公开(公告)号：US20100259735A1

公开(公告)日：2010-10-14

申请号：US12756754

申请日：2010-04-08

申请人： Erik Henricus Egidius Catharina Eummelen ,  Koen Steffens ,  Takeshi Kaneko ,  Gregory Martin Mason Corcoran

发明人： Erik Henricus Egidius Catharina Eummelen ,  Koen Steffens ,  Takeshi Kaneko ,  Gregory Martin Mason Corcoran

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.

摘要翻译： 一种用于浸没式光刻设备的流体处理系统，其具有用于从浸没空间中去除浸没液体的流体去除装置和用于去除浸液的液滴的液滴去除装置，其中：所述液滴去除装置位于远离光轴 并且液滴去除装置包括面向例如被暴露的基板和/或基板台的多孔构件。

公开(公告)号：US08786830B2

公开(公告)日：2014-07-22

申请号：US12761038

申请日：2010-04-15

申请人： Christophe De Metsenaere ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

发明人： Christophe De Metsenaere ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

摘要： An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

摘要翻译： 浸没式光刻设备具有压力传感器，该压力传感器被配置为测量浸没液体在基板和投影系统之间的空间中的压力。 控制系统响应于由压力传感器产生的压力信号，并且控制定位器在衬底台上施加力以补偿由浸没液体施加在衬底台上的力。

公开(公告)号：US20130050665A1

公开(公告)日：2013-02-28

申请号：US13592068

申请日：2012-08-22

申请人： Ivo Adam Johannes Thomas ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter

发明人： Ivo Adam Johannes Thomas ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

摘要翻译： 公开了流体处理结构，光刻设备和器件制造方法。 根据所公开的实施例，流体处理结构被配置为在面向表面相对于结构的运动期间将浸没流体限制在投影系统的最终元件和面对表面之间的空间中，其中该结构具有至少一个 加热器以加热与加热器相邻的面对表面的一部分，所述至少一个加热器具有流体加热器以加热流体从结构到相对表面的流动，从而加热该部分。

公开(公告)号：US20100290013A1

公开(公告)日：2010-11-18

申请号：US12761038

申请日：2010-04-15

申请人： Christophe DE METSENAERE ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

发明人： Christophe DE METSENAERE ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

摘要： An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

摘要翻译： 浸没式光刻设备具有压力传感器，该压力传感器被配置为测量浸没液体在基板和投影系统之间的空间中的压力。 控制系统响应于由压力传感器产生的压力信号，并且控制定位器在衬底台上施加力以补偿由浸没液体施加在衬底台上的力。

公开(公告)号：US09904177B2

公开(公告)日：2018-02-27

申请号：US13592068

申请日：2012-08-22

申请人： Ivo Adam Johannes Thomas ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter

发明人： Ivo Adam Johannes Thomas ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

公开(公告)号：US09897928B2

公开(公告)日：2018-02-20

申请号：US13586728

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70341

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US09298107B2

公开(公告)日：2016-03-29

申请号：US13183220

申请日：2011-07-14

申请人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

发明人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC分类号： G03F7/20

CPC分类号： G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。

公开(公告)号：US09274436B2

公开(公告)日：2016-03-01

申请号：US13693923

申请日：2012-12-04

申请人： Theodorus Wilhelmus Polet ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

发明人： Theodorus Wilhelmus Polet ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

摘要翻译： 一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面 基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。

公开(公告)号：US08416388B2

公开(公告)日：2013-04-09

申请号：US12756754

申请日：2010-04-08

申请人： Erik Henricus Egidius Catharina Eummelen ,  Koen Steffens ,  Takeshi Kaneko ,  Gregory Martin Mason Corcoran

发明人： Erik Henricus Egidius Catharina Eummelen ,  Koen Steffens ,  Takeshi Kaneko ,  Gregory Martin Mason Corcoran

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.

摘要翻译： 一种用于浸没式光刻设备的流体处理系统，其具有用于从浸没空间去除浸没液体的流体去除装置，以及用于去除浸液的液滴的液滴去除装置，其中：所述液滴去除装置位于远离光轴 并且液滴去除装置包括面向例如被暴露的基板和/或基板台的多孔构件。

公开(公告)号：US20130045447A1

公开(公告)日：2013-02-21

申请号：US13586728

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： B23Q3/00 ,  G03F7/20 ,  H05B3/68

CPC分类号： G03F7/70875 ,  G03F7/70341

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

摘要翻译： 支撑台，其被配置为支撑基板，所述支撑台具有支撑部分以支撑基板和调节系统以向所述支撑部分提供热能和/或从所述支撑部分移除热能，其中所述调节系统包括多个调节单元 这是独立可控的。