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    DEPOSITION METHOD
    1.
    发明申请
    DEPOSITION METHOD 有权
    沉积方法

    公开(公告)号：US20130280414A1

    公开(公告)日：2013-10-24

    申请号：US13993266

    申请日：2010-12-15

    申请人： Eiji Fuchita ,  Eiji Tokizaki ,  Eiichi Ozawa

    发明人： Eiji Fuchita ,  Eiji Tokizaki ,  Eiichi Ozawa

    IPC分类号： B05B7/14

    CPC分类号： B05B7/1404 ,  C23C24/04

    摘要： [Object] To provide a deposition method that enables fine particles having a relatively large particle diameter (at least larger than 0.5 μm diameter) to be more stably deposited on a substrate by using a simple configuration.[Solving Means] In the deposition method, fine particles P whose surface is at least insulative are placed in an airtight container 2, and a carrier gas is introduced into the container, thereby triboelectrically charging the fine particles and generating an aerosol A of the fine particles. The fine particles in question are charged by friction with the inner surface of a transfer tubing 6 connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber 3 which is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate S placed in the deposition chamber.

    摘要翻译： 本发明提供一种能够通过简单的结构将具有较大粒径（至少大于0.5μm直径）的细颗粒更稳定地沉积在基板上的沉积方法。 [解决方案]在沉积方法中，将表面至少是绝缘的细颗粒P放置在气密容器2中，并将载气引入容器中，由此摩擦带电微细颗粒并产生微细气溶胶A 粒子。 所讨论的细颗粒通过与连接到容器的转移管6的内表面的摩擦而被充电，并且气雾剂经由这样的管输送到沉积室3，沉积室3保持在低于气密容器中的压力。 带电的微粒沉积在沉积室中的衬底S上。

    Method for forming a film of lithium metal or lithium alloys and an apparatus for the same
    4.
    发明申请
    Method for forming a film of lithium metal or lithium alloys and an apparatus for the same 审中-公开
    锂金属或锂合金膜的形成方法及其制造方法

    公开(公告)号：US20070048170A1

    公开(公告)日：2007-03-01

    申请号：US11510860

    申请日：2006-08-28

    申请人： Eiji Fuchita ,  Yoshiyuki Honjo ,  Yukio Yamakawa

    发明人： Eiji Fuchita ,  Yoshiyuki Honjo ,  Yukio Yamakawa

    IPC分类号： B22F3/24 ,  C22C33/02

    CPC分类号： B22F9/12 ,  B22F7/08 ,  B22F2998/00 ,  C22B26/12 ,  C23C14/14 ,  C23C14/22 ,  C23C14/228 ,  C23C14/564 ,  B22F2201/20

    摘要： A lithium or lithium alloy film forming method comprises: the step of heating and evaporating lithium or lithium alloy under an atmosphere of inert gas in an ultra fine particle producing chamber to produce ultra fine particles of lithium or lithium alloy therein; the step of transporting the ultra fine particles through a transfer pipe with the inert gas into a film forming chamber under vacuum atmosphere; the step of jetting the ultra fine particles onto a substrate arranged in the film forming chamber from a nozzle; the step of moving a substrate holder holding the substrate in the X-direction and/or Y-direction; the step of preheating the substrate at a predetermined temperature within the range of 100 to the melting point of lithium or lithium alloy: and the step of forming a film of lithium or lithium alloy on the substrate being moved with the substrate holder.

