公开(公告)号：US20170031193A1

公开(公告)日：2017-02-02

申请号：US15290492

申请日：2016-10-11

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shi SHU ,  Guanbao HUI ,  Teng YE ,  Chunsheng JIANG ,  Cuili GAI

IPC: G02F1/1368 ,  H01L29/786 ,  H01L27/12 ,  G02F1/1362

CPC classification number: H01L27/1262 ,  G02F1/136209 ,  G02F1/136227 ,  G02F2001/136231 ,  H01L27/1248 ,  H01L29/41733 ,  H01L29/78633

Abstract: Embodiments of the disclosure provide a manufacturing method of a TFT array substrate, a TFT array substrate and a display device. The TFT array substrate comprises a thin film transistor and a pixel electrode formed on a base substrate, the pixel electrode is electrically connected with a drain electrode of the thin film transistor. The array substrate further comprises an light-shielding pattern provided above the thin film transistor.

Abstract translation: 本发明的实施例提供了TFT阵列基板，TFT阵列基板和显示装置的制造方法。 TFT阵列基板包括薄膜晶体管和形成在基底基板上的像素电极，像素电极与薄膜晶体管的漏极电连接。 阵列基板还包括设置在薄膜晶体管上方的遮光图案。

公开(公告)号：US20160315103A1

公开(公告)日：2016-10-27

申请号：US15098519

申请日：2016-04-14

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Yonglian QI ,  Shi SHU ,  Chuanxiang XU ,  Feng ZHANG

IPC: H01L27/12 ,  H01L29/786

CPC classification number: H01L29/78645 ,  H01L27/124 ,  H01L29/78633

Abstract: An array substrate and a method for fabricating the same, and a display device are disclosed. The array substrate comprises light-transmissive regions for display and shading regions, a plurality of thin film transistors are provided in the shading region, the thin film transistor comprises: a base substrate; an active layer, a gate insulating layer, agate and a passivation layer sequentially provided on the base substrate; and a source and a drain provided on the passivation layer, the source and the drain comprise a conductive shading layer connected to the active layer and a copper layer provided on the conductive shading layer, the conductive shading layer is provided between the active layer and the copper layer, and at least a part of region of the shading region other than the source and the drain is provided with the conductive shading layer.

Abstract translation: 阵列基板及其制造方法以及显示装置。 阵列基板包括用于显示和阴影区域的透光区域，在阴影区域中设置多个薄膜晶体管，薄膜晶体管包括：基底基板; 依次设置在基底基板上的有源层，栅极绝缘层，玛瑙和钝化层; 以及设置在钝化层上的源极和漏极，源极和漏极包括连接到有源层的导电性遮光层和设置在导电性遮光层上的铜层，导电性遮光层设置在有源层和 铜层，并且除了源极和漏极之外的阴影区域的至少一部分区域设置有导电性遮光层。

公开(公告)号：US20150380671A1

公开(公告)日：2015-12-31

申请号：US14428847

申请日：2014-05-29

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shi SHU ,  Jingxia GU ,  Chuanxiang XU ,  Yonglian QI ,  Qi YAO

IPC: H01L51/50 ,  H01L51/52 ,  H01L51/56 ,  H01L27/32

CPC classification number: H01L51/502 ,  G02F1/133617 ,  G02F2001/01791 ,  G02F2001/136222 ,  H01L27/12 ,  H01L27/322 ,  H01L27/3248 ,  H01L27/3276 ,  H01L51/5056 ,  H01L51/5072 ,  H01L51/5209 ,  H01L51/5225 ,  H01L51/5284 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/301

Abstract: An array substrate, manufacturing method thereof and a display device are provided. The array substrate comprises thin film transistor units (2) arranged in array, and further comprises a quantum dot layer (3) disposed over the thin film transistor units (2). The quantum dot layer includes at least three kinds of quantum dots, any one kind of which emits light of a respective wave band when being irradiated and excited by light from an incident portion of the array substrate. The array substrate can improve color gamut range, transmittance of a display device without increasing the power consumption of the display device.

Abstract translation: 提供阵列基板，其制造方法和显示装置。 阵列基板包括排列成阵列的薄膜晶体管单元（2），并且还包括设置在薄膜晶体管单元（2）上的量子点层（3）。 量子点层包括至少三种量子点，其中任何一种在被来自阵列基板的入射部分的光照射和激发时发射各波段的光。 阵列基板可以在不增加显示装置的功耗的情况下提高显示装置的色域范围，透射率。

公开(公告)号：US20150357239A1

公开(公告)日：2015-12-10

申请号：US14513324

申请日：2014-10-14

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shi SHU ,  Zhijun LV ,  Jingxia GU ,  Yue SHI ,  Fangzhen ZHANG ,  Bing SUN ,  Chuanxiang XU

IPC: H01L21/768 ,  H01L21/3205

CPC classification number: H01L21/76892 ,  H01L21/3081 ,  H01L21/32055 ,  H01L23/49877 ,  H01L2924/0002 ,  H05K3/064 ,  H05K2201/0108 ,  H05K2201/0323 ,  H05K2201/10128 ,  H01L2924/00

Abstract: The invention provides a method for patterning a graphene layer and a method for manufacturing a display substrate. The method for patterning a graphene layer comprises: forming an isolation layer on a graphene layer; forming a photoresist layer on the isolation layer; patterning the photoresist layer; etching the isolation layer according to the patterned photoresist layer to form a patterned isolation layer; etching the graphene layer according to the patterned photoresist layer to form a patterned graphene layer; and removing the patterned isolation layer. In the method of the invention, the unfavorable condition of the prior art may be avoided that a graphene film sloughs off or a photoresist remains on a graphene film when a photoresist material is peeled off, and the product yield can be improved in the case that the production cost is controlled.

Abstract translation: 本发明提供一种用于图案化石墨烯层的方法和用于制造显示基板的方法。 图案化石墨烯层的方法包括：在石墨烯层上形成隔离层; 在隔离层上形成光致抗蚀剂层; 图案化光致抗蚀剂层; 根据图案化的光致抗蚀剂层蚀刻隔离层以形成图案化隔离层; 根据图案化的光致抗蚀剂层蚀刻石墨烯层以形成图案化的石墨烯层; 并去除图案化隔离层。 在本发明的方法中，可以避免现有技术的不利条件，当光致抗蚀剂材料被剥离时，石墨烯薄膜脱落或光致抗蚀剂残留在石墨烯薄膜上，并且在以下情况下可提高产品产率： 生产成本受到控制。