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    Glycidyl ether-capped acetylenic diol ethoxylate surfactants
    5.
    发明授权
    Glycidyl ether-capped acetylenic diol ethoxylate surfactants 有权
    缩水甘油醚封端的炔二醇乙氧基化物表面活性剂

    公开(公告)号：US06717019B2

    公开(公告)日：2004-04-06

    申请号：US10060679

    申请日：2002-01-30

    申请人： Kevin Rodney Lassila

    发明人： Kevin Rodney Lassila

    IPC分类号： C07C4314

    CPC分类号： C08L71/02 ,  C08G65/22 ,  C08G65/2609 ,  C08G2650/60 ,  C09D171/02 ,  C11D1/72 ,  C11D1/722 ,  C11D3/164

    摘要： The present invention pertains to glycidyl ether-capped acetylenic diol ethoxylates having a structure according to the formula: wherein R1 is hydrogen or a linear, branched, or cyclic alkyl group having from 1 to about 6 carbon atoms; R2 is a linear, branched, or cyclic alkyl group having from 1 to about 12 carbon atoms; R3=—CH2OR4; R4 is a linear, branched, or cyclic alkyl, alkenyl, aryl, or aralkyl group having from 2 to about 30 carbon atoms; (n+m) is from 1 to about 100; and (p+q) is from 0.5 to about 5 and its use to reduce equilibrium and dynamic surface tension in water-based compositions containing an organic or inorganic compound, particularly aqueous organic coating, ink, acid gas scrubbing and agricultural compositions.

    摘要翻译： 本发明涉及具有下式结构的缩水甘油醚封端炔属二醇乙氧基化物：其中R 1是氢或具有1至约6个碳原子的直链，支链或环状烷基; R 2是具有1至约12个碳原子的直链，支链或环状烷基; R 3 = -CH 2 OR 4; R 4是具有2至约30个碳原子的直链，支链或环状烷基，烯基，芳基或芳烷基; （n + m）为1〜约100; 和（p + q）为0.5至约5，并且其用于减少含有机或无机化合物，特别是水性有机涂料，油墨，酸性气体洗涤剂和农用组合物的水基组合物中的平衡和动态表面张力。

    VIOLET LEAVES ODORANTS
    6.
    发明申请
    VIOLET LEAVES ODORANTS 有权
    紫露露出气味

    公开(公告)号：US20150322375A1

    公开(公告)日：2015-11-12

    申请号：US14801767

    申请日：2015-07-16

    申请人： FIRMENICH SA

    发明人： Christian CHAPUIS

    IPC分类号： C11B9/00 ,  C11D3/00 ,  C11D3/18 ,  C11D3/50

    CPC分类号： C11B9/0007 ,  C11D3/001 ,  C11D3/164 ,  C11D3/184 ,  C11D3/50

    摘要： A method of use, as a perfuming ingredient, of a compound of formula I in the form of any one of its stereoisomers or a mixture thereof, and wherein each R1 represents a hydrogen atom or a methyl group and at least one of said R1 is a hydrogen atom; R2 represents a linear or branched C3-8 alkyl group or unsaturated groups; and R3 represents a hydrogen atom or a methyl group. These compounds impart odor notes of the violet leaves type optionally together with green odor notes.

    摘要翻译： 使用其任何一种立体异构体或其混合物形式的式I化合物作为加香成分的方法，其中每个R 1表示氢原子或甲基，并且所述R 1中的至少一个是 氢原子; R2表示直链或支链C 3-8烷基或不饱和基团; 并且R 3表示氢原子或甲基。 这些化合物赋予紫色叶子类型的气味，同时带有绿色气味。

    Process solutions containing surfactants used as post-chemical mechanical planarization treatment
    9.
    发明授权
    Process solutions containing surfactants used as post-chemical mechanical planarization treatment 有权
    含有表面活性剂的工艺溶液用作后化学机械平面化处理

    公开(公告)号：US07208049B2

    公开(公告)日：2007-04-24

    申请号：US10689402

    申请日：2003-10-20

    申请人： Peng Zhang ,  Brenda Faye Ross

    发明人： Peng Zhang ,  Brenda Faye Ross

    IPC分类号： C23G1/00

    CPC分类号： H01L21/02074 ,  C11D1/08 ,  C11D1/40 ,  C11D1/72 ,  C11D3/164 ,  C11D11/0047 ,  Y10S134/902

    摘要： Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention.

    摘要翻译： 使用包含一种或多种表面活性剂的工艺溶液来减少半导体器件制造中的缺陷数量。 在某些优选的实施方案中，本发明的方法溶液可以在CMP处理过程中或之后用作冲洗溶液时减少缺陷。 还公开了使用本发明的处理溶液来减少多个后CMP处理基板上的缺陷数量的方法。