公开(公告)号：US20070217500A1

公开(公告)日：2007-09-20

申请号：US10584844

申请日：2004-07-08

申请人： Wen Gao ,  Junhao Zheng ,  Siwei Ma ,  Xiangyang Ji ,  Peng Zhang ,  Yan lu

发明人： Wen Gao ,  Junhao Zheng ,  Siwei Ma ,  Xiangyang Ji ,  Peng Zhang ,  Yan lu

IPC分类号： H04N7/32

CPC分类号： H04N19/132 ,  H04N19/176 ,  H04N19/51 ,  H04N19/61 ,  H04N19/70

摘要： The present invention provides an encoding method for skipped macroblocks in a video image comprising the steps of: adding one indication bit into a picture header for indicating a coding mode for skipped macroblocks in a current image; selecting the coding mode for a macroblock type in the current image according to the number of skipped macroblocks, if it is a run_length coding, then setting the indication bit of the picture header as a status indicating a run_length coding, and encoding the macroblock type in the image by the run_length coding mode; if it is a joint coding of the number of skipped macroblocks and the macroblock type, then setting the indication bit of the picture header as status indicating a joint coding and encoding the macroblock type in the image by the joint coding mode of the number of skipped macroblocks and the macroblock type; finally, encoding other data in the current macroblock and writing data into a code stream. The present invention selects the coding mode for skipped macroblocks in video image adaptively, which improves the image encoding efficiency, reduces the cost for transmission and storage, therefore it is a simple and practical technical solution. The present invention can be used validly in both frame encoding and field encoding.

摘要翻译： 本发明提供一种视频图像中的跳过宏块的编码方法，包括以下步骤：将一个指示位添加到用于指示当前图像中跳过的宏块的编码模式的图像头中; 根据跳过的宏块的数量，选择当前图像中的宏块类型的编码模式，如果是长度编码，则将图像头的指示位设置为指示运行长度编码的状态，并将宏块类型编码 图像由run_length编码模式; 如果是跳过的宏块的数量和宏块类型的联合编码，则通过跳过的数量的联合编码模式将图像头的指示位设置为指示联合编码并且将宏块类型编码在图像中的状态 宏块和宏块类型; 最后，编码当前宏块中的其他数据并将数据写入代码流。 本发明自适应地选择视频图像中的跳过宏块的编码模式，提高了图像编码效率，降低了传输和存储成本，因此是一种简单实用的技术方案。 本发明可以在帧编码和场编码两者中有效地使用。

公开(公告)号：USD539891S1

公开(公告)日：2007-04-03

申请号：US29262475

申请日：2006-07-05

申请人： Lintao Lu ,  Bernie Tumkiw ,  Kurtis Narus ,  Dawei Ding ,  Peng Zhang ,  Yunpeng Dong ,  Ying Yu

设计人： Lintao Lu ,  Bernie Tumkiw ,  Kurtis Narus ,  Dawei Ding ,  Peng Zhang ,  Yunpeng Dong ,  Ying Yu

公开(公告)号：US20070010412A1

公开(公告)日：2007-01-11

申请号：US11520983

申请日：2006-09-14

申请人： Peng Zhang ,  Danielle Curzi ,  Eugene Karwacki ,  Leslie Barber

发明人： Peng Zhang ,  Danielle Curzi ,  Eugene Karwacki ,  Leslie Barber

IPC分类号： C11D7/32

CPC分类号： G03F7/322 ,  G03F7/0048 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40 ,  G03F7/425 ,  Y10S134/902

摘要： Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of pattern collapse defects on a plurality of photoresist coated substrates employing the process solution of the present invention.

