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32 条记录 (耗时 0.013 秒)

    Phase detector
    1.
    发明授权
    Phase detector 有权
    相位检测器

    公开(公告)号：US08698070B2

    公开(公告)日：2014-04-15

    申请号：US13271811

    申请日：2011-10-12

    申请人： Yi-Xiang Wang ,  Jian Zhang

    发明人： Yi-Xiang Wang ,  Jian Zhang

    IPC分类号： G01D5/34

    CPC分类号： G01J9/00

    摘要： This invention provides a phase detector with more than two detector units on a printed circuit layer. A detector set includes a pair of detector units or one detector unit, and a detector row includes a plurality of detector sets in one line. The phase detector includes a plurality of detector rows and each row has a detector set in one period, wherein all detector units are interleaved to have the same interval between any two adjacent detector units, which is defined as a pitch and the pitch is equal to one period dividing the detector pair number, which is the half sum of the number of one detector set for all rows.

    摘要翻译： 本发明提供一种在印刷电路层上具有多于两个检测器单元的相位检测器。 检测器组包括一对检测器单元或一个检测器单元，检测器行包括一行中的多个检测器组。 相位检测器包括多个检测器行，并且每行具有在一个周期中设置的检测器，其中所有检测器单元被交错以在任何两个相邻检测器单元之间具有相同的间隔，其被定义为间距，并且间距等于 一个分隔检测器对数的周期，它是所有行的一个检测器的数量的一半。

    PHASE DETECTOR
    2.
    发明申请
    PHASE DETECTOR 有权
    相位检测器

    公开(公告)号：US20130094017A1

    公开(公告)日：2013-04-18

    申请号：US13271811

    申请日：2011-10-12

    申请人： Yi-Xiang WANG ,  Jian Zhang

    发明人： Yi-Xiang WANG ,  Jian Zhang

    IPC分类号： G01J1/00

    CPC分类号： G01J9/00

    摘要： This invention provides a phase detector with more than two detector units on a printed circuit layer. A detector set includes a pair of detector units or one detector unit, and a detector row includes a plurality of detector sets in one line. The phase detector includes a plurality of detector rows and each row has a detector set in one period, wherein all detector units are interleaved to have the same interval between any two adjacent detector units, which is defined as a pitch and the pitch is equal to one period dividing the detector pair number, which is the half sum of the number of one detector set for all rows.

    摘要翻译： 本发明提供一种在印刷电路层上具有多于两个检测器单元的相位检测器。 检测器组包括一对检测器单元或一个检测器单元，检测器行包括一行中的多个检测器组。 相位检测器包括多个检测器行，并且每行具有在一个周期中设置的检测器，其中所有检测器单元被交错以在任何两个相邻检测器单元之间具有相同的间隔，其被定义为间距，并且间距等于 一个分隔检测器对数的周期，它是所有行的一个检测器的数量的一半。

    CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND REVIEW
    3.
    发明申请
    CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND REVIEW 有权
    充电颗粒系统用于反渗透/缺陷检测和检查

    公开(公告)号：US20120280125A1

    公开(公告)日：2012-11-08

    申请号：US13463208

    申请日：2012-05-03

    申请人： CHIYAN KUAN ,  YI-XIANG WANG ,  CHUNG-SHIH PAN ,  ZHONGHUA DONG ,  ZHONGWEI CHEN

    发明人： CHIYAN KUAN ,  YI-XIANG WANG ,  CHUNG-SHIH PAN ,  ZHONGHUA DONG ,  ZHONGWEI CHEN

    IPC分类号： G01N23/225 ,  G21K5/10

    CPC分类号： G01N23/2251 ,  G01N2223/307 ,  G01N2223/611

    摘要： The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system.

    摘要翻译： 本发明涉及一种用于掩模版或半导体晶片缺陷检查和审查的带电粒子系统，更具体地涉及一种用于掩模版或半导体晶片缺陷检查和检查的电子束检查工具，而不引力AMC沉降。 带电粒子系统是一个向上的电子束检查系统。 面朝下设计可以防止AMC在检查期间在试样的被检查面上引力沉降，之后与常规的面朝上检查系统相比具有更清洁的结果。

    System and method for removing charges with enhanced efficiency
    6.
    发明申请
    System and method for removing charges with enhanced efficiency 有权
    以提高效率消除电荷的系统和方法

    公开(公告)号：US20050201038A1

    公开(公告)日：2005-09-15

    申请号：US11035048

    申请日：2005-01-12

    申请人： Yi Xiang Wang ,  Guofan Ye

    发明人： Yi Xiang Wang ,  Guofan Ye

    IPC分类号： H02H1/00

    CPC分类号： H01L21/3105 ,  H01L21/67115

    摘要： Method and apparatus for removing and neutralizing charges. The method includes loading a structure into a chamber. The structure includes a first surface and a plurality of charges away from the first surface. Additionally, the method includes supplying a first ionized gas to the first surface of the structure, and radiating the structure with a first ultraviolate light. The supplying a first ionized gas and the radiating the structure with a first ultraviolate light are performed simultaneously for a first period of time.

