Abstract:
A lighting system for generating pre-determined beam-pattern comprises a reflector body for reflecting the light forwardly thereof, an optical means for receiving and transmitting said reflected light, a discharge lamp and a lamp base. The discharge lamp is positioned between the reflector body and the optical means. The discharge lamp comprises a sealed discharge vessel made of ceramic light-transmitting material and contains an ionizable fill. The discharge lamp has at least one leg, a pair of spaced-apart electrodes within the discharge vessel between which an electric discharge is developed when the lamp is operated. The lamp base provides for supporting and positioning the discharge lamp, and includes contact elements for connecting the discharge lamp to an operating circuit.
Abstract:
Provided is an electron-emitting device which can be applied to an image-forming apparatus for displaying images with high luminance and high quality stably over a long period. The electron-emitting device has first and second carbon films laid on a substrate and first and second electrodes electrically connected to the respective carbon films, a higher voltage is applied to the second electrode than to the first electrode, and the carbon film connected to the second electrode comprises nitrogen.
Abstract:
A Reflective Field Emission Display system, components and methods for fabricating the components. In the FED system, a plurality of reflective edge emission pixel elements are arranged in a matrix of N rows and M columns, the pixel elements contain an edge emitter that is operable to emit electrons and a reflector that is operable to extract and laterally reflect emitted electrons. A collector layer, laterally disposed from said reflector layer is operable to attract the reflected electrons. Deposited on the collector layer is a phosphor layer that emits a photon of a known wavelength when activated by an attracted electron. A transparent layer that is oppositely positioned with respect to the pixel elements is operable to attract reflected electrons and prevent reflected electrons from striking the phosphor layer. Color displays are further contemplated by incorporating individually controlled sub-pixel elements in each of the pixel elements. The phosphor layers emit photons having wavelengths in the red, green or blue color spectrum.
Abstract:
There are provided an electron beam device which has an atmospheric pressure-resistant member such as a spacer interposed between an electron source and a member to be irradiated with electrons, and can suppress charge on the member, a charging-suppressing member, and its producing method. An electron beam device having an electron source for emitting electrons, a member to be irradiated with the electrons, and a first member interposed between the electron source and the member to be irradiated is characterized in that the surface of the first member has a three-dimensional shape, and projecting portions of the three-dimensional shape form a network shape. In addition, an electron beam device having an electron source for emitting electrons, a member to be irradiated with the electrons, and a first member interposed between the electron source and the member to be irradiated is characterized in that the surface of the first member has a three-dimensional shape, and the three-dimensional shape has recessed portions continuously surrounded by projecting portions.
Abstract:
A ring or collar surrounding a semiconductor workpiece in a plasma chamber. According to one aspect, the ring has an elevated collar portion having an inner surface oriented at an obtuse angle to the plane of the workpiece, this angle preferably being 135°. This angular orientation causes ions bombarding the inner surface of the elevated collar to scatter in a direction more parallel to the plane of the workpiece, thereby reducing erosion of any dielectric shield at the perimeter of the workpiece, and ameliorating spatial non-uniformity in the plasma process due to any excess ion density near such perimeter. In a second aspect, the workpiece is surrounded by a dielectric shield, and the shield is covered by a non-dielectric ring which protects the dielectric shield from reaction with, or erosion by, the process gases. In a third aspect, the dielectric shield is thin enough to couple substantial power from the cathode to the plasma, thereby improving spatial uniformity of the plasma process near the perimeter of the workpiece. In a fourth aspect, azimuthal non-uniformities in process performance can be ameliorated by corresponding azimuthal variations in the dimensions of the elevated collar and/or the dielectric shield surrounding the workpiece.
Abstract:
A method for fabricating an electrode having extended operating life comprising brazing a cap and adapter to an insulator composed of magnesium oxide-stabilized zirconia (MSZ), calcium oxide stabilized zirconia (CSZ) or yttroim oxide-stabilized (YSZ). Electrodes comprising insulators composed of CSZ, MSZ and/or YSZ are also described.
Abstract:
A field emission-type electron source (10) is provided with a conductive substrate (1), a semiconductor layer formed on a surface of the conductive substrate (1), at least a part of the semiconductor layer being made porous, and a conductive thin film (7) formed on the semiconductor layer. Electrons injected into the conductive substrate (1) are emitted from the conductive thin film (7) through the semiconductor layer by applying a voltage between the conductive thin film (7) and the conductive substrate (1) in such a manner that the conductive thin film (7) acts as a positive electrode against the conductive substrate (1). The semiconductor layer includes a porous semiconductor layer (6) in which columnar structures (21) and porous structures (25) composed of fine semiconductor crystals of nanometer scale coexist, a surface of each of the structures being covered with an insulating film (22,24). Further, an average dimension of each of the porous structures (25) in a thickness direction of the semiconductor layer is smaller than or equal to 2 &mgr;m.
Abstract:
An electrode for an electro-optical device is provided. Light is passing through this electrode which comprises a pattern of conductive elements. The elements have dimensions small compared to the wavelength of light, so that the electrode appear transparent. The light intensity distribution after having penetrated the electrode compared with the light intensity distribution before having penetrated the electrode is influenced by forward scattering.
Abstract:
This method and apparatus permit installing and removing an electron beam generating element comprising a filament or a cathode in a rapidly replaceable module. The apparatus is an electron gun system having an electron gun enclosure, a feed-through element extending through the electron gun enclosure, an electron beam generating element housed within a filament module housing and connected to the feed-through element, an electron gun column and a connector port in the gun enclosure for direct removal and replacement of the filament. The feed-through element and the filament module housing are removed, through the connector port, from the gun enclosure and then the filament is removed and replaced. A load-lock is provided above the connector port to avoid venting into the gun. A bellows can be used to facilitate removal of the gun with minimal exposure to ambient atmospheric gases.
Abstract:
A high pressure discharge lamp includes a quartz glass bulb, a conductive element which is sealed at a sealing portion of the bulb, and a pair of electrodes. Each electrode is disposed in the quartz glass bulb so as to be opposite the other and connected to the conductive element. A part of each electrode is sealed with the quartz glass bulb at the sealing portion so as to generate a contacting portion formed by the part of each electrode and the bulb. The maximum length, Lmax, of the contacting portion is defined as: Lmax (mm)≦200/(P×D); and the minimum length, Lmin, of the contacting portion is defined as: Lmin (mm)≧0.8/(D2×&pgr;) or Lmin (mm)≧0.7 whichever is longer, where D is the diameter (mm) of the electrode and P is the power (W) supplied to the electrode.