公开(公告)号：US20060285093A1

公开(公告)日：2006-12-21

申请号：US11451303

申请日：2006-06-13

申请人： Shinichi Hara ,  Noriyasu Hasegawa

发明人： Shinichi Hara ,  Noriyasu Hasegawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7095

摘要： An exposure apparatus includes a projection optical system configured to project an image of a pattern of a reticle onto a substrate. The exposure apparatus exposes the substrate via the projection optical system and a liquid that is disposed between the projection optical system and the substrate. The exposure apparatus includes a top plate configured to hold the substrate, an auxiliary plate disposed around the substrate on the top plate and having a surface that is substantially flush with a surface of the substrate, and a mirror disposed on the top plate for use in measuring at least one of a position of the top plate and an orientation of the top plate. The auxiliary plate preferably is formed of a low-thermal-expansion material having a coefficient of linear expansion of no greater than 100 ppb.

摘要翻译： 曝光装置包括：投影光学系统，被配置为将掩模版图案的图像投影到基板上。 曝光装置经由投影光学系统和设置在投影光学系统和基板之间的液体露出基板。 曝光装置包括：被配置为保持基板的顶板，设置在顶板上的基板周围的辅助板，其具有与基板的表面基本齐平的表面;以及设置在顶板上的反射镜，用于 测量顶板的位置和顶板的取向中的至少一个。 辅助板优选由线膨胀系数不大于100ppb的低热膨胀材料形成。

公开(公告)号：US07057703B2

公开(公告)日：2006-06-06

申请号：US11128220

申请日：2005-05-13

申请人： Keiji Emoto ,  Hirohide Matsuhisa ,  Kotaro Akutsu

发明人： Keiji Emoto ,  Hirohide Matsuhisa ,  Kotaro Akutsu

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  H02K41/00

CPC分类号： G03F7/70525 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975 ,  H01L21/67109

摘要： An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 MΩ·cm.

摘要翻译： 一种曝光装置，其将基板暴露于图案。 该装置包括使纯水作为冷却剂流动的通道，调节在通道中流动的纯净水的温度的温度调节单元和产生在通道中作为冷却剂流动的纯水的冷却剂产生装置， 电阻率不小于1momega.cm。

公开(公告)号：US07050147B2

公开(公告)日：2006-05-23

申请号：US10886050

申请日：2004-07-08

申请人： Rene Theodorus Petrus Compen

发明人： Rene Theodorus Petrus Compen

IPC分类号： H01J21/27

CPC分类号： G03F7/707 ,  G03F7/70783 ,  G03F7/7095 ,  G03F7/70975

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a beam production system configured to provide a beam of radiation, pattern the beam, and project the patterned beam onto a target portion of a substrate, and a support table for supporting an article so that a planar surface of the article lies in a predetermined plane transverse to a propagation direction of the projection beam. The support table has a support surface and an array of protrusions disposed on the support surface that are constructed and arranged to support the article. A position selective material surface melting device is configured to act on individual protrusions when the support table is operable in the apparatus, such that localized areas of an upper surface of the protrusion are melted and subsequently allowed to cool, thereby causing the localized areas to be raised with respect to the upper surface of the protrusion.

摘要翻译： 公开了一种光刻投影装置。 该装置包括：束生产系统，其被配置为提供辐射束，图案束，并将图案化束投影到基底的目标部分上;以及支撑台，用于支撑制品，使得制品的平坦表面位于 与投影光束的传播方向横切的预定平面。 支撑台具有支撑表面和布置在支撑表面上的突出物阵列，其构造和布置成支撑物品。 位置选择性材料表面熔化装置构造成当支撑台在装置中可操作时作用于单独的突起，使得突起的上表面的局部区域熔化并随后允许冷却，从而使局部区域成为 相对于突起的上表面凸起。

公开(公告)号：US20060087630A1

公开(公告)日：2006-04-27

申请号：US11212921

申请日：2005-08-29

申请人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

发明人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

IPC分类号： G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US06982841B2

公开(公告)日：2006-01-03

申请号：US10778810

申请日：2004-02-13

申请人： Yoshiki Kino ,  Yoshinori Miwa ,  Masanori Honda

发明人： Yoshiki Kino ,  Yoshinori Miwa ,  Masanori Honda

IPC分类号： G02B7/02 ,  G02B7/182 ,  G03B21/14

CPC分类号： G03F7/70825 ,  G02B7/182 ,  G03F7/7095

摘要： Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.

摘要翻译： 公开了一种反射镜保持系统，由此可以减少由于光学部件的变形或位置偏离导致的成像性能的降低而产生的像差，从而确保期望的光学性能。 还公开了一种基于这种镜子保持系统的曝光装置和装置制造方法。 保持系统包括用于在多个支撑件处支撑光学元件的支撑构件，多个支撑件可沿大致径向方向围绕预定点移动。

公开(公告)号：US20050213062A1

公开(公告)日：2005-09-29

申请号：US11128220

申请日：2005-05-13

申请人： Keiji Emoto ,  Hirohide Matsuhisa ,  Kotaro Akutsu

发明人： Keiji Emoto ,  Hirohide Matsuhisa ,  Kotaro Akutsu

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70525 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975 ,  H01L21/67109

摘要： An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 MΩ·cm.

