公开(公告)号：US5862823A

公开(公告)日：1999-01-26

申请号：US729283

申请日：1996-10-10

申请人： Yuji Kamikawa ,  Naoki Shindo

发明人： Yuji Kamikawa ,  Naoki Shindo

IPC分类号： B08B11/02 ,  B08B3/04 ,  H01L21/00 ,  H01L21/304 ,  H01L21/677 ,  B08B3/00

CPC分类号： H01L21/67057 ,  Y10S134/902

摘要： The substrate cleaning method for performing cleaning processing on a plurality of substrates disposed such that front surfaces of the substrates on which a circuit pattern is to be formed extend substantially in a vertical direction. This method includes a step of picking up substrates contained in a cassette, all together, from the cassette, a step of making front surfaces of adjacent substrates face each other without bringing the front surfaces into contact with each other, while making back surfaces of adjacent substrates face each other without bringing the back surfaces into contact with each other, the front surfaces of the adjacent substrates being situated with a pitch interval L.sub.1 interposed therebetween, and the pitch interval being set to be larger than a pitch interval L.sub.2 interposed between the back surfaces of the adjacent substrates, a step of dipping the plurality of substrates thus disposed, all together, into a chemical solution, and a step of making the chemical solution flow between the front surfaces of adjacent substrates of the plurality of substrates, facing each other, and between the back surfaces of adjacent substrates of the plurality of substrates, facing each other.

摘要翻译： 用于对多个基板进行清洁处理的基板清洗方法，所述基板设置成使得要形成电路图案的基板的正面基本上沿垂直方向延伸。 该方法包括从盒子一起拾取包含在盒中的基板的步骤，使相邻基板的前表面彼此面对的步骤，而不使表面彼此接触，同时使相邻的基板的背面 基板彼此面对而不会使背面彼此接触，相邻基板的前表面间隔有间距间隔L1，并且间距间隔被设定为大于插入在背面之间的间距间隔L2 相邻基板的表面，将如此设置的多个基板一起浸入化学溶液的步骤，以及使化学溶液在彼此面对的多个基板的相邻基板的前表面之间流动的步骤 ，并且在多个基板的相邻基板的背面之间彼此面对。

公开(公告)号：US5488964A

公开(公告)日：1996-02-06

申请号：US880068

申请日：1992-05-07

申请人： Shinya Murakami ,  Yuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

公开(公告)号：US08744302B2

公开(公告)日：2014-06-03

申请号：US13481279

申请日：2012-05-25

申请人： Kaoru Matsushita ,  Kazuyoshi Hagiwara ,  Kazutoshi Sugitani ,  Kuniaki Tanaka ,  Koichi Sato ,  Yuji Kamikawa ,  Koji Deguchi ,  Yusuke Sakai

发明人： Kaoru Matsushita ,  Kazuyoshi Hagiwara ,  Kazutoshi Sugitani ,  Kuniaki Tanaka ,  Koichi Sato ,  Yuji Kamikawa ,  Koji Deguchi ,  Yusuke Sakai

IPC分类号： G03G21/00

CPC分类号： G03G15/161 ,  G03G2215/0129

摘要： A cleaning device includes a first cleaning member, a first opposing member, a second cleaning member, a second opposing member, and a pressing member. The first and second cleaning members clean an outer surface of a belt member by coming into contact with the outer surface. The first and second opposing members are in contact with an inner face of the belt member at positions that are opposite the first and second cleaning members. The pressing member is disposed between the first and second opposing members and is in contact with the outer surface of the belt member. The pressing member presses a portion of the belt member that is located between the first and second opposing members from an outer surface side of the belt member toward an inner face side of the belt member.

摘要翻译： 清洁装置包括第一清洁构件，第一相对构件，第二清洁构件，第二相对构件和按压构件。 第一和第二清洁部件通过与外表面接触来清洁带部件的外表面。 第一和第二相对构件在与第一和第二清洁构件相对的位置处与带构件的内表面接触。 按压构件设置在第一和第二相对构件之间并且与带构件的外表面接触。 按压构件将带状构件的位于第一和第二对置构件之间的部分从带构件的外表面侧朝向带构件的内表面侧按压。

