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    Glass-like insulator for electrically isolating electrodes from ion implanter housing
    1.
    发明授权
    Glass-like insulator for electrically isolating electrodes from ion implanter housing 有权
    用于将电极与离子注入机外壳电隔离的玻璃状绝缘体

    公开(公告)号：US06291828B1

    公开(公告)日：2001-09-18

    申请号：US09469068

    申请日：1999-12-21

    申请人： Kourosh Saadatmand ,  David R. Swenson ,  William F. DiVergilio ,  Stephen M. Quinn ,  Zhimin Wan ,  Victor M. Benveniste

    发明人： Kourosh Saadatmand ,  David R. Swenson ,  William F. DiVergilio ,  Stephen M. Quinn ,  Zhimin Wan ,  Victor M. Benveniste

    IPC分类号： G21K510

    CPC分类号： H01J37/3171 ,  H01J37/12 ,  H01J2237/038 ,  H01J2237/04737 ,  H01J2237/04924

    摘要： An electrostatic quadrupole lens assembly (60) is provided for an ion implanter (10) having an axis (86) along which an ion beam passes, comprising: (i) four electrodes (84a-84d) oriented radially outward from the axis (86), approximately 90° apart from each other, such that a first pair of electrodes (84a and 84c) oppose each other approximately 180° apart, and a second pair of electrodes (84b and 84d) also oppose each other approximately 180° apart; (ii) a housing (62) having a mounting surface (64) for mounting the assembly (60) to the implanter, the housing at least partially enclosing the four electrodes (84a-84d); (iii) a first electrical lead (104) for providing electrical power to the first pair of electrodes (84a and 84c); (iv) a second electrical lead (108) for providing electrical power to the second pair of electrodes (84b and 84d); and (v) a plurality of electrically insulating members (92) formed of a glass-like material, comprising at least a first electrically insulating member for attaching the first pair of electrodes (84a and 84c) to the housing, and at least a second electrically insulating member for attaching the second pair of electrodes (84b and 84d) to the housing. The plurality of electrically insulating members (92) are preferably comprised of quartz (SiO2), or a heat resistant and chemical resistant glass material such as Pyrex®. The members (92) resist accumulation of material such as graphite sputtered off of the electrodes (84a-84d) by the ion beam, thus reducing the occurrence of high voltage breakdown and electrical current breakdown.

    摘要翻译： 为具有离子束通过的轴线（86）的离子注入机（10）提供静电四极透镜组件（60），包括：（i）从轴线（86）径向向外取向的四个电极（84a-84d） ）彼此大约90°，使得第一对电极（84a和84c）彼此相对大约180°，并且第二对电极（84b和84d）也彼此相对大约180°; （ii）具有用于将所述组件（60）安装到所述注入器的安装表面（64）的壳体（62），所述壳体至少部分地包围所述四个电极（84a-84d）; （iii）用于向所述第一对电极（84a和84c）提供电力的第一电引线（104）; （iv）用于向所述第二对电极（84b和84d）提供电力的第二电引线（108）; 和（v）由玻璃状材料形成的多个电绝缘构件（92），至少包括用于将第一对电极（84a和84c）附接到壳体的第一电绝缘构件，以及至少第二 用于将第二对电极（84b和84d）附接到壳体的电绝缘构件。 多个电绝缘构件（92）优选地由石英（SiO 2）或耐热和耐化学腐蚀的玻璃材料（例如Pyrex）组成。 构件（92）通过离子束阻止溅射在电极（84a-84d）之外的诸如石墨的材料的堆积，从而减少高压击穿和电流击穿的发生。

    Method of and apparatus for measurement and control of a gas cluster ion beam
    2.
    发明授权
    Method of and apparatus for measurement and control of a gas cluster ion beam 有权
    气体簇离子束的测量和控制方法和装置

    公开(公告)号：US07067828B2

    公开(公告)日：2006-06-27

    申请号：US10765246

    申请日：2004-01-27

    申请人： David R. Swenson

    发明人： David R. Swenson

    IPC分类号： H01J37/317

    CPC分类号： H01J37/304 ,  C23C14/221 ,  C23C14/54 ,  H01J2237/0812 ,  H01J2237/31

    摘要： Methods and apparatus are disclosed for measuring controlling characteristics of clusters in a cluster ion beam, including average cluster ion velocity {overscore (v)}, average cluster ion mass {overscore (m)}, average cluster ion energy Ē, average cluster ion charge state {overscore (q)}, average cluster ion mass per charge ( m q ) average , and average energy/charge ( E q ) average . The measurements are employed in gas cluster ion beam processing systems to monitor and control gas cluster ion beam characteristics that are critical for optimal processing of workpieces by gas cluster ion beam irradiation.

