公开(公告)号：US08371318B2

公开(公告)日：2013-02-12

申请号：US13591877

申请日：2012-08-22

申请人： Teruomi Minami ,  Norihiro Ito ,  Yuji Kamikawa

发明人： Teruomi Minami ,  Norihiro Ito ,  Yuji Kamikawa

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/67028 ,  H01L21/67034

摘要： A liquid processing apparatus 1 comprises a casing 5, a substrate holding mechanism 20 that holds a wafer (substrate to be processed) W, a process-liquid supplying mechanism 30 that supplies a process liquid, a draining cup 12 that receives a process liquid, and a draining pipe 13 that discharges a process liquid outside. The process-liquid supplying mechanism 30 includes a first chemical-liquid supply mechanism that supplies a hydrofluoric process liquid, and a drying-liquid supplying mechanism that supplies an organic solvent for drying a wafer W. A control part 50 causes the first chemical-liquid supplying mechanism to supply a hydrofluoric process liquid, and then causes the drying-liquid supplying mechanism to supply an organic solvent. In addition, before the control part 50 causes the drying-liquid supplying mechanism to supply an organic solvent, the control part causes a cleaning mechanism 10 to remove an alkaline component in a casing 5.

公开(公告)号：US20100083986A1

公开(公告)日：2010-04-08

申请号：US12596882

申请日：2008-12-12

申请人： Yuji Kamikawa ,  Norihiro Ito ,  Jiro Higashijima

发明人： Yuji Kamikawa ,  Norihiro Ito ,  Jiro Higashijima

IPC分类号： B08B3/08 ,  B08B13/00 ,  B08B7/00

CPC分类号： H01L21/68742 ,  H01L21/67051 ,  H01L21/68792

摘要： A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated.

摘要翻译： 一种液体处理装置，包括：中空的保持板，其构造成保持待加工物体; 固定地连接到所述保持板的中空外旋转轴; 构造成旋转所述外旋转轴的旋转驱动部; 以及设置在所述保持板的中空空间中的提升销板，并且具有构造成支撑待处理物体的升降销。 在升降销板内部，延长了构造成供给清洗液的清洗液供给部。 连接到升降销板的是提升构件，其构造成将升降销板定位在上部位置和下部位置。 当位于下部位置时，提升销板受到用于旋转外部旋转轴的旋转驱动部的力，使得升降销板旋转。

公开(公告)号：US08268087B2

公开(公告)日：2012-09-18

申请号：US12596882

申请日：2008-12-12

申请人： Yuji Kamikawa ,  Norihiro Ito ,  Jiro Higashijima

发明人： Yuji Kamikawa ,  Norihiro Ito ,  Jiro Higashijima

IPC分类号： B08B7/00 ,  B08B7/04 ,  B08B3/00

CPC分类号： H01L21/68742 ,  H01L21/67051 ,  H01L21/68792

摘要： A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated.

摘要翻译： 一种液体处理装置，包括：中空的保持板，其构造成保持待加工物体; 固定地连接到所述保持板的中空外旋转轴; 构造成旋转所述外旋转轴的旋转驱动部; 以及设置在所述保持板的中空空间中的提升销板，并且具有构造成支撑待处理物体的升降销。 在升降销板内部，延长了构造成供给清洗液的清洗液供给部。 连接到升降销板的是提升构件，其构造成将升降销板定位在上部位置和下部位置。 当位于下部位置时，提升销板受到用于旋转外部旋转轴的旋转驱动部的力，使得升降销板旋转。

公开(公告)号：US20100147335A1

公开(公告)日：2010-06-17

申请号：US12596889

申请日：2009-01-27

申请人： Norihiro Ito ,  Yuji Kamikawa

发明人： Norihiro Ito ,  Yuji Kamikawa

IPC分类号： B08B3/00

CPC分类号： H01L21/68792 ,  H01L21/68742

摘要： A liquid processing apparatus includes: a hollow holding plate to hold an object to be processed; a hollow outer rotary shaft fixedly joined to the holding plate; a lift pin plate having a lift pin to support the object; an inner rotary shaft fixedly joined to the lift pin plate; and a lifting member to raise and lower the lift pin plate to locate the lift pin plate on an upper position and a lower position. Inside the inner rotary shaft, there is disposed a cleaning-liquid supply part to supply a cleaning liquid to the object to be processed. An outer rotary drive part is joined to the outer rotary shaft, the outer rotary drive part being configured to rotate the outer rotary shaft. An inner rotary drive part is joined to the inner rotary shaft, the inner rotary drive part being configured to rotate the inner rotary shaft.

