公开(公告)号：US20170175255A1

公开(公告)日：2017-06-22

申请号：US15118416

申请日：2015-02-13

Applicant: EVATEC ADVANCED TECHNOLOGIES AG

Inventor： Oliver RATTUNDE ,  Hans HIRSCHER

IPC: C23C14/54 ,  C23C14/34 ,  C23C14/04 ,  H01J37/34 ,  H01J37/20

CPC classification number: C23C14/542 ,  C23C14/046 ,  C23C14/34 ,  C23C14/3492 ,  H01J37/20 ,  H01J37/347

Abstract: A film is sputter-deposited on an essentially plane, extended surface of a substrate which has recesses therein, namely at least one of grooves, of holes, of bores, of vias, of trenches. So as to establish on one hand a homogeneous thickness distribution of the film along the addressed surface of the substrate and, on the other hand, a thick film deposition within the recesses, sputter deposition is performed first at a large distance between a sputter surface of a target and the addressed surface of the substrate and then at a reduced distance between the addressed surfaces.

公开(公告)号：US20160169536A1

公开(公告)日：2016-06-16

申请号：US14908206

申请日：2014-07-29

Applicant: EVATEC ADVANCED TECHNOLOGIES AG

Inventor： Juergen Weichart ,  Rolf Bazlen

IPC: F24C15/24 ,  H01L21/67

CPC classification number: F24C15/24 ,  H01L21/67115

Abstract: An electrical radiation heater arrangement for a vacuum enclosure includes at least two sets of linear heating sources, arranged in a corresponding number of concentric heating zones. The heating sources are arranged directly on the vacuum side of the vacuum enclosure and electrically connected to current rails arranged on the vacuum side with each of the current rails being connected to one electrical feedthrough from vacuum to ambient. Preferably, the heating sources are arranged in a polygon approaching a circle, essentially radially or a combination of both.

Abstract translation: 用于真空外壳的电辐射加热器装置包括布置在相应数量的同心加热区域中的至少两组线性加热源。 加热源直接设置在真空外壳的真空侧，并电连接到设置在真空侧的电流轨，每个电流轨与真空至环境的一个电馈通连接。 优选地，加热源被布置在接近圆的多边形中，基本上是放射状的或两者的组合。

公开(公告)号：US20160108515A1

公开(公告)日：2016-04-21

申请号：US14892268

申请日：2014-05-23

Applicant: EVATEC ADVANCED TECHNOLOGIES AG

Inventor： MOHAMED ELGHAZZALI ,  Jurgen WEICHART

IPC: C23C14/34 ,  C23C14/02 ,  C23F4/00 ,  C23C14/04 ,  H01J37/34 ,  H01J37/32 ,  C23C14/06 ,  C23C14/58

CPC classification number: C23C14/34 ,  C23C14/022 ,  C23C14/046 ,  C23C14/0623 ,  C23C14/3407 ,  C23C14/5826 ,  C23C14/5873 ,  C23F4/00 ,  H01J37/32431 ,  H01J37/3429 ,  H01J37/3476

Abstract: Vias of at least approx. 1:1 aspect ratio in substrates are filled with material which exhibits a thermally driven amorphous/crystalline phase change. This is performed within a vacuum process chamber. During a first timespan the material is sputter-deposited by DC sputtering from a material target. In a subsequent timespan a void, which may remain in the via as material covered by the addressed sputtering, is opened by etching performed with the help of an inductively coupled plasma generated by an Rf driven electric coil and applying to the substrate with the via an Rf bias.

Abstract translation: 至少大约有通风口 衬底中的1：1长宽比填充有表现出热驱动的非晶/晶相变的材料。 这在真空处理室内进行。 在第一次时间段期间，材料通过DC溅射从材料靶溅射沉积。 在随后的时间段中，可以通过由寻址的溅射覆盖的材料保留在通孔中的空隙通过借助于由Rf驱动的电线圈产生的电感耦合等离子体进行的蚀刻而被打开，并且通过通孔 Rf偏差。

公开(公告)号：US11143416B2

公开(公告)日：2021-10-12

申请号：US14908206

申请日：2014-07-29

Applicant: Evatec Advanced Technologies AG

Inventor： Juergen Weichart ,  Rolf Bazlen

IPC: F24C15/24 ,  H01L21/67

Abstract: An electrical radiation heater arrangement for a vacuum enclosure includes at least two sets of linear heating sources, arranged in a corresponding number of concentric heating zones. The heating sources are arranged directly on the vacuum side of the vacuum enclosure and electrically connected to current rails arranged on the vacuum side with each of the current rails being connected to one electrical feedthrough from vacuum to ambient. Preferably, the heating sources are arranged in a polygon approaching a circle, essentially radially or a combination of both.