公开(公告)号：US09103031B2

公开(公告)日：2015-08-11

申请号：US12144968

申请日：2008-06-24

Applicant: John J. Hautala ,  Michael Graf ,  Yan Shao ,  Brian S. Freer

Inventor： John J. Hautala ,  Michael Graf ,  Yan Shao ,  Brian S. Freer

IPC: C23C14/00 ,  C23C14/48 ,  H01J27/02 ,  C23C14/10 ,  C23C14/22 ,  H01J27/00

CPC classification number: C23C14/48 ,  C23C14/10 ,  C23C14/221 ,  H01J27/026 ,  H01J2237/0812

Abstract: A method of forming a thin film on a substrate is described. The method comprises providing a substrate in a reduced-pressure environment, and generating a gas cluster ion beam (GCIB) in the reduced-pressure environment from a pressurized gas mixture. A beam acceleration potential and a beam dose are set to achieve a thickness of the thin film ranging up to about 300 angstroms and to achieve a surface roughness of an upper surface of the thin film that is less than about 20 angstroms. The GCIB is accelerated according to the beam acceleration potential, and the accelerated GCIB is irradiated onto at least a portion of the substrate according to the beam dose. By doing so, the thin film is grown on the at least a portion of the substrate to achieve the thickness and the surface roughness.

Abstract translation: 描述了在基板上形成薄膜的方法。 该方法包括在减压环境中提供衬底，以及在减压环境中从加压气体混合物产生气体簇离子束（GCIB）。 设置光束加速电位和光束剂量以实现高达约300埃的薄膜厚度，并且实现薄膜上表面的表面粗糙度小于约20埃。 GCIB根据光束加速电位被加速，并且根据光束剂量将加速的GCIB照射到基底的至少一部分上。 通过这样做，薄膜在衬底的至少一部分上生长以获得厚度和表面粗糙度。

公开(公告)号：US20090087969A1

公开(公告)日：2009-04-02

申请号：US11864318

申请日：2007-09-28

Applicant: Noel Russell ,  Steven Sherman ,  John Hautala

Inventor： Noel Russell ,  Steven Sherman ,  John Hautala

IPC: H01L21/425

CPC classification number: H01L21/76834 ,  H01J27/026 ,  H01J2237/0812 ,  H01L21/31051 ,  H01L21/3148 ,  H01L21/318 ,  H01L21/3185 ,  H01L21/76825

Abstract: Embodiments of methods for improving a copper/dielectric interface in semiconductor devices are generally described herein. Other embodiments may be described and claimed.

Abstract translation: 这里通常描述用于改善半导体器件中的铜/电介质界面的方法的实施例。 可以描述和要求保护其他实施例。

公开(公告)号：US20080042580A1

公开(公告)日：2008-02-21

申请号：US11648366

申请日：2006-12-29

Applicant: Thomas Horsky

Inventor： Thomas Horsky

IPC: H01J7/24

CPC classification number: C23C14/48 ,  H01J27/026 ,  H01J27/08 ,  H01J27/205 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0815 ,  H01J2237/082 ,  H01J2237/0827 ,  H01J2237/31701 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/2658 ,  H01L21/823814

Abstract: An ion source is disclosed for providing a range of ion beams consisting of either ionized clusters, such as B2Hx+, B5Hx+, B10Hx+, B18Hx+, P4+ or As4+′ or monomer ions, such as Ge+, In+, Sb+, B+, As+, and P+, to enable cluster implants and monomer implants into silicon substrates for the purpose of manufacturing CMOS devices, and to do so with high productivity. The range of ion beams is generated by a universal ion source in accordance with the present invention which is configured to operate in two discrete modes: an electron impact mode, which efficiently produces ionized clusters, and an arc discharge mode, which efficiently produces monomer ions.

