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173 条记录 (耗时 0.029 秒)

    ENVIRONMENTAL CONDITIONING MECHANICAL TEST SYSTEM
    1.
    发明公开
    ENVIRONMENTAL CONDITIONING MECHANICAL TEST SYSTEM 审中-公开

    公开(公告)号：US20240319055A1

    公开(公告)日：2024-09-26

    申请号：US18676849

    申请日：2024-05-29

    申请人： Bruker Nano, Inc.

    发明人： Syed Amanulla Syed Asif ,  Edward Cyrankowski ,  Bartosz Nowakowski ,  Douglas D. Stauffer

    IPC分类号： G01N3/06

    CPC分类号： G01N3/062 ,  G01N3/068 ,  G01N2203/0226 ,  G01N2291/02845 ,  G01N2291/02872

    摘要： Among other things, a heating jacket configured for heating a mechanical testing instrument having a probe is disclosed herein. The heating jacket includes a heating element including a jacket wall, and the jacket wall extends around a probe recess, the jacket wall is configured to receive a probe of a mechanical testing instrument within the probe recess, and the heating element is mechanically isolated from the probe with a probe gap. Additionally, a system to correct for thermomechanical drift in a mechanical testing assembly is disclosed herein. The system isolates the mechanical testing instrument from thermomechanical drift of a system frame using a determined difference between, for instance, a probe displacement and a sample displacement.

    Method of Analyzing Metrology Data
    4.
    发明公开
    Method of Analyzing Metrology Data 审中-公开

    公开(公告)号：US20230400781A1

    公开(公告)日：2023-12-14

    申请号：US18209040

    申请日：2023-06-13

    申请人： Bruker Nano, Inc.

    发明人： Vladimir Fonoberov ,  Sean Hand ,  David Fey

    IPC分类号： G03F7/00

    CPC分类号： G03F7/70655 ,  G03F7/706845

    摘要： The preferred embodiments are directed to a metrology method used, for example, in recess analysis in semiconductor fabrication that includes using atomic force microscopy (AFM) data of a sample having an array of 2D-periodic features to generate a sample image, and calculating a periodicity of the features. The method identifies the peaks in the periodicity to determine a feature period and a lattice angle, and constructs a lattice mask that is registered to the image to perform an alignment calculation. The mask is offset, and alignment calculation made, to optimize cost.

    Debris removal in high aspect structures
    5.
    发明授权
    Debris removal in high aspect structures 有权

    公开(公告)号：US11577286B2

    公开(公告)日：2023-02-14

    申请号：US17348217

    申请日：2021-06-15

    申请人： Bruker Nano, Inc.

    发明人： Tod Evan Robinson ,  Bernabe Arruza ,  Kenneth Gilbert Roessler ,  David Brinkley ,  Jeffrey E. LeClaire

    IPC分类号： B08B7/00 ,  B08B1/00 ,  G03F1/82 ,  G03F1/84 ,  G03F7/00 ,  G03F7/20 ,  G01Q20/02 ,  G01Q60/42 ,  G01Q70/12 ,  G01Q80/00

    摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

    Torsion wing probe assembly
    6.
    发明授权
    Torsion wing probe assembly 有权

    公开(公告)号：US11555827B2

    公开(公告)日：2023-01-17

    申请号：US17473577

    申请日：2021-09-13

    申请人： Bruker Nano, Inc.

    发明人： Shuiqing Hu ,  Martin Wagner ,  Weijie Wang ,  Chanmin Su

    IPC分类号： G01Q20/02 ,  G01Q60/38

    摘要： A torsional probe for a metrology instrument includes a cantilever coupled to a support structure via a torsion bar. The cantilever, support structure, and arms of torsion bar have substantially the same thickness. A method of manufacture of the torsion probe, as well as a method of using the torsion probe to measure photothermal induced surface displacement of a sample are also described.

    Reduction of error in testing friction and wear with the use of high-speed reciprocating motion
    7.
    发明授权
    Reduction of error in testing friction and wear with the use of high-speed reciprocating motion 有权

    公开(公告)号：US11313777B2

    公开(公告)日：2022-04-26

    申请号：US16775776

    申请日：2020-01-29

    申请人： Bruker Nano, Inc.

    发明人： Jair Giovanni Ramirez Gonzalez ,  Vladimir Gulkov ,  Steven J. Shaffer ,  Douglas Werner

    IPC分类号： G01N3/56 ,  F16C17/24 ,  G01M13/04

    摘要： System for conducting measurements of friction of a chosen material with reduced errors. The system includes a sample holder, a bushing accommodating such holder while permitting reversible repositioning of the holder along a bushing axis, a horizontal force sensor, a vertical force sensor, a sample holder pusher and a subsystem including a linear vertical bearing (disposed in the bushing and separating the holder from the bushing) and/or a horizontally-sliding element between the rod pusher and the vertical force sensor. The subsystem is structured to reduce a rocking motion of the holder in the bushing caused by a relative motion between the sample and an auxiliary body brought in contact with the sample. The method for performing measurements with such system.

    Apparatus and method for contamination identification
    8.
    发明授权
    Apparatus and method for contamination identification 有权

    公开(公告)号：US11311917B2

    公开(公告)日：2022-04-26

    申请号：US15400143

    申请日：2017-01-06

    申请人： Bruker Nano, Inc.

    发明人： Jeffrey E. LeClaire ,  Kenneth G. Roessler ,  David Brinkley ,  Alexander M. Figliolini

    IPC分类号： B08B7/00 ,  G03F1/84 ,  G03F1/82

    摘要： Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.

    Testing assembly including a multiple degree of freedom stage
    10.
    发明授权
    Testing assembly including a multiple degree of freedom stage 有权

    公开(公告)号：US11237087B2

    公开(公告)日：2022-02-01

    申请号：US16845258

    申请日：2020-04-10

    申请人： Bruker Nano, Inc.

    发明人： Edward Cyrankowski ,  Syed Amanulla Syed Asif ,  Ryan Major ,  Derek Rasugu ,  Yuxin Feng

    IPC分类号： G01N3/04 ,  G01N3/42 ,  G02B21/26 ,  G02B21/32 ,  G21K5/10 ,  H01J37/20

    摘要： A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.