公开(公告)号：US08587762B2

公开(公告)日：2013-11-19

申请号：US12237557

申请日：2008-09-25

申请人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

发明人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。

公开(公告)号：US20090086175A1

公开(公告)日：2009-04-02

申请号：US12237557

申请日：2008-09-25

申请人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

发明人： Bob Streefkerk ,  Roelof Frederik De Graaf ,  Johannes Catharinus Hubertus Mulkens ,  Marcel Beckers ,  Paul Petrus Joannes Berkvens ,  David Lucien Anstotz

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。

公开(公告)号：US07057702B2

公开(公告)日：2006-06-06

申请号：US10873650

申请日：2004-06-23

申请人： Joeri Lof ,  Johannes Catharinus Hubertus Mulkens ,  Jeroen Johannes Sophia Maria Mertens ,  Antonius Johannes Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

发明人： Joeri Lof ,  Johannes Catharinus Hubertus Mulkens ,  Jeroen Johannes Sophia Maria Mertens ,  Antonius Johannes Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70341 ,  G03F7/70808

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

摘要翻译： 公开了一种光刻投影装置。 该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置用于使辐射束在其横截面上具有图案。 该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。 体积包括投影系统的至少一部分和/或照明系统的至少一部分。 该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。

公开(公告)号：US09036127B2

公开(公告)日：2015-05-19

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

发明人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US07808614B2

公开(公告)日：2010-10-05

申请号：US12340362

申请日：2008-12-19

申请人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。

公开(公告)号：US08427629B2

公开(公告)日：2013-04-23

申请号：US12871631

申请日：2010-08-30

申请人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

公开(公告)号：US20090153823A1

公开(公告)日：2009-06-18

申请号：US12340362

申请日：2008-12-19

申请人： Carlo Cornelis Maria LUIJTEN ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria LUIJTEN ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。

公开(公告)号：US07522261B2

公开(公告)日：2009-04-21

申请号：US10948749

申请日：2004-09-24

申请人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。

公开(公告)号：US20060066826A1

公开(公告)日：2006-03-30

申请号：US10948749

申请日：2004-09-24

申请人： Carlo Maria Luijten ,  Sjoerd Lambertus Donders ,  Nicolaas Kemper ,  Martinus Antonius Leenders ,  Erik Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Maria Luijten ,  Sjoerd Lambertus Donders ,  Nicolaas Kemper ,  Martinus Antonius Leenders ,  Erik Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

公开(公告)号：US20100321651A1

公开(公告)日：2010-12-23

申请号：US12871631

申请日：2010-08-30

申请人： Carlo Cornelis Maria LUIJTEN ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria LUIJTEN ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。