    摘要翻译： 公开了用于测量簇离子束中的簇的控制特性的方法和装置，包括平均簇离子速度（超核（v，平均簇离子质量（超滤（m，平均簇离子能量E，平均簇离子电荷状态 q，每次充电的平均簇离子质量 （ ， 和平均能量/费用 （ E q MI>平均值 。 气体团簇离子束处理系统中的测量用于监测和控制气体簇离子束 通过气体簇离子束照射对工件进行最佳加工至关重要的特性 。

      Time of flight energy measurement apparatus for an ion beam implanter
      4.
      发明授权
      Time of flight energy measurement apparatus for an ion beam implanter 有权
      离子束注入机的飞行时间能量测量装置

      公开(公告)号：US6137112A

      公开(公告)日：2000-10-24

      申请号：US150177

      申请日：1998-09-10

      申请人： Edward K. McIntyre ,  Kevin W. Wenzel ,  David R. Swenson ,  Ernst F. Scherer ,  William F. Divergilio ,  Kourosh Saadatmand

      发明人： Edward K. McIntyre ,  Kevin W. Wenzel ,  David R. Swenson ,  Ernst F. Scherer ,  William F. Divergilio ,  Kourosh Saadatmand

      IPC分类号： H01L21/66 ,  C23C14/48 ,  H01J37/304 ,  H01J37/317 ,  H01J49/40 ,  H01J49/44 ,  H01L21/265 ,  H01J37/244

      CPC分类号： H01J49/40 ,  H01J37/304 ,  H01J37/3171

      摘要： An ion implanter including a time of flight energy measurement apparatus for measuring and controlling the energy of an ion beam includes an ion source for generating the ion beam, an ion acceleration assembly for accelerating the beam resulting in the beam comprising a series of ion pulses having a predetermined frequency and beam forming and directing structure for directing the ion beam at workpieces supported in an implantation chamber of the implanter. The time of flight energy measurement apparatus includes spaced apart first and second sensors, timing circuitry and conversion circuitry. The time of flight energy measurement apparatus measures an average kinetic energy of an ion included in a selected ion pulse of the ion beam. The first sensor and a second sensor are disposed adjacent the ion beam and spaced a predetermined distance apart, the second sensor being downstream of the first sensor. The first sensor generates a signal when an ion pulse of the ion beam passes the first sensor and the second sensor generates a signal when an ion pulse of the ion beam passes the second sensor. The timing circuitry of the energy measurement apparatus is electrically coupled to the first and second sensors and determines an elapsed time, t, for the selected ion pulse to traverse the predetermined distance between the first and second sensors. The timing circuitry calculates an average number of ion pulses, N, in the ion beam between the first and second sensors based on the approximation of the ion beam energy and calculates an offset time, t(offset), for the selected ion pulse using the formula, t(offset)=N.times.T. The timing circuitry than determines the elapsed time, t. The conversion circuitry converts the elapsed time, t, for the selected ion pulse into a measure of the energy of the ion beam.

      摘要翻译： 包括用于测量和控制离子束的能量的飞行时间能量测量装置的离子注入机包括用于产生离子束的离子源，用于加速所述束的束的离子加速组件，所述离子加速组件包括一系列具有 预定的频率和波束形成和引导结构，用于将离子束引导到支撑在注入机的植入室中的工件上。 飞行时间能量测量装置包括间隔开的第一和第二传感器，定时电路和转换电路。 飞行时间能量测量装置测量离子束的选定离子脉冲中包含的离子的平均动能。 第一传感器和第二传感器邻近离子束设置并间隔预定距离，第二传感器位于第一传感器的下游。 当离子束的离子脉冲通过第一传感器时，第一传感器产生信号，当离子束的离子脉冲通过第二传感器时，第二传感器产生信号。 能量测量装置的定时电路电耦合到第一和第二传感器，并且确定所选离子脉冲经过第一和第二传感器之间的预定距离的经过时间t。 定时电路基于离子束能量的近似计算第一和第二传感器之间的离子束中的离子脉冲的平均数目N，并且使用该离子脉冲计算所选离子脉冲的偏移时间t（偏移） 公式，t（offset）= NxT。 定时电路确定经过的时间t。 转换电路将所选择的离子脉冲的经过时间t转换成离子束的能量的量度。