摘要翻译： 使用包含一种或多种表面活性剂的工艺溶液来减少半导体器件制造中的缺陷数量。 在某些优选实施方案中，当在图案化光致抗蚀剂层的显影期间或之后，当用作冲洗溶液时，本发明的工艺溶液可以减少显影后缺陷，例如图案塌陷。 还公开了一种减少使用本发明的工艺溶液的多个光致抗蚀剂涂覆的基材上的图案塌陷缺陷的数量的方法。

公开(公告)号：US20070006894A1

公开(公告)日：2007-01-11

申请号：US11519476

申请日：2006-09-12

申请人： Peng Zhang ,  Brenda Ross

发明人： Peng Zhang ,  Brenda Ross

IPC分类号： C23G1/00 ,  B08B3/00

CPC分类号： H01L21/02074 ,  C11D1/08 ,  C11D1/40 ,  C11D1/72 ,  C11D3/164 ,  C11D11/0047 ,  Y10S134/902

摘要： Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention.

公开(公告)号：US20060217972A1

公开(公告)日：2006-09-28

申请号：US11342259

申请日：2006-01-27

申请人： Rafid Sukkar ,  Richard Younce ,  Peng Zhang ,  Michael Horning ,  Robert Cochran ,  Stephen Griffith ,  Leni Thomas ,  Brian McConnell

发明人： Rafid Sukkar ,  Richard Younce ,  Peng Zhang ,  Michael Horning ,  Robert Cochran ,  Stephen Griffith ,  Leni Thomas ,  Brian McConnell

IPC分类号： G10L19/00

CPC分类号： G10L21/02

摘要： Signal Quality Enhancement is performed directly in a coded domain. Coded Domain-Signal Quality Enhancement (CD-SQE) is applied to an encoded signal populated substantially with encoded signal bits to produce an enhanced encoded signal. The enhanced encoded signal is outputted. Thus, the signal does not have to go through intermediate decoder/re-encoder(s), which can degrade overall speech quality. Computational resources required for a complete re-encoding are not needed. Overall delay of the system is minimized. The CD-SQE system can be used in any network in which signals are communicated in a coded domain, such as a Third Generation (3G) wireless network.

摘要翻译： 信号质量增强直接在编码域中执行。 编码域信号质量增强（CD-SQE）被应用于基本上用编码信号位填充的编码信号，以产生增强的编码信号。 输出增强编码信号。 因此，信号不必经过中间解码器/重新编码器，这可能降低整体语音质量。 不需要完全重新编码所需的计算资源。 系统的整体延迟最小化。 CD-SQE系统可以用于在诸如第三代（3G）无线网络的编码域中传送信号的任何网络中。

公开(公告)号：US20050161644A1

公开(公告)日：2005-07-28

申请号：US10764227

申请日：2004-01-23

申请人： Peng Zhang ,  Bridgette Budhlall ,  Gene Parris ,  Leslie Barber

发明人： Peng Zhang ,  Bridgette Budhlall ,  Gene Parris ,  Leslie Barber

IPC分类号： H01L21/027 ,  G03F7/004 ,  G03F7/20 ,  G03B11/00

CPC分类号： G03F7/2041

摘要： Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 248 nm are disclosed herein.

摘要翻译： 可以加入到浸渍流体中的合适的添加剂，包含至少一种选自水性流体，非水性流体及其混合物的载体介质的浸液，以及包含至少一种载体介质和至少一种可用于 本文公开了在140nm至248nm范围内的工作波长的浸没式光刻技术。

公开(公告)号：US20050132229A1

公开(公告)日：2005-06-16

申请号：US10987762

申请日：2004-11-12

申请人： Peng Zhang ,  Zheng Yan

发明人： Peng Zhang ,  Zheng Yan

IPC分类号： H04L9/32 ,  H04L12/46 ,  H04L29/06 ,  H04L9/00

CPC分类号： H04L63/0272 ,  H04L9/3265 ,  H04L12/4641 ,  H04L63/0435 ,  H04L63/0823 ,  H04L63/083 ,  H04L63/0853 ,  H04L63/20 ,  H04L2209/80

摘要： A Virtual Private Network (VPN) system that includes a plurality of terminals, services and servers, part or all of which are root-trust module based platforms. The system provides the management of root-trust based platforms in the network, and enables verification among the platforms.

