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11 条记录 (耗时 0.015 秒)

    Arrangement for the Illumination of a Substrate with a Plurality of Individually Shaped Particle Beams for High-Resolution Lithography of Structure Patterns
    1.
    发明申请
    Arrangement for the Illumination of a Substrate with a Plurality of Individually Shaped Particle Beams for High-Resolution Lithography of Structure Patterns 有权

    公开(公告)号：US20100148087A1

    公开(公告)日：2010-06-17

    申请号：US12635140

    申请日：2009-12-10

    申请人： Hans-Joachim Doering ,  Thomas Elster ,  Joachim Heinitz ,  Matthias Slodowski

    发明人： Hans-Joachim Doering ,  Thomas Elster ,  Joachim Heinitz ,  Matthias Slodowski

    IPC分类号： G21K5/10

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/045 ,  H01J2237/0492

    摘要： The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate (91) with a plurality of individually shaped, controllable particle beamlets (118) which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility. According to the invention, this object is met in that a first aperture diaphragm array and a second aperture diaphragm array are constructed as multiple-format diaphragm arrays (41, 42) for generating particle beamlets (118) with different beam cross sections, and at least three multibeam deflector arrays (51, 52, 53) for individual deflection of the particle beamlets (118) are associated with the first multiple-format diaphragm array (41) and with the second multiple-format diaphragm array (42), wherein at least one multibeam deflector array (51) is arranged between the first multiple-format diaphragm array (41) and the second multiple-format diaphragm array (42) in order to generate different cross sections of the particle beamlets (118), at least a second multibeam deflector array (52) is arranged in the vicinity of the second multiple-format diaphragm array (42) in order to blank or deflect individual particle beamlets (118) into individual crossovers, and at least a third multibeam deflector array (53) is arranged downstream of the second multiple-format diaphragm array (42) at a distance of 10-20% of the distance to the next crossover (112) in order to generate different positions of the particle beamlets (118) on the substrate (91).

    Method for the in-situ extraction of gas from coal seams
    2.
    发明授权
    Method for the in-situ extraction of gas from coal seams 失效
    从煤层原位提取气体的方法

    公开(公告)号：US06571874B1

    公开(公告)日：2003-06-03

    申请号：US09786488

    申请日：2001-05-30

    申请人： Armin Lovenich ,  Hans-Joachim Doering

    发明人： Armin Lovenich ,  Hans-Joachim Doering

    IPC分类号： E21B4700

    CPC分类号： E21B43/006

    摘要： A method for the in-situ extraction of gas from coal seams is provided. Flow paths are produced in gas-containing coal by opening up the structure of the coal by introducing into a bore hole that is sunk into the coal at least one gas and/or liquid under pressure over a prolonged period of time at a pressure that is less than the lowest principal stress determined in a respective seam layer from which gas is to be extracted. The introduction into the bore hole is carried out with a cyclically fluctuating pressure. Gas is subsequently extracted via the bore hole.

    摘要翻译： 提供了一种从煤层原位提取气体的方法。 在含气煤的煤气中产生流动通道，通过将煤的结构引入一个钻孔中，该钻孔在压力下在压力下在压力下沉入至少一种气体和/或液体的孔中，压力为 小于要从其中提取气体的相应接缝层中确定的最低主应力。 钻孔的引入是以周期性波动的压力进行的。 随后通过钻孔提取气体。

    Electrostatic deflection system for corpuscular radiation
    5.
    发明授权
    Electrostatic deflection system for corpuscular radiation 失效
    静电偏转系统用于红外辐射

    公开(公告)号：US07491946B2

    公开(公告)日：2009-02-17

    申请号：US11346666

    申请日：2006-02-03

    申请人： Stefan Risse ,  Thomas Peschel ,  Christoph Damm ,  Andreas Gebhardt ,  Mathias Rohde ,  Christoph Schenk ,  Thomas Elster ,  Hans-Joachim Doering ,  Gerhard Schubert

    发明人： Stefan Risse ,  Thomas Peschel ,  Christoph Damm ,  Andreas Gebhardt ,  Mathias Rohde ,  Christoph Schenk ,  Thomas Elster ,  Hans-Joachim Doering ,  Gerhard Schubert

    IPC分类号： H01J37/147

    CPC分类号： G21K1/087

    摘要： The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

    摘要翻译： 本发明涉及用于微粒束的静电偏转系统，其可以特别用于光刻设备或测量设备中的微结构和纳米结构应用中。 根据本发明的提出的目的，这种偏转系统的各个电极应该永久地保持和保持相对于彼此的精确的轴向对称布置。 在根据本发明的静电偏转系统中，棒状电极被保持在向内空心载体中的轴向对称布置，通过该载体可以引导红细胞束。 载体由彼此连接的至少两个，最多四个载体构件形成。

    Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate
    9.
    发明授权
    Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate 有权
    用于粒子束的多光束调制器以及多光束调制器用于衬底无掩模构造的用途

    公开(公告)号：US07741620B2

    公开(公告)日：2010-06-22

    申请号：US11666957

    申请日：2005-10-25

    申请人： Hans-Joachim Doering ,  Joachim Heinitz

    发明人： Hans-Joachim Doering ,  Joachim Heinitz

    IPC分类号： G21K1/02

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0437 ,  H01J2237/31774

    摘要： The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over its surface. The multibeam modulator comprises a plurality of aperture groups composed of aperture row groups. The totality of all aperture rows defines a matrix of m×n cells, where m cells form a row, and k openings are formed in each row. The density of openings within a row is inhomogeneously distributed.

    摘要翻译： 本发明公开了一种从粒子束产生多个单独波束的多波束调制器。 粒子束至少部分地在其表面上照射多光束调制器。 多波束调制器包括由孔径行组组成的多个孔径组。 所有孔径行的总和定义了m×n个单元的矩阵，其中m个单元格形成一行，并且在每一行中形成k个开口。 一行内的开口密度不均匀分布。

    Multi-Beam Modulator For a Particle Beam and Use of the Multi-Beam Modulator for the Maskless Structuring of a Substrate
    10.
    发明申请
    Multi-Beam Modulator For a Particle Beam and Use of the Multi-Beam Modulator for the Maskless Structuring of a Substrate 有权
    用于粒子束的多光束调制器和多光束调制器用于基板无掩模结构的应用

    公开(公告)号：US20080128638A1

    公开(公告)日：2008-06-05

    申请号：US11666957

    申请日：2005-10-25

    申请人： Hans-Joachim Doering ,  Joachim Heinitz

    发明人： Hans-Joachim Doering ,  Joachim Heinitz

    IPC分类号： G21K1/02 ,  G21K5/04

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0437 ,  H01J2237/31774

    摘要： The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over its surface. The multibeam modulator comprises a plurality of aperture groups composed of aperture row groups. The totality of all aperture rows defines a matrix of m×n cells, where m cells form a row, and k openings are formed in each row. The density of openings within a row is inhomogeneously distributed.

    摘要翻译： 本发明公开了一种从粒子束产生多个单独波束的多波束调制器。 粒子束至少部分地在其表面上照射多光束调制器。 多波束调制器包括由孔径行组组成的多个孔径组。 所有孔径行的总和定义了m×m个单元的矩阵，其中m个单元格形成一行，并且在每一行中形成k个开口。 一行内的开口密度不均匀分布。