公开(公告)号：US08234602B2

公开(公告)日：2012-07-31

申请号：US12533592

申请日：2009-07-31

申请人： Yuji Kobayashi

发明人： Yuji Kobayashi

IPC分类号： G06F17/50

CPC分类号： H01L22/12 ,  H01L22/20

摘要： A semiconductor-device manufacturing method includes steps of performing a sidewall fabrication thereby forming a first pattern structure; measuring an amount of displacement of line portions of the first pattern structure; correcting an overlay specification for an overlay of the first pattern structure and a second pattern structure dynamically based on the amount of displacement; and determining whether an error in the overlay of the first pattern structure and the second pattern structure meets the corrected overlay specification.

摘要翻译： 半导体器件制造方法包括以下步骤：执行侧壁制造，从而形成第一图案结构; 测量所述第一图案结构的线部分的位移量; 基于位移量来动态地修正第一图案结构和第二图案结构的覆盖层的叠加规格; 以及确定所述第一图案结构和所述第二图案结构的叠加中的错误是否满足所述修正的覆盖规范。

公开(公告)号：US08084194B2

公开(公告)日：2011-12-27

申请号：US11675869

申请日：2007-02-16

申请人： Tomoyuki Takeishi ,  Yuji Kobayashi

发明人： Tomoyuki Takeishi ,  Yuji Kobayashi

IPC分类号： B05C11/10 ,  B08B1/04 ,  B08B3/04

CPC分类号： H01L21/67051 ,  G03F7/2028 ,  G03F7/3021 ,  H01L21/6715

摘要： A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatment target substrate in which the latent image is formed on the processing target film, developing the processing target film after the heating, inspecting whether a residue is present at an edge of the treatment target substrate after the developing, and cleaning an end of the treatment target substrate to remove the residue at the edge of the treatment target substrate determined to be defective in the inspecting.

摘要翻译： 一种基板边缘处理方法，包括：在处理对象基板上形成处理对象膜，向处理对象膜上的预定位置施加能量线，在所述处理对象膜上形成潜像，对所述处理对象基板进行加热， 在加工对象膜上形成潜像，在加热后显影加工对象膜，检查在显影后是否存在处理对象基板的边缘残留物，清洗处理对象基板的末端以除去残留物 在处理对象基材的边缘被确定为检查中有缺陷。

公开(公告)号：US20110009652A1

公开(公告)日：2011-01-13

申请号：US12920097

申请日：2009-02-20

申请人： Yuji Kobayashi ,  Hiroshi Uchida ,  Kazuhiko Sato ,  Yoshihiro Kon

发明人： Yuji Kobayashi ,  Hiroshi Uchida ,  Kazuhiko Sato ,  Yoshihiro Kon

IPC分类号： C07D301/12

CPC分类号： C07D301/12 ,  B01J31/0237 ,  B01J31/0259 ,  B01J31/0271 ,  B01J31/34 ,  B01J2231/72 ,  B01J2531/66 ,  C07D303/04 ,  C07D303/40

摘要： A novel process for producing a polyfunctional epoxy monomer is provided that facilitates separation of an aqueous layer catalyst from a reaction solution and has satisfactory hydrogen peroxide efficiency by reacting an aqueous hydrogen peroxide solution with a polyolefin without using an organic solvent and under mild conditions. The process in the present invention is a process for producing a corresponding epoxy compound by reacting an organic compound having a carbon-carbon double bond with hydrogen peroxide present in an aqueous hydrogen peroxide solution to epoxidate the double bond, wherein a tungsten compound and tertiary amine are used as reaction catalysts.

