Composition containing naphthoquinone diazide sulfonic acid mixed esters
and radiation-sensitive recording material prepared therewith
    1.
    发明授权
    Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith 失效
    含有萘醌二叠氮磺酸混合酯和用其制备的辐射敏感记录材料的组合物

    公开(公告)号:US5306595A

    公开(公告)日:1994-04-26

    申请号:US862603

    申请日:1992-04-01

    CPC分类号: G03F7/022

    摘要: The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.

    摘要翻译: 本发明涉及一种含有树脂粘合剂的辐射敏感性组合物,其不溶于水,但在碱性水溶液,至少一种辐射敏感化合物和任选的交联剂中可溶或至少可溶胀。 辐射敏感性化合物是由a)含有2-6个芳族羟基的化合物,b)环取代的(邻 - 萘醌-2-二叠氮化物)-4-磺酸(重氮化合物D1)和c) (重氮化合物D2)和/或非辐射敏感性有机酸(化合物D0)的(邻 - 萘醌-2-二叠氮化物)-4-或-5-磺酸(化合物D0),其中D1:(D2和 /或D0)摩尔比为约0.1:1至30:1。

    Voltage protection circuit
    2.
    发明授权
    Voltage protection circuit 有权
    电压保护电路

    公开(公告)号:US07019953B2

    公开(公告)日:2006-03-28

    申请号:US10440741

    申请日:2003-05-19

    IPC分类号: H02H9/00

    CPC分类号: H04M3/18 H02H9/041

    摘要: A voltage protection circuit for a terminal of an electronic device, for example the TIP and RING lines of a linecard, is provided. The voltage protection circuit comprises a protection element, a first terminal of which is coupled to the terminal of the electronic device, a second terminal of which is coupled to a ground potential and a control terminal of which is coupled to a reference voltage element, the protection element having a low resistance between its first and second terminals when the control terminal is in a first state and a higher resistance between its first and second terminals when the control terminal is in a second state, the reference voltage element being further coupled to a reference voltage and being adapted such that the state of the control terminal depends on an applied voltage at the first terminal and the reference voltage. Additionally, a voltage limiting element for limiting the voltage drop over the reference voltage element coupled to the reference voltage and the ground potential is provided, leading to less severe demands on the reference voltage element. Additionally or alternatively, a voltage limiting element between the protection element and the reference voltage element may be provided.

    摘要翻译: 提供了一种用于电子设备终端的电压保护电路,例如线卡的TIP和RING线路。 电压保护电路包括保护元件,其第一端耦合到电子器件的端子,其第二端耦合到接地电位,其控制端耦合到参考电压元件, 所述保护元件在所述控制端子处于第一状态时在所述第一端子与所述第二端子之间具有低电阻,并且当所述控制端子处于第二状态时在所述第一端子和所述第二端子之间具有较高的电阻,所述参考电压元件还耦合到 参考电压并且被适配成使得控制端子的状态取决于第一端子处的施加电压和参考电压。 此外,提供用于限制耦合到参考电压和地电位的参考电压元件上的电压降的电压限制元件,导致对参考电压元件的要求较低。 附加地或替代地,可以提供保护元件和参考电压元件之间的电压限制元件。

    Radiation-sensitive composition containing esterification product of
(1,2-naphthoquinone-2-diazide)-sulfonic acid with
2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone
    3.
    发明授权
    Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone 失效
    含有(1,2-萘醌-2-二叠氮化物) - 磺酸与2,3,4,4'-四羟基二苯甲酮的酯化产物和二 - 或三 - 羟基二苯甲酮的辐射敏感组合物

    公开(公告)号:US5358823A

    公开(公告)日:1994-10-25

    申请号:US863681

    申请日:1992-04-01

    CPC分类号: G03F7/022

    摘要: A radiation-sensitive composition is disclosed comprising a polymeric binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solution and a 2,3,4,4'-tetrahydroxybenzophenone which is partially esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid, which additionally contains either a dihydroxybenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid or a trihydroxybenzophenone which is partially or completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid. The weight ratio of esterified 2,3,4,4'-tetrahydroxybenzophenone to esterified di- or trihydroxybenzophenone varies between about 4:6 and 7:3 and the esterified hydroxybenzophenones, as a whole, are present in a proportion of 5 to 40% by weight, based on the total weight of solids contained in the composition. Also disclosed is a radiation-sensitive recording material comprising a support and a layer containing this composition, which is present on the support.

