公开(公告)号：US5655869A

公开(公告)日：1997-08-12

申请号：US430816

申请日：1995-04-28

申请人： Werner Scheler ,  Berndt Lahne ,  Andreas Mages ,  Uwe Michl ,  Eberhard Gemkow ,  Alfred Schulz

发明人： Werner Scheler ,  Berndt Lahne ,  Andreas Mages ,  Uwe Michl ,  Eberhard Gemkow ,  Alfred Schulz

IPC分类号： B65G49/07 ,  H01L21/02 ,  H01L21/673 ,  H01L21/677

CPC分类号： H01L21/67775 ,  Y10S414/14

摘要： The object of a device for coupling loading and unloading devices with semiconductor machines is to couple devices required for the use of SMIF technology with semiconductor processing machines in which subsequent integration of SMIF technology is not possible, wherein the charging to be carried out after coupling is highly flexible and capable of managing increasing dimensions of semiconductor wafers. An adjustable receiving element for the loading and unloading device is provided inside a movable enclosure, this receiving element being displaceable between at least two planes situated one above the other, one plane serving for charging the loading and unloading device and every other plane being used for the charging of the semiconductor machine carried out by the loading and unloading device. The enclosure has aligning and holding elements for fastening to a coupling element which is aligned with the semiconductor processing machine. The device enables retrofitting of semiconductor processing planes with SMIF technology while taking into account ergonomic requirements.

摘要翻译： 用于将加载和卸载装置与半导体机器耦合的装置的目的是将SMIF技术所需的设备与半导体加工机器耦合，其中SMIF技术的后续集成是不可能的，其中在耦合之后执行的充电是 高度灵活且能够管理半导体晶片的尺寸增加。 用于装载和卸载装置的可调节接收元件设置在可移动外壳的内部，该接收元件可在位于另一个之上的至少两个平面之间移动，一个用于对装载和卸载装置充电的平面以及用于 由装卸装置对半导体机器进行充电。 外壳具有用于紧固到与半导体加工机对准的联接元件的对准和保持元件。 该设备可以使用SMIF技术对半导体加工平面进行改造，同时考虑到人体工程学的要求。

公开(公告)号：US5581383A

公开(公告)日：1996-12-03

申请号：US395669

申请日：1995-02-28

申请人： Frank Reichel ,  Ernst Gaertner

发明人： Frank Reichel ,  Ernst Gaertner

IPC分类号： G01P5/22 ,  G01P3/36 ,  G01P5/00 ,  G02B27/48 ,  G02F3/00 ,  C02F1/135 ,  G01B9/02 ,  G06E3/00

CPC分类号： G01P3/366 ,  G01P5/001 ,  G02B27/48

摘要： An arrangement for optical autocorrelation of laser speckle photography (LSP) photographs or particle image velocimetry (PIV) photographs using optical Fourier transforms is disclosed. The object of providing an electro-optical arrangement for optical correlation of LSP film recordings and PIV film recordings which is simple to produce and accurate is met by using an optically addressable liquid crystal SLM (spatial light modulator) for producing the Young's fringe patterns which contains a uniaxial double-refracting liquid crystal layer and is read out with linearly polarized light of a laser light source, wherein the polarization direction of the laser light source on the readout side coincides with the extraordinary semi-axis of the refractive index ellipsoid of the liquid crystal layer.

摘要翻译： 公开了使用光学傅里叶变换的激光散斑摄影（LSP）照片或粒子图像测速（PIV）照片的光学自相关的布置。 通过使用光学可寻址液晶SLM（空间光调制器）来产生杨氏条纹图案来满足提供简单的生产和准确的LSP胶片记录和PIV胶片记录的光学相关性的电光装置的目的， 单轴双折射液晶层，并用激光光源的线性偏振光读出，其中读出侧的激光源的偏振方向与液体的折射率椭圆体的异常半轴重合 晶体层。

公开(公告)号：US5515410A

公开(公告)日：1996-05-07

申请号：US388978

申请日：1995-02-15

申请人： Bernd Seher ,  Rudi Neuland ,  Frank Reuther

发明人： Bernd Seher ,  Rudi Neuland ,  Frank Reuther

IPC分类号： G03F7/20 ,  G03F9/00 ,  G21K5/02 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/70008 ,  G03F7/70691 ,  G03F7/70866 ,  G03F9/7049

