公开(公告)号：US20180144901A1

公开(公告)日：2018-05-24

申请号：US15783855

申请日：2017-10-13

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  David Charles Reynolds ,  Alan Francis Lyon

IPC: H01J35/10 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  G21K1/06

CPC classification number: G21K1/067 ,  G21K2201/064 ,  H01J35/105 ,  H01J35/108 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  H01J2235/086 ,  H01J2235/088 ,  H01J2235/1204

Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

公开(公告)号：US20170162288A1

公开(公告)日：2017-06-08

申请号：US15431786

申请日：2017-02-14

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G21K1/06 ,  H01J35/08 ,  H01J35/18 ,  H01J35/14

CPC classification number: G01N23/223 ,  G21K1/06 ,  G21K2201/064 ,  H01J35/08 ,  H01J2235/081 ,  H01J2235/086

Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.

公开(公告)号：US09543109B2

公开(公告)日：2017-01-10

申请号：US14999147

申请日：2016-04-01

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: H01J35/08 ,  H01J35/10 ,  H01J35/18 ,  H01J35/14 ,  G21K1/06

CPC classification number: H01J35/106 ,  G21K1/06 ,  H01J35/08 ,  H01J35/12 ,  H01J35/14 ,  H01J35/18 ,  H01J2235/081 ,  H01J2235/086 ,  H01J2235/1204 ,  H01J2235/1291

Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.

Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。 这可以通过对齐离散x射线子源或通过使用包含与具有高导热性的基底紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这样可以更有效地将热量从X射线产生材料中拉出，并且进而允许以较高电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。 微结构的方向允许使用轴上收集角，允许来自若干微结构的X射线的聚集被对准以看起来具有单个原点，也称为“零角”x射线辐射。

公开(公告)号：US09448190B2

公开(公告)日：2016-09-20

申请号：US14636994

申请日：2015-03-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: H01J35/08 ,  G01N23/207 ,  H01J35/14 ,  G01N23/06

CPC classification number: G01N23/2076 ,  G01N23/085 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

Abstract translation: 本公开提供了x射线吸收精细结构（XAFS）测量的系统，其具有比现有紧凑系统大几个数量级的x射线通量和通量密度。 这些对于x射线吸收近边缘光谱（XANES）或扩展X射线精细吸收结构（EXFAS）光谱的实验室或现场应用是有用的。 通过使用X射线靶的设计来实现更高的亮度，所述X射线靶包括与具有高导热性的基底紧密热接触制造的x射线产生材料的多个对准微结构。 这允许用更高电子密度和/或更高能量的电子进行轰击，导致更大的x射线亮度和高通量。 然后将高亮度x射线源耦合到X射线反射光学系统以准直x射线，以及选择曝光能量的单色仪。 使用高通量单色x射线的样品的吸收光谱可以使用标准检测技术进行。

公开(公告)号：US20160178540A1

公开(公告)日：2016-06-23

申请号：US15060477

申请日：2016-03-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G01N23/205 ,  G01N23/201 ,  G01N23/207 ,  G01B15/02

CPC classification number: G01N23/205 ,  G21K1/062 ,  H01J35/08 ,  H01J2235/086

Abstract: This disclosure presents systems for x-ray diffraction/scattering measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore be useful for applications such as structural analysis and crystallography.The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux.The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.

Abstract translation: 本公开提供了具有x射线通量和x射线通量密度比现有x射线技术大几个数量级的x射线衍射/散射测量的系统。 因此，这些可用于诸如结构分析和晶体学的应用。 较高的亮度部分地通过使用x射线靶的设计来实现，所述X射线靶包括与具有高导热性的衬底紧密热接触制造的一个或多个选定的x射线产生材料的多个微结构。 这允许用更高电子密度或更高能量电子轰击靶，这导致更大的x射线亮度和因此更大的x射线通量。 然后，高亮度/高通量源可以耦合到x射线反射光学系统，其可将高通量x射线聚焦到可以小至1微米的点，导致高通量密度。

公开(公告)号：US20150117599A1

公开(公告)日：2015-04-30

申请号：US14527523

申请日：2014-10-29

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00

CPC classification number: A61B6/484 ,  A61B6/032 ,  A61B6/035 ,  A61B6/4007 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/502 ,  A61B6/508 ,  G21K2207/005 ,  H01J35/08 ,  H01J35/12

Abstract: We disclose an x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, and a means to translate the second grating G2 relative to the detector.In some embodiments, the structures are microstructures with lateral dimensions measured on the order of microns, and with a thickness on the order of one half of the electron penetration depth within the substrate. In some embodiments, the structures are formed within a regular array.

Abstract translation: 我们公开了一种X射线干涉成像系统，其中x射线源包括具有嵌入在导热衬底中的多个结构化的x射线子结构相干子源的靶。 该系统还包括分束光栅G1，其形成Talbot干涉图案，其可以是“ 移相光栅和X射线检测器将二维x射线强度转换为电子信号。 该系统还可以包括第二分析器光栅G2，其可以放置在检测器的前面以形成附加的干涉条纹，以及相对于检测器平移第二光栅G2的装置。 在一些实施例中，结构是具有测量的微米量级的横向尺寸并且厚度在衬底内的电子穿透深度的一半的微结构。 在一些实施例中，结构在规则阵列内形成。