Element for homogenizing the illumination with simultaneous setting of the polarization degree
    1.
    发明授权
    Element for homogenizing the illumination with simultaneous setting of the polarization degree 有权
    用于同步设置偏振度的均匀化照明元件

    公开(公告)号:US08390927B2

    公开(公告)日:2013-03-05

    申请号:US12154728

    申请日:2008-05-27

    申请人: Michael Heiden

    发明人: Michael Heiden

    IPC分类号: G02B27/28

    CPC分类号: G02B5/3025 G02B3/0056

    摘要: Element for homogenizing the illumination with simultaneous setting of the polarization degree, wherein the element consists of at least two components. The first component is a microlens array, and the second component is a filter for setting the desired polarization.

    摘要翻译: 用于通过同时设置偏振度使照明均匀化的元件,其中元件由至少两个部件组成。 第一组件是微透镜阵列,第二组件是用于设置所需偏振的滤光器。

    Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology
    2.
    发明授权
    Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology 有权
    用于确定由衬底拓扑结果产生的衬底上的结构边缘的位置的测量中的系统误差的方法

    公开(公告)号:US08149383B2

    公开(公告)日:2012-04-03

    申请号:US12219000

    申请日:2008-07-21

    申请人: Slawomir Czerkas

    发明人: Slawomir Czerkas

    IPC分类号: G03B27/42

    CPC分类号: G01B21/045 G01B11/03

    摘要: A method for determining the lateral correction as a function of the substrate topology and/or the geometry of the substrate holder is disclosed. The substrate is placed on a measuring stage traversable in the X coordinate direction and Y coordinate direction, which carries the substrate to be measured. The substrate is supported on at least three support points which define a plane. An apparatus is provided for determining the position of a plurality of positions on the surface of the substrate in the in the X, Y and Z coordinate directions. The substrate is tiltable about an axis parallel to the X/Y plane, to enable the substrate to be measured in a tilted position.

    摘要翻译: 公开了一种用于确定横向校正作为衬底拓扑和/或衬底保持器的几何形状的函数的方法。 将基板放置在能够在X坐标方向和Y坐标方向上横穿的测量台,该坐标方向承载待测量的基板。 衬底被支撑在限定平面的至少三个支撑点上。 提供了一种用于在X,Y和Z坐标方向上确定基板表面上的多个位置的位置的装置。 基板可以围绕平行于X / Y平面的轴线倾斜,以使基板能够在倾斜位置被测量。

    Device for measuring or inspecting substrates of the semiconductor industry
    3.
    发明授权
    Device for measuring or inspecting substrates of the semiconductor industry 有权
    用于测量或检查半导体工业基板的装置

    公开(公告)号:US07906978B2

    公开(公告)日:2011-03-15

    申请号:US12316344

    申请日:2008-12-11

    IPC分类号: G01R31/02

    摘要: A device for measuring or inspecting substrates of the semiconductor industry, including a base frame and a module detachably mounted thereon via a module frame, wherein the module frame is detachably connected to the base frame via at least two self-aligning coupling elements and at least one alignment element, wherein the base frame and the module frame are in exactly defined spatial alignment with each other, when the module frame is detachably connected to the base frame.

    摘要翻译: 一种用于测量或检查半导体工业的基板的装置,包括基座框架和经由模块框架可拆卸地安装在其上的模块,其中模块框架经由至少两个自对准耦合元件可拆卸地连接到基座框架,并且至少 一个对准元件,其中当模块框架可拆卸地连接到基架时,其中基架和模块框架彼此精确限定的空间对准。

    Method for calibration of a measuring table of a coordinate measuring machine
    4.
    发明授权
    Method for calibration of a measuring table of a coordinate measuring machine 有权
    校准坐标测量机测量台的方法

    公开(公告)号:US07823295B2

    公开(公告)日:2010-11-02

    申请号:US12690489

    申请日:2010-01-20

    申请人: Klaus Rinn

    发明人: Klaus Rinn

    IPC分类号: G01B5/008 G01B1/00

    摘要: A method is disclosed which is suitable for the calibration of a measuring table (20) of a coordinate measuring machine (1). For this purpose, a mask (2) is deposited in a three-point support of the measuring table (20), wherein the mask (2) used for the calibration of the measuring table (20) is a mask (2), which is used for the semiconductor production. The measurement of positions of a plurality of different structures (3) which are arranged in a distributed manner on the mask (2) is carried out. The structures (3) are available in an initial orientation on the mask (2). The mask (2) is rotated and the position of the structures (3) is determined in the rotated orientation. Afterwards, the mask (2) is shifted and the position of the structures (3) is also determined. A total correction function for eliminating coordinate-dependant measuring errors is determined, wherein the total correction function has a first correction function and a second correction function.

    摘要翻译: 公开了一种适于校准坐标测量机(1)的测量台(20)的方法。 为此,将掩模(2)沉积在测量台(20)的三点支撑件中,其中用于校准测量台(20)的掩模(2)是掩模(2),其中 用于半导体生产。 执行以分布式布置在掩模(2)上的多个不同结构(3)的位置的测量。 结构(3)可以在掩模(2)上以初始取向获得。 旋转掩模(2)并且以旋转方向确定结构(3)的位置。 之后,掩模(2)移动,结构(3)的位置也被确定。 确定用于消除坐标相关测量误差的总校正功能,其中总校正功能具有第一校正功能和第二校正功能。

    Interferometric device for position measurement and coordinate measuring machine
    6.
    发明申请
    Interferometric device for position measurement and coordinate measuring machine 有权
    位置测量和坐标测量机的干涉仪

    公开(公告)号:US20100020332A1

    公开(公告)日:2010-01-28

    申请号:US12459751

    申请日:2009-07-07

    IPC分类号: G01B11/14

    摘要: An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers.