摘要翻译： 一种液体处理装置，包括：中空的保持板，用于保持被加工物; 固定地连接到保持板的中空外旋转轴; 具有用于支撑所述物体的升降销的升降销板; 固定地连接到提升销板的内部旋转轴; 以及提升构件，用于升高和降低升降销板，以将升降销板定位在上部位置和下部位置。 在内部旋转轴内部设置有清洁液供给部件，用于向被处理物体供应清洁液体。 外旋转驱动部与外旋转轴接合，外旋转驱动部构成为使外旋转轴旋转。 内旋转驱动部与内旋转轴接合，内旋转驱动部构成为使内旋转轴旋转。

公开(公告)号：US20090056764A1

公开(公告)日：2009-03-05

申请号：US12222871

申请日：2008-08-18

申请人： Teruomi Minami ,  Norihiro Ito ,  Yuji Kamikawa

发明人： Teruomi Minami ,  Norihiro Ito ,  Yuji Kamikawa

IPC分类号： B08B3/08 ,  B08B3/02

CPC分类号： H01L21/67051 ,  H01L21/67028 ,  H01L21/67034

摘要： A liquid processing apparatus 1 comprises a casing 5, a substrate holding mechanism 20 that holds a wafer (substrate to be processed) W, a process-liquid supplying mechanism 30 that supplies a process liquid, a draining cup 12 that receives a process liquid, and a draining pipe 13 that discharges a process liquid outside. The process-liquid supplying mechanism 30 includes a first chemical-liquid supply mechanism that supplies a hydrofluoric process liquid, and a drying-liquid supplying mechanism that supplies an organic solvent for drying a wafer W. A control part 50 causes the first chemical-liquid supplying mechanism to supply a hydrofluoric process liquid, and then causes the drying-liquid supplying mechanism to supply an organic solvent. In addition, before the control part 50 causes the drying-liquid supplying mechanism to supply an organic solvent, the control part causes a cleaning mechanism 10 to remove an alkaline component in a casing 5.

摘要翻译： 液体处理装置1包括壳体5，保持晶片（待处理基板）W的基板保持机构20，供给处理液的处理液供给机构30，接收处理液的排出杯12， 以及将处理液体排出到外部的排水管13。 处理液供给机构30包括供给氢氟化处理液的第一药液供给机构和供给干燥晶片W的有机溶剂的干燥液供给机构。控制部50使第一药液 供给机构供给氢氟化处理液，然后使干燥液供给机构供给有机溶剂。 此外，在控制部50使干燥液供给机构供给有机溶剂之前，控制部使清洁机构10除去壳体5内的碱性成分。

公开(公告)号：US09012902B2

公开(公告)日：2015-04-21

申请号：US14007440

申请日：2012-03-09

申请人： Nobuhiro Ide ,  Norihiro Ito ,  Hiroya Tsuji ,  Yuko Suzuka

发明人： Nobuhiro Ide ,  Norihiro Ito ,  Hiroya Tsuji ,  Yuko Suzuka

IPC分类号： H01L51/50 ,  H01L51/52

CPC分类号： H01L51/5008 ,  H01L51/5044 ,  H01L51/5278

摘要： Provided is an organic electroluminescent element superior in long-term durability and lifetime characteristics. The organic electroluminescent element has a structure where plurality of light-emitting layers formed via an intermediate layer are interposed between a positive electrode and a negative electrode. The intermediate layer has a mixed layer, a first layer, and a hole-injection layer which are formed in this order from the positive electrode to the negative electrode, the mixed layer containing an electron-donating substance and an electron-transporting organic material, and the first layer being made of an electron-transporting material. The first layer has a thickness in a range of 0.2 to 2.0 nm. The hole-injection layer consists of an electro-accepting organic material.

摘要翻译： 提供了长期耐久性和寿命特性优异的有机电致发光元件。 有机电致发光元件具有通过中间层形成的多个发光层插入在正极和负极之间的结构。 中间层具有从正极到负极的顺序形成的混合层，第一层和空穴注入层，含有供电子物质和电子传输有机材料的混合层， 并且第一层由电子传输材料制成。 第一层的厚度为0.2〜2.0nm。 空穴注入层由电接收有机材料构成。

公开(公告)号：US08950414B2

公开(公告)日：2015-02-10

申请号：US12837840

申请日：2010-07-16

申请人： Norihiro Ito

发明人： Norihiro Ito

IPC分类号： H01L21/00 ,  H01L21/67

CPC分类号： H01L21/6708 ,  H01L21/67051 ,  H01L21/67248 ,  Y10S134/902

摘要： The liquid processing apparatus includes: a liquid supply mechanism; a supply line connected to the liquid supply mechanism, the supply line having a discharge opening for discharging a temperature-regulated liquid; a processing unit supporting the discharge opening of the supply line; a return line configured to return the liquid supplied to the supply line to the liquid supply mechanism; and a liquid-supply switching valve configured to switch between supply of the liquid, which is used in a processing of an object to be processed in the processing unit, and stoppage of the liquid supply. The liquid-supply switching valve is disposed on the supply line on a route of the liquid returning from the supply line to the liquid supply mechanism through the return line.