    摘要翻译: 公开了一种辐射敏感性组合物,其包含不溶于水,但在碱性水溶液中可溶或至少可溶胀的聚合物粘合剂和被(1,2-萘醌)部分酯化的2,3,4,4'-四羟基二苯甲酮 2-二叠氮基)-4-和/或-5-磺酸,其另外含有与(1,2-萘醌-2-二叠氮化物)-4-和/或-5-磺酸完全酯化的二羟基二苯甲酮或 由(1,2-萘醌-2-二叠氮化物)-4-和/或-5-磺酸部分或完全酯化的三羟基二苯甲酮。 酯化的2,3,4,4'-四羟基二苯甲酮与酯化的二 - 或三羟基二苯甲酮的重量比在约4:6和7:3之间变化,酯化的羟基二苯甲酮整体上以5-40%的比例存在, ,基于组合物中所含的固体的总重量。 还公开了一种辐射敏感记录材料,其包含载体和包含该组合物的层,其存在于载体上。

    Positive-working photosensitive mixture and recording material of high
thermal stability with phenolic novolak of m-cresol and
2,3,6-trialkylphenol
    5.
    发明授权
    Positive-working photosensitive mixture and recording material of high thermal stability with phenolic novolak of m-cresol and 2,3,6-trialkylphenol 失效
    阳离子感光性混合物和具有高热稳定性的间苯酚酚醛清漆和2,3,6-三烷基苯酚的记录材料

    公开(公告)号:US4971887A

    公开(公告)日:1990-11-20

    申请号:US330173

    申请日:1989-03-29

    IPC分类号: G03F7/023 H01L21/027 H05K3/06

    CPC分类号: G03F7/0236

    摘要: A positive-working photosensitive mixture is disclosed, which comprises an o-quinonediazide as the photosensitive compound and a novolak resin, which is insoluble in water and soluble in aqueous-alkaline media, as a binder, said novolak resin being prepared by condensation of a mixture comprising m-cresol and 2,3,6-trialkylphenol with a carbonyl component, preferably in a solvent. The photosensitive mixture containing the above-described binder is distinguished by high thermal stability and by a low dark erosion rate when developed with a metal ion-free developer.

    摘要翻译: 公开了一种正性感光性混合物,其包含作为感光性化合物的邻醌二叠氮化物和不溶于水并可溶于水 - 碱性介质的酚醛清漆树脂作为粘合剂,所述酚醛清漆树脂通过 包含间甲酚和2,3,6-三烷基苯酚的混合物与羰基组分,优选在溶剂中。 含有上述粘合剂的感光性混合物的特征是当用无金属离子的显影剂显影时,具有高的热稳定性和低的暗侵蚀速率。

    Solvents for photoresist removal
    7.
    发明授权
    Solvents for photoresist removal 失效
    溶剂去除光致抗蚀剂

    公开(公告)号:US4765844A

    公开(公告)日:1988-08-23

    申请号:US920665

    申请日:1986-10-20

    CPC分类号: G03F7/425

    摘要: The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of(a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula ##STR1## in which R.sup.1, R.sup.2, R.sup.3, R.sup.4 denote H or alkyl groupsn,m denote 0 to 2, ando denotes 1 to 3; and(b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula ##STR2## in which R.sup.3, R.sup.4 denote H, alkyl or ##STR3## and P denotes 1 to 3.

    摘要翻译: 本发明涉及基于水溶性氨基衍生物和丙二醇组分的溶剂系统,用于除去光致抗蚀剂。 这些溶剂体系包括(a)约10至100重量%的至少一种通式为“IMAGE”的水溶性胺,其中R 1,R 2,R 3,R 4表示H或烷基n,m表示 0〜2,o表示1〜3; 和(b)约0至90重量%的至少一种通式为“IMAGE”的水溶性丙二醇衍生物,其中R3,R4表示H,烷基或“IMAGE”,P表示1至3。