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    Method for forming ONO top oxide in NROM structure
    2.
    发明授权
    Method for forming ONO top oxide in NROM structure 有权
    在NROM结构中形成ONO顶部氧化物的方法

    公开(公告)号：US06962728B2

    公开(公告)日：2005-11-08

    申请号：US10440437

    申请日：2003-05-16

    Applicant: Hsian Lan Lung ,  Ching Tang Wang

    Inventor： Hsian Lan Lung ,  Ching Tang Wang

    IPC: H01L21/28 ,  H01L21/314 ,  C23C16/30

    CPC classification number: H01L21/28282 ,  H01L21/3144

    Abstract: A method for making a silicon oxide/silicon nitride/silicon oxide structure includes forming a tunnel oxide layer and a silicon nitride layer over a substrate; annealing the silicon nitride layer; forming a silicon oxide layer over the annealed silicon nitride layer by high temperature low pressure chemical vapor deposition; depositing a first gate layer over the silicon oxide layer; patterning to form a silicon oxide/silicon nitride/silicon oxide (ONO) structure; forming bit lines in the substrate adjacent the ONO structure; and annealing to form a thermal oxide over the bit lines.

    Abstract translation: 制造氧化硅/氮化硅/氧化硅结构的方法包括在衬底上形成隧道氧化物层和氮化硅层; 退火氮化硅层; 通过高温低压化学气相沉积在退火的氮化硅层上形成氧化硅层; 在所述氧化硅层上沉积第一栅极层; 图案化以形成氧化硅/氮化硅/氧化硅（ONO）结构; 在邻近ONO结构的衬底中形成位线; 并进行退火以在位线上形成热氧化物。

    Process of making splittable microfiber substrate
    4.
    发明授权
    Process of making splittable microfiber substrate 失效
    制造可分离的微纤维基材的工艺

    公开(公告)号：US06737004B2

    公开(公告)日：2004-05-18

    申请号：US09917946

    申请日：2001-07-31

    Applicant: Ching-Tang Wang ,  Mong-Ching Lin ,  Kuo-Kuang Cheng ,  Chin-Yi Lin

    Inventor： Ching-Tang Wang ,  Mong-Ching Lin ,  Kuo-Kuang Cheng ,  Chin-Yi Lin

    IPC: D01D526

    CPC classification number: D01F8/14 ,  D01F8/04 ,  D01F8/06 ,  D01F8/12 ,  D01F8/16 ,  D04H1/435 ,  D04H1/4382 ,  D04H1/4391

    Abstract: A microfiber substrate of improved carding ability and its manufacturing method, and more particularly a micro-fiber spun by conjugated melting of crystallization difference of high crystallization polymer and low crystallization polyester, drawn to form an unsplit microfiber staple having a layer of thin film in its surrounding, the microfiber staple which is still kept in unsplitting state during opening, carding and lapping treatment, will be split just at the layer of thin layer of its surrounding of the microfiber staple by spunlace to completely split from the microfiber, knitted to form water-jet punch web, then subject to hot water to shrink to densification. The microfiber nonwoven web excellent in the wiping effect, cleaning effect and microfiber artificial leather excellent in the hand feeling and fluff compaction without environment pollution is enabled to offer the artificial leather more cheaply and easily finished.

    Abstract translation: 具有改善梳理能力的微纤维基材及其制造方法，特别是通过高结晶聚合物和低结晶聚酯的结晶差异共轭熔融纺丝的微纤维，被拉伸以形成其中具有薄膜层的非分裂超细纤维短纤维 围绕着，在打开，梳理和研磨处理期间仍然处于不切割状态的超细纤维短纤维将在其超细纤维短纤维的周围的薄层的层上被水刺分裂，以从超细纤维完全分裂，以编织形成水 冲压网，然后受热水收缩而致密化。 擦拭效果，清洁效果和超细纤维人造革优异的超细纤维非织造纤维网手感和绒毛压实无环境污染，使得人造革更便宜和容易地完成。

