04 ,  G01V5/0025

Abstract: Exemplary systems and methods are provided for imaging a unit under test. Orientation of an imaging system is determined with a machine vision system, a unit under test is scanned with the imaging system, and the scanned image is processed into a substantially distortion-free image. The scanned image may be processed into a substantially distortion-free image by mapping a scanned image to coordinates determined by the machine vision system. By combining the position and orientation information collected at the time each image pixel is collected, the image can be assembled without distortion by mapping a detector signal to the appropriate image coordinate. Alternately, the scanned image may be processed into a substantially distortion-free image by mapping a scanned image to a predetermined matrix grid of coordinates, identifying distortion in the scanned image, and correcting identified distortion in the scanned image.

Abstract translation: 提供了示例性系统和方法用于对被测单元进行成像。 使用机器视觉系统确定成像系统的取向，用成像系统扫描被测单元，并将扫描图像处理成基本上无失真的图像。 扫描图像可以通过将扫描图像映射到由机器视觉系统确定的坐标而被处理成基本无畸变的图像。 通过组合在收集每个图像像素时收集的位置和方向信息，可以通过将检测器信号映射到适当的图像坐标来组合图像而不失真。 或者，扫描图像可以通过将扫描图像映射到预定的坐标矩阵网格来识别基本上无失真的图像，识别扫描图像中的失真，以及校正已扫描图像中的识别失真。

公开(公告)号：US20080075227A1

公开(公告)日：2008-03-27

申请号：US11597625

申请日：2005-05-24

Applicant: Ralf Christoph ,  Wolfgang Rauh

Inventor： Ralf Christoph ,  Wolfgang Rauh

IPC: G01B15/00 ,  G01D18/00

CPC classification number: G01B15/00 ,  A61B6/4417 ,  A61B6/583 ,  A61B6/584 ,  G01B15/04 ,  G01N23/046 ,  G01N23/083 ,  G01N2223/1006 ,  G01N2223/3306 ,  G01N2223/419 ,  G01T7/005 ,  G01T7/10

Abstract: The invention relates to a coordinate measuring apparatus (110) for measuring an object (3), comprising an x-ray sensory mechanism as a first sensory mechanism that is provided with an x-ray source (10) and at least one x-ray sensor (7) which detects the x-rays, and a second sensory mechanism such as a tactile and/or an optical sensory mechanism (8, 11; 9) that can be placed in the x, y, and/or z direction of the coordinate measuring apparatus in relation to the object. In order to be able to easily measure also large-size test objects, the x-ray sensory mechanism (7, 10) can be positioned in the coordinate measuring apparatus (10) according to the second sensory mechanism (8, 11; 9).

Abstract translation: 本发明涉及一种用于测量物体（3）的坐标测量装置（110），该坐标测量装置包括一个x射线感觉机构，作为设置有X射线源（10）的第一感觉机构和至少一个x射线 检测X射线的传感器（7），以及可以放置在x，y和/或z方向上的第二感觉机构，例如触觉和/或光学感觉机构（8,11; 9） 相对于物体的坐标测量装置。 为了能够容易地测量大尺寸的试验对象，可以根据第二感官机构（8,11; 9）将X射线感觉机构（7,10）定位在坐标测量装置（10）中， 。

公开(公告)号：US20080015813A1

公开(公告)日：2008-01-17

申请号：US11728822

申请日：2007-03-27

Applicant: Jun Matsumoto

Inventor： Jun Matsumoto

IPC: G01B15/04

CPC classification number: G01N23/227 ,  G01B15/04 ,  G06T7/12 ,  G06T2207/10061

Abstract: A pattern measurement apparatus includes a line profile creating unit for creating a line profile of a pattern formed on a sample by scanning with a charged particle beam, a derivative profile creating unit for creating a second derivative profile by differentiating twice the line profile, and an edge detecting unit for judging whether an edge in the pattern is a rising edge or a falling edge by use of two peak positions and two peak values appearing in the vicinity of an edge position of the pattern obtained from the second derivative profile. Assuming that the two peak positions appearing in the vicinity of the edge position of the pattern obtained from the second derivative profile are defined as X1 and X2, X2 being larger than X1, the edge detecting-unit judges that the edge is a rising edge when a signal amount in the peak position X1 is larger than a signal amount in the peak position X2.

Abstract translation: 图案测量装置包括：线轮廓生成单元，用于通过用带电粒子束扫描来产生在样本上形成的图案的线轮廓;导数轮廓创建单元，用于通过对线轮廓进行微分来产生二阶导数轮廓， 边缘检测单元，用于通过使用出现在从第二导数轮廓获得的图案的边缘位置附近出现的两个峰值位置和两个峰值来判断图案中的边缘是上升沿还是下降沿。 假设出现在从二次导数轮廓获得的图案的边缘位置附近出现的两个峰值位置被定义为X 1和X 2，X 2大于X 1，则边缘检测单元判断边缘是 当峰值位置X 1中的信号量大于峰值位置X 2中的信号量时的上升沿。

公开(公告)号：US20070195311A1

公开(公告)日：2007-08-23

申请号：US11359256

申请日：2006-02-22

Applicant: Courtney Morgan ,  William Hall

Inventor： Courtney Morgan ,  William Hall

IPC: G01B9/00 ,  G01B11/24

CPC classification number: G01N23/00 ,  A61F2/16 ,  G01B15/04

Abstract: The invention relates to an apparatus and method for non-contact/non-destructive measurement of the geometry of molded ophthalmic lenses and the precision molds and tooling used in the manufacture of the ophthalmic lenses. In particular the present system uses micro computed tomography to measure the geometries.