Abstract translation: 公开了一种离子源，用于提供由离子簇组成的一系列离子束，例如B 2 H 2，H 2，SUP 2 +，/ B 2， > 5 + ，B 或B 1，B 3，B 3，...，...，...， 或者单体离子，例如Ge +，Sb +，Sb +，SO 3 + 为了使集群植入物和单体植入物进入硅衬底以用于制造CMOS器件，以及 以高生产力这样做。 离子束的范围由根据本发明的通用离子源产生，其被配置为以两种离散模式操作：电子冲击模式，其有效地产生离子簇，以及电弧放电模式，其有效地产生单体离子 。

公开(公告)号：US07173252B2

公开(公告)日：2007-02-06

申请号：US11257524

申请日：2005-10-25

Applicant: Michael E. Mack

Inventor： Michael E. Mack

IPC: H01J27/02 ,  H01J27/00 ,  H01J49/00

CPC classification number: H01J27/08 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3053 ,  H01J2237/0041 ,  H01J2237/0812

Abstract: An ionizer for forming a gas-cluster ion beam is disclosed including inlet and outlet ends partially defining an ionization region traversed by a gas-cluster jet and one or more plasma electron source(s) for providing electrons to the ionizing region for ionizing at least a portion of the gas-clusters to form a gas-cluster ion beam. One or more sets of substantially linear rod electrodes may be disposed substantially parallel to and in one or more corresponding partial, substantially cylindrical pattern(s) about the gas-cluster jet axis, wherein some sets are arranged in substantially concentric patterns with differing radii. In certain embodiments, the ionizer includes one or more substantially linear thermionic filaments disposed substantially parallel to the gas-cluster jet axis, heating means, electrical biasing means to judiciously bias sets of the linear rod electrodes with respect to the thermionic filaments to achieve electron repulsion.

Abstract translation: 公开了一种用于形成气体簇离子束的离子发生器，其包括部分地限定由气体簇射流穿过的电离区域的一个或多个等离子体电子源的入口端和出口端，以及用于向离子化区域提供电子至少电离 一部分气体团簇形成气体团簇离子束。 一组或多组基本上线性的棒状电极可以布置成基本上平行于一个或多个对应的部分基本圆柱形图案围绕气体簇射流轴线，其中一些组以不同半径的大致同心图案布置。 在某些实施例中，电离器包括基本上平行于气体簇射流轴线布置的一个或多个基本上线性的热电偶丝线，加热装置，电偏置装置，用于相对于热离子细丝明智地偏置线性棒电极组，以实现电子排斥 。

公开(公告)号：US20060097185A1

公开(公告)日：2006-05-11

申请号：US11257524

申请日：2005-10-25

Applicant: Michael Mack

Inventor： Michael Mack

IPC: H01J27/00

CPC classification number: H01J27/08 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3053 ,  H01J2237/0041 ,  H01J2237/0812

Abstract: An ionizer for forming a gas-cluster ion beam is disclosed including inlet and outlet ends partially defining an ionization region traversed by a gas-cluster jet and one or more plasma electron source(s) for providing electrons to the ionizing region for ionizing at least a portion of the gas-clusters to form a gas-cluster ion beam. One or more sets of substantially linear rod electrodes may be disposed substantially parallel to and in one or more corresponding partial, substantially cylindrical pattern(s) about the gas-cluster jet axis, wherein some sets are arranged in substantially concentric patterns with differing radii. In certain embodiments, the ionizer includes one or more substantially linear thermionic filaments disposed substantially parallel to the gas-cluster jet axis, heating means, electrical biasing means to judiciously bias sets of the linear rod electrodes with respect to the thermionic filaments to achieve electron repulsion.