公开(公告)号：US08491726B2

公开(公告)日：2013-07-23

申请号：US12232458

申请日：2008-09-17

申请人： Yuji Kamikawa ,  Shigenori Kitahara

发明人： Yuji Kamikawa ,  Shigenori Kitahara

IPC分类号： B08B3/00

CPC分类号： H01L21/67023 ,  B08B3/00 ,  G01N27/10

摘要： A liquid processing apparatus includes: a processing part 80 configured to process an object to be processed by a process liquid; a supply path 1 connected to the processing part 80, the supply path 1 being configured to guide the process liquid to the processing part 80; a solvent supply part 7 configured to supply a solvent to the supply path 1; and a chemical-liquid supply part 5 configured to supply a chemical liquid to the supply path 1 through a chemical-liquid supply path so as to generate a chemical liquid diluted with the solvent. A measuring part 10, which is configured to measure a conductivity of the chemical liquid diluted with the solvent, is disposed in the supply path at a position downstream from a connection points 25a, 35a, 45a, to which the chemical-liquid supply path 6 is connected. An additional chemical-liquid supply part 1, which is configured to supply an additional chemical liquid different from the chemical liquid through an additional chemical-liquid supply path 3, is connected to the supply path at a position downstream from a measuring point 10a on which the measuring part 10 is disposed.

摘要翻译： 一种液体处理设备，包括：处理部分80，被配置为处理由处理液体处理的物体; 连接到处理部80的供给路径1，供给路径1构成为将处理液引导到处理部80; 配置成向供给路径1供给溶剂的溶剂供给部7; 以及药液供给部5，其经由药液供给路径向供给路径1供给化学液，以生成用溶剂稀释的药液。 被配置为测量用溶剂稀释的化学液体的电导率的测量部件10设置在供应路径中的连接点25a，35a，45a的下游位置，药液供给路径6 已连接。 配置为通过附加的药液供给路径3供给与化学液体不同的附加的药液的附加的药液供给部1在测量点10a的下游的位置与供给路径连接， 设置测量部10。

公开(公告)号：US08268087B2

公开(公告)日：2012-09-18

申请号：US12596882

申请日：2008-12-12

申请人： Yuji Kamikawa ,  Norihiro Ito ,  Jiro Higashijima

发明人： Yuji Kamikawa ,  Norihiro Ito ,  Jiro Higashijima

IPC分类号： B08B7/00 ,  B08B7/04 ,  B08B3/00

CPC分类号： H01L21/68742 ,  H01L21/67051 ,  H01L21/68792

摘要： A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated.

摘要翻译： 一种液体处理装置，包括：中空的保持板，其构造成保持待加工物体; 固定地连接到所述保持板的中空外旋转轴; 构造成旋转所述外旋转轴的旋转驱动部; 以及设置在所述保持板的中空空间中的提升销板，并且具有构造成支撑待处理物体的升降销。 在升降销板内部，延长了构造成供给清洗液的清洗液供给部。 连接到升降销板的是提升构件，其构造成将升降销板定位在上部位置和下部位置。 当位于下部位置时，提升销板受到用于旋转外部旋转轴的旋转驱动部的力，使得升降销板旋转。

公开(公告)号：US20100147335A1

公开(公告)日：2010-06-17

申请号：US12596889

申请日：2009-01-27

申请人： Norihiro Ito ,  Yuji Kamikawa

发明人： Norihiro Ito ,  Yuji Kamikawa

IPC分类号： B08B3/00

CPC分类号： H01L21/68792 ,  H01L21/68742

摘要： A liquid processing apparatus includes: a hollow holding plate to hold an object to be processed; a hollow outer rotary shaft fixedly joined to the holding plate; a lift pin plate having a lift pin to support the object; an inner rotary shaft fixedly joined to the lift pin plate; and a lifting member to raise and lower the lift pin plate to locate the lift pin plate on an upper position and a lower position. Inside the inner rotary shaft, there is disposed a cleaning-liquid supply part to supply a cleaning liquid to the object to be processed. An outer rotary drive part is joined to the outer rotary shaft, the outer rotary drive part being configured to rotate the outer rotary shaft. An inner rotary drive part is joined to the inner rotary shaft, the inner rotary drive part being configured to rotate the inner rotary shaft.

摘要翻译： 一种液体处理装置，包括：中空的保持板，用于保持被加工物; 固定地连接到保持板的中空外旋转轴; 具有用于支撑所述物体的升降销的升降销板; 固定地连接到提升销板的内部旋转轴; 以及提升构件，用于升高和降低升降销板，以将升降销板定位在上部位置和下部位置。 在内部旋转轴内部设置有清洁液供给部件，用于向被处理物体供应清洁液体。 外旋转驱动部与外旋转轴接合，外旋转驱动部构成为使外旋转轴旋转。 内旋转驱动部与内旋转轴接合，内旋转驱动部构成为使内旋转轴旋转。

公开(公告)号：US20090101186A1

公开(公告)日：2009-04-23

申请号：US11922502

申请日：2006-06-16

申请人： Koukichi Hiroshiro ,  Yuji Kamikawa ,  Takayuki Toshima ,  Naoki Shindo

发明人： Koukichi Hiroshiro ,  Yuji Kamikawa ,  Takayuki Toshima ,  Naoki Shindo

IPC分类号： B08B3/04

CPC分类号： H01L21/02057 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67057

摘要： Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture.

