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96 条记录 (耗时 0.026 秒)

    Industrial two-layer fabric
    81.
    发明申请
    Industrial two-layer fabric 有权
    工业双层面料

    公开(公告)号：US20060102244A1

    公开(公告)日：2006-05-18

    申请号：US11270509

    申请日：2005-11-10

    申请人： Ikuo Ueda ,  Hiroyuki Nagura

    发明人： Ikuo Ueda ,  Hiroyuki Nagura

    IPC分类号： D21F1/00

    CPC分类号： D21F1/0036

    摘要： An industrial two-layer fabric obtained by alternately arranging, on an upper surface side thereof, (a) a warp complete design made of a design in which a warp passes over one upper surface side weft and then passes under one upper surface side weft, and any one of the following warp complete designs of: (b) a warp complete design made of a design in which a warp passes over two upper surface side wefts and then passes under two upper surface side wefts, (c) a warp complete design made of a design in which a warp passes over one upper surface side weft and then passes under three upper surface side wefts, (d) a warp complete design made of a design in which a warp passes over three upper surface side wefts and then passes under one upper surface side weft, and others.

    摘要翻译： 一种工业用双层织物，其在其上表面侧交替地设置（a）由经过一个上表面侧纬纱然后通过一个上表面侧纬纱的设计制成的经纱整体设计， 以及以下任何一种弯曲完整的设计：（b）由经线穿过两个上表面侧纬纱然后通过两个上表面侧纬纱的设计制成的经纱完整设计，（c）经纱完整设计 由经线穿过一个上表面侧纬纱然后穿过三个上表面侧纬纱的设计制成，（d）由经纱穿过三个上表面侧纬纱然后通过的设计制成的经纱整体设计 在一个上表面侧纬纱等。

    Industrial two-layer fabric
    82.
    发明申请
    Industrial two-layer fabric 有权
    工业双层面料

    公开(公告)号：US20060040578A1

    公开(公告)日：2006-02-23

    申请号：US11207942

    申请日：2005-08-22

    申请人： Hiroyuki Nagura ,  Ikuo Ueda ,  Keiichi Takimoto

    发明人： Hiroyuki Nagura ,  Ikuo Ueda ,  Keiichi Takimoto

    IPC分类号： D03D15/00 ,  B32B5/26

    CPC分类号： D21F1/0036 ,  Y10S162/90 ,  Y10S162/902 ,  Y10S162/903 ,  Y10T442/30 ,  Y10T442/3472

    摘要： An industrial two-layer fabric which comprises eight pairs of warps obtained by arranging eight upper surface side warps and eight lower surface side warps, and a plurality of upper surface side wefts and lower surface side wefts, and has an upper surface side layer and a lower surface side layer bound with warp-direction yarns. In the lower surface side layer, warps are formed by successively arranging a design in which one warp passes over four successive lower surface side wefts, passes under one lower surface side weft, passes over two lower surface side wefts, and passes under one lower surface side weft while shifting the design by three lower surface side wefts, and two adjacent lower surface side warps simultaneously weave therein, from the lower surface side, one lower surface side weft.

    摘要翻译： 一种工业双层织物，其包括通过布置八个上表面侧经纱和八个下表面侧经纱而获得的八对经纱，以及多个上表面侧纬纱和下表面侧纬纱，并且具有上表面侧层和 与经向纱线结合的下表面侧层。 在下表面侧层中，通过连续地设置一个经纱经过四个连续的下表面侧纬线，经过一个下表面侧纬线，经过两个下表面侧纬纱并在一个下表面下方通过的设计形成经纱 侧面纬纱同时由三个下表面纬纱移动设计，并且从下表面侧同时编织两个相邻的下表面侧经纱，一个下表面侧纬纱。

    Carbostyril derivatives and antiallergic agent
    83.
    发明授权
    Carbostyril derivatives and antiallergic agent 失效
    卡波他汀衍生物和抗过敏剂

    公开(公告)号：US5457099A

    公开(公告)日：1995-10-10

    申请号：US81021

    申请日：1993-06-22

    申请人： Takeshi Shogaki ,  Hiromu Toyoda ,  Takao Kakita ,  Masumi Furukawa ,  Seiichi Nakatsugi ,  Emi Masai ,  Tsuyako Yashima ,  Ikuo Ueda