摘要： In an irradiation device for deep x-ray lithography the adjustment precision necessary for the irradiation is to be ensured and influences, which act uncontrolled on the adjusted position, substantially eliminated. An object stand is provided which is surrounded by a vacuum chamber, secured to a carrier and is movable with positioning means with respect to a beam and which has a holder suitable not only to receive an article to be irradiated but also to receive an adjusting element. Between the carrier, object stand and positioning means on the one hand and the vacuum chamber on the other hand there is a first isolating, flexible connection and between wall elements, of which one is connected to the carrier and the other is fixed to the frame, there is a second isolating, flexible connection, the surfaces of the two isolating, flexible connections acting against the external air pressure being of the same size. The vacuum chamber and a space defined by the wall elements with the second flexible connection are coupled together for pressure balancing. Such irradiation devices are usable for manufacturing technical microsystem components in accordance with a technology which has become known under the name LIEA process (Lithography with Synchrotron Radiation, Galvano shaping Forming Technology with Plastics).

摘要翻译： 在用于深X射线光刻的照射装置中，确保照射所需的调节精度，并且基本上消除了在调整位置上不受控制的影响。 提供了一个被真空室包围的物体台，该真空室被固定到载体上，并且可相对于一个梁与定位装置一起移动，并具有一个保持器，其不仅适用于接收待照射的物品，而且还用于容纳调节元件 。 一方面，在载体，物体支架和定位装置之间，另一方面，真空室具有第一隔离，柔性连接，并且在壁元件之间，其中一个连接到载体，另一个固定到框架 ，存在第二隔离，柔性连接，两个隔离的柔性连接件的表面抵抗外部空气压力具有相同的尺寸。 真空室和由具有第二柔性连接的壁元件限定的空间联接在一起用于压力平衡。 这种照射装置可用于根据已知的名称为LIEA工艺（使用同步加速器辐射的光刻，具有塑料的Galvano成形技术）的技术制造技术微系统部件。

公开(公告)号：US6075880A

公开(公告)日：2000-06-13

申请号：US395668

申请日：1995-02-28

申请人： Dietmar Kollhof ,  Joachim Wienecke ,  Karl-Heinz Franke ,  Michael Graef ,  Heiko Kempe

发明人： Dietmar Kollhof ,  Joachim Wienecke ,  Karl-Heinz Franke ,  Michael Graef ,  Heiko Kempe

IPC分类号： G01B11/24 ,  G01B11/30 ,  G01N21/88 ,  G01R31/308 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G06K9/00

CPC分类号： G06T7/0004 ,  G01N21/8851 ,  G01R31/308 ,  G06T2207/20076 ,  G06T2207/30141 ,  G06T2207/30148

摘要： The object of a method for detecting defects in the inspection of structured surfaces is to ensure a detection of defects which is not dependent on the number of structuring planes and includes structure features in real-time operation for separating defects from good structures. From image point classification in which zones of a recorded image which have similar image point features are assembled, a gray-value intermediate image containing edge structures and corner structures is generated from the image and the behavior of the image point features of every image point in the intermediate image is analyzed with respect to its neighboring image points. The method is used predominantly in statistical process control in the production process of masks, LCD's, printed circuit boards and semiconductor wafers.

摘要翻译： 用于检测结构化表面检查中的缺陷的方法的目的是确保检测不依赖于结构平面数量的缺陷，并且包括用于将缺陷与良好结构分离的实时操作中的结构特征。 从具有类似图像点特征的记录图像的区域的图像点分类，从图像生成包含边缘结构和角结构的灰度值中间图像，并且从每个图像点的图像点特征的行为生成 相对于其相邻图像点分析中间图像。 该方法主要用于掩模，LCD，印刷电路板和半导体晶片的生产过程中的统计过程控制。

公开(公告)号：US5715929A

公开(公告)日：1998-02-10

申请号：US430407

申请日：1995-04-28

申请人： Werner Scheler ,  Volker Schlehahn ,  Peter Fabian ,  Hans-Joachim Weske

发明人： Werner Scheler ,  Volker Schlehahn ,  Peter Fabian ,  Hans-Joachim Weske

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65G47/24

CPC分类号： H01L21/67781 ,  Y10S414/14

摘要： The object of a charging device for semiconductor processing installations is to increase the flexibility of the charging process while excluding negative influences on dependability and clean room conditions. At least in a portion of the movement of a linearly movable part which is supported by a stationary part of a drive for transferring a transport object between two end positions, a gripper for the transport object being attached to the movable part, a rotating movement of the gripper is combined with the linear movement. The device is provided in particular for use in the fabrication of semiconductors.

