利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.014 秒)

    2-diazo-1,2-naphthoquinone compounds
    2.
    发明授权
    2-diazo-1,2-naphthoquinone compounds 失效
    2-重氮基-1,2-萘醌化合物

    公开(公告)号：US5312905A

    公开(公告)日：1994-05-17

    申请号：US736343

    申请日：1991-07-26

    申请人： Kan Wakamatsu ,  Yuichi Wakata ,  Masato Satomura ,  Tomizo Namiki

    发明人： Kan Wakamatsu ,  Yuichi Wakata ,  Masato Satomura ,  Tomizo Namiki

    IPC分类号： C07C309/71 ,  C07C309/76 ,  C07C309/77 ,  C07C323/20 ,  G03F7/022 ,  C07C245/12 ,  G03C1/52 ,  G03C1/54 ,  G03F7/016

    CPC分类号： G03F7/022 ,  C07C309/71 ,  C07C309/76 ,  C07C309/77 ,  C07C323/20

    摘要： A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an image forming material in which the invention compound is added to at least one of laminated layers. When these laminated layers are exposed to light, the adhesiveness of the compound-containing layer to its adjoining layer is reduced effectively due to the polarity-changing ability of the compound, thus making the easy delamination of the layers possible. This compound is applicable to many instances in which image receiving sheets are used, such as the formation of a multi-color image by a transfer method (a color proof, for example) and the preparation of a printing plate of the delamination development type.

    摘要翻译： 描述了具有被至少一个氟原子取代的烷基的取代基的2-重氮基-1,2-醌化合物。 该化合物在暴露于光下时具有改变其极性的能力。 本发明还提供一种图像形成材料，其中将本发明化合物加入到层压层中的至少一层中。 当这些层叠层暴露于光时，由于化合物的极性变化能力，含化合物层与其邻接层的粘附性有效降低，因此易于使层分层成为可能。 该化合物适用于使用图像接收片材的许多情况，例如通过转印方法形成多色图像（例如，有色），以及分层显影型印刷版的制备。

    Method and apparatus for synthesis of highly isomerically pure stereoisomers of glycidol derivatives
    3.
    发明授权
    Method and apparatus for synthesis of highly isomerically pure stereoisomers of glycidol derivatives 失效
    用于合成缩水甘油衍生物的高度异构纯的立体异构体的方法和装置

    公开(公告)号：US5274160A

    公开(公告)日：1993-12-28

    申请号：US4923

    申请日：1993-01-15

    申请人： Roger C. Hahn

    发明人： Roger C. Hahn

    IPC分类号： C07C309/71 ,  C07D303/16 ,  C07D301/00 ,  C07D301/32

    CPC分类号： C07C309/71 ,  C07D303/16 ,  C07C2102/42

    摘要： There is disclosed a process for producing an alkyl casylate by the reaction of a metal casylate or an enantiomer of a quaternary casylate with a trialkyl phosphite in the presence of a slight molar excess of sulfuric acid. According to one aspect of the invention the reaction is conducted under heat in the presence of concentrated sulfuric acid. When the reaction is complete, an organic layer that contains the alkyl casylate is isolated. In another aspect of the invention at least 1.0 equivalents of a trialkyl phosphite is added to a thoroughly dried enantiomer of camphorsulfonic acid, and the mixture optionally heated to about 80.degree. C. The reaction is allowed to proceed until camphorsulfonic acid is no longer present. Thereafter all phosphorus-containing species are selectively removed by distillation at reduced pressure to obtain a pure alkyl casylate in high yield.

    摘要翻译： 公开了在少量摩尔过量的硫酸的存在下，通过金属甲酸酯或季戊烯酸酯与三烷基亚磷酸酯的对映异构体的反应制备烷基酯化的方法。 根据本发明的一个方面，反应在加热下在浓硫酸的存在下进行。 当反应完成时，分离含有芳基酯的有机层。 在本发明的另一方面，将至少1.0当量的亚磷酸三烷基酯加入到樟脑磺酸的彻底干燥的对映异构体中，并将​​混合物任选地加热至约80℃。使反应进行直到樟脑磺酸不再存在。 此后，通过减压蒸馏选择性地除去所有含磷物质，以高产率得到纯的烷基酯。

    Positive photoresist composition utilizing O-quinonediazide and novolak resin
    4.
    发明授权
    Positive photoresist composition utilizing O-quinonediazide and novolak resin 失效
    使用O-醌二叠氮化物和酚醛清漆树脂的正性光致抗蚀剂组合物