    摘要翻译： 去除和中和电荷的方法和装置。 该方法包括将结构加载到腔室中。 该结构包括远离第一表面的第一表面和多个电荷。 另外，该方法包括向结构的第一表面提供第一电离气体，并且用第一紫外线照射该结构。 在第一时间段内同时进行第一离子化气体的供给和第一紫外线照射结构。

    PARTICLE DETECTION SYSTEM
    7.
    发明申请
    PARTICLE DETECTION SYSTEM 有权
    颗粒检测系统

    公开(公告)号：US20120145898A1

    公开(公告)日：2012-06-14

    申请号：US12968229

    申请日：2010-12-14

    申请人： YI-XIANG WANG ,  JOE WANG ,  WEIMING REN

    发明人： YI-XIANG WANG ,  JOE WANG ,  WEIMING REN

    IPC分类号： G21K7/00 ,  H01J3/14

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24435 ,  H01J2237/2444 ,  H01J2237/2449

    摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

    摘要翻译： 本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。 通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。 配置聚光透镜以增加检测器的带宽，可以提高扫描速度。

    E-BEAM DEFECT REVIEW SYSTEM
    9.
    发明申请
    E-BEAM DEFECT REVIEW SYSTEM 有权
    电子束缺陷评估系统

    公开(公告)号：US20100150429A1

    公开(公告)日：2010-06-17

    申请号：US12335458

    申请日：2008-12-15

    申请人： Jack JAU ,  Zhongwei CHEN ,  Yi Xiang WANG ,  Chung-Shih PAN ,  Joe WANG ,  Xuedong LIU ,  Weiming REN ,  Wei FANG

    发明人： Jack JAU ,  Zhongwei CHEN ,  Yi Xiang WANG ,  Chung-Shih PAN ,  Joe WANG ,  Xuedong LIU ,  Weiming REN ,  Wei FANG

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G01N23/04 ,  G01N2223/102 ,  G01N2223/426 ,  G01N2223/611 ,  G06T2207/10061 ,  G06T2207/30148

    摘要： The present invention relates to a defect review system, and/or particularly, to an apparatus and method of defect review sampling, review method and classification on a semiconductor wafer or a pattern lithography reticle during integrated circuit fabrication. These objects are achieved in comparing a reviewed image with a reference image pick-up through a smart sampling filter. A clustering computer system base on high speed network will provide data cache and save operation time and memory. A smart review sampling filter automatically relocate abnormal pattern or defects and classify the device location extracted from design database and/or from golden die image on the same substrate. The column of the present defect review system is comprised of the modified SORIL type objective lens. This column provides solution of improving throughput during sample review, material identification better image quality, and topography image of defect. One embodiment of the present invent adopts an optical auto focusing system to compromise micro height variation due wafer surface topography. And another embodiment adopts surface charge control system to regulate the charge accumulation due to electron irradiation during the review process.

    摘要翻译： 本发明涉及一种缺陷评估系统，和/或特别涉及在集成电路制造期间对半导体晶片或图案光刻掩模版进行缺陷评估抽样，评估方法和分类的装置和方法。 通过智能采样滤波器将经检查的图像与参考图像拾取进行比较，实现了这些目的。 基于高速网络的集群计算机系统将提供数据缓存，节省操作时间和内存。 智能检查采样过滤器自动重新定位异常模式或缺陷，并将从设计数据库中提取的设备位置和/或从相同基板上的金色模具图像分类。 本缺陷检查系统的列由改进的SORIL型物镜组成。 该栏提供了在样本审查期间提高吞吐量，材料识别更好的图像质量和缺陷的地形图像的解决方案。 本发明的一个实施例采用光学自动聚焦系统来破坏由晶片表面形貌引起的微高度变化。 另一个实施例采用表面电荷控制系统来调节在检查过程中由电子辐射引起的电荷累积。

    OPTICAL AUTO FOCUSING SYSTEM AND METHOD FOR ELECTRON BEAM INSPECTION TOOL
    10.
    发明申请
    OPTICAL AUTO FOCUSING SYSTEM AND METHOD FOR ELECTRON BEAM INSPECTION TOOL 有权
    光电自动聚焦系统和电子束检测工具的方法

    公开(公告)号：US20080302974A1

    公开(公告)日：2008-12-11

    申请号：US11759138

    申请日：2007-06-06

    申请人： Yi Xiang Wang ,  Van-Duc Nguyen ,  Jian Zhang

    发明人： Yi Xiang Wang ,  Van-Duc Nguyen ,  Jian Zhang

    IPC分类号： G21K5/10 ,  G01B11/00

    CPC分类号： G03B13/36 ,  G02B7/32 ,  G06T7/001 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2817

    摘要： A method and system for inspecting a semiconductor wafer. The method includes providing an illumination flux through a pattern plate and a lens to a surface of a specimen to project a pattern onto the surface of the specimen. The pattern is associated with the pattern plate. Additionally, the method includes detecting the illumination flux reflected from the surface of the specimen with a detector, processing information associated with the detected illumination flux, and generating a first image based on at least information associated with the detected illumination flux. The first image includes a first image part for the pattern and a second image part for the specimen. Moreover, the method includes adjusting the lens to a state in order to achieve a first predetermined quality for the first image part, and moving the specimen to a first position.

    摘要翻译： 一种用于检查半导体晶片的方法和系统。 该方法包括将图案板和透镜的照射通量提供到样品的表面以将图案投影到样品的表面上。 图案与图案板相关联。 此外，该方法包括利用检测器检测从样本表面反射的照射通量，处理与检测到的照射通量相关联的信息，以及至少基于与检测到的照射通量相关联的信息产生第一图像。 第一图像包括用于图案的第一图像部分和用于样本的第二图像部分。 此外，该方法包括将透镜调整到状态以便实现第一图像部分的第一预定质量，并将样本移动到第一位置。