摘要翻译： 用于半导体处理装置的充电装置的目的是增加充电过程的灵活性，同时排除对可靠性和洁净室条件的不利影响。 至少在由用于在两个端部位置之间传送运输物体的驱动器的固定部分支撑的线性可移动部分的运动的一部分中，用于输送物体的夹持器附接到可移动部件，旋转运动 夹具与线性运动相结合。 该器件特别用于制造半导体。

公开(公告)号：US5566023A

公开(公告)日：1996-10-15

申请号：US360805

申请日：1994-12-28

申请人： Ernst-Bernhard Kley

发明人： Ernst-Bernhard Kley

IPC分类号： G02B3/08 ,  G03F7/00 ,  G03F7/20 ,  G02B27/44 ,  G02B5/18 ,  G03H5/00

CPC分类号： G03F7/0005 ,  G02B3/08 ,  G03F7/2022 ,  G03F7/2059

摘要： In a stepped lens with a Fresnel surface structure produced by lithography and a process for fabricating same, the high potential exposure speed of high-speed electron-beam exposure systems which work with variable rectangular beam cross sections is converted in such a way that stepped Fresnel type lenses can be fabricated with high efficiency and, in so doing, the required amounts of data is reduced. According to the invention, radiation dose distributions which correspond to cylindrical lenses are exposed one upon the other, at least one of the radiation dose distributions corresponding to a Fresnel type cylindrical lens.Lens structures with any desired lens curvature, from radially spherical to elliptical, can be efficiently produced by lithography by the disclosed process.

摘要翻译： PCT No.PCT / EP94 / 01307 Sec。 371日期1994年12月28日第 102（e）日期1994年12月28日PCT 1994年4月26日PCT PCT。 公开号WO94 / 25881 日期1994年11月10日在具有通过光刻制造的菲涅尔表面结构的阶梯透镜及其制造方法中，可变矩形束截面的高速电子束曝光系统的高潜在曝光速度被转换成 可以以高效率制造阶梯式菲涅耳型透镜的方式，并且在这样做时减少所需量的数据。 根据本发明，对应于柱面透镜的辐射剂量分布彼此暴露，对应于菲涅尔型柱面透镜的辐射剂量分布中的至少一个辐射剂量分布。 通过公开的方法通过光刻可以有效地产生具有从径向球形到椭圆形的任何所需透镜曲率的透镜结构。

公开(公告)号：US5535250A

公开(公告)日：1996-07-09

申请号：US375415

申请日：1995-01-18

申请人： Bernd Seher ,  Frank Reuther ,  Lutz Mueller

发明人： Bernd Seher ,  Frank Reuther ,  Lutz Mueller

IPC分类号： G21K1/02 ,  G03F7/20 ,  G21K1/04 ,  G21K3/00 ,  G21K5/02 ,  H01L21/027 ,  H05H13/04

CPC分类号： G03F7/70058 ,  G03F7/2039 ,  G03F7/70358 ,  G03F7/70575 ,  G03F7/70808 ,  G21K1/04

摘要： A device for manipulating a synchrotron beam bundle is intended to produce properties of the beam bundle, under vacuum conditions, which are adapted to the respective application of deep X-ray lithography, in particular, which are adapted to the scanning regimen. Pairs of diaphragms which are displaceable relative to one another are provided between the object table and an inlet window within a vacuum chamber containing an object table for receiving an object to be irradiated, which object table is adjustable by a scanning movement relative to the synchrotron beam bundle. The pair of diaphragms for which the direction of relative displacement of the diaphragms coincides with the scanning movement is coupled with the scanning movement. Further, a filter chamber is arranged upstream of the vacuum chamber and contains filters which can be inserted into the synchrotron beam bundle. The device is for use in irradiating equipment for deep X-ray lithography which are used to fabricate microsystems components by means of a technique known as the LIGA process (lithography with synchrotron radiation, electroforming and plastics molding).

