公开(公告)号：US20130149649A1

公开(公告)日：2013-06-13

申请号：US13693923

申请日：2012-12-04

申请人： Theodorus Wilhelmus POLET ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

发明人： Theodorus Wilhelmus POLET ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

摘要翻译： 一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面 基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。

公开(公告)号：US09274436B2

公开(公告)日：2016-03-01

申请号：US13693923

申请日：2012-12-04

申请人： Theodorus Wilhelmus Polet ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

发明人： Theodorus Wilhelmus Polet ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

摘要翻译： 一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面 基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。

公开(公告)号：US08786830B2

公开(公告)日：2014-07-22

申请号：US12761038

申请日：2010-04-15

申请人： Christophe De Metsenaere ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

发明人： Christophe De Metsenaere ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

摘要： An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

摘要翻译： 浸没式光刻设备具有压力传感器，该压力传感器被配置为测量浸没液体在基板和投影系统之间的空间中的压力。 控制系统响应于由压力传感器产生的压力信号，并且控制定位器在衬底台上施加力以补偿由浸没液体施加在衬底台上的力。

公开(公告)号：US20100290013A1

公开(公告)日：2010-11-18

申请号：US12761038

申请日：2010-04-15

申请人： Christophe DE METSENAERE ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

发明人： Christophe DE METSENAERE ,  Ronald Casper Kunst ,  Paul Petrus Joannes Berkvens ,  Mauritius Gerardus Elisabeth Schneiders ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

摘要： An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

摘要翻译： 浸没式光刻设备具有压力传感器，该压力传感器被配置为测量浸没液体在基板和投影系统之间的空间中的压力。 控制系统响应于由压力传感器产生的压力信号，并且控制定位器在衬底台上施加力以补偿由浸没液体施加在衬底台上的力。

公开(公告)号：US08823918B2

公开(公告)日：2014-09-02

申请号：US12428237

申请日：2009-04-22

申请人： Robert Douglas Watso ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Anthonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

发明人： Robert Douglas Watso ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Anthonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

摘要翻译： 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。

公开(公告)号：US20090284715A1

公开(公告)日：2009-11-19

申请号：US12428237

申请日：2009-04-22

申请人： Robert Douglas Watso ,  Youri Johannes Laurentius Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Anthonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

发明人： Robert Douglas Watso ,  Youri Johannes Laurentius Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Anthonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

摘要翻译： 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体发泡。 还公开了热隔离岛的使用以及其最佳位置。

公开(公告)号：US08836915B2

公开(公告)日：2014-09-16

申请号：US13403798

申请日：2012-02-23

申请人： Pieter Mulder ,  Jan Willem Cromwijk ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Marjan Leonardus Catharina Hoofman ,  Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks

发明人： Pieter Mulder ,  Jan Willem Cromwijk ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Marjan Leonardus Catharina Hoofman ,  Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

摘要翻译： 公开了一种浸没式光刻设备，其具有被配置为将图案化的辐射束引导到衬底上的投影系统，以及液体处理系统，其配置成将浸没液体供应并限制在所述投影系统和衬底或衬底台之间限定的空间中， 或两者。 提供控制器，用于在衬底和/或衬底台相对于液体处理系统的运动期间相对于衬底的顶表面调整液体处理系统的下表面的角度，取决于衬底的位置和/ 或衬底台相对于液体处理系统和/或衬底和/或衬底台和液体处理系统之间的相对运动的方向。

公开(公告)号：US08654309B2

公开(公告)日：2014-02-18

申请号：US12634242

申请日：2009-12-09

申请人： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

发明人： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03B27/42 ,  G03B27/32 ,  G03F7/20 ,  F01N1/02

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US20100149501A1

公开(公告)日：2010-06-17

申请号：US12634242

申请日：2009-12-09

申请人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

发明人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03B27/52 ,  B01D69/14 ,  B01D61/36

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US08836912B2

公开(公告)日：2014-09-16

申请号：US13273879

申请日：2011-10-14

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。