Abstract translation: 本发明涉及一种用于非接触/非破坏性测量模制眼镜片的几何形状的设备和方法以及用于制造眼科镜片的精密模具和模具。 特别地，本系统使用微计算机断层摄影来测量几何形状。

公开(公告)号：US07230241B2

公开(公告)日：2007-06-12

申请号：US11052467

申请日：2005-02-08

Applicant: Manfred Moert ,  Thomas Hingst

Inventor： Manfred Moert ,  Thomas Hingst

IPC: G01N23/00 ,  H01L21/66

CPC classification number: G01B15/04 ,  G01B11/30 ,  H01J2237/2814 ,  H01L22/12

Abstract: The invention relates to a method for matching a first measurement method for measuring structure widths of trapezoidally tapering structures on a substrate wafer to a second measurement method for measuring the structure widths. This is performed in order to obtain measured values for the structure width which are comparable with one another. The second measurement method is suitable for measuring a second structure width at an unknown second height above the surface of the substrate, and the first measurement method is suitable for measuring a first structure width at a first height, the first height being settable.

Abstract translation: 本发明涉及一种用于匹配用于测量衬底晶片上的梯形渐变结构的结构宽度的第一测量方法与用于测量结构宽度的第二测量方法相匹配的方法。 这是为了获得彼此可比较的结构宽度的测量值而进行的。 第二测量方法适于测量基板表面以上未知第二高度的第二结构宽度，并且第一测量方法适用于测量第一高度处的第一结构宽度，第一高度可设定。

公开(公告)号：US20060201246A1

公开(公告)日：2006-09-14

申请号：US11194947

申请日：2005-08-02

Applicant: Ilona Rolfes ,  Thomas Musch

Inventor： Ilona Rolfes ,  Thomas Musch

IPC: G01F23/00

CPC classification number: G01F23/284 ,  G01B15/04

Abstract: A method for measuring the fill level of a medium in a container by applying the radar principle, whereby a measuring signal is generated and transmitted in the direction of the medium. A retroreflected portion of the measuring signal is captured and the fill level is determined as a function of the runtime of the measuring signal. The measuring signal is transmitted into multiple mutually different regions and the retroreflected portions of the measuring signal is received at multiple receiving points. In this fashion, it is possible to at least approximate the surface structure of the medium in the container.

Abstract translation: 一种用于通过应用雷达原理来测量容器中的介质的填充量的方法，由此产生测量信号并沿介质的方向传输测量信号。 捕获测量信号的回射部分，并且根据测量信号的运行时间确定填充水平。 测量信号被发送到多个相互不同的区域，并且在多个接收点处接收测量信号的回射部分。 以这种方式，可以至少近似容器中介质的表面结构。

公开(公告)号：US07049589B2

公开(公告)日：2006-05-23

申请号：US10752527

申请日：2004-01-08

Applicant: Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Ryuta Tsuchiya ,  Hiroki Kawada ,  Shozo Yoneda

Inventor： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Ryuta Tsuchiya ,  Hiroki Kawada ,  Shozo Yoneda

IPC: G01N23/00

CPC classification number: G01B15/04 ,  G01B15/08

Abstract: The present invention may include a pattern inspection method of extracting a pattern edge shape from an image obtained by a scanning microscope and inspecting the pattern. A control section and a computer of the scanning microscope process the intensity distribution of reflected electrons or secondary electrons, find the distribution of gate lengths in a single gate from data about edge positions, estimate the transistor performance by assuming a finally fabricated transistor to be a parallel connection of a plurality of transistors having various gate lengths, and determine the pattern quality and grade based on an estimated result. In this manner, it is possible to highly, accurately and quickly estimate an effect of edge roughness on the device performance and highly accurately and efficiently inspect patterns in accordance with device specifications.

Abstract translation: 本发明可以包括从由扫描显微镜获得的图像中提取图案边缘形状并检查图案的图案检查方法。 扫描显微镜的控制部分和计算机处理反射电子或二次电子的强度分布，从关于边缘位置的数据中找到单个栅极中栅极长度的分布，通过假设最终制造的晶体管为 具有各种栅极长度的多个晶体管的并联连接，并且基于估计结果确定图案质量和等级。 以这种方式，可以高度，准确和快速地估计边缘粗糙度对器件性能的影响，并且根据器件规格高精度和有效地检查图案。