    发明人： Takeshi Shogaki ,  Hiromu Toyoda ,  Takao Kakita ,  Masumi Furukawa ,  Seiichi Nakatsugi ,  Emi Masai ,  Tsuyako Yashima ,  Ikuo Ueda

    IPC分类号： A61K31/47 ,  C07D215/22 ,  C07D215/227 ,  C07D401/06 ,  C07D401/14 ,  C07D407/12 ,  C07D409/14

    CPC分类号： C07D215/227 ,  A61K31/47 ,  C07D401/06 ,  C07D401/14 ,  C07D407/12 ,  C07D409/14

    摘要： 1. A compound of the formula: ##STR1## wherein the symbol of a solid line with a broken line means a single bond or a double bond,R and R' are independently selected from the group consisting of hydrogen atom, halogen atom, lower alkyl, nitro, unsubstituted amino and substituted amino,A and B are independently selected from the group consisting of hydrogen atom, lower alkyl optionally substituted with a lower cycloalkyl, aryl optionally substituted with one or more halogen atoms and the group: -Y-R.sup.2wherein Y is lower alkylene and R.sup.2 is the group: ##STR2## wherein m is integer of 1 to 3, n is 0 or 1, Z is >N-, >CH-- or >C=, R.sup.3 is diaryl (lower) alkyl optionally substituted with one or more halogen atoms or is condensed heterocyclic group optionally substituted with oxo, with the proviso that(a) at least one of A and B is the group -Y-R.sup.2 and(b) when A is hydrogen atom and B is the group -Y-R.sup.2, then Z is >CH-- or >C= if R.sup.3 is condensed heterocyclic group optionally substituted with oxo and n is Oor a pharmaceutically acceptable salt thereof. The compounds of the above formula have antiallergic activity.

    摘要翻译： 1.下式的化合物：其中虚线的实线的符号表示单键或双键，R和R'独立地选自氢原子，卤原子，低级 烷基，硝基，未取代的氨基和取代的氨基，A和B独立地选自氢原子，任选被低级环烷基取代的低级烷基，任选被一个或多个卤素原子取代的基团和-Y-R 2 其中Y为低级亚烷基且R2为基团：其中m为1至3的整数，n为0或1，Z为> N-，> CH-或> C =，R3为二芳基（低级）烷基 任选地被一个或多个卤素原子取代或是被氧代取代的稠合杂环基，条件是（a）A和B中的至少一个是基团-Y-R 2和（b）当A是氢原子和B 是基团-Y-R 2，则Z是> CH-或> C =，如果R 3是任选被氧代a取代的稠合杂环基 nd n是O或其药学上可接受的盐。 上述化合物具有抗过敏活性。

    Imidazoisoquinoline compounds useful as anti-ulcerative agents
    85.
    发明授权
    Imidazoisoquinoline compounds useful as anti-ulcerative agents 失效
    咪唑并异喹啉化合物可用作抗溃疡剂

    公开(公告)号：US4738967A

    公开(公告)日：1988-04-19

    申请号：US945788

    申请日：1986-12-23

    申请人： Ikuo Ueda ,  Youichi Shiokawa ,  Masayuki Kato ,  Nobukiyo Konishi ,  Atsushi Akahane

    发明人： Ikuo Ueda ,  Youichi Shiokawa ,  Masayuki Kato ,  Nobukiyo Konishi ,  Atsushi Akahane

    IPC分类号： C07D471/04 ,  A61K31/47 ,  A61P1/04 ,  C07D487/04 ,  A61K31/40

    CPC分类号： C07D487/04

    摘要： A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl,R.sup.3 is hydrogen, halogen or ar(lower)alkoxy, andR is lower alkanoyl, nitroso, amino, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, haloformyl, aminomethyleneamino which may be substituted with cyano or lower alkyl, iminomethylamino which may be substituted with cyano or lower alkyl, or a group of the formula: --A--R.sup.2 in which A is lower alkylene andR.sup.2 is di(lower) alkylamino, cyano, lower alkoxy, N-containing heterocyclic group which may have suitable substituent(s), lower alkynyloxy, lower alkenyloxy, lower alkylthio, amino(lower)alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, hydroxy, lower alkanoyloxy, heterocyclicamino(lower)alkylthio having two oxo groups, hydrogen or a group of the formula: ##STR2## in which R.sup.4, R.sup.5 and R.sup.6 are each lower alkyl andX is an acid residue,and pharmaceutically acceptable salts thereof. pa The compounds are useful as anti ulcer agents.