摘要翻译： 包括多个终端，服务和服务器的虚拟专用网（VPN）系统，其中的一部分或全部是基于根信任模块的平台。 系统在网络中提供基于信任的基于平台的管理，并能够在平台之间进行验证。

公开(公告)号：US06641986B1

公开(公告)日：2003-11-04

申请号：US10218068

申请日：2002-08-12

申请人： Peng Zhang ,  Danielle Megan King ,  Eugene Joseph Karwacki ,  Leslie Cox Barber

发明人： Peng Zhang ,  Danielle Megan King ,  Eugene Joseph Karwacki ,  Leslie Cox Barber

IPC分类号： G03F730

CPC分类号： B01F17/0028 ,  B01F17/0021 ,  G03F7/0048 ,  G03F7/16 ,  G03F7/38

摘要： Aqueous solutions comprising one or more acetylenic diol type surfactants are used to improve the wettability of a substrate surface by lowering the contact angle of the aqueous developer solution are enclosed herein. In one embodiment, the aqueous solution is used to prepare the surface of the substrate prior to development of the resist coating layer.

摘要翻译： 包含一种或多种炔属二醇型表面活性剂的水溶液用于通过降低含水显影剂溶液的接触角来改善基材表面的润湿性。 在一个实施方案中，水溶液用于在显影抗蚀剂涂层之前制备基材的表面。

公开(公告)号：US09979797B2

公开(公告)日：2018-05-22

申请号：US14417448

申请日：2012-07-27

申请人： Peng Zhang

发明人： Peng Zhang

IPC分类号： H04L29/08 ,  H04W4/18

CPC分类号： H04L67/32 ,  H04L67/04 ,  H04L67/10 ,  H04L67/18 ,  H04L67/28 ,  H04W4/18

摘要： A method, apparatus and computer program product are to facilitate the utilization of cloud computing resources by a mobile terminal. From the standpoint of a mobile hub, a request for cloud services is received that has been issued by an application executed by a mobile terminal. An application agent is then created based upon the application that issued the request and a request is caused to be transmitted to a cloud service provider in response to the request for cloud services. A response is then received from the cloud service provider and a response is caused to be provided to the mobile terminal based upon the response from the cloud service provider.

公开(公告)号：US09382269B2

公开(公告)日：2016-07-05

申请号：US14491581

申请日：2014-09-19

申请人： Antonio Sanchez ,  Gennadily Itov ,  Peng Zhang ,  Matthew Damien Stephens

发明人： Antonio Sanchez ,  Gennadily Itov ,  Peng Zhang ,  Matthew Damien Stephens

IPC分类号： C07F7/04 ,  C07F7/10

CPC分类号： C07F7/025 ,  C07F7/10 ,  H01L21/02219 ,  H01L21/02617

摘要： Compounds and method of preparation of Si—X and Ge—X compounds (X═N, P, As and Sb) via dehydrogenative coupling between the corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metallic catalysts is described. This new approach is based on the catalytic dehydrogenative coupling of a Si—H and a X—H moiety to form a Si—X containing compound and hydrogen gas (X═N, P, As and Sb). The process can be catalyzed by transition metal heterogenous catalysts such as Ru(0) on carbon, Pd(0) on MgO) as well as transition metal organometallic complexes that act as homogeneous catalysts. The —Si—X products produced by dehydrogenative coupling are inherently halogen free. Said compounds can be useful for the deposition of thin films by chemical vapor deposition or atomic layer deposition of Si-containing films.

摘要翻译： 描述了通过金属催化剂催化的相应的未取代的硅烷和胺（包括氨）或膦之间的脱氢偶联制备Si-X和Ge-X化合物（X = N，P，As和Sb）的化合物和方法。 这种新方法是基于Si-H和X-H部分的催化脱氢偶合形成含Si-X的化合物和氢气（X = N，P，As和Sb）。 该过程可以通过过渡金属异质催化剂如碳上的Ru（0），MgO上的Pd（0））以及作为均相催化剂的过渡金属有机金属络合物催化。 由脱氢偶联产生的-Si-X产物固有地是无卤素的。 所述化合物可用于通过化学气相沉积或含Si膜的原子层沉积沉积薄膜。