    公开(公告)号：US5089373A

    公开(公告)日：1992-02-18

    申请号：US363568

    申请日：1989-06-07

    申请人： Kazuya Uenishi ,  Yasumasa Kawabe ,  Tadayoshi Kokubo

    发明人： Kazuya Uenishi ,  Yasumasa Kawabe ,  Tadayoshi Kokubo

    IPC分类号： G03C1/72 ,  C07C309/71 ,  C07C309/76 ,  G03F7/022 ,  G03F7/038

    CPC分类号： G03F7/022 ,  C07C309/71 ,  C07C309/76 ,  G03F7/038

    摘要： A positive photoresist composition containing the combination of at least one alkali-soluble novolak resin and at least one light-sensitive compound represented by formula (I): ##STR1## wherein each of R.sub.1 to R.sub.10, which may be the same or different, represents hydrogen, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylester group, a substituted or unsubstituted arylester group, a substituted or unsubstituted aralkylester group, a substituted or unsubstituted alkylsulfonylester group, a substituted or unsubstituted arylsulfonylester group, ##STR2## provided that at least one of R.sub.1 to R.sub.10 represents ##STR3## where R.sub.17 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; and at least two of R.sub.1 to R.sub.10 represent ##STR4## and R.sub.11 and R.sub.12, which may be the same or different, each represents hydrogen, --OH, --COOH, --CN, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aralkyl group, --COOR.sub.13, --R.sub.14 --COOH, or --R.sub.15 --COOR.sub.16 ; where R.sub.13 and R.sub.16, which may be the same or different, each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group; and R.sub.14 and R.sub.15 each represents a substituted or unsubstituted alkylene group, or a substituted or unsubstituted arylene group; provided that at least one of R.sub.11 and R.sub.12 represents a group other than hydrogen.The positive photoresist composition has high resolving power and sensitivity, and a nearly perpendicular cross-section.

    摘要翻译： 含有至少一种碱溶性酚醛清漆树脂和至少一种由式（I）表示的感光性化合物的组合的正性光致抗蚀剂组合物：其中R1至R10各自可以相同或不同， 代表氢，-OH，取代或未取代的烷基，取代或未取代的烷氧基，取代或未取代的芳基，取代或未取代的芳烷基，取代或未取代的烷基酯基，取代或未取代的芳基酯基， 取代或未取代的芳烷基酯基团，取代或未取代的烷基磺酰基基团，取代或未取代的芳基磺酰基基团，条件是R 1至R 10中的至少一个表示其中R 17表示取代或未取代的烷基，取代或未取代的烷基， 未取代的芳基或取代或未取代的芳烷基; 并且R 1至R 10中的至少两个表示，R 11和R 12可以相同或不同，表示氢，-OH，-COOH，-CN，卤素原子，取代或未取代的烷基， 取代或未取代的烷氧基，取代或未取代的芳烷基，-COOR13，-R14-COOH或-R15-COOR16; 其中R 13和R 16可以相同或不同，表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基; R 14和R 15各自表示取代或未取代的亚烷基，或取代或未取代的亚芳基; 条件是R 11和R 12中的至少一个表示除氢以外的基团。 正型光致抗蚀剂组合物具有高分辨能力和灵敏度，并且具有近似垂直的横截面。

    Image forming materials prepared using 2-diazo-1,2-naphthoquinone compounds having fluorine atom containing substituent groups
    9.
    发明授权
    Image forming materials prepared using 2-diazo-1,2-naphthoquinone compounds having fluorine atom containing substituent groups 失效
    使用具有含氟取代基的2-重氮基-1,2-萘醌化合物制备的成像材料

    公开(公告)号：US5384227A

    公开(公告)日：1995-01-24

    申请号：US93722

    申请日：1993-07-20

    申请人： Kan Wakamatsu ,  Yuichi Wakata ,  Masato Satomura ,  Tomizo Namiki

    发明人： Kan Wakamatsu ,  Yuichi Wakata ,  Masato Satomura ,  Tomizo Namiki

    IPC分类号： C07C309/71 ,  C07C309/76 ,  C07C309/77 ,  C07C323/20 ,  G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/022 ,  C07C309/71 ,  C07C309/76 ,  C07C309/77 ,  C07C323/20

    摘要： A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an image forming material in which the invention compound is added to at least one of laminated layers. When these laminated layers are exposed to light, the adhesiveness of the compound-containing layer to its adjoining layer is reduced effectively due to the polarity-changing ability of the compound, thus making the easy delamination of the layers possible. This compound is applicable to many instances in which image receiving sheets are used, such as the formation of a multi-color image by a transfer method (a color proof, for example) and the preparation of a printing plate of the delamination development type.