    Method for Making Macromolecular Laminate
    5.
    发明申请
    Method for Making Macromolecular Laminate 审中-公开
    制备高分子层压板的方法

    公开(公告)号：US20080095945A1

    公开(公告)日：2008-04-24

    申请号：US11956857

    申请日：2007-12-14

    Applicant: Ching-Tang Wang ,  Wu-Tsang Tsai ,  Lung-Chuan Wang ,  Chung-Chih Feng ,  Chun-Wei Wu

    Inventor： Ching-Tang Wang ,  Wu-Tsang Tsai ,  Lung-Chuan Wang ,  Chung-Chih Feng ,  Chun-Wei Wu

    IPC: B05D3/12

    CPC classification number: C08L75/04

    Abstract: A method for making a macromolecular laminate is disclosed. Firstly, a high solid-content polyurethane resin is prepared. The high solid-content polyurethane resin has a solid content higher than 80% by weight and a viscosity from 20000 to 60000 cps/30° C. The high solid-content polyurethane resin is liquid at the room temperature. The high solid-content polyurethane resin is mixed with additives to form a first type of polyurethane resin compound with a solid content higher than 50% by weight and a viscosity from 20000 to 60000 cps/30° C. The first type of polyurethane resin compound is liquid at room temperature and has a pot life of at least three hours at room temperature. The first type of polyurethane resin compound is coated on a releasing paper to make a main layer. Then, the releasing paper is removed from the main layer to make a laminate.

    Abstract translation: 公开了制备高分子层压体的方法。 首先，制备高固含量聚氨酯树脂。 高固含量聚氨酯树脂的固含量高于80重量％，粘度为20000至60000cps / 30℃。高固含量聚氨酯树脂在室温下为液体。 将高固含量的聚氨酯树脂与添加剂混合以形成固体含量高于50重量％，粘度为20000至60000cps / 30℃的第一种聚氨酯树脂化合物。第一种类型的聚氨酯树脂化合物 在室温下为液体，在室温下具有至少3小时的适用期。 将第一种类型的聚氨酯树脂化合物涂覆在脱模纸上以制成主层。 然后，将脱模纸从主层移除以制成层压体。

    Method for producing environmental friendly artificial leather product
    7.
    发明申请
    Method for producing environmental friendly artificial leather product 审中-公开
    生产环保人造革产品的方法

    公开(公告)号：US20060249244A1

    公开(公告)日：2006-11-09

    申请号：US11486542

    申请日：2006-07-14

    Applicant: Ching-Tang Wang ,  Mong-Ching Lin ,  Chung-Chih Feng ,  Pei-Huo Huang ,  Yong-Song Lin

    Inventor： Ching-Tang Wang ,  Mong-Ching Lin ,  Chung-Chih Feng ,  Pei-Huo Huang ,  Yong-Song Lin

    IPC: B44C1/17 ,  B32B37/00

    CPC classification number: D06N3/0097 ,  B44F9/12 ,  D06N3/145

    Abstract: A method for producing an environmental friendly artificial leather product includes coating a first solvent-free elastomer resin composition on a releasing paper to form a top layer, coating a polyurethane resin composition containing more than 50% by weight solid content on the top layer to form an intermediate layer, coating a second solvent-free elastomer resin composition on the intermediate layer to form an adhesive layer, and finally applying a substrate on the adhesive layer, and peeling the releasing paper.

