Fast model-based optical proximity correction
    1.
    发明授权
    Fast model-based optical proximity correction 失效
    基于快速模型的光学邻近校正

    公开(公告)号:US07079223B2

    公开(公告)日:2006-07-18

    申请号:US10783938

    申请日:2004-02-20

    IPC分类号: G03B27/42

    摘要: A method and system is provided for computing lithographic images that may take into account non-scalar effects such as lens birefringence, resist stack effects, tailored source polarizations, and blur effects of the mask and the resist. A generalized bilinear kernel is formed, which is independent of the mask transmission function, and which may then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Weighted pre-images may be formed from a coherent sum of pre-computed convolutions of the dominant eigenfunctions of the generalized bilinear kernel with the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel. The resulting image can then be used to perform model-based optical proximity correction (MBOPC).

    摘要翻译: 提供了一种用于计算光刻图像的方法和系统,其可以考虑非标量效应,例如透镜双折射,抗蚀剂堆叠效应,定制的源极化以及掩模和抗蚀剂的模糊效果。 形成广义双线性核,其与掩模传递函数无关,然后可以使用分解来处理,以允许快速计算包括这种非标量效应的图像。 加权预图像可以由广义双线性核的主要本征函数与适当的掩模多边形扇区的预先计算的卷积的相干和形成。 一点上的图像可以由广义双线性核的所有主要特征函数上的加权预图像的非相干和形成。 然后,所得到的图像可用于执行基于模型的光学邻近校正(MBOPC)。

    System for converting optical beams to collimated flat-top beams
    2.
    发明授权
    System for converting optical beams to collimated flat-top beams 有权
    将光束转换成准直平顶梁的系统

    公开(公告)号:US06801368B2

    公开(公告)日:2004-10-05

    申请号:US10679058

    申请日:2003-10-02

    IPC分类号: G02B1318

    摘要: An optical beam transformation system includes a first and a second optical element, each of which has a non-reentrant surface. The system transforms a substantially non-uniform optical input beam (such as a Gaussian) to a substantially uniform output beam. The first and second optical elements are arranged in either a Keplerian or Galilean configuration. The aspheric surface of the second optical element is related to the aspheric surface of the first optical element by a ray-tracing function that maps substantially all of an input light beam that is incident on the first optical element to a collimated output light beam that is output from the second optical element. Preferably, the output light beam has a Fermi-Dirac intensity distribution, and the ray-tracing function maps the input light beam to the output beam out to the (1/e)6 intensity radius of the input light beam.

    摘要翻译: 光束转换系统包括第一和第二光学元件,每个光学元件具有非凹入表面。 系统将基本上不均匀的光输入光束(例如高斯)转换成基本均匀的输出光束。 第一和第二光学元件以开普勒或伽利略配置布置。 第二光学元件的非球面通过光线跟踪功能与第一光学元件的非球面相关,该光线跟踪功能将入射在第一光学元件上的输入光束基本上全部映射到准直的输出光束 从第二光学元件输出。 优选地,输出光束具有费米 - 迪拉克强度分布,并且光线跟踪功能将输入光束映射到输入光束的输出光束的(1 / e)6强度半径。

    Atomic clock employing ion trap of mono- or multi-planar geometry
    3.
    发明授权
    Atomic clock employing ion trap of mono- or multi-planar geometry 失效
    采用单平面或多平面几何离子阱的原子钟

    公开(公告)号:US5379000A

    公开(公告)日:1995-01-03

    申请号:US81505

    申请日:1992-10-30

    摘要: An atomic clock system employs one of a family of ion trap configurations confining an ion in a potential well, such that a vibrational frequency confined ion may be measured accurately. The ion traps disclassed for use in such atomic clock systems include configurations of ring-shaped conductive members, or sheets of conductive material having circular holes therein. The trap apparatus further has a means to apply an RF field such that the resulting electric field being generated in a space defined by the conductive members has a characteristic of a substantially quadrupole field whereby a charged particle, being injected into the space, is confined in said field, maintaining a dynamic equilibrium condition.

