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    Electron beam apparatus and spacer
    82.
    发明授权
    Electron beam apparatus and spacer 失效
    电子束装置和间隔器

    公开(公告)号：US07309270B2

    公开(公告)日：2007-12-18

    申请号：US11251771

    申请日：2005-10-18

    申请人： Nobuhiro Ito ,  Hideaki Mitsutake

    发明人： Nobuhiro Ito ,  Hideaki Mitsutake

    IPC分类号： H01J9/00

    CPC分类号： H01J9/242 ,  H01J29/028 ,  H01J29/864 ,  H01J31/127 ,  H01J2329/863 ,  H01J2329/8635 ,  H01J2329/864 ,  H01J2329/8645 ,  H01J2329/8655 ,  H01J2329/866

    摘要： A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the display of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.

    摘要翻译： 静电受限制的间隔物和设置间隔物的电子束装置。 在包括设置有电子发射装置的电子源的电子束装置中，设置有设置在电子源和面板之间的阳极和间隔物的面板在间隔基板的表面上形成不均匀性， 具有比粗糙度更小的厚度。 这使得对于能量低于电阻膜的第二交叉点能量的一次电子的入射角倍增系数的限制成为可能。 具有上述间隔物的电子束装置由于间隔件可以限制发光点的显示和伴随静电的沿面放电的显示定义和长期可靠性的优异。

    Electron beam emitting apparatus and image-forming apparatus
    83.
    发明授权
    Electron beam emitting apparatus and image-forming apparatus 失效
    电子束发射装置和图像形成装置

    公开(公告)号：US07180233B2

    公开(公告)日：2007-02-20

    申请号：US10705880

    申请日：2003-11-13

    申请人： Nobuhiro Ito ,  Hideaki Mitsutake

    发明人： Nobuhiro Ito ,  Hideaki Mitsutake

    IPC分类号： H01J1/62 ,  H01J63/04

    CPC分类号： H01J3/022 ,  H01J29/92 ,  H01J31/127 ,  H01J2201/3165

    摘要： An electron beam emitting apparatus has a first plate with an electron-emitting device 15, and an electrode 8 opposed to the first plate, and the electrode 8 is applied a potential to accelerate electrons emitted from the electron-emitting device 15. In the electron beam emitting apparatus, a potential defining region 9 is provided a surface of the first plate on the electrode 8 side and a first potential defining region forming the potential defining region 9 is provided in a projective area of the electrode 8 onto the potential defining region 9; and, where d represents a distance between the electrode 8 and the potential defining region 9, an additional potential defining region is defined in the range of 0.83d in all directions parallel to the first plate from the edge of the projective area of the electrode 8 onto the potential defining region 9. This stabilizes trajectories of electrons and permits an excellent image to be formed without deviation of light emission positions.

    摘要翻译： 电子束发射装置具有带有电子发射器件15的第一板和与第一板相对的电极8，并且施加电极8以加速从电子发射器件15发射的电子的电位。 在电子束发射装置中，电极限定区域9设置在电极8侧的第一板的表面，并且形成电位限定区域9的第一电位限定区域设置在电极8的投影区域中， 定义区域9; 并且其中d表示电极8和电位限定区域9之间的距离，附加电位限定区域被限定在从电极8的投影区域的边缘平行于第一板的所有方向的0.83d的范围内 到潜在定义区域9。 这稳定了电子的轨迹，并且允许在没有光发射位置的偏差的情况下形成优异的图像。

    Electron beam emitting apparatus with potential defining region and image-forming apparatus having the same
    87.
    发明授权
    Electron beam emitting apparatus with potential defining region and image-forming apparatus having the same 失效
    具有电位限定区域的电子束发射装置和具有其的图像形成装置