    摘要翻译: 公开了一种用于在平面中可移动的元件的位置测量的干涉测量装置。 激光源测量可移动元件的位置并发射所需的测量光。 分束器将测量光分成第一部分光束路径和第二局部光束路径,每个光束路径经由干涉仪撞击可移动元件的反射表面。 这里,至少将测量光分成第一部分光束路径和第二部分光束路径的分束器以及将第三部分光束路径经由干涉仪引导到标准具上的分束器具有相应的光束捕获器 与它们相关联,其捕获从各个干涉仪返回的光。

    Method for determining correction values for the measured values of positions of structures on a substrate
    7.
    发明授权
    Method for determining correction values for the measured values of positions of structures on a substrate 有权
    用于确定衬底上的结构的位置的测量值的校正值的方法

    公开(公告)号:US07584072B2

    公开(公告)日:2009-09-01

    申请号:US12147703

    申请日:2008-06-27

    IPC分类号: G01P11/00

    CPC分类号: G01B21/045

    摘要: A method for allocating correction values of the degree of bending of a substrate (2) relative to a coordinate system (40) of a coordinate measuring machine (1) is disclosed. The positions of the at least two reference marks (32) on the substrate holder (27) are automatically determined relative to the coordinate system (40) of the coordinate measuring machine (1) for each substrate (2) currently placed in the substrate holder (27) in the coordinate measuring machine (1).

    摘要翻译: 公开了一种用于分配基板(2)相对于坐标测量机(1)的坐标系(40)的弯曲程度的校正值的方法。 基板保持器(27)上的至少两个参考标记(32)的位置相对于当前放置在基板保持器中的每个基板(2)的坐标测量机(1)的坐标系(40)自动确定 (27)在坐标测量机(1)中。

    Device for measuring or inspecting substrates of the semiconductor industry
    8.
    发明申请
    Device for measuring or inspecting substrates of the semiconductor industry 有权
    用于测量或检查半导体工业基板的装置

    公开(公告)号:US20090189157A1

    公开(公告)日:2009-07-30

    申请号:US12316344

    申请日:2008-12-11

    IPC分类号: H01L23/58

    摘要: A device for measuring or inspecting substrates of the semiconductor industry, including a base frame and a module detachably mounted thereon via a module frame, wherein the module frame is detachably connected to the base frame via at least two self-aligning coupling elements and at least one alignment element, wherein the base frame and the module frame are in exactly defined spatial alignment with each other, when the module frame is detachably connected to the base frame.

    摘要翻译: 一种用于测量或检查半导体工业的基板的装置,包括基座框架和经由模块框架可拆卸地安装在其上的模块,其中模块框架经由至少两个自对准耦合元件可拆卸地连接到基座框架,并且至少 一个对准元件,其中当模块框架可拆卸地连接到基架时,其中基架和模块框架彼此精确限定的空间对准。

    Method for determining the focal position of at least two edges of structures on a substrate
    9.
    发明授权
    Method for determining the focal position of at least two edges of structures on a substrate 有权
    用于确定衬底上的结构的至少两个边缘的焦点位置的方法

    公开(公告)号:US07551296B2

    公开(公告)日:2009-06-23

    申请号:US12040872

    申请日:2008-03-01

    IPC分类号: G01B11/14

    CPC分类号: G02B7/38 G03F1/84

    摘要: A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.

    摘要翻译: 公开了一种用于确定衬底(30)上的结构(31)的至少两个边缘的焦点位置的方法。 在测量目标(21)在Z坐标方向移动期间,采用检测器的至少一个测量窗(45)获取所述至少一个结构(31)的多个图像。 为每个图像确定结构(31)的强度分布。

    Method and apparatus for processing the image of the surface of a wafer recorded by at least one camera
    10.
    发明申请
    Method and apparatus for processing the image of the surface of a wafer recorded by at least one camera 有权
    用于处理由至少一个照相机记录的晶片表面的图像的方法和装置

    公开(公告)号:US20090153657A1

    公开(公告)日:2009-06-18

    申请号:US12315589

    申请日:2008-12-04

    申请人: Detlef Michelsson

    发明人: Detlef Michelsson

    IPC分类号: H04N7/18 G06K9/00

    摘要: A method for processing the image data of the surface of a wafer (2) recorded by at least one camera (5) is disclosed, wherein an image field (15) is defined for each camera (5) in such a way that the recorded image content is repeated after N recorded images. In an evaluation electronics (18) M utility programs (19) are determined, wherein M is equal to the number of recorded images after which the image content is repeated. The number M of utility programs (19) is adapted to the number N of images. Each of the M utility programs (19) of the plurality of recorded images is only fed with images having the same image contents in order to detect defects on the basis of the image contents of the images of the surface of the wafer. The results of the M utility programs (19) are respectively forwarded to a central program (20) in a sequential manner, which compiles a distribution of the defects present on the surface of the wafer (2) from the individual results of the M utility programs (19).

    摘要翻译: 公开了一种用于处理由至少一个照相机(5)记录的晶片(2)的表面的图像数据的方法,其中为每个照相机(5)定义图像场(15),使得记录 N记录图像后重复图像内容。 在评估电子设备(18)中,确定M个应用程序(19),其中M等于重复图像内容的记录图像的数量。 实用程序(19)的数量M适用于数量N的图像。 为了根据晶片表面的图像的图像内容检测缺陷,多个记录图像中的M个实用程序(19)中的每一个仅供给具有相同图像内容的图像。 M实用程序(19)的结果分别以顺序方式转发到中央程序(20),其从M实用程序的各个结果编译存在于晶片(2)的表面上的缺陷的分布 节目(19)。