    摘要翻译： 描述了具有被至少一个氟原子取代的烷基的取代基的2-重氮基-1,2-醌化合物。 该化合物在暴露于光下时具有改变其极性的能力。 本发明还提供一种图像形成材料，其中将本发明化合物加入到层压层中的至少一层中。 当这些层叠层暴露于光时，由于化合物的极性变化能力，含化合物层与其邻接层的粘附性有效降低，因此易于使层分层成为可能。 该化合物适用于使用图像接收片材的许多情况，例如通过转印方法形成多色图像（例如，有色），以及分层显影型印刷版的制备。

    Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
    10.
    发明授权
    Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives 失效
    来自硝基苄基衍生物的重氮萘醌磺酸盐的光化学产生酸

    公开(公告)号：US5308744A

    公开(公告)日：1994-05-03

    申请号：US26923

    申请日：1993-03-05

    申请人： Thomas A. Koes

    发明人： Thomas A. Koes

    IPC分类号： C07C309/71 ,  C07C309/76 ,  C09K3/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/031 ,  G03F7/039 ,  G03F7/26 ,  H01L21/027 ,  G03F7/23 ,  G03F7/30

    CPC分类号： C07C309/71 ,  G03F7/0045 ,  G03F7/022

    摘要： A new photoacid generator having the formula ##STR1## wherein R=hydrogen, hydroxyl, or the --O--S(.dbd.O).sub.2 --Q moiety;R.sup.1 =CH.sub.2 OS(.dbd.O).sub.2 --Q, or --NO.sub.2 ;R.sup.2 =CH.sub.2 OS(.dbd.O).sub.2 --Q, or --NO.sub.2 ;R.sup.3 =lower alkyl or hydrogen;R.sup.4 =hydrogen, --CH.sub.2 OS(.dbd.O).sub.2 --Q, or --NO.sub.2 ;R.sup.5 =hydrogen, --CH.sub.2 OS(.dbd.O).sub.2 --Q, or --NO.sub.2 ; andQ is a diazonaphthoquinone moiety; with the proviso that R.sup.3 is lower alkyl when R.sup.2 and R.sup.4 are NO.sub.2, and with the proviso that R.sup.1 .noteq.R.sup.2 and R.sup.4 .noteq.R.sup.5.exhibits unprecedented sensitivity to actinic radiation. This compound is photochemically transformed from a non-acidic entity to photoproducts which contain both sulfonic and carboxylic acid functuional groups. The acid generator is effective with polymers having acid labile groups, converting them into alkaline-soluble polymers, and with polymers which do not have such acid labile groups. Positive or negative working photoresist compositions containing the new photoacid generator have unparalleled performance characteristics because of the increased acidity generated per quantum of light.A preferred photoacid generator is made by reacting 2,6-dimethylol-3,5-dinitro-p-alkyl phenol with a diazonaphthoquinone sulfonyl chloride.

    摘要翻译： 具有下式的新的光致酸发生剂其中R =氢，羟基或-O-S（= O）2-Q部分; R1 = CH2OS（= O）2-Q或-NO2; R2 = CH2OS（= O）2-Q或-NO2; R 3 =低级烷基或氢; R4 =氢，-CH2OS（= O）2-Q或-NO2; R5 =氢，-CH2OS（= O）2-Q或-NO2; Q为重氮萘醌部分; 条件是当R 2和R 4为NO 2时，R 3为低级烷基，条件是R 1为R 2和R 4为等式R 5。 对光化辐射表现出前所未有的敏感性。 该化合物从非酸性实体光化学转化成含有磺酸和羧酸官能团的光产物。 酸发生剂对具有酸不稳定基团的聚合物有效，将其转化为碱溶性聚合物，并且与不具有这种酸不稳定基团的聚合物是有效的。 含有新的光致酸发生剂的正性或负性工作光致抗蚀剂组合物具有无与伦比的性能特征，因为每量子光产生增加的酸度。 优选的光酸产生剂是通过使2,6-二羟甲基-3,5-二硝基对 - 烷基苯酚与重氮萘醌磺酰氯反应制得的。