    摘要翻译： 锂或锂合金膜形成方法包括：在超细颗粒产生室中在惰性气体氛围下加热和蒸发锂或锂合金以在其中产生锂或锂合金的超细颗粒的步骤; 在真空气氛下将超细颗粒通过惰性气体输送管输送到成膜室中的步骤; 从喷嘴将超微粒子喷射到配置在成膜室内的基板上的工序; 将保持基板的基板保持件沿X方向和/或Y方向移动的步骤; 在100〜100℃的锂或锂合金的熔点的预定温度下预热基板的步骤;以及在所述基板上形成由所述基板保持器移动的锂或锂合金膜的工序。

    Deposition method
    5.
    发明授权
    Deposition method 有权
    沉积法

    公开(公告)号：US08877297B2

    公开(公告)日：2014-11-04

    申请号：US13993266

    申请日：2010-12-15

    申请人： Eiji Fuchita ,  Eiji Tokizaki ,  Eiichi Ozawa

    发明人： Eiji Fuchita ,  Eiji Tokizaki ,  Eiichi Ozawa

    IPC分类号： B05D1/06 ,  C23C24/04 ,  B05B7/14

    CPC分类号： B05B7/1404 ,  C23C24/04

    摘要： A deposition method is provided to enable fine particles having a relatively large particle diameter, for example, a diameter larger than 0.5 μm, to be stably deposited on a substrate. The fine particles with insulating surface are placed in an airtight container, and a carrier gas is introduced into the container, triboelectrically charging the fine particles and generating an aerosol of the fine particles. The fine particles are charged by friction with the inner surface of a transfer tubing connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber that is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate placed in the deposition chamber.

    摘要翻译： 提供沉积方法以使得具有相对较大粒径（例如，大于0.5μm的直径）的细颗粒能够稳定地沉积在基底上。 将具有绝缘表面的细颗粒放置在密封容器中，并将载气引入容器中，对细颗粒进行摩擦充电并产生细颗粒的气溶胶。 微粒通过与连接到容器的输送管的内表面的摩擦而被加载，并且气雾剂经由这样的管输送到沉积室，该沉积室保持在低于气密容器中的压力。 带电的微粒沉积在沉积室中的基底上。

    Method for forming zirconia film
    6.
    发明授权
    Method for forming zirconia film 有权
    氧化锆膜的形成方法

    公开(公告)号：US08137743B2

    公开(公告)日：2012-03-20

    申请号：US13057514

    申请日：2010-01-21

    申请人： Eiji Fuchita

    发明人： Eiji Fuchita

    IPC分类号： B05D1/12

    CPC分类号： C23C24/04

    摘要： [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method.[Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 μm or more and 11 μm or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.

    摘要翻译： 本发明提供一种能够通过气溶胶气体沉积法获得良好的膜质量的形成氧化锆膜的方法。 [解决方案]通过气溶胶气体沉积法形成氧化锆膜的方法，该方法包括：将平均粒径为0.7μm以上且11μm以下，比表面积为1m 2的氧化锆微粒P / g以上且7m 2 / g以下的密闭容器2; 通过将气体引入密闭容器2中产生氧化锆微粒P的气溶胶A; 将气溶胶A通过连接到密闭容器2的输送管6输送到保持在比封闭容器2的压力低的压力下的沉积室3; 并将氧化锆微粒P沉积在沉积室3中的基板S上。可以通过满足上述条件的氧化锆细颗粒形成致密且高粘合性的氧化锆薄膜。

    Method for Forming Zirconia Film
    7.
    发明申请
    Method for Forming Zirconia Film 有权
    形成氧化锆薄膜的方法

    公开(公告)号：US20110305828A1

    公开(公告)日：2011-12-15

    申请号：US13057514

    申请日：2010-01-21

    申请人： Eiji Fuchita

    发明人： Eiji Fuchita

    IPC分类号： B05D1/24

    CPC分类号： C23C24/04

    摘要： [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method.[Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 μm or more and 11 μm or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.

