Charged-Particle Microscopy Imaging Method
    1.
    发明申请
    Charged-Particle Microscopy Imaging Method 有权
    带电粒子显微镜成像方法

    公开(公告)号:US20130037714A1

    公开(公告)日:2013-02-14

    申请号:US13572206

    申请日:2012-08-10

    IPC分类号: H01J37/26

    摘要: Charged-particle microscopy includes irradiating a sample in N measurement sessions, each having an associated beam parameter (P) value; Detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, where n is an integer in the range 1≦n≦N, and processing the set (S) by: Defining a Point Spread Function (K) having a kernel value Kn for each value of n; Defining a spatial variable (V); Defining an imaging quantity (Q) having for each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; For each value of n, determining a minimum divergence min D(Mn∥Kn*V) between Mn and Qn, solving for V while applying constraints on the values Kn.

    摘要翻译: 带电粒子显微术包括在N个测量会话中照射样品,每个测量会话具有相关的光束参数(P)值; 检测在每个测量会话期间发射的辐射,将被测量(M)与每个测量会话相关联,从而提供数据对{Pn,Mn}的数据集(S),其中n是范围1≦̸ n≦̸ N, 并通过以下方式处理集合(S):定义每个n值具有内核值Kn的点扩展函数(K); 定义空间变量(V); 定义对于n的每个值具有作为Kn和V的三维卷积的值Qn的成像量(Q),使得Qn = Kn * V; 对于n的每个值,确定Mn和Qn之间的最小发散最小值D(Mn∥Kn* V),在对Kn进行约束的同时求解V。

    SEM Imaging Method
    2.
    发明申请
    SEM Imaging Method 有权
    SEM成像方法

    公开(公告)号:US20110266440A1

    公开(公告)日:2011-11-03

    申请号:US13098300

    申请日:2011-04-29

    IPC分类号: G01N23/00 G21K7/00

    摘要: A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1≦i≦N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.

    摘要翻译: 一种使用扫描电子显微镜(SEM)研究样品的方法,包括以下步骤:在多个(N)个测量会话中使用探测电子束照射样品的表面(S),每个测量会话具有相关联的束 参数(P)值,其从这样的值的范围中选择并且在测量会话之间不同; 在每个测量会话期间检测由样本发射的受激辐射,将被测量(M)与其相关联并注意每个测量会话的该被测量的值,从而允许编辑数据对(Pi,Mi)的数据集(D) 其中:采用统计盲分离(BSS)技术来自动处理数据集(D),并将其空间解析为成像对(Qk,Lk)的结果集(R),其中 具有值Qk的成像量(Q)与参考表面S的离散深度级Lk相关联。

    Charged particle microscopy imaging method
    3.
    发明授权
    Charged particle microscopy imaging method 有权
    带电粒子显微镜成像方法

    公开(公告)号:US08581189B2

    公开(公告)日:2013-11-12

    申请号:US13572206

    申请日:2012-08-10

    IPC分类号: H01J37/26

    摘要: A charged-particle microscopy includes irradiating a sample in measurement sessions, each having an associated beam parameter (P) value detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, wherein an integer in the range of 1≦n≦N, and processing the set (S) by: defining a Point Spread Function (K) having a kernel value Kn for each value n; defining a spatial variable (V); defining an imaging quantity (Q) having fore each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; for each value of n, determining a minimum divergence min D(Mn∥Kn*V) between Mn and Qn, solving V while applying constraints on the values Kn.

    摘要翻译: 带电粒子显微术包括在测量会话中照射样本,每个测量会话具有检测在每个测量会话期间发射的辐射的相关联的波束参数(P)值,将被测量(M)与每个测量会话相关联,从而提供数据集(S) 数据对{Pn,Mn},其中1 @ n @ N范围内的整数,并且通过以下方式来处理集合(S):定义每个值n具有内核值Kn的点扩展函数(K) 定义空间变量(V); 定义在每个值n之前具有作为Kn和V的三维卷积的值Qn的成像量(Q),使得Qn = Kn * V; 对于n的每个值,确定Mn和Qn之间的最小发散最小值D(Mn∥Kn* V),同时对值Kn施加约束来求解V。

    SEM imaging method
    4.
    发明授权
    SEM imaging method 有权
    SEM成像方法

    公开(公告)号:US08232523B2

    公开(公告)日:2012-07-31

    申请号:US13098300

    申请日:2011-04-29

    IPC分类号: G01N23/00 G21K7/00

    摘要: A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1≦i≦N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.

    摘要翻译: 使用扫描电子显微镜(SEM)研究样品的方法,包括以下步骤:在多个(N)个测量会话中使用探测电子束照射样品的表面(S),每个测量会话具有相关联的束 参数(P)值,其从这样的值的范围中选择并且在测量会话之间不同; 在每个测量会话期间检测由样本发射的受激辐射,将被测量(M)与其相关联并注意每个测量会话的该被测量的值,从而允许编辑数据对(Pi,Mi)的数据集(D) 其中:采用统计盲分离(BSS)技术来自动处理数据集(D),并将其空间解析为成像对(Qk,Lk)的结果集(R),其中 具有值Qk的成像量(Q)与参考表面S的离散深度级Lk相关联。

    Method and device for the generation of a plasma through electric discharge in a discharge space
    7.
    发明授权
    Method and device for the generation of a plasma through electric discharge in a discharge space 有权
    用于通过放电空间中的放电产生等离子体的方法和装置

    公开(公告)号:US07518300B2

    公开(公告)日:2009-04-14

    申请号:US10548243

    申请日:2004-03-05

    IPC分类号: H01J17/26

    CPC分类号: H05G2/003 H05G2/005 H05H1/48

    摘要: The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).

    摘要翻译: 本发明涉及一种用于在放电空间中通过放电产生等离子体的方法和装置,其包含至少两个电极,其中至少一个电极由基质材料或载体材料构成,使得易受侵蚀 至少由电流形成具有蒸发点的区域。 为了呈现通过放电产生等离子体的方法或装置,建议至少在蒸发点处提供牺牲衬底(38),在放电操作期间所述牺牲衬套(38)的沸点位于 低于载体材料(30)的熔点,使得在电流中产生的电荷载体主要从牺牲衬底(38)产生。