公开(公告)号：US08587762B2

公开(公告)日：2013-11-19

申请号：US12237557

申请日：2008-09-25

申请人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

发明人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。

公开(公告)号：US20090086175A1

公开(公告)日：2009-04-02

申请号：US12237557

申请日：2008-09-25

申请人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

发明人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。

公开(公告)号：US20090073395A1

公开(公告)日：2009-03-19

申请号：US11898637

申请日：2007-09-13

申请人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Spruytenburg ,  Joris Johan Verstraete

发明人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Spruytenburg ,  Joris Johan Verstraete

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

公开(公告)号：US08681308B2

公开(公告)日：2014-03-25

申请号：US11898637

申请日：2007-09-13

申请人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

发明人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/42 ,  G03B27/32 ,  G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

公开(公告)号：US08638417B2

公开(公告)日：2014-01-28

申请号：US13085069

申请日：2011-04-12

申请人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  Y10T137/86292

摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中。 流体处理结构的下表面具有供给开口，其构造成朝向相对表面供应流体;多个提取开口，其构造成从流体处理结构和相对表面之间移除流体;以及在供给开口和提取物之间的突起 开口

公开(公告)号：US08634053B2

公开(公告)日：2014-01-21

申请号：US11987569

申请日：2007-11-30

申请人： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

发明人： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。

公开(公告)号：US07710540B2

公开(公告)日：2010-05-04

申请号：US11783115

申请日：2007-04-05

申请人： Erik Roelof Loopstra ,  Henrikus Herman Marie Cox ,  Jeroen Johannes Sophia Maria Mertens ,  Wilhelmus Franciscus Johannes Simons ,  Paul Petrus Joannes Berkvens

发明人： Erik Roelof Loopstra ,  Henrikus Herman Marie Cox ,  Jeroen Johannes Sophia Maria Mertens ,  Wilhelmus Franciscus Johannes Simons ,  Paul Petrus Joannes Berkvens

IPC分类号： G03B27/42

CPC分类号： G05B19/404 ,  G03F7/70725 ,  G03F7/709 ,  G05B2219/45031 ,  G05B2219/49189

摘要： A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.

摘要翻译： 用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，被配置为确定传感器或传感器目标在基板支撑件上的位置;控制器，被配置为基于目标部分的期望位置提供控制信号 和一个或多个致动器构造成作用在基板支撑件上。 所述位置控制系统包括所述基板支撑件的刚度补偿模型，所述刚度补偿模型包括所述目标部分的位置变化的差异与所述传感器或传感器目标的位置变化之间的关系 施加在基板支撑件上。 位置控制系统被配置为至少在图案化的辐射束在目标部分上的投影期间基本上校正，目标部分的位置使用刚度补偿模型。

公开(公告)号：US08421993B2

公开(公告)日：2013-04-16

申请号：US12437433

申请日：2009-05-07

申请人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Koen Steffens ,  Arnold Jan Van Putten

发明人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Koen Steffens ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

摘要翻译： 公开了一种流体处理结构，其中指定了流体提取开口的尺寸和布置，以便减少由于两相抽取而被传送到流体处理结构的振动。 可以控制每个流体提取开口的面积和/或所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 振动的减少增加了曝光的准确性。

公开(公告)号：US20110005603A1

公开(公告)日：2011-01-13

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

IPC分类号： F03B11/00

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US20080246936A1

公开(公告)日：2008-10-09

申请号：US11783115

申请日：2007-04-05

申请人： Erik Roelof Loopstra ,  Henrikus Herman Marie Cox ,  Jeroen Johannes Sophia Maria Mertens ,  Wilhelmus Franciscus Johannes Simons ,  Paul Petrus Joannes Berkvens

发明人： Erik Roelof Loopstra ,  Henrikus Herman Marie Cox ,  Jeroen Johannes Sophia Maria Mertens ,  Wilhelmus Franciscus Johannes Simons ,  Paul Petrus Joannes Berkvens

IPC分类号： G03B27/42

CPC分类号： G05B19/404 ,  G03F7/70725 ,  G03F7/709 ,  G05B2219/45031 ,  G05B2219/49189

摘要： A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.

摘要翻译： 用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，被配置为确定传感器或传感器目标在基板支撑件上的位置;控制器，被配置为基于目标部分的期望位置提供控制信号 和一个或多个致动器构造成作用在基板支撑件上。 所述位置控制系统包括所述基板支撑件的刚度补偿模型，所述刚度补偿模型包括所述目标部分的位置变化的差异与所述传感器或传感器目标的位置变化之间的关系 施加在基板支撑件上。 位置控制系统被配置为至少在图案化的辐射束在目标部分上的投影期间基本上校正，目标部分的位置使用刚度补偿模型。