公开(公告)号：US20090193387A1

公开(公告)日：2009-07-30

申请号：US12019125

申请日：2008-01-24

申请人： Maharaj Mukherjee ,  James A. Culp ,  Alan E. Rosenbluth

发明人： Maharaj Mukherjee ,  James A. Culp ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： A method is provided for designing a mask that includes the use of a pixel-based simulation of a lithographic process model, in which test structures are designed for determining numerical and discretization errors associated with the pixel grid as opposed to other model inaccuracies. The test structure has a plurality of rows of the same sequence of features, but each row is offset from other rows along an x-direction by a multiple of a minimum step size, such as used in modifying masks during optical proximity correction. The images for each row are simulated with a lithographic model that uses the selected pixel-grid size and the differences between row images are compared. If the differences between rows exceed or violate a predetermined criterion, the pixel grid size may be modified to minimize discretization and/or numerical errors due to the choice of pixel grid size.

摘要翻译： 提供了一种用于设计包括使用光刻处理模型的基于像素的仿真的掩模的方法，其中测试结构被设计用于确定与像素网格相关的数值和离散化误差，而不是其他模型不准确。 测试结构具有相同序列特征的多行，但是每一行都沿x方向与其他行偏移最小步长的倍数，例如在光学邻近校正期间用于修改掩模。 使用所选择的像素网格大小的光刻模型来模拟每行的图像，并比较行图像之间的差异。 如果行之间的差异超过或违反预定标准，则可以修改像素网格大小以使由于像素网格大小的选择而导致的离散化和/或数值误差最小化。

公开(公告)号：US20090180711A1

公开(公告)日：2009-07-16

申请号：US12015084

申请日：2008-01-16

申请人： Mark A. Lavin ,  Maharaj Mukherjee ,  Alan E. Rosenbluth

发明人： Mark A. Lavin ,  Maharaj Mukherjee ,  Alan E. Rosenbluth

IPC分类号： G06K9/36

CPC分类号： G03F7/705 ,  G03F1/36

摘要： A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering.

摘要翻译： 公开了一种用于渲染掩模的方法，系统和计算机程序产品。 渲染掩模的方法可以包括：提供用于光刻工艺的初始掩模设计，初始掩模设计包括多边形; 最初在基于像素的图像计算中将初始掩模设计呈现为粗糙掩模表示; 识别突出部分; 并且使用一组子空间渲染悬伸部分，其中来自空间定位的伪像位于具有大于在光刻工艺中使用的投影透镜的数值孔径的假透镜的实际分辨率之外; 并基于突出部分呈现来更新初始呈现。

公开(公告)号：US20090040486A1

公开(公告)日：2009-02-12

申请号：US12208358

申请日：2008-09-11

申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

IPC分类号： G03B27/42

CPC分类号： G03F7/70216

摘要： A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

摘要翻译： 一种用于使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于对图像的光敏感区域的方法和系统。 采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。 成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。 反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。 选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分 从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

公开(公告)号：US20080184189A1

公开(公告)日：2008-07-31

申请号：US11627418

申请日：2007-01-26

申请人： Alan E. Rosenbluth

发明人： Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： A set of candidate global optima is identified, one of which is a global solution for making a mask for printing a lithographic pattern. A solution space is formed from dominant joint eigenvectors that is constrained for bright and dark areas of the printed pattern. The solution space is mapped to identify regions each containing at most one local minimum intensity. For each selected region, stepped intensity contours are generated for intensity of the dark areas and stepped constraint surfaces are generated for a target exposure dose at an individual test point. An individual test point is stepped toward a lowest intensity contour along the stepped constraint surfaces of each selected region. Further lowering of the intensities of these points is also detailed, where possible in adjacent regions, to yield final test points. The set of candidate global optima is the final test points at their respective lowest intensity contour of the respective selected regions.

摘要翻译： 确定一组候选全局最优值，其中之一是制作用于印刷光刻图案的掩模的全球解决方案。 由占优的联合特征向量形成解决空间，该特征向量被限制在印刷图案的明暗区域。 映射空间被映射以识别每个最多包含一个局部最小强度的区域。 对于每个选择的区域，针对暗区的强度产生阶梯强度轮廓，并且在单个测试点处针对目标曝光剂量产生阶梯式约束表面。 单个测试点沿着每个选定区域的阶梯式约束表面朝向最低强度轮廓。 在相邻区域可能的情况下，这些点的强度进一步降低也是详细的，以产生最终的测试点。 候选全局最优的集合是各自选定区域各自最低强度轮廓的最终测试点。

公开(公告)号：US07366342B2

公开(公告)日：2008-04-29

申请号：US10694299

申请日：2003-10-27

申请人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06K9/00

CPC分类号： G03F1/36

摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.

摘要翻译： 方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。 在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。 确定角位置，并且切割线的切割线的第一和第二部分位于切割线和多边形的侧边缘之间的交叉点的相对侧上，随后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。 以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

公开(公告)号：US07343582B2

公开(公告)日：2008-03-11

申请号：US11138172

申请日：2005-05-26

申请人： Maharaj Mukherjee ,  Scott M. Mansfield ,  Alan E. Rosenbluth ,  Kafai Lai

发明人： Maharaj Mukherjee ,  Scott M. Mansfield ,  Alan E. Rosenbluth ,  Kafai Lai

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G03F1/36 ,  G03F7/70441 ,  G06F2217/12 ,  Y02P90/265

摘要： A method, program product and system is disclosed for performing optical proximity correction (OPC) wherein mask shapes are fragmented based on the effective image processing influence of neighboring shapes on the shape to be fragmented. Neighboring shapes are smoothed prior to determining their influence on the fragmentation of the shape of interest, where the amount of smoothing of a neighboring shape increases as the influence of the neighboring shape on the image process of the shape of interest decreases. A preferred embodiment includes the use of multiple regions of interactions (ROIs) around the shape of interest, and assigning a smoothing parameter to a given ROI that increases as the influence of shapes in that ROI decreases with respect to the shape to be fragmented. The invention provides for accurate OPC that is also efficient.