Abstract translation: 公开了一种用于形成气体簇离子束的离子发生器，其包括部分地限定由气体簇射流穿过的电离区域的一个或多个等离子体电子源的入口端和出口端，以及用于向离子化区域提供电子至少电离 一部分气体团簇形成气体团簇离子束。 一组或多组基本上线性的棒状电极可以布置成基本上平行于一个或多个对应的部分基本圆柱形图案围绕气体簇射流轴线，其中一些组以不同半径的大致同心图案布置。 在某些实施例中，电离器包括基本上平行于气体簇射流轴线布置的一个或多个基本上线性的热电偶丝线，加热装置，电偏置装置，用于相对于热离子细丝明智地偏置线性棒电极组，以实现电子排斥 。

公开(公告)号：US06737643B2

公开(公告)日：2004-05-18

申请号：US09811904

申请日：2001-03-19

Applicant: Richard P. Torti ,  Matthew C. Gwinn ,  Jerald P. Dykstra

Inventor： Richard P. Torti ,  Matthew C. Gwinn ,  Jerald P. Dykstra

IPC: H01J4926

CPC classification number: H01J49/10 ,  H01J27/026 ,  H01J49/0422 ,  H01J2237/0812 ,  H01J2237/24485

Abstract: A detector apparatus and its use for cluster ion beam diagnostics are described. The detector has a Faraday cup with a conductance path to a gas pressure detector and a conductance to the detector exit. The detector acquires ion current, which is a measure of the ion beam flux, and also acquires mass flux, through a pressure measurement. The pressure measurement responds to the mass of dissociated gas clusters and is combined with information about instantaneous ion current to estimate mean gas cluster ion size ({overscore (N)}i).

Abstract translation: 描述了一种检测器装置及其用于群集离子束诊断的用途。 检测器具有法拉第杯，其具有通向气体压力检测器的电导路径和对检测器出口的电导。 检测器获取离子电流，其是离子束通量的量度，并且还通过压力测量获得质量通量。 压力测量响应于解离的气体团簇的质量，并结合关于瞬时离子电流的信息来估计平均气体团簇离子大小（{超核（Ni））。

公开(公告)号：US20010033128A1

公开(公告)日：2001-10-25

申请号：US09727810

申请日：2000-12-01

Inventor： Richard P. Torti ,  Jerald P. Dykstra

IPC: H05H001/00

CPC classification number: H01J49/0422 ,  H01J27/026 ,  H01J37/05 ,  H01J49/10 ,  H01J2237/0812 ,  H05H7/04

Abstract: Incorporating the use of a permanent magnet within a GCIB apparatus to separate undesirable monomer ions from a gas cluster ion beam to facilitate improved processing of workpieces. In an alternate embodiment, the effect of the permanent magnet may be controlled by the use of an electrical coil. The above system eliminates problems related to power consumption and heat generation.

Abstract translation: 在GCIB装置中结合使用永磁体，以将不期望的单体离子与气体团簇离子束分离，以促进工件的改进处理。 在替代实施例中，永磁体的作用可以通过使用电线圈来控制。 上述系统消除了与功耗和发热有关的问题。

公开(公告)号：US20160086758A1

公开(公告)日：2016-03-24

申请号：US14888078

申请日：2014-04-18

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kota Iwasaki

IPC: H01J27/02 ,  H01J37/18 ,  H01J49/26 ,  B05B17/06 ,  B05B15/02 ,  H01J49/14 ,  H01J27/20

CPC classification number: H01J27/026 ,  B05B15/50 ,  B05B17/06 ,  H01J27/02 ,  H01J27/205 ,  H01J37/08 ,  H01J37/18 ,  H01J49/147 ,  H01J49/26 ,  H01J2237/0812 ,  H01J2237/182

Abstract: In the known liquid droplet injecting apparatus, when a tube and a nozzle are heated in order to prevent deposition of a solid source material of liquid droplets, the efficiency of injection of liquid droplets into a vacuum vessel is decreased by evaporation of the liquid droplets. The present invention provides a liquid droplet injecting apparatus capable of efficiently injecting liquid droplets into a vacuum vessel. The liquid droplet injecting apparatus includes a liquid container which holds a liquid and whose inside pressure can be adjusted, a liquid droplet generating unit configured to generate liquid droplets from the liquid held in the liquid container, a nozzle which injects the liquid droplets generated in the liquid container, a connecting tube which connects the nozzle and the liquid container, and a first heating unit configured to heat at least one of the connecting tube and the nozzle.

