-
1.发明授权公开(公告)号：US12085860B2
公开(公告)日：2024-09-10
申请号：US17150685
申请日：2021-01-15
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Heng-Hsin Liu , Li-Jui Chen , Shang-Chieh Chien
CPC classification number: G03F7/70033 , G03F7/7055 , G03F7/7085 , G03F7/70916 , G21K1/065 , H05G2/005 , H05G2/008
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.
-
公开(公告)号：US09678432B2
公开(公告)日：2017-06-13
申请号：US14828603
申请日：2015-08-18
Applicant: Carl Zeiss SMT GmbH
Inventor： Ingo Saenger , Christoph Hennerkes
CPC classification number: G03F7/70033 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G21K1/065 , G21K1/067 , G21K1/12
Abstract: An optical system has a light source having an original etendue of less than 0.1 mm2 for an illumination system for projection lithography. An optical assembly serves for simultaneously increasing the etendue of a used emission of the light source. The optical assembly is embodied such that an increase in the etendue by at least a factor of 10 results. A component of the optical assembly that is impinged on is displaced relative to the light source such that an impingement region of the emission of the light source on the optical component of the optical assembly varies temporally.
-
公开(公告)号：US20130123984A1
公开(公告)日：2013-05-16
申请号：US13733378
申请日：2013-01-03
Applicant: Giovanni BERTI
Inventor： Giovanni BERTI
CPC classification number: B25J9/1694 , G01N23/2073 , G21K1/065
Abstract: Radiation lenses including channels consisting of capillaries or fibres, polycapillaries or multilayer planar properly coupled, a central channel filled with refracting material for neutrons and an extraction channel. The channels can be bent with a graded curvature and filled with material with an increasing refracting index, such an increasing refracting index depending on the position of the channel respect the central channel. The lenses can be subdivided into sectors in which the channels have a different curvature and are filled with materials with a different refracting index to increase the combined effect of the total reflection and the refraction. The sectors can be configured in a cubic, cone or prism shape.
Abstract translation: 辐射透镜包括由毛细管或纤维组成的通道，聚合毛细管或适当耦合的多层平面，填充有用于中子的折射材料的中心通道和提取通道。 通道可以以渐变的曲率弯曲并且填充有增加的折射率的材料，这种增加的折射率取决于相对于中心通道的通道的位置。 透镜可以细分成其中通道具有不同曲率的扇区，并且填充具有不同折射率的材料以增加全反射和折射的组合效果。 这些扇区可以被配置成立方体，锥形或棱镜形状。
-
公开(公告)号：US20090216373A1
公开(公告)日：2009-08-27
申请号：US11922842
申请日：2006-06-20
Applicant: Giovanni Berti
Inventor： Giovanni Berti
CPC classification number: B25J9/1694 , G01N23/2073 , G21K1/065
Abstract: A mobile equipment endowed with a neutrons source possibly in combination with other radiation sources including a robot system that, moving on a controlled trajectory, realize the conditions to observe from different positions the radiation emerging from a specimen either mobile or fixed, properly irradiated, is described.
Abstract translation: 具有中子源的移动设备可能与其他辐射源组合，包括机器人系统，其在受控轨迹上移动，实现从不同位置观察的条件，从移动或固定的适当照射的样本出射的辐射是 描述。
-
公开(公告)号：US06668040B2
公开(公告)日：2003-12-23
申请号：US10043692
申请日：2002-01-10
Applicant: Bjorn Cederstrom
Inventor： Bjorn Cederstrom
IPC: G21K106
Abstract: The present invention refers to a refractive arrangement for X-rays, and specially to a lens comprising: a member of low-Z material, said member of low-Z material having a first end adapted to receive x-rays emitted from an x-ray source and a second end from which emerge said x-rays received at said first end. It further comprises a plurality of substantially saw-tooth formed grooves disposed between said first and second ends, said plurality of grooves oriented such that said x-rays which are received at said first end, pass through said member of low-Z material and said plurality of grooves, and emerge from said second end, are refracted to a focal point.
-
Patent Agency Ranking
公开(公告)号：US20030081724A1
公开(公告)日：2003-05-01
申请号：US10246507
申请日：2002-09-17
Inventor： Melvin A. Piestrup
IPC: G21K001/06
CPC classification number: G21K1/065 , A61B6/4092 , A61B6/502 , G21K1/06
Abstract: An x-ray or neutron apparatus for the transmission of x-ray or neutron images is described, which includes x-ray- or neutron-three-dimensional (3-D) arrays or mosaics, including a plurality of x-ray or neutron lenses positioned so that they form a two-dimensional (2-D) mosaic of compound refractive lenses to provide a plurality of separate x-ray or neutron paths between an object and an image at an x-ray- or neutron-detector. The apparatus is so constructed that it permits separate parts of an object to be imaged such that a total composite image is formed from these various parts. An imaging apparatus of the detection of carcinoma in breast tissue is formed using such an apparatus. Methods of microscopy and imaging are obtained using this apparatus.
