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公开(公告)号：US09341944B2
公开(公告)日：2016-05-17
申请号：US12705018
申请日：2010-02-12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
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82.发明申请Device for Directing Radiation to a Layer, Apparatus with Such Device and Method Using Such Apparatus 失效用于将辐射定向到层的装置，具有这种装置的装置和使用这种装置的方法公开(公告)号：US20080186549A1
公开(公告)日：2008-08-07
申请号：US11911559
申请日：2006-04-13
IPC分类号： G02B26/08
CPC分类号： G11B7/261 , G03F7/70383 , G03F7/70583
摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.
摘要翻译： 描述了用于将辐射引导到层（1）的装置。 该装置包括用于将源自第一辐射源（S1）的第一辐射束（B 1）聚焦到所述层上的第一光学元件（L 1），用于聚焦第二辐射束的第二光学元件（L 2） B 2）源自第二辐射源（S 2）到所述层上。 来自所述第一和第二辐射源的辐射的波长彼此不同。 第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。 第二光学元件（L 2）具有允许第一辐射束（B 1）的光学上不受干扰地通过的孔径（A 2）。 以这种方式，实现了L 1和L 2的紧凑和轻型结构以及改进的辐射束质量。 此外，公开了一种包括这种装置的装置和使用这种装置的方法。
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公开(公告)号：US07354698B2
公开(公告)日：2008-04-08
申请号：US11030326
申请日：2005-01-07
申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
发明人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记， 介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。
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84.发明申请Photolithographic process, stamper, use of said stamper and optical data storage medium 审中-公开光刻工艺，压模，使用所述压模和光学数据存储介质公开(公告)号：US20060246378A1
公开(公告)日：2006-11-02
申请号：US10553720
申请日：2004-04-22
申请人： Jacobus Neijzen , Helmar Van Santen
发明人： Jacobus Neijzen , Helmar Van Santen
IPC分类号： G03F7/26
CPC分类号： G11B7/263 , G03F7/0015 , G03F7/30 , G11B7/261
摘要： A photolithographic process is described. It comprises the steps of: applying a photoresist layer (2) on a substrate (1), locally exposing the photoresist layer (2) to a radiation source with a suitable wavelength, providing a suitable liquid developer composition on the substrate (1), dissolving an exposed or unexposed region of the photoresist layer (2) with the developer composition, rinsing and drying the photoresist layer (2) thereby interrupting said dissolving step. The substrate (1) has a metallic surface (1c) in contact with the photoresist layer (2) and the photoresist layer (2) has a thickness dr
摘要翻译： 描述光刻工艺。 它包括以下步骤：将光致抗蚀剂层（2）施加到基底（1）上，将光刻胶层（2）局部地曝光到具有合适波长的辐射源上，在基底（1）上提供合适的液体显影剂组合物， 用显影剂组合物溶解光致抗蚀剂层（2）的曝光或未曝光区域，漂洗并干燥光致抗蚀剂层（2），从而中断所述溶解步骤。 基板（1）具有与光致抗蚀剂层（2）接触的金属表面（1c），并且光致抗蚀剂层（2）的厚度dr <100nm。 达到70度以上的相对高的光致抗蚀剂壁陡度。 该方法可以用于通过使用通过所述方法生产的压模（3）来生产高密度光学数据存储介质。
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公开(公告)号：US20060144275A1
公开(公告)日：2006-07-06
申请号：US11025835
申请日：2004-12-30
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译： 公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记 定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分 模式，并将主模板与压印介质分离。
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公开(公告)号：US20050134815A1
公开(公告)日：2005-06-23
申请号：US10743271
申请日：2003-12-23
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。
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公开(公告)号：US06550941B1
公开(公告)日：2003-04-22
申请号：US09717507
申请日：2000-11-21
IPC分类号： F21V500
CPC分类号： F21V5/02 , F21Y2115/10
摘要： A luminaire suitable for accommodating a light source which light source is situated substantially in a first plane. The luminaire has an optical element which is situated substantially in a second plane. The optical element is provided with facets of mutually differing inclination angles at one or both sides. The facets are shaped as substantially parallel prisms. Consecutive facets form a surface which is alternately convex and concave in shape.
摘要翻译： 一种适于容纳光源的照明器，该光源基本上位于第一平面中。 照明器具有基本上位于第二平面中的光学元件。 光学元件设置有在一侧或两侧具有相互不同的倾斜角的小平面。 小面成形为基本平行的棱镜。 连续小面形成交替凸形和凹形的表面。
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公开(公告)号：US08767171B2
公开(公告)日：2014-07-01
申请号：US12727456
申请日：2010-03-19
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。
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89.发明授权Lithographic apparatus and device manufacturing method involving a barrier to collect liquid 有权平版印刷设备和装置制造方法涉及到采集液体的屏障公开(公告)号：US08704998B2
公开(公告)日：2014-04-22
申请号：US13012303
申请日：2011-01-24
申请人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
发明人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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90.发明授权Cyclonic liquid degassing separator and method for degassing a fluid mixture 有权旋风液体脱气分离器和用于对流体混合物进行脱气的方法公开(公告)号：US08105422B2
公开(公告)日：2012-01-31
申请号：US12306539
申请日：2007-06-27
申请人： Marco Betting , Bart Prast , Helmar Van Santen , Cornelius Johannes Schellekens , Paulus Henricus Joannes Verbeek , Peter Mervyn Wilkinson
发明人： Marco Betting , Bart Prast , Helmar Van Santen , Cornelius Johannes Schellekens , Paulus Henricus Joannes Verbeek , Peter Mervyn Wilkinson
IPC分类号： B01D19/00
摘要： The invention is a method and cyclonic separator for degassing a fluid mixture comprising a carrier liquid and gaseous or vaporizable components. In this method, the fluid mixture is accelerated in a throat section of a vortex tube such that the static pressure of the fluid mixture is decreased and vaporizable components evaporate into a gaseous phase and the fluid mixture flows as a substantially homogeneously dispersed gas-liquid mixture through the throat section; the accelerated fluid mixture is induced to swirl within a tubular mid section of the vortex tube such that the fluid mixture is separated by centrifugal forces into a degassed liquid fraction and a gas enriched fraction; the degassed liquid fraction is induced to flow into an annular liquid outlet conduit; and the gas enriched fraction is induced to flow into a central gas outlet conduit.
摘要翻译： 本发明是用于对包含载体液体和气态或可汽化组分的流体混合物进行脱气的方法和旋风分离器。 在这种方法中，流体混合物在涡流管的喉部被加速，使得流体混合物的静压降低，并且可蒸发的组分蒸发成气相，并且流体混合物作为基本上均匀分散的气液混合物 通过喉部; 加速的流体混合物在涡流管的管状中间部分内引起涡流，使得流体混合物通过离心力分离成脱气的液体馏分和富含气体的馏分; 诱发脱气的液体部分流入环形液体出口导管; 并且气体富集部分被诱导流入中心气体出口导管。
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