Abstract translation: 在已知的液滴注入装置中，为了防止液滴的固体源材料的沉积而加热管和喷嘴时，通过液滴的蒸发而使液滴注入真空容器的效率降低。 本发明提供一种能够有效地将液滴注入真空容器的液滴注入装置。 液滴喷射装置包括：液体容器，其保持液体并且可以调节其内部压力;液滴产生单元，被配置为从保持在液体容器中的液体产生液滴;喷嘴，喷射在液体容器中产生的液滴; 液体容器，连接喷嘴和液体容器的连接管，以及构造成加热连接管和喷嘴中的至少一个的第一加热单元。

公开(公告)号：US20140106086A1

公开(公告)日：2014-04-17

申请号：US14136329

申请日：2013-12-20

Applicant: JAPAN AVIATION ELECTRONICS INDUSTRY, LIMITED

Inventor： Akinobu SATO ,  Akiko SUZUKI ,  Emmanuel BOURELLE ,  Jiro MATSUO ,  Toshio SEKI

IPC: H01J37/317

CPC classification number: C23F4/00 ,  H01J27/026 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/317 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01L21/3065

Abstract: A scratch or similar surface roughness in a solid surface is reduced by gas cluster ion beam irradiation. A gas-cluster-ion-beam solid surface smoothing method includes an irradiation step in which the solid surface is irradiated with a gas cluster ion beam. The irradiation step includes a process of causing clusters from a plurality of directions to collide with at least an area (spot) irradiated with the gas cluster ion beam in the solid surface. Collision of clusters from a plurality of directions with the spot can be brought about by emitting a divergent gas cluster ion beam which releases clusters in diverging directions with respect to the beam center, for example.

公开(公告)号：US20130180844A1

公开(公告)日：2013-07-18

申请号：US13823499

申请日：2011-10-10

Applicant: Bryan Barnard

Inventor： Bryan Barnard

IPC: H01J37/08

CPC classification number: H01J37/08 ,  H01J27/026 ,  H01J37/05 ,  H01J37/3171 ,  H01J49/142 ,  H01J2237/057 ,  H01J2237/0812 ,  H01J2237/0827

Abstract: A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters for irradiating a surface and an atomic mode setting for producing an ion beam substantially comprising ionised gas atoms for irradiating a surface; and selectively operating the ion gun in the cluster mode by mass selecting ionised gas clusters using a variable mass selector thereby irradiating a surface substantially with ionised gas clusters or the atomic mode by mass selecting ionised gas atoms using a variable mass selector thereby irradiating a surface substantially with ionised gas atoms. Also provided is a switchable ion gun comprising: a gas expansion nozzle for producing gas clusters; an ionisation chamber for ionising the gas clusters and gas atoms; and a variable (preferably a magnetic sector) mass selector for mass selecting the ionised gas clusters and ionised gas atoms to produce an ion beam variable between substantially comprising ionised gas clusters and substantially comprising ionised gas atoms. Preferably, the gun comprises an electrically floating flight tube for adjusting the energy of the ions whilst within the mass selector.

Abstract translation: 提供一种处理一个或多个表面的方法，包括：提供可切换离子枪，其可在用于产生基本上包括用于照射表面的电离气体簇的离子束的簇模式设置和用于产生离子束的原子模式设置之间切换 基本上包括用于照射表面的电离气体原子; 并且通过使用可变质量选择器质量选择电离气体簇来选择性地操作离子枪，从而通过使用可变质量选择器大量选择电离气体原子而基本上用电离气体簇或原子模式照射表面，从而基本上照射表面 具有电离气体原子。 还提供了一种可切换离子枪，包括：用于产生气体团的气体膨胀喷嘴; 用于电离气团和气原子的电离室; 以及用于质量选择电离气体团簇和电离气体原子以产生基本上包含电离气体簇并且基本上包含电离气体原子的离子束可变的变量（优选磁性扇区）质量选择器。 优选地，枪包括电浮动飞行管，用于在质量选择器内调节离子的能量。