摘要翻译： 用于操纵同步加速器束束的装置旨在在真空条件下产生束束的特性，其适于各自应用深X射线光刻，特别是适用于扫描方案。 相对于彼此可移位的隔膜对设置在包含用于接收待照射物体的物体台的真空室内的入口窗口之间，该对象台可通过相对于同步加速器光束的扫描运动来调节 束。 膜片的相对位移方向与扫描运动一致的一对隔膜与扫描运动相结合。 此外，过滤室设置在真空室的上游，并且包含能够插入到同步加速器束束中的过滤器。 该装置用于深X射线光刻的照射设备，其用于通过称为LIGA工艺（具有同步辐射，电铸和塑料成型的光刻）的技术来制造微系统部件。

公开(公告)号：US5636724A

公开(公告)日：1997-06-10

申请号：US396673

申请日：1995-03-01

申请人： Werner Scheler ,  Juergen Graefe ,  Andreas Mages ,  Andreas Birkner ,  Erich Adler

发明人： Werner Scheler ,  Juergen Graefe ,  Andreas Mages ,  Andreas Birkner ,  Erich Adler

IPC分类号： B65G49/07 ,  H01L21/677 ,  H01R13/24 ,  H01R41/00 ,  B65G47/24

CPC分类号： H01L21/67772 ,  H01L21/67775 ,  Y10S414/14

摘要： The object of a device for transferring a transport object between two end positions is to exclude negative influences on dependability and clean room conditions, also in lengthy transport paths, while ensuring a highly flexible transfer. To control the operation of sensors and actuators at a movable part of a drive serving to transfer, electrical contact between these sensors and actuators and a supply unit located in a stationary part of the drive is effected exclusively in the two end positions. The device is provided in particular for use in the manufacture of semiconductors, e.g., for charging semiconductor processing machines, but is not limited to this field.

摘要翻译： 用于在两个终端位置之间传送传输对象的设备的目的是在确保高度灵活的传送的同时，在可靠性和洁净室条件以及冗长的传输路径中排除负面影响。 为了控制用于传送的驱动器的可移动部分的传感器和致动器的操作，这些传感器和致动器之间的电接触以及位于驱动器的静止部分中的供应单元仅在两个端部位置进行。 该器件特别用于制造半导体，例如用于对半导体加工机进行充电，但不限于此。

公开(公告)号：US5575372A

公开(公告)日：1996-11-19

申请号：US356457

申请日：1994-12-15

申请人： Gerd Huebner ,  Michael Heitmann

发明人： Gerd Huebner ,  Michael Heitmann

IPC分类号： E05F15/42 ,  F16P3/12 ,  F16P3/00

CPC分类号： F16P3/12 ,  E05F15/42 ,  E05Y2900/60

摘要： A device for preventing shearing or pinching of a foreign object is suitable for use in SMIF (Standard Mechanical Interface) systems. A barrier which is constructed as a solid body is fastened at and displaceable relative to one of two parts which can move past one another. The barrier is fastened to this part at a distance above electric contact elements in three-point formation, which distance is greater than the maximum braking distance required for stopping movement. The barrier is substantially adapted in shape and position at its shearing line to the part moving past it, wherein contact is broken in at least one contact element and accordingly in an otherwise closed circuit when the barrier is displaced relative to the part. Such devices serve to prevent injuries and damage in the operation of systems in which two parts move past one another at a slight distance.

摘要翻译： 用于防止异物的剪切或夹持的装置适用于SMIF（标准机械接口）系统。 被构造为实体的障碍物相对于可以彼此移动的两个部件中的一个被固定并可移位。 屏障在三点形成时比电接触元件上方一定距离紧固到该部分，该距离大于停止运动所需的最大制动距离。 屏障在其剪切线处的形状和位置基本上适应于移动通过它的部分，其中当屏障相对于部件移位时，接触在至少一个接触元件中断开，并因此在另一闭合电路中断开。 这样的装置用于防止在两个部件稍微距离移动的系统的操作中的伤害和损坏。