摘要翻译： 液体处理装置包括：液体供给机构; 连接到液体供给机构的供给管线，供给管线具有用于排出温度调节液体的排出口; 支撑供给管线的排出口的处理单元; 返回管线，被配置为将供应到所述供应管线的液体返回到所述液体供应机构; 以及液体供给切换阀，其配置为在所述处理单元中的被处理物的处理中使用的液体的供给与所述液体供给的停止之间切换。 液体供给切换阀通过返回管路从供给管路返回到液体供给机构的液体的路线配置在供给管路上。

公开(公告)号：US20130014786A1

公开(公告)日：2013-01-17

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/04 ,  F17D1/00

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.

摘要翻译： 顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。 设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。 构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

公开(公告)号：US08201568B2

公开(公告)日：2012-06-19

申请号：US12533743

申请日：2009-07-31

申请人： Norihiro Ito ,  Hidemasa Aratake

发明人： Norihiro Ito ,  Hidemasa Aratake

IPC分类号： B08B7/00 ,  B08B7/04 ,  B08B3/00 ,  B08B3/04

CPC分类号： B08B3/04 ,  H01L21/67051 ,  Y10S134/902

摘要： Disclosed is a liquid treatment apparatus capable of effectively exhausting processing liquid atmosphere around a target object. The liquid treatment apparatus includes a container, a support part located within the container that supports the target object, a rotation driving mechanism to rotate the target object supported by the support part, a processing liquid supply mechanism to supply a processing liquid to the target object, and a rotation cup, which is located outside of the outer circumference of the target object and is rotatable together with the support part. A rotation exhaust cup is arranged above the rotation cup and is rotatable together with the rotation cup. A discharge mechanism discharges processing liquid atmosphere guided by the rotation cup and the rotation exhaust cup.

摘要翻译： 公开了能够有效地排出目标物体周围的处理液体气氛的液体处理装置。 液体处理装置包括容器，位于容器内的支撑目标物体的支撑部，旋转驱动机构，使由支撑部支撑的目标物体旋转;处理液供给机构，用于向目标物体供给处理液 以及旋转杯，其位于目标物体的外周的外侧，并与支撑部一起旋转。 旋转排气杯设置在旋转杯的上方，并与旋转杯一起旋转。 排出机构排出由旋转杯和旋转排气杯引导的处理液体气氛。

公开(公告)号：US20100144158A1

公开(公告)日：2010-06-10

申请号：US11991845

申请日：2007-07-20

申请人： Norihiro Ito ,  Satoshi Kaneko ,  Hiromitsu Nanba

发明人： Norihiro Ito ,  Satoshi Kaneko ,  Hiromitsu Nanba

IPC分类号： H01L21/46

CPC分类号： H01L21/67051

摘要： A liquid treatment device having a substrate holding section (2) for horizontally holding a wafer (W) and capable of rotating with the wafer (W), a rotation cup (4) having an annular shape so as to surround the wafer (W) held by the substrate holding section (2) and capable of rotating with the wafer (W), a rotation mechanism (3) for integrally rotating the rotation cup (4) and the substrate holding section (2), a nozzle (5) for supplying a treatment liquid for the wafer (W) and a cleaning liquid for the rotation cup (4), a liquid supply section (85) for supplying the treatment liquid and cleaning liquid to the nozzle (5), and a nozzle movement mechanism for moving the nozzle (5) between a first position at which the liquid is discharged to the wafer (W) and a second position at which the liquid is discharged to an external portion of the rotation cup (4). The wafer (W) is treated with the liquid with the nozzle (5) positioned at the wafer treatment position, and the cleaning liquid is discharged to the external portion of the rotation cup with the nozzle (5) positioned at the rotation cup cleaning position.

摘要翻译： 一种液体处理装置，具有用于水平地保持晶片（W）并且能够与晶片（W）一起旋转的基板保持部分（2），具有围绕晶片（W）的环形的旋转杯（4） 由所述基板保持部（2）保持并且能够与所述晶片（W）一起旋转的旋转机构（3），所述旋转机构（3）用于使所述旋转杯（4）和所述基板保持部（2）一体旋转;喷嘴（5），其用于 提供用于晶片（W）的处理液和用于旋转杯（4）的清洁液体，用于向喷嘴（5）供应处理液和清洁液体的液体供应部分（85），以及用于 将喷嘴（5）在液体排放到晶片（W）的第一位置和液体排出到旋转杯（4）的外部的第二位置之间移动。 用喷嘴（5）位于晶片处理位置的液体处理晶片（W），并且将清洁液体喷射到旋转杯的外部，喷嘴（5）位于旋转杯清洁位置 。