摘要翻译： 公开了一种用于清洗和干燥诸如半导体晶片的衬底的衬底处理装置。 该基板处理装置包括：液体处理单元，用于通过将基板浸渍在储存的净化水中来处理基板;干燥单元，布置在液体处理单元上方并构造成干燥基板;基板输送装置，用于在液体处理 单元和干燥单元，用于将含有纯净水的蒸气或雾的挥发性有机溶剂的蒸气或雾的流体混合物供给到干燥单元的流体供给机构，以及用于控制流体混合物的供给的控制器。

公开(公告)号：US07412981B2

公开(公告)日：2008-08-19

申请号：US11545471

申请日：2006-10-11

申请人： Koji Egashira ,  Yuji Kamikawa

发明人： Koji Egashira ,  Yuji Kamikawa

IPC分类号： B08B3/02

CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902

摘要： A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in order to perform a liquid process. The nozzles 54, 56 are respectively equipped with a plurality of ejecting orifices 53, 55 capable of ejecting the processing liquid in a plane manner, allowing the substrates W to be processed uniformly and effectively.

摘要翻译： 液体处理装置包括容纳多个晶片W的处理室51,52的容器26,27,26a，26b和用于向基板W供给处理液体以进行液体处理的喷嘴54,56。 喷嘴54,56分别配备有能够以平面方式喷射处理液的多个喷射孔53,55，从而能够均匀有效地对基板W进行加工。

公开(公告)号：US20070215172A1

公开(公告)日：2007-09-20

申请号：US11717170

申请日：2007-03-13

申请人： Tsukasa Watanabe ,  Naoki Shindo ,  Takahiro Furukawa ,  Yuji Kamikawa

发明人： Tsukasa Watanabe ,  Naoki Shindo ,  Takahiro Furukawa ,  Yuji Kamikawa

IPC分类号： B08B3/12 ,  B08B3/00

CPC分类号： B08B3/12 ,  B01F15/00207 ,  B01F15/0022 ,  B01F15/0429 ,  B08B3/00 ,  C11D11/0047 ,  H01L21/67057

摘要： The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate to be processed W is subjected to an ultrasonic cleaning process. While the substrate to be processed is being cleaned, a dissolved gas concentration of a gas dissolved in the cleaning liquid contained in the cleaning tank is changed.

摘要翻译： 本发明提供一种能够以高去除效率从待处理基板的整个表面去除颗粒的基板清洗方法。 在本发明的基板清洗方法中，将被处理基板W浸渍在清洗槽12内的清洗液中。 然后，在包含在清洗槽12中的清洗液中产生超声波，使待处理基板W进行超声波清洗处理。 当被处理基板被清洗时，溶解在清洗槽中所含的清洗液中的溶解气体浓度变化。

公开(公告)号：US06861371B2

公开(公告)日：2005-03-01

申请号：US10285410

申请日：2002-11-01

申请人： Yuji Kamikawa ,  Eiichi Mukai

发明人： Yuji Kamikawa ,  Eiichi Mukai

IPC分类号： H01L21/304 ,  B08B3/02 ,  H01L21/00 ,  H01L21/302 ,  H01L21/401

CPC分类号： H01L21/67023 ,  B08B3/02 ,  Y10S438/905

摘要： The present invention provides a substrate processing system and method which can prevent the filter from being stuffed with foreign objects and make the filter accordingly more durable.The substrate processing system 12 comprising a substrate processing unit 46 for processing substrates W with a processing liquid, and a processing liquid recovery passage 75 for passing the processing liquid discharged from the substrate processing unit 46, in which the processing liquid recovery passage 75 includes a filter 80 for removing foreign objects mixed in the processing liquid, a cleaning fluid supply passage 120 for feeding a cleaning fluid for cleaning the filter 80, and a discharge passage 115 for discharging the processing liquid and the cleaning fluid from the filter 80.

摘要翻译： 本发明提供一种基板处理系统和方法，其可以防止过滤器被异物填充，并且使过滤器相对更耐用。基板处理系统12包括用处理液体处理基板W的基板处理单元46，以及 处理液回收通道75，用于使从基板处理单元46排出的处理液体通过，其中处理液回收通道75包括用于除去混合在处理液体中的异物的过滤器80;清洁液供给通道120， 用于清洁过滤器80的清洁流体，以及用于从过滤器80排出处理液体和清洁流体的排出通道115。