    摘要翻译: 原子钟系统采用将离子限制在势阱中的一系列离子阱配置中的一种,使得可以精确地测量振动频率限制离子。 分离用于这种原子钟系统的离子阱包括环形导电构件或其中具有圆形孔的导电材料的构造。 陷阱装置还具有施加RF场的装置,使得在由导电构件限定的空间中产生的所得电场具有基本上四极场的特性,由此将注入空间的带电粒子限制在 该领域保持动态平衡状态。

    Bleachable materials for lithography
    4.
    发明申请
    Bleachable materials for lithography 有权
    用于光刻的可漂洗材料

    公开(公告)号:US20080182178A1

    公开(公告)日:2008-07-31

    申请号:US11698182

    申请日:2007-01-25

    IPC分类号: G03C1/00 G03F1/00

    摘要: Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organosilicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals “R” and “Y” represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.

    摘要翻译: 包含可光漂白有机材料的组合物可以用193nm的光漂白,并且在曝光后通过刺激使其恢复到其初始状态。 (可逆光漂白)。 我们将这些组合物用于本领域已知的对比增强层和作为光致抗蚀剂的一部分,特别是在用于半导体制造的光刻工艺中。 它们可以包括聚合物,例如有机硅聚合物,包含芳族羟基化合物如苯酚和萘酚的聚合物的聚合物,例如苯酚甲醛聚合物和萘酚甲醛聚合物苯乙烯聚合物和酚醛丙烯酸酯聚合物或环状材料,其包含:其中基团“R”和“Y “表示有机或取代的有机部分,结构I,II和III表示碱性有机骨架,并且可以在任何可用的位置被未取代或被任意一个或多个取代基的组合取代。

    Ion traps of mono- or multi-planar geometry and planar ion trap devices
    5.
    发明授权
    Ion traps of mono- or multi-planar geometry and planar ion trap devices 失效
    单平面或多平面几何形状和平面离子阱装置的离子阱

    公开(公告)号:US5248883A

    公开(公告)日:1993-09-28

    申请号:US883798

    申请日:1992-05-12

    摘要: An ion confinement, i.e., trap, apparatus comprises electrically conductive members, including concentric, coplanar rings or parallel sheets separated by dielectric spacers disposed on the outer edges of the sheets, each of the sheets having a circular hole, the circular holes being symmetrically aligned substantially along a common axis. The trap apparatus further has means for applying an RF potential to the conductive members, such that the resulting electric field being generated in the space defined by the conductive members has a characteristic of a substantially quadrupole field. A charged particle, being injected into the space, is confined in the field, maintaining a dynamic equilibrium condition.

    摘要翻译: 离子限制,即陷阱装置包括导电构件,包括同心的共面环或由设置在片的外边缘上的电介质间隔隔开的平行片,每个片具有圆形孔,圆形孔对称对准 基本上沿着公共轴线。 陷阱装置还具有用于向导电构件施加RF电势的装置,使得在由导电构件限定的空间中产生的所得电场具有基本四极场的特性。 注入空间的带电粒子被限制在现场,保持动态平衡状态。

    Bleachable materials for lithography
    6.
    发明授权
    Bleachable materials for lithography 有权
    用于光刻的可漂洗材料

    公开(公告)号:US07875408B2

    公开(公告)日:2011-01-25

    申请号:US11698182

    申请日:2007-01-25

    摘要: Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organo-silicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals “R” and “Y” represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.

    摘要翻译: 包含可光漂白有机材料的组合物可以用193nm的光漂白,并且在曝光后通过刺激使其恢复到其初始状态。 (可逆光漂白)。 我们将这些组合物用于本领域已知的对比增强层和作为光致抗蚀剂的一部分,特别是在用于半导体制造的光刻工艺中。 它们可以包括聚合物,例如有机硅聚合物,包含芳族羟基化合物如苯酚和萘酚的聚合物的聚合物,例如苯酚甲醛聚合物和萘酚甲醛聚合物苯乙烯聚合物和酚醛丙烯酸酯聚合物或环状材料,其包括:其中基团“R”和 “Y”表示有机或取代的有机部分,结构I,II和III表示碱性有机骨架,并且可以在任何可用位置被未取代或被任何一个或多个取代基的组合取代。

    System for converting optical beams to collimated flat-top beams
    7.
    发明授权
    System for converting optical beams to collimated flat-top beams 有权
    将光束转换成准直平顶梁的系统