Abstract translation: 描述了用于传输x射线或中子图像的x射线或中子装置，其包括x射线或中子三维（3-D）阵列或马赛克，包括多个x射线或中子 定位的透镜使得它们形成复合折射透镜的二维（2-D）镶嵌，以在x射线或中子检测器处在物体和图像之间提供多个单独的x射线或中子路径。 该装置被构造成允许对象的单独部分被成像，使得从这些各个部分形成总的合成图像。 使用这样的装置形成检测乳腺组织中的癌的成像装置。 使用该装置获得显微镜和成像的方法。
-
公开(公告)号：US12014839B2
公开(公告)日：2024-06-18
申请号：US17794769
申请日：2021-07-12
Inventor： Shanzhi Tang , Zhongrui Ren , Weiwei Zhang , Weifan Sheng , Ming Li
IPC: G21K1/06
CPC classification number: G21K1/065
Abstract: The invention discloses an X-ray zoom lens system (Transfocator) and a focus variation method. The system includes a main frame, many switched arms arranged on one side of the main frame, and a driving component set at the top of the main frame, and a positioning groove set at the bottom of the main frame; For them, each switched arm is composed of successively connected a push rod, a push-push ratchet mechanism, a preload spring and a guide stick, two-dimensional flexible axis, and a CRLs holder from top to bottom; CRLs are stacked and arranged in the mentioned above CRLs holder.
-
公开(公告)号：US11813102B2
公开(公告)日：2023-11-14
申请号：US17450085
申请日：2021-10-06
Applicant: Houxun Miao
Inventor： Houxun Miao
CPC classification number: A61B6/484 , A61B6/4021 , A61B6/4035 , A61B6/4291 , G21K1/062 , G21K1/065 , G21K2201/061 , G21K2201/062 , G21K2201/067 , G21K2207/005
Abstract: Disclosed herein is an x-ray interferometer for x-ray phase contrast imaging including an x-ray source, an x-ray source grating, two x-ray phase gratings, an x-ray analyzer grating and an x-ray detector. An alternative interferometer includes a periodically structured x-ray source, two x-ray phase gratings, an x-ray analyzer grating and an x-ray detector. The phase gratings are placed much closer to the x-ray detector than to the x-ray source and the image object is positioned upstream and close to the phase gratings to achieve high sensitivity and large field-of-view simultaneously.
-
公开(公告)号：US09640293B2
公开(公告)日：2017-05-02
申请号：US14785644
申请日：2014-11-12
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor： Ewald Roessl , Thomas Koehler
IPC: G21K1/06
CPC classification number: G21K1/065 , G21K1/06 , G21K2207/005
Abstract: The invention relates to a grating arrangement and a method for spectral filtering of an X-ray beam (B), the grating arrangement comprising: a dispersive element (10) comprising a prism configured to diffract the X-ray beam (B) into a first beam component (BC1) comprising a first direction (D1) and a second beam component comprising (BC2) a second direction (D2), tilted with respect to the first direction; a first grating (20) configured to generate a first diffraction pattern (DP1) of the first beam component (BC1) and a second diffraction pattern (DP2) of the second beam component (BC2), the second diffraction pattern (DP2) shifted with respect to the first diffraction patter (DP1); and a second grating (30) comprising at least one opening (31) which is aligned along a line (d) from a maximum (MA) to a minimum (MI) of intensity of the first diffraction pattern (DP1) or of the second diffraction pattern (DP2).
-
公开(公告)号：US20150355552A1
公开(公告)日：2015-12-10
申请号：US14828603
申请日：2015-08-18
Applicant: Carl Zeiss SMT GmbH
Inventor： Ingo Saenger , Christoph Hennerkes
CPC classification number: G03F7/70033 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G21K1/065 , G21K1/067 , G21K1/12
Abstract: An optical system has a light source having an original etendue of less than 0.1 mm2 for an illumination system for projection lithography. An optical assembly serves for simultaneously increasing the etendue of a used emission of the light source. The optical assembly is embodied such that an increase in the etendue by at least a factor of 10 results. A component of the optical assembly that is impinged on is displaced relative to the light source such that an impingement region of the emission of the light source on the optical component of the optical assembly varies temporally.
Abstract translation: 对于用于投影光刻的照明系统，光学系统具有小于0.1mm 2的原始光密度的光源。 光学组件用于同时增加所使用的光源发射的光密度。 光学组件被实施为使得光密度增加至少10倍的结果。 被照射的光学组件的部件相对于光源被移位，使得在光学组件的光学部件上的光源的发射的冲击区域在时间上变化。
-
-
-
-
-
-
-
-
-
Search Results
47
records
(took 0.015 seconds)