摘要翻译： 一种曝光装置，其将基板暴露于图案。 该装置包括使纯水作为冷却剂流动的通道，调节在通道中流动的纯净水的温度的温度调节单元和产生在通道中作为冷却剂流动的纯水的冷却剂产生装置， 电阻率不小于1momega.cm。

公开(公告)号：US20050083496A1

公开(公告)日：2005-04-21

申请号：US10925148

申请日：2004-08-25

申请人： Michel Dansberg ,  Sebastiaan Cornelissen ,  Henrikus Cox ,  Robert Van Diesen ,  Nicolaas Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Van Der Schoot ,  Rob Jansen

发明人： Michel Dansberg ,  Sebastiaan Cornelissen ,  Henrikus Cox ,  Robert Van Diesen ,  Nicolaas Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Van Der Schoot ,  Rob Jansen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。 第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。 该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。 底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。

公开(公告)号：US06631038B1

公开(公告)日：2003-10-07

申请号：US09636061

申请日：2000-08-10

申请人： Marc Spinali

发明人： Marc Spinali

IPC分类号： G02B702

CPC分类号： G03F7/70225 ,  G02B7/021 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/7095

摘要： A catadioptric lens barrel structure for a projection exposure apparatus includes first and second lens barrels having parallel optical axes. The lens barrel structure also includes a third lens barrel transversely connecting the first lens barrel to the second lens barrel. A support structure firmly secures the plurality of lens barrels. The support structure includes a plurality of connecting rods for securing the first and second lens barrels, support platforms for individually supporting the lens barrels, and a plurality of flexures for resiliently supporting the lens barrel structure. The connecting rods are made of a material having a low coefficient of thermal expansion to minimize errors due to temperature changes, vibrational or rotational motion, and other conditions. Alternatively, the support structure may comprise a base support platform for firmly supporting base portions of the first and second lens barrels, and an upper support platform for flexibly supporting upper portions of the lens barrels. The base and upper support platforms are also made a material having a low coefficient of thermal expansion. In one embodiment, the lens barrel structure is used in semiconductor fabrication. A reticle is placed in front of an entrance end of the first lens barrel and a semiconductor wafer is placed in front of an exit end of the second lens barrel. A light beam passes through the reticle, travels through the lens barrel structure, and exposes a semiconductor wafer.

摘要翻译： 用于投影曝光装置的反射折射透镜镜筒结构包括具有平行光轴的第一和第二透镜筒。 透镜镜筒结构还包括将第一透镜镜筒横向连接到第二透镜镜筒的第三镜筒。 支撑结构牢固地固定多个透镜筒。 支撑结构包括用于固定第一和第二透镜筒的多个连接杆，用于单独地支撑透镜筒的支撑平台以及用于弹性地支撑透镜筒结构的多个弯曲部。 连杆由具有低热膨胀系数的材料制成，以最小化由于温度变化，振动或旋转运动以及其它条件引起的误差。 或者，支撑结构可以包括用于牢固地支撑第一和第二透镜筒的基部的基座支撑平台和用于柔性地支撑透镜筒的上部的上支撑平台。 基底和上支撑平台也被制成具有低热膨胀系数的材料。 在一个实施例中，透镜镜筒结构用于半导体制造。 将标线放置在第一透镜镜筒的入口端的前方，并且将半导体晶片放置在第二镜筒的出口端的前方。 光束通过掩模版，穿过透镜镜筒结构，并露出半导体晶片。

公开(公告)号：US5325180A

公开(公告)日：1994-06-28

申请号：US999020

申请日：1992-12-31

申请人： Ronald E. Chappelow ,  Edward W. Conrad

发明人： Ronald E. Chappelow ,  Edward W. Conrad

IPC分类号： G01B5/00 ,  G03F7/20 ,  H01L21/68 ,  G01B11/00

CPC分类号： G03F7/70591 ,  G01B5/0014 ,  G03F7/70716 ,  G03F7/7095 ,  H01L21/682

摘要： The present invention provides a device which can identify and measure both thermally induced errors and system induced errors in a measuring system, especially a photolithographic system for processing semiconductor wafers. The system includes a stage having associated therewith a first material having a known, relatively high, coefficient of thermal expansion (CTE) and a second material having a significantly lower (preferably zero) CTE in the temperature range in which the system is to be used. The system has a "home" position or location. At least one first indicia mark or set of marks is placed on the first material at a given known (calibrated) distance(s) (at a given known temperature) from the "home" position, and at least one second indicia mark or set of marks is placed on the second material at a given known (calibrated) distance(s) from the home position. The system is configured to periodically measure (even during wafer processing) the distances between each of the indicia marks and the "home" position. By periodically measuring these distances and checking them against their calibrated values, the system can determine, measure and distinguish both system induced errors and temperature induced errors.

摘要翻译： 本发明提供了一种能够识别和测量测量系统中的热诱导误差和系统感应误差的装置，特别是用于处理半导体晶片的光刻系统。 该系统包括具有与其相关联的具有已知的相对较高的热膨胀系数（CTE）的第一材料和在使用该系统的温度范围内具有显着较低（优选为零）CTE的第二材料的级 。 系统具有“家”的位置或位置。 至少一个第一标记标记或一组标记在来自“家”位置的给定已知（校准）距离（在给定的已知温度）处放置在第一材料上，以及至少一个第二标记标记或设置 在距离原始位置的给定已知（校准）距离处将标记放置在第二材料上。 该系统被配置为周期性地（即使在晶片处理期间）测量每个标记标记与“家”位置之间的距离。 通过定期测量这些距离并根据其校准值进行检查，系统可以确定，测量和区分系统引起的误差和温度引起的误差。

公开(公告)号：US20180164704A1

公开(公告)日：2018-06-14

申请号：US15856153

申请日：2017-12-28

申请人： ASML Netherlands B.V.

发明人： Johannes Henricus Wilhelmus JACOBS ,  Jan Steven Christiaan Westerlaken

IPC分类号： G03F7/20 ,  H01L21/67

CPC分类号： G03F7/70875 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70816 ,  G03F7/70891 ,  G03F7/7095 ,  H01L21/67103

摘要： A thermal conditioning unit to thermally condition a substrate in a lithographic apparatus, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.