利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

24 条记录 (耗时 0.025 秒)

    Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
    1.
    发明授权
    Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound 失效
    包含1,2-醌二叠氮化合物，碱溶性树脂和多酚化合物的辐射敏感性正性抗蚀剂组合物

    公开(公告)号：US5861229A

    公开(公告)日：1999-01-19

    申请号：US948466

    申请日：1992-09-22

    申请人： Haruyoshi Osaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    发明人： Haruyoshi Osaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:X--.alpha.--H (I)wherein x is a group of the formula: ##STR1## and .alpha. is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.

    摘要翻译： 一种正性抗蚀剂组合物，其包含1,2-醌二叠氮化合物和含有下列通式的多酚化合物（I）的碱溶性树脂：X-α-H（I），其中x是下式的基团： 并且α是包含下式的重复单元的二价基团：其中n是不小于1的数目：或 a，b，c，d，e和f相同或不同，数目为0-3，条件是d + f不小于1; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其抗蚀剂组成对辐射敏感，并具有良好的灵敏度，分辨能力和耐热性的平衡。

    Radiation-sensitive positive resist composition
    3.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5456996A

    公开(公告)日：1995-10-10

    申请号：US224563

    申请日：1994-04-07

    申请人： Haruyoshi Ozaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    发明人： Haruyoshi Ozaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0236 ,  G03F7/0226

    摘要： A positive resist composition which comprises, in admixture, a photosensitive 1,2-quinone diazide compound, an alkali-soluble resin to bind ingredients and polyphenol compound to control a dissolution rate in a developer having a molecular weight of not more than 550 and represented by the general formula: ##STR1## wherein a, b, c, d, e, and f are the same or different and a number of 0-3, provided that d+f is not less than 1, and provided that if b, d and f are 1, then at least one of a, c, and e is not 0; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or aryl group, wherein an amount of said 1,2-quinone diazide compound is from 5 to 100% by weight and an amount of said polyphenol compound is from 4 to 40% by weight based on the total weight of said alkali-soluble resin, wherein the resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.

    摘要翻译： 一种正性抗蚀剂组合物，其包含光敏1,2-醌二叠氮化合物，碱溶性树脂以结合成分和多酚化合物以控制分子量不大于550的显影剂中的溶解速率，并表示为 其通式如下：其中a，b，c，d，e和f相同或不同，数为0-3，条件是d + f不小于1，条件是如果b ，d和f为1，则a，c和e中的至少一个不为0; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其中所述1,2-醌二叠氮化合物的量为5〜100重量％，所述多酚化合物的量为4〜40体积％ 基于所述碱溶性树脂的总重量，其中抗蚀剂组合物对辐射敏感，并且具有良好的灵敏度平衡，分辨能力和耐热性。

    Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
    4.
    发明授权
    Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
    包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物

    公开(公告)号：US5736292A

    公开(公告)日：1998-04-07

    申请号：US490511

    申请日：1995-06-14

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

    Radiation-sensitive positive resist composition
    5.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5792585A

    公开(公告)日：1998-08-11

    申请号：US217892

    申请日：1994-03-25

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。