    公开(公告)号：US06693376B1

    公开(公告)日：2004-02-17

    申请号：US09699394

    申请日：2000-10-31

    申请人： Nobuhiro Ito ,  Hideaki Mitsutake

    发明人： Nobuhiro Ito ,  Hideaki Mitsutake

    IPC分类号： H01J162

    CPC分类号： H01J3/022 ,  H01J29/92 ,  H01J31/127 ,  H01J2201/3165

    摘要： An electron beam emitting apparatus has a first plate with an electron-emitting device 15, and an electrode 8 opposed to the first plate, and the electrode 8 is applied a potential to accelerate electrons emitted from the electron-emitting device 15. In the electron beam emitting apparatus, a potential defining region 9 is provided a surface of the first plate on the electrode 8 side and a first potential defining region forming the potential defining region 9 is provided in a projective area of the electrode 8 onto the potential defining region 9; and, where d represents a distance between the electrode 8 and the potential defining region 9, an additional potential defining region is defined in the range of 0.83d in all directions parallel to the first plate from the edge of the projective area of the electrode 8 onto the potential defining region 9. This stabilizes trajectories of electrons and permits an excellent image to be formed without deviation of light emission positions.

    摘要翻译： 电子束发射装置具有带电子发射器件15的第一板和与第一板相对的电极8，并且施加电极8以加速从电子发射器件15发射的电子。在电子 在电极8侧设置电位限定区域9，第一板的表面，形成电位限定区域9的第一电位限定区域设置在电极8的突出区域中的电位限定区域9上 ; 并且其中d表示电极8和电位限定区域9之间的距离，附加电位限定区域被限定在从电极8的投影区域的边缘平行于第一板的所有方向的0.83d的范围内 电势限定区域9.稳定电子的轨迹并允许形成优异的图像而不偏离光发射位置。

    Electron beam device, method for producing charging-suppressing member used in the electron beam device, and image forming apparatus
    88.
    发明授权
    Electron beam device, method for producing charging-suppressing member used in the electron beam device, and image forming apparatus 失效
    电子束装置，用于电子束装置的电荷抑制部件的制造方法以及图像形成装置

    公开(公告)号：US06657368B1

    公开(公告)日：2003-12-02

    申请号：US09722720

    申请日：2000-11-28

    申请人： Yoko Kosaka ,  Masahiro Fushimi ,  Hideaki Mitsutake

    发明人： Yoko Kosaka ,  Masahiro Fushimi ,  Hideaki Mitsutake

    IPC分类号： H01J100

    CPC分类号： H01J29/028 ,  H01J29/864 ,  H01J31/127 ,  H01J2201/3165 ,  H01J2329/863 ,  H01J2329/8635 ,  H01J2329/864 ,  H01J2329/8645 ,  H01J2329/8655 ,  H01J2329/866

    摘要： There are provided an electron beam device which has an atmospheric pressure-resistant member such as a spacer interposed between an electron source and a member to be irradiated with electrons, and can suppress charge on the member, a charging-suppressing member, and its producing method. An electron beam device having an electron source for emitting electrons, a member to be irradiated with the electrons, and a first member interposed between the electron source and the member to be irradiated is characterized in that the surface of the first member has a three-dimensional shape, and projecting portions of the three-dimensional shape form a network shape. In addition, an electron beam device having an electron source for emitting electrons, a member to be irradiated with the electrons, and a first member interposed between the electron source and the member to be irradiated is characterized in that the surface of the first member has a three-dimensional shape, and the three-dimensional shape has recessed portions continuously surrounded by projecting portions.

    摘要翻译： 提供了一种电子束装置，其具有诸如隔着电子源和要被电子照射的构件之间的隔离物的耐压构件，并且可以抑制构件上的电荷，充电抑制构件及其制造 方法。 具有用于发射电子的电子源的电子束装置，被电子照射的部件以及插在电子源和被照射部件之间的第一部件的特征在于，第一部件的表面具有三维形状， 立体形状，并且三维形状的突出部分形成网络形状。 另外，具有用于发射电子的电子源的电子束装置，被电子照射的部件以及插在电子源和被照射部件之间的第一部件的特征在于，第一部件的表面具有 三维形状，并且三维形状具有被突出部连续包围的凹部。