    Abstract translation: 一种生产环保人造革制品的方法包括在脱模纸上涂布第一无溶剂弹性体树脂组合物以形成顶层，在顶层上涂覆含有多于50重量％固体含量的聚氨酯树脂组合物以形成 中间层，在中间层上涂布第二无溶剂弹性体树脂组合物以形成粘合剂层，最后在粘合剂层上涂布基材，剥离剥离纸。

    Method for monitoring oxide film deposition
    9.
    发明申请
    Method for monitoring oxide film deposition 有权
    监测氧化膜沉积的方法

    公开(公告)号：US20060177949A1

    公开(公告)日：2006-08-10

    申请号：US11052806

    申请日：2005-02-09

    Applicant: Mao-Chan Chiu ,  May-Jun Chou ,  Ching-Tang Wang ,  Keng-Hui Su

    Inventor： Mao-Chan Chiu ,  May-Jun Chou ,  Ching-Tang Wang ,  Keng-Hui Su

    IPC: H01L21/66

    CPC classification number: H01L22/12

    Abstract: A method for monitoring oxide film deposition is disclosed. The method utilizes silicon wafers having silicon nitride films thereon instead of bare silicon wafers to monitor the growth of silicon oxide/dioxide films in a furnace. The method for monitoring oxide film deposition comprises the following steps. First of all, a wafer having silicon nitride film and a silicon wafer are provided. Next an oxide layer is formed on the wafer and the silicon wafer, and the thickness of the oxide layer is controlled substantially equally on the wafer and the silicon wafer. Then the thickness of the oxide layer on the wafer and the silicon wafer is measured.

    Abstract translation: 公开了一种用于监测氧化膜沉积的方法。 该方法利用其上具有氮化硅膜的硅晶片代替裸硅晶片来监测炉中氧化硅/二氧化物膜的生长。 用于监测氧化膜沉积的方法包括以下步骤。 首先，提供具有氮化硅膜和硅晶片的晶片。 接下来，在晶片和硅晶片上形成氧化物层，并且在晶片和硅晶片上基本上均匀地控制氧化物层的厚度。 然后测量晶片和硅晶片上的氧化物层的厚度。

    [METHOD OF FORMING A SILICON NITRIDE LAYER]
    10.
    发明申请
    [METHOD OF FORMING A SILICON NITRIDE LAYER] 有权
    [形成氮化硅层的方法]

    公开(公告)号：US20050266696A1

    公开(公告)日：2005-12-01

    申请号：US10710193

    申请日：2004-06-24

    Applicant: Ching-Tang Wang ,  Chin-Tung Niao ,  Keng-Hui Su ,  Huang-Sheng Chiu ,  Min-Hsin Wang

    Inventor： Ching-Tang Wang ,  Chin-Tung Niao ,  Keng-Hui Su ,  Huang-Sheng Chiu ,  Min-Hsin Wang

    IPC: H01L21/31 ,  H01L21/318 ,  H01L21/76

    CPC classification number: H01L21/0217 ,  H01L21/02271 ,  H01L21/3185

    Abstract: A method of forming a silicon nitride layer is provided. A deposition furnace having an outer tube, a wafer boat, a gas injector and a uniform gas injection apparatus is provided. The wafer boat is positioned within the outer tube for carrying a plurality of wafers. The gas injector is positioned between the outer tube and the wafer boat. Similarly, the uniform gas injection apparatus is positioned between the outer tube and the wafer boat. Gas injected into the uniform gas injection apparatus is uniformly distributed throughout the entire deposition furnace. To form a silicon nitride layer on each wafer, a silicon-containing gas is passed into the deposition furnace via the gas injector and a nitrogen-mixed carrier gas is passed into the deposition furnace via the uniform gas injection apparatus.

    Abstract translation: 提供了形成氮化硅层的方法。 提供一种具有外管，晶片舟，气体注入器和均匀气体注入装置的沉积炉。 晶片舟定位在外管内用于承载多个晶片。 气体喷射器位于外管和晶片舟之间。 类似地，均匀气体注入装置位于外管和晶片舟之间。 注入均匀气体注入装置的气体均匀分布在整个沉积炉中。 为了在每个晶片上形成氮化硅层，通过气体注入器将含硅气体送入沉积炉，并且氮气混合的载气通过均匀的气体注入装置进入沉积炉。

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