摘要翻译： 提供了一种制备多官能环氧单体的新方法，其有助于从反应溶液中分离水层催化剂，并且通过使过氧化氢水溶液与聚烯烃反应而不使用有机溶剂并在温和的条件下使其具有令人满意的过氧化氢效率。 本发明的方法是通过使具有碳 - 碳双键的有机化合物与过氧化氢水溶液中存在的过氧化氢反应来环氧化双键来制备相应的环氧化合物的方法，其中钨化合物和叔胺 用作反应催化剂。

公开(公告)号：US07862965B2

公开(公告)日：2011-01-04

申请号：US11797529

申请日：2007-05-04

申请人： Hisako Aoyama ,  Yuji Kobayashi

发明人： Hisako Aoyama ,  Yuji Kobayashi

IPC分类号： G03F9/00 ,  G03C5/00

CPC分类号： G01N21/956 ,  G03F1/44

摘要： A method for detecting defects which originate from a chemical solution includes coating a chemical solution on a surface of a mask, and radiating an exposure beam to the mask on which the chemical solution is coated, thereby performing enlarged projection exposure on a resist film which is formed on a surface of a substrate for an inspection. Further, the method for detecting defects which originate from a chemical solution includes performing an inspection of defects on the resist film which has been subjected to the enlarged projection exposure, and determining whether a result of the inspection meets a predetermined standard.

摘要翻译： 用于检测来自化学溶液的缺陷的方法包括将化学溶液涂布在掩模的表面上，并且将曝光光束照射到其上涂覆有化学溶液的掩模，从而对抗蚀剂膜进行放大的投影曝光，该抗蚀剂膜是 形成在用于检查的基板的表面上。 此外，用于检测来自化学溶液的缺陷的方法包括对经过放大的投影曝光的抗蚀剂膜上的缺陷进行检查，并确定检查结果是否达到预定标准。

公开(公告)号：US20100300168A1

公开(公告)日：2010-12-02

申请号：US12745156

申请日：2008-11-21

申请人： Ryohei Ishikura ,  Takashi Kano ,  Makio Kato ,  Yuji Kobayashi ,  Satoru Ujihashi ,  Kiyoshi Okumura

发明人： Ryohei Ishikura ,  Takashi Kano ,  Makio Kato ,  Yuji Kobayashi ,  Satoru Ujihashi ,  Kiyoshi Okumura

IPC分类号： C21D7/06 ,  B24C1/10

CPC分类号： B24C1/10 ,  B24C1/086 ,  C21D1/26 ,  C21D7/06 ,  C21D2211/001 ,  C21D2211/008 ,  Y10T29/479

摘要： The object of the present invention is to provide a method for shot peening by which a compressive residual stress that is higher than any achieved by the conventional method can be achieved while the thickness of the processed material that is scraped is suppressed. The method is characterized in that the shot materials are shot against the processed material that has the hardness of 750 HV or more that is calculated from equations (1) to (3) below. The shot materials have Vickers hardness that is higher than the hardness of the processed material by 50 HV to 250 HV. The thickness of the processed material that is to be scraped is suppressed to 5 μm or less. HV(m)={f(C)−f(T,t)}(1−γR/100)+400×γR/100  Equation (1) f(C)=−660C2+1373C+278  Equation (2) f(T,t)=0.05T(log t+17)−318  Equation (3) where C denotes the C (carbon) content in the surface layer that is achieved by carburizing (mass %), T denotes the tempering temperature (K), t denotes the tempering time (hr), and γR denotes the amount of residual austenite (vol. %).

摘要翻译： 本发明的目的是提供一种用于喷丸硬化的方法，通过该方法可以获得高于通过常规方法实现的压缩残余应力，同时抑制被刮除的被处理材料的厚度。 该方法的特征在于，针对由下述等式（1）至（3）计算的具有750HV或更高的硬度的处理材料进行喷丸处理。 喷丸材料的维氏硬度比加工材料的硬度高50HV至250HV。 要被刮削的被处理材料的厚度被抑制在5μm以下。 HV（m）= {f（C）-f（T，t）}（1-γR/ 100）+ 400×γR/ 100等式（1）f（C）= - 660C2 + 1373C + f（T，t）= 0.05T（log t + 17）-318等式（3）其中C表示通过渗碳实现的表面层中的C（碳）含量（质量％），T表示回火温度 K），t表示回火时间（hr），γR表示残留奥氏体量（体积％）。