摘要翻译： 公开了一种用于执行光学邻近校正（OPC）的方法，程序产品和系统，其中基于相邻形状对要分段的形状的有效图像处理影响，掩模形状被分段。 相邻形状在确定其对感兴趣的形状的碎片的影响之前被平滑，其中相邻形状的平滑化量随着相关形状对感兴趣形状的图像处理的影响而增加。 优选实施例包括使用感兴趣的形状周围的多个交互区域（ROI），以及为给定的ROI分配平滑参数，随着该ROI中的形状的影响相对于待分割的形状而减小。 本发明提供了也是有效的精确OPC。

公开(公告)号：US07287239B2

公开(公告)日：2007-10-23

申请号：US10694473

申请日：2003-10-27

申请人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

摘要翻译： 方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。 计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。 然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。 对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。 然后使用这个折叠的第二个多边形来校正光学接近度。

公开(公告)号：US07079223B2

公开(公告)日：2006-07-18

申请号：US10783938

申请日：2004-02-20

申请人： Alan E. Rosenbluth ,  Gregg M. Gallatin ,  Ronald L. Gordon ,  Nakgeuon Seong ,  Alexey Y. Lvov ,  William D. Hinsberg ,  John A. Hoffnagle ,  Frances A. Houle ,  Martha I. Sanchez

发明人： Alan E. Rosenbluth ,  Gregg M. Gallatin ,  Ronald L. Gordon ,  Nakgeuon Seong ,  Alexey Y. Lvov ,  William D. Hinsberg ,  John A. Hoffnagle ,  Frances A. Houle ,  Martha I. Sanchez

IPC分类号： G03B27/42

CPC分类号： G03F7/705 ,  G03F1/36 ,  G03F7/70441

摘要： A method and system is provided for computing lithographic images that may take into account non-scalar effects such as lens birefringence, resist stack effects, tailored source polarizations, and blur effects of the mask and the resist. A generalized bilinear kernel is formed, which is independent of the mask transmission function, and which may then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Weighted pre-images may be formed from a coherent sum of pre-computed convolutions of the dominant eigenfunctions of the generalized bilinear kernel with the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel. The resulting image can then be used to perform model-based optical proximity correction (MBOPC).

摘要翻译： 提供了一种用于计算光刻图像的方法和系统，其可以考虑非标量效应，例如透镜双折射，抗蚀剂堆叠效应，定制的源极化以及掩模和抗蚀剂的模糊效果。 形成广义双线性核，其与掩模传递函数无关，然后可以使用分解来处理，以允许快速计算包括这种非标量效应的图像。 加权预图像可以由广义双线性核的主要本征函数与适当的掩模多边形扇区的预先计算的卷积的相干和形成。 一点上的图像可以由广义双线性核的所有主要特征函数上的加权预图像的非相干和形成。 然后，所得到的图像可用于执行基于模型的光学邻近校正（MBOPC）。

公开(公告)号：US07055126B2

公开(公告)日：2006-05-30

申请号：US10694339

申请日：2003-10-27

申请人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/5068

摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchal arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchal arrangement to ultimately correct for optical lithography.

摘要翻译： 方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。 该布局代表了所需的设计数据层次结构。 然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。 使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。 截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。 使用这些存储桶生成层次排列，并且使用层级排列来强制执行所需的设计数据层级，以最终校正光学光刻。

公开(公告)号：US06798475B2

公开(公告)日：2004-09-28

申请号：US09260869

申请日：1999-03-02

申请人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

发明人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

IPC分类号： G02F11335

CPC分类号： H04N9/3105 ,  G02B27/283 ,  G02F1/134336 ,  G02F1/1396

摘要： A liquid crystal (LC) lightvalve comprising a twisted nematic LC layer whose molecules are aligned with pixel edges at the mirror backplane, thereby providing improved contrast and efficiency, and reduced visibility of post spacers in black state. The present invention is directed to an LC structure wherein the backplane is rubbed in a direction rectilinear with pixel edges. The LC layer is given the same twist rotation and birefringence as in the conventional TN lightvalve. Polarization control is maintained by illuminating the lightvalve with light whose polarization is rotated by the twist angle relative to the x,y, pixel axes, and by collecting the orthogonally polarized component of the reflected light. The lightvalve top glass is thus rubbed in a direction which is rotated by the twist angle from the horizontal or vertical direction at which the backplane is rubbed.

摘要翻译： 一种液晶（LC）光阀，其包括扭曲向列LC层，其分子与镜面背板上的像素边缘对准，从而提供改善的对比度和效率，并降低后隔片在黑色状态下的可视性。 本发明涉及一种LC结构，其中背板沿着具有像素边缘的直线方向摩擦。 给出LC层与常规TN光阀相同的扭转旋转和双折射。 通过用偏振相对于x，y，像素轴旋转扭转角的光并通过收集反射光的正交偏振分量来照射光阀来维持极化控制。 因此，光阀顶玻璃沿着背板被摩擦的水平或垂直方向旋转扭转角的方向摩擦。