    公开(公告)号:US06654183B2

    公开(公告)日:2003-11-25

    申请号:US09917370

    申请日:2001-07-27

    IPC分类号: G02B1318

    摘要: An optical beam transformation system includes a first and a second optical element, each of which has a non-reentrant surface. The system transforms a substantially non-uniform optical input beam (such as a Gaussian) to a substantially uniform output beam. The first and second optical elements are arranged in either a Keplerian or Galilean configuration. The aspheric surface of the second optical element is related to the aspheric surface of the first optical element by a ray-tracing function that maps substantially all of an input light beam that is incident on the first optical element to a collimated output light beam that is output from the second optical element. Preferably, the output light beam has a Fermi-Dirac intensity distribution, and the ray-tracing function maps the input light beam to the output beam out to the (1/e)6 intensity radius of the input light beam.

    摘要翻译: 光束转换系统包括第一和第二光学元件,每个光学元件具有非凹入表面。 系统将基本上不均匀的光输入光束(例如高斯)转换成基本均匀的输出光束。 第一和第二光学元件以开普勒或伽利略配置布置。 第二光学元件的非球面通过光线跟踪功能与第一光学元件的非球面相关,该光线跟踪功能将入射在第一光学元件上的输入光束基本上全部映射到准直的输出光束 从第二光学元件输出。 优选地,输出光束具有费米 - 迪拉克强度分布,并且光线跟踪功能将输入光束映射到输入光束的输出光束的(1 / e)6强度半径。

    Monolithic symmetric interferometer for generation of variable-periodicity patterns for lithography
    8.
    发明授权
    Monolithic symmetric interferometer for generation of variable-periodicity patterns for lithography 失效
    用于生成用于光刻的可变周期性图案的单片对称干涉仪

    公开(公告)号:US06178000B1

    公开(公告)日:2001-01-23

    申请号:US09111878

    申请日:1998-07-08

    申请人: John A. Hoffnagle

    发明人: John A. Hoffnagle

    IPC分类号: G01B902

    CPC分类号: G03F7/70408

    摘要: An interferometer device includes a first prism portion and a second prism portion. The first prism portion has a semi-transparent surface, a beam incident surface and a beam emerging surface. The beam incident surface receives an incident light beam at a wavelength of &lgr; and at an angle of incidence &thgr; with respect to a normal to the beam incident surface. The second prism portion has a surface that corresponds to the semi-transparent surface of the first prism portion and a beam emerging surface that corresponds to the beam emerging surface of the first prism portion. The first and second prism portions are attached to each other at the semi-transparent surface of the first prism portion and the surface of the second prism portion corresponding to the semi-transparent surface. The semi-transparent surface splits the incident light beam into first and second light beams by reflecting the first beam at the semi-transparent surface and by passing the second light beam through the semi-transparent surface so that the second light beam enters the second prism portion. The first and second light beams are each respectively reflected internally to the first and second prism portions and emerge from the respective beam emerging surfaces of the first and second prism portions to form an interference pattern on a surface that has a periodicity &Lgr; that is a function of the angle of incidence &thgr; of the incident light beam, with the ratio of &Lgr;:&lgr; being greater than 2:1.

    摘要翻译: 干涉仪装置包括第一棱镜部分和第二棱镜部分。 第一棱镜部分具有半透明表面,光束入射表面和光束出射表面。 光束入射表面以相对于光束入射表面的法线接收入射光束,其入射光束以羔羊的波长并且以入射角θ相对于法线接收。 第二棱镜部分具有对应于第一棱镜部分的半透明表面的表面和对应于第一棱镜部分的光束出射表面的光束出射表面。 第一和第二棱镜部分在第一棱镜部分的半透明表面和对应于半透明表面的第二棱镜部分的表面彼此附接。 半透明表面通过在半透明表面处反射第一光束并使第二光束穿过半透明表面将入射光束分裂成第一和第二光束,使得第二光束进入第二棱镜 一部分。 第一和第二光束各自分别在内部反射到第一和第二棱镜部分并从第一和第二棱镜部分的相应光束出射表面出射,以在具有周期性LAMBD的表面上形成干涉图案 的入射光束的入射角θ,LAMBD:兰比的比值大于2:1。