公开(公告)号：US20090253915A1

公开(公告)日：2009-10-08

申请号：US12301716

申请日：2007-05-17

申请人： Toshio Fujita ,  Yuji Kobayashi ,  Hiroshi Uchida ,  Nobutoshi Sasaki ,  Kazuhiko Sato ,  Masanori Ookoshi ,  Masao Shimizu

发明人： Toshio Fujita ,  Yuji Kobayashi ,  Hiroshi Uchida ,  Nobutoshi Sasaki ,  Kazuhiko Sato ,  Masanori Ookoshi ,  Masao Shimizu

IPC分类号： C07D491/14 ,  C07F7/02

CPC分类号： C07D491/044 ,  C07D491/08 ,  C07F7/0814

摘要： Novel epoxy compounds having imide structures represented by general formula (I) or general formula (II) below, and having an allyl group in the same molecule, as well as a process for their production. (wherein R1 and R2 each represent hydrogen, a C1-6 alkyl group, or a C1-4 trialkylsilyl group) (wherein R3 represents hydrogen, a C1-6 alkyl group, or a C1-4 trialkylsilyl group)

摘要翻译： 具有由通式（I）或通式（II）表示的酰亚胺结构的新型环氧化合物，并且在同一分子中具有烯丙基，以及它们的制备方法。 （其中R1和R2各自表示氢，C1-6烷基或C1-4三烷基甲硅烷基）（其中R3表示氢，C1-6烷基或C1-4三烷基甲硅烷基）

公开(公告)号：US20070236728A1

公开(公告)日：2007-10-11

申请号：US11637699

申请日：2006-12-13

申请人： Yuji Kobayashi ,  Shintarou Ono ,  Munehiro Natsume ,  Hiroyuki Yoshikawa ,  Teruhiko Fujikura ,  Kenichi Hayashi ,  Yoshihiko Sezukuri ,  Iwao Fujii

发明人： Yuji Kobayashi ,  Shintarou Ono ,  Munehiro Natsume ,  Hiroyuki Yoshikawa ,  Teruhiko Fujikura ,  Kenichi Hayashi ,  Yoshihiko Sezukuri ,  Iwao Fujii

IPC分类号： G06F3/12

CPC分类号： G06F3/1204 ,  G03G15/5087 ,  G06F3/122 ,  G06F3/1253 ,  G06F3/1286 ,  H04N1/00222 ,  H04N1/00233 ,  H04N1/2315 ,  H04N1/2361 ,  H04N1/33369 ,  H04N2201/0094 ,  H04N2201/33321 ,  H04N2201/33335 ,  H04N2201/33378

摘要： In order to facilitate an input of a process condition for allowing any of a plurality of image forming apparatuses to form an image, a PC communicative to a plurality of MFPs connected via a network obtains function information defining a function held by each of a plurality of MFPs, displays a common condition setting window for accepting an input of a process condition for performing a common function held by all of a plurality of image forming apparatuses, based on the obtained function information, accepts an input of a process condition, and outputs the accepted process condition to any one of a plurality of MFPs.

摘要翻译： 为了便于输入用于允许多个图像形成装置中的任一个形成图像的处理条件，与通过网络连接的多个MFP通信的PC获得定义由多个图像形成装置中的每一个保持的功能的功能信息 MFP显示用于接受用于执行由所有多个图像形成装置保持的共同功能的处理条件的输入的公共条件设置窗口，基于获得的功能信息，接受处理条件的输入，并输出 接受的处理条件到多个MFP中的任何一个。

