摘要:
A power source noise of a semiconductor device having a core cell configuring a logic circuit is reduced. Above the core cell configuring the logic circuit provided on a main surface of a semiconductor substrate are provided a first branch line for a first power source of the core cell, which is electrically connected to a first power source trunk line, and a second branch line for a second power source of the core cell, which is electrically connected to a second power source trunk line. The first and second branch lines are oppositely provided, thereby forming a capacitor between the first and second power sources.
摘要:
A power source noise of a semiconductor device having a core cell configuring a logic circuit is reduced. Above the core cell configuring the logic circuit provided on a main surface of a semiconductor substrate are provided a first branch line for a first power source of the core cell, which is electrically connected to a first power source trunk line, and a second branch line for a second power source of the core cell, which is electrically connected to a second power source trunk line. The first and second branch lines are oppositely provided, thereby forming a capacitor between the first and second power sources.
摘要:
Disclosed are a semiconductor integrated circuit device and a method of manufacturing the same capable of realizing the two-level gate insulator process for the DRAM without increasing the number of manufacturing steps and that of photomasks. After forming a gate electrode of a MISFET which constitutes a memory cell in a memory array region on a semiconductor substrate, the substrate is subjected to thermal treatment (re-oxidation process). At this time, since bird's beak of the thick gate insulating film formed below the sidewall portion of the gate electrode penetrates into the center of the gate electrode, a gate insulating film thicker than the gate insulating film before the re-oxidation process is formed just below the center of the gate electrode. Meanwhile, since the gate electrode in the peripheral circuit region has a gate length longer than that of the gate electrode in the memory array region, the thickness of the gate insulating film just below the center thereof is almost equal to that before the re-oxidation process.
摘要:
A SRAM having its memory cell constructed to include transfer MISFETs to be controlled by word lines and a flip-flop circuit having driver MISFETs and load MISFETs. Plate electrodes of large area fixed on predetermined power source lines are arranged over the load MISFETs such that the plate electrodes over the offset region of the load MISFETs are formed with an opening. A silicon nitride film having a thickness permeable to hydrogen but not to humidity is formed over the transfer MISFETs and the driver MISFETs formed over the main surface of a semiconductor substrate and the load MISFETs formed of a polycrystalline silicon film deposited on the driver MISFETs.
摘要:
A SRAM having its memory cell constructed to include transfer MISFETs to be controlled by word lines and a flip-flop circuit having driver MISFETs and load MISFETs. Plate electrodes of large area fixed on predetermined power source lines are arranged over the load MISFETs such that the plate electrodes over the offset region of the load MISFETs are formed with an opening. A silicon nitride film having a thickness permeable to hydrogen but not to humidity is formed over the transfer MISFETs and the driver MISFETs formed over the main surface of a semiconductor substrate and the load MISFETs formed of a polycrystalline silicon film deposited on the driver MISFETs.