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    Method and apparatus for electron beam processing of substrates
    3.
    发明授权
    Method and apparatus for electron beam processing of substrates 失效
    用于基板电子束处理的方法和装置

    公开(公告)号：US07038225B2

    公开(公告)日：2006-05-02

    申请号：US10875629

    申请日：2004-06-23

    Applicant: David Shiao-Min Kuo ,  Christopher Joseph Formato ,  Neil Deeman ,  Sundeep Chauhan ,  Lawrence Matthias Bryant

    Inventor： David Shiao-Min Kuo ,  Christopher Joseph Formato ,  Neil Deeman ,  Sundeep Chauhan ,  Lawrence Matthias Bryant

    IPC: H01J37/00 ,  G11B5/596

    CPC classification number: H01L21/67259 ,  G11B7/261 ,  H01J2237/2025 ,  H01J2237/304 ,  H01L21/67253 ,  H01L21/681

    Abstract: Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data signal to a rotational speed control system. Another encoder wheel is configured to provide a pattern generator clock signal at a higher frequency than the rotational speed data signal to a pattern generator. In one embodiment of the present invention, at least one of the encoder wheels is positioned adjacent the substrate to minimize torsional and differential movements between the at least one encoder wheel and the substrate.

    Abstract translation: 本发明的实施例通常提供电子束基板处理系统。 在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于包括两个编码轮。 一个编码轮构造成向转速控制系统提供转速数据信号。 另一个编码器轮被配置为向图案发生器提供比转速数据信号更高的频率的模式发生器时钟信号。 在本发明的一个实施例中，编码器轮中的至少一个定位成与基板相邻，以最小化编码轮和基板之间的扭转和差速运动。

    Multi-level stamper for improved thermal imprint lithography
    4.
    发明授权
    Multi-level stamper for improved thermal imprint lithography 失效
    用于改进热压印光刻的多级压模

    公开(公告)号：US06869557B1

    公开(公告)日：2005-03-22

    申请号：US10156063

    申请日：2002-05-29

    Applicant: Koichi Wago ,  Gennady Gauzner ,  Christopher Joseph Formato

    Inventor： Koichi Wago ,  Gennady Gauzner ,  Christopher Joseph Formato

    IPC: B29C59/00 ,  B29D17/00 ,  G03F7/00 ,  G28B11/08

    CPC classification number: G11B5/855 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: A stamper/imprinter for use in performing thermal imprint lithography of a substrate/workpiece surface to form a pattern of features in first portions of the surface intended to receive the pattern, without incurring random formation of undesired, disordered features in second portions of the substrate/workpiece surface not intended to receive the pattern, comprising an imprinting surface configured to substantially prevent formation of gaps between the imprinting surface and the second portions of the surface during stamping/imprinting. Embodiments include stampers/imprinters with a multilevel imprinting surface comprises a first portion having a first level for forming the pattern of features in the first portions of the surface and a second portion having a second level for substantially preventing formation of gaps between the imprinting surface and the second portions of the surface during stamping/imprinting.

    Abstract translation: 一种压模/打印机，用于执行基板/工件表面的热压印光刻，以形成用于接收图案的表面的第一部分中的特征图案，而不会在基板的第二部分中随机形成不期望的无序特征 包括不打算接收图案的工件表面，包括压印表面，其被构造成在冲压/压印期间基本上防止在压印表面和表面的第二部分之间形成间隙。 实施例包括具有多层压印表面的压模/打印机包括具有用于在表面的第一部分中形成特征图案的第一层的第一部分和具有第二层的第二部分，用于基本上防止在压印表面和 在冲压/压印期间表面的第二部分。

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