    摘要翻译： 本发明提供一种能够通过气溶胶气体沉积法获得良好的膜质量的形成氧化锆膜的方法。 [解决方案]通过气溶胶气体沉积法形成氧化锆膜的方法，该方法包括：将平均粒径为0.7μm以上且11μm以下，比表面积为1m 2的氧化锆微粒P / g以上且7m 2 / g以下的密闭容器2; 通过将气体引入密闭容器2中产生氧化锆微粒P的气溶胶A; 将气溶胶A通过连接到密闭容器2的输送管6输送到保持在比封闭容器2的压力低的压力下的沉积室3; 并将氧化锆微粒P沉积在沉积室3中的基板S上。可以通过满足上述条件的氧化锆细颗粒形成致密且高粘合性的氧化锆薄膜。

    Ultra fine particle gas deposition apparatus
    8.
    发明授权
    Ultra fine particle gas deposition apparatus 失效
    超细颗粒气体沉积装置

    公开(公告)号：US5837316A

    公开(公告)日：1998-11-17

    申请号：US580143

    申请日：1995-12-28

    申请人： Eiji Fuchita

    发明人： Eiji Fuchita

    IPC分类号： C23C14/24 ,  C23C14/02 ,  C23C14/22 ,  B05D3/02 ,  B05D3/08 ,  B05D3/10 ,  C23C16/00

    CPC分类号： C23C14/228 ,  C23C14/025 ,  C23C14/22

    摘要： In a gas deposition apparatus includes: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe directly facing to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing to the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles evaporated from the evaporation source by heating the latter, are transported together with inert gas through the transfer pipe and they are ejected out from the nozzle onto the substrate to form a film or condensation of ultra fine particle thereon, a DC power source is connected to the transfer pipe and the seethe heater is wound on the nozzle.

    摘要翻译： 在气体沉积设备中包括：超细颗粒蒸发室; 设置在超细颗粒蒸发室中的蒸发源; 沉积室; 布置在所述沉积室中的基板; 将超细粒子蒸发室与沉积室连接的输送管; 所述输送管的入口直接面对所述超细颗粒蒸发室中的蒸发源，并且所述输送管的出口在所述沉积室中; 连接到输送管的出口的喷嘴，与沉积室中的基板相对; 以及用于将惰性气体引入超细颗粒蒸发室的引入口，其中通过加热蒸发源从蒸发源蒸发的超细颗粒通过传输管与惰性气体一起输送，并且它们从喷嘴喷射到基板上 为了在其上形成超细颗粒的薄膜或冷凝物，将DC电源连接到传送管，并且将热水器卷绕在喷嘴上。

    Ultra fine particle gas deposition apparatus
    9.
    发明授权
    Ultra fine particle gas deposition apparatus 失效
    超细颗粒气体沉积装置

    公开(公告)号：US5536324A

    公开(公告)日：1996-07-16

    申请号：US351701

    申请日：1994-12-08

    申请人： Eiji Fuchita

    发明人： Eiji Fuchita

    IPC分类号： C23C14/24 ,  C23C14/02 ,  C23C14/22 ,  C23C16/00

    CPC分类号： C23C14/228 ,  C23C14/025 ,  C23C14/22

    摘要： In a gas deposition apparatus including: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe indirect facing relationship to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles are evaporated from the evaporation source by heating the latter. The particles are transported together with inert gas through the transfer pipe and they are ejected out from the nozzle onto the substrate to form a film or condensate of ultra fine particles thereon. In order to heat the transfer pipe, a DC power source is connected to the transfer pipe and a seethe heater is wound on the nozzle.

    摘要翻译： 一种气体沉积设备，包括：超细颗粒蒸发室; 设置在超细颗粒蒸发室中的蒸发源; 沉积室; 布置在所述沉积室中的基板; 将超细粒子蒸发室与沉积室连接的输送管; 所述输送管的入口与所述超细颗粒蒸发室中的蒸发源间接面对，并且所述输送管的出口在所述沉积室中; 连接到输送管的出口的喷嘴，与沉积室中的基板相对; 以及用于将惰性气体引入超细颗粒蒸发室的引入口，其中通过加热蒸发源从蒸发源蒸发超细颗粒。 颗粒通过传输管与惰性气体一起输送，并从喷嘴中喷出到基板上，以形成其上的超细颗粒的膜或冷凝物。 为了加热输送管，将直流电源连接到输送管，并且在该喷嘴上缠绕一个加热器。