公开(公告)号：US20070207392A1

公开(公告)日：2007-09-06

申请号：US11638427

申请日：2006-12-14

申请人： Yuji Kobayashi

发明人： Yuji Kobayashi

IPC分类号： G03F1/00 ,  G03C5/00

CPC分类号： G03F1/36

摘要： A manufacturing method of a photo mask includes: forming a metal film on a mask substrate; forming a positive resist film on the metal film; forming a negative resist film on the metal film; patterning the positive resist film with a first pattern to form a first resist pattern, the first pattern being to be transferred onto a resist film on a substrate and then to be resolved, a semiconductor device is to be formed on the substrate; patterning the negative resist film with a second pattern to form a second resist pattern, the second pattern being intended to improve a resolution performance of the first pattern and including an auxiliary pattern which is not resolved on the substrate, the semiconductor device is to be formed on the substrate; and processing the metal film by use of the first resist pattern and the second resist pattern.

摘要翻译： 光掩模的制造方法包括：在掩模基板上形成金属膜; 在金属膜上形成正的抗蚀剂膜; 在金属膜上形成负的抗蚀剂膜; 以第一图案形成正性抗蚀剂膜以形成第一抗蚀剂图案，将第一图案转印到基板上的抗蚀剂膜上，然后拆分，在基板上形成半导体器件; 以第二图案图案化负抗蚀剂膜以形成第二抗蚀剂图案，第二图案旨在提高第一图案的分辨率性能，并且包括在基板上未分辨的辅助图案，将形成半导体器件 在基材上 以及通过使用第一抗蚀剂图案和第二抗蚀剂图案来处理金属膜。

公开(公告)号：US20070196566A1

公开(公告)日：2007-08-23

申请号：US11675869

申请日：2007-02-16

申请人： Tomoyuki Takeishi ,  Yuji Kobayashi

发明人： Tomoyuki Takeishi ,  Yuji Kobayashi

IPC分类号： B41M5/00

CPC分类号： H01L21/67051 ,  G03F7/2028 ,  G03F7/3021 ,  H01L21/6715

摘要： A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatment target substrate in which the latent image is formed on the processing target film, developing the processing target film after the heating, inspecting whether a residue is present at an edge of the treatment target substrate after the developing, and cleaning an end of the treatment target substrate to remove the residue at the edge of the treatment target substrate determined to be defective in the inspecting.

摘要翻译： 一种基板边缘处理方法，包括：在处理对象基板上形成处理对象膜，向处理对象膜上的预定位置施加能量线，在所述处理对象膜上形成潜像，对所述处理对象基板进行加热， 在加工对象膜上形成潜像，在加热后显影加工对象膜，检查在显影后是否存在处理对象基板的边缘残留物，清洗处理对象基板的末端以除去残留物 在处理对象基材的边缘被确定为检查中有缺陷。

公开(公告)号：US20070022169A1

公开(公告)日：2007-01-25

申请号：US11398136

申请日：2006-04-05

申请人： Nobuo Suzuki ,  Yuji Kobayashi ,  Tatsuomi Kita

发明人： Nobuo Suzuki ,  Yuji Kobayashi ,  Tatsuomi Kita

IPC分类号： G06F15/16

CPC分类号： H04M3/493

摘要： There is provided a mediation device that performs a process for registering or retrieving voice information to or from an electronic bulletin board system in response to a request from a user. The mediation device includes a notifying section that, when an update of the electronic bulletin board is made, produces and transmits notification data to a user related to the update, the notification data including information indicating the update and access information for invoking an operation related to the update, and a request processing section that receives from the user an operation request made with use of the access information, and performs a process for the operation which corresponds to the access information.

摘要翻译： 提供了一种中介装置，其响应于来自用户的请求，执行用于向电子公告板系统注册或从电子公告板系统检索语音信息的过程。 中介装置包括通知部，当进行电子公告板的更新时，生成并发送与更新相关的用户的通知数据，所述通知数据包括指示更新的信息和用于调用与 所述更新，以及请求处理部，其从所述用户接收使用所述访问信息进行的操作请求，并且执行与所述访问信息对应的操作的处理。