公开(公告)号：US07919760B2

公开(公告)日：2011-04-05

申请号：US12331336

申请日：2008-12-09

申请人： Jack Jau ,  Hong Xiao ,  Joe Wang ,  Zhongwei Chen ,  Yi Xiang Wang ,  Edward Tseng

发明人： Jack Jau ,  Hong Xiao ,  Joe Wang ,  Zhongwei Chen ,  Yi Xiang Wang ,  Edward Tseng

IPC分类号： G21K5/10

CPC分类号： H01J37/28 ,  H01J37/20 ,  H01J2237/202 ,  H01J2237/2817 ,  H01L21/67288 ,  H01L21/6831

摘要： The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.

摘要翻译： 本发明涉及用于基板（晶片）边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。 然而，应当认识到，本发明具有更广泛的应用范围。 根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。 检查区域包括顶部近边缘，斜面，顶点和底部斜面。 操作台包括支撑台，z台，X-Y台，静电卡盘，摆台和旋转轨道。 具有静电卡盘的摆台安装具有从0°摆动到180°的能力，同时执行基板顶部斜面，顶部和底部斜面检查或检查。 为了将基板保持在对焦状态，并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移，本发明的一个实施例公开了一种方法，使得摆台的旋转轴线由上部的切线 要检查的基板的边缘。 本发明的静电卡盘的直径小于要检查的基板的直径。 在检查过程中，静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置，该设计确保能够检查斜面上的所有位置和顶点。

公开(公告)号：US20100270468A1

公开(公告)日：2010-10-28

申请号：US12832127

申请日：2010-07-08

申请人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

发明人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

IPC分类号： H01J37/145 ,  H01J37/28

CPC分类号： H01J37/145 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/24485 ,  H01J2237/2807

摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

摘要翻译： 带电粒子束的系统和方法。 根据实施例，本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

公开(公告)号：US20080121810A1

公开(公告)日：2008-05-29

申请号：US11923012

申请日：2007-10-24

申请人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

发明人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

IPC分类号： H01J1/50

CPC分类号： H01J37/145 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/24485 ,  H01J2237/2807

摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

摘要翻译： 带电粒子束的系统和方法。 根据实施例，本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

公开(公告)号：US20100140498A1

公开(公告)日：2010-06-10

申请号：US12331336

申请日：2008-12-09

申请人： JACK JAU ,  HONG XIAO ,  JOE WANG ,  ZHONGWEI CHEN ,  YI XIANG WANG ,  EDWARD TSENG

发明人： JACK JAU ,  HONG XIAO ,  JOE WANG ,  ZHONGWEI CHEN ,  YI XIANG WANG ,  EDWARD TSENG

IPC分类号： G21K5/10

CPC分类号： H01J37/28 ,  H01J37/20 ,  H01J2237/202 ,  H01J2237/2817 ,  H01L21/67288 ,  H01L21/6831

摘要： The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.

摘要翻译： 本发明涉及用于基板（晶片）边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。 然而，应当认识到，本发明具有更广泛的应用范围。 根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。 检查区域包括顶部近边缘，斜面，顶点和底部斜面。 操作台包括支撑台，z台，X-Y台，静电卡盘，摆台和旋转轨道。 具有静电卡盘的摆台安装具有从0°摆动到180°的能力，同时执行基板顶部斜面，顶部和底部斜面检查或检查。 为了将基板保持在对焦状态，并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移，本发明的一个实施例公开了一种方法，使得摆台的旋转轴线由上部的切线 要检查的基板的边缘。 本发明的静电卡盘的直径小于要检查的基板的直径。 在检查过程中，静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置，该设计确保能够检查斜面上的所有位置和顶点。

公开(公告)号：US08164060B2

公开(公告)日：2012-04-24

申请号：US12832127

申请日：2010-07-08

申请人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

发明人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

IPC分类号： H01J37/244 ,  H01J37/145

CPC分类号： H01J37/145 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/24485 ,  H01J2237/2807

摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

摘要翻译： 带电粒子束的系统和方法。 根据实施例，本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

公开(公告)号：US07825386B2

公开(公告)日：2010-11-02

申请号：US11923012

申请日：2007-10-24

申请人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

发明人： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

IPC分类号： H01J37/244

CPC分类号： H01J37/145 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/24485 ,  H01J2237/2807

摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

摘要翻译： 带电粒子束的系统和方法。 根据实施例，本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。