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公开(公告)号：US10653376B2
公开(公告)日：2020-05-19
申请号：US16402887
申请日：2019-05-03
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon
IPC: A61B6/00 , A61B6/03 , H01J35/08 , H01J35/12 , G01N23/046 , G01N23/041 , A61B6/04
Abstract: An x-ray imaging system includes an x-ray source, a beam-splitting grating having a plurality of structures arranged in a two-dimensional periodic array, a stage configured to hold an object to be imaged, and an x-ray detector having a two-dimensional array of x-ray detecting elements and positioned to detect x-rays diffracted by the beam-splitting grating and perturbed by the object to be imaged.
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公开(公告)号：US20190088438A9
公开(公告)日：2019-03-21
申请号：US15783855
申请日：2017-10-13
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , David Charles Reynolds , Alan Francis Lyon
Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
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公开(公告)号：US09390881B2
公开(公告)日：2016-07-12
申请号：US14490672
申请日：2014-09-19
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon
CPC classification number: H01J35/08 , G21K1/06 , H01J2235/081 , H01J2235/086
Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness.Some embodiments of the invention comprise x-ray optical elements placed between sub-sources of x-rays. These x-ray optical elements may form images of one or more x-ray sub-sources in alignment with other x-ray sub-sources, and may enhance the linear accumulation that can be achieved.
Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。 这可以通过对齐离散x射线子源或通过使用包含与具有高导热性的基底紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这样可以更有效地将热量从X射线产生材料中拉出，并且进而允许以更高的电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。 本发明的一些实施例包括放置在x射线的子源之间的x射线光学元件。 这些X射线光学元件可以形成与其他x射线子源对准的一个或多个x射线子源的图像，并且可以增强可以实现的线性累积。
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公开(公告)号：US10416099B2
公开(公告)日：2019-09-17
申请号：US15927520
申请日：2018-03-21
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Srivatsan Seshadri , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon , Benjamin Donald Stripe
Abstract: A method for performing x-ray absorption spectroscopy and an x-ray absorption spectrometer system to be used with a compact laboratory x-ray source to measure x-ray absorption of the element of interest in an object with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness laboratory x-ray source, an optical train to focus the x-rays through an object to be examined, and a spectrometer comprising a single crystal analyzer (and, in some embodiments, also a mosaic crystal) to disperse the transmitted beam onto a spatially resolving x-ray detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 105 mrad. and be coupled to an optical train that collects and focuses the high flux x-rays to spots less than 500 micrometers, leading to high flux density. The coatings of the optical train may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.
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公开(公告)号：US10269528B2
公开(公告)日：2019-04-23
申请号：US15166274
申请日：2016-05-27
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon , David Charles Reynolds
Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
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Patent Agency Ranking
公开(公告)号：US20190011379A1
公开(公告)日：2019-01-10
申请号：US15927520
申请日：2018-03-21
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Srivatsan Seshadri , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon , Benjamin Donald Stripe
IPC: G01N23/085
CPC classification number: G01N23/085 , G21K1/06 , H01J35/02 , H01J35/10 , H01J35/12
Abstract: A method for performing x-ray absorption spectroscopy and an x-ray absorption spectrometer system to be used with a compact laboratory x-ray source to measure x-ray absorption of the element of interest in an object with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness laboratory x-ray source, an optical train to focus the x-rays through an object to be examined, and a spectrometer comprising a single crystal analyzer (and, in some embodiments, also a mosaic crystal) to disperse the transmitted beam onto a spatially resolving x-ray detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 105 mrad. and be coupled to an optical train that collects and focuses the high flux x-rays to spots less than 500 micrometers, leading to high flux density. The coatings of the optical train may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.
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公开(公告)号：US10297359B2
公开(公告)日：2019-05-21
申请号：US15783855
申请日：2017-10-13
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , David Charles Reynolds , Alan Francis Lyon
Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
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公开(公告)号：US20170261442A1
公开(公告)日：2017-09-14
申请号：US15605957
申请日：2017-05-26
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Srivatsan Seshadri , Alan Francis Lyon , David Charles Reynolds
CPC classification number: G01N23/04 , A61B6/4007 , A61B6/4291 , A61B6/484 , A61B6/508 , G01N23/20075 , G01N2223/3306 , G21K1/02 , G21K7/00 , G21K2207/005 , H01J35/08 , H01J2235/086 , H01J2235/1291
Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.
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公开(公告)号：US20160351370A1
公开(公告)日：2016-12-01
申请号：US15166274
申请日：2016-05-27
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon , David Charles Reynolds
CPC classification number: H01J35/08 , G21K1/06 , H01J2235/081 , H01J2235/086 , H01J2235/1204
Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。 这可以通过使用包括与具有高导热性的基板紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这使得能够更有效地从X射线产生材料中引出热量，并且允许以较高电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。 微结构的方向允许使用在0°或接近0°的起飞角度，允许来自几个微结构的X射线的积聚被对准并且用于形成环形锥形的束。
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公开(公告)号：US20160066870A1
公开(公告)日：2016-03-10
申请号：US14943445
申请日：2015-11-17
Applicant: Sigray, Inc.
Inventor： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon
IPC: A61B6/00
CPC classification number: A61B6/484 , A61B6/032 , A61B6/035 , A61B6/4007 , A61B6/4035 , A61B6/4291 , A61B6/502 , A61B6/508 , G21K2207/005 , H01J35/08 , H01J35/12
Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array.The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π or π/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.
Abstract translation: 一种X射线干涉成像系统，其中x射线源包括具有嵌入在导热衬底中的多个X射线结构化相干子源的靶。 该结构可以是具有在微米数量级上测量的横向尺寸的微结构，并且在一些实施例中，结构以正规阵列排列。 该系统还包括分束光栅G1，其形成Talbot干涉图案，其可以是“ 或＆pgr / / 2移相光栅，X射线检测器将二维x射线强度转换为电子信号，并且在一些实施例中还包括可以放置在检测器前面的附加分析器光栅G2 形成额外的干涉条纹。 系统还可以包括相对于用于层析成像应用的分束光栅和/或分析器光栅来平移和/或旋转x射线源和被研究对象的相对位置的装置。
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