公开(公告)号：US20060292457A1

公开(公告)日：2006-12-28

申请号：US11167560

申请日：2005-06-28

Applicant: Hendricus Johannes Meijer ,  Uwe Mickan ,  Marco Kluse

Inventor： Hendricus Johannes Meijer ,  Uwe Mickan ,  Marco Kluse

IPC: A47G1/12 ,  G03B27/62 ,  B05B5/053 ,  G03F1/14 ,  G21K5/00 ,  G03F1/00

CPC classification number: G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/38 ,  G03F1/40 ,  G03F7/707 ,  G03F7/70708 ,  G21K2201/06

Abstract: A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.

公开(公告)号：US20050286041A1

公开(公告)日：2005-12-29

申请号：US10874690

申请日：2004-06-24

Applicant: Erik Ham ,  Robert Gabriel Lansbergen ,  Ellart Meijer ,  Hendricus Johannes Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Gert-Jan Heerens

Inventor： Erik Ham ,  Robert Gabriel Lansbergen ,  Ellart Meijer ,  Hendricus Johannes Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Gert-Jan Heerens

IPC: G03B27/52 ,  G03B27/62

CPC classification number: G03B27/52 ,  G03F7/70741

Abstract: The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.

Abstract translation: 本发明涉及一种用于输送平版印刷图案形成装置的盒子，该盒子被布置为与光刻设备配合。 输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。 该箱还包括用于封闭开口的封闭部分，以及用于将气体从盒子内部空间排出和/或送入箱体的内部空间的通道系统。 本发明还涉及一种被配置为与传送箱配合的光刻设备。

公开(公告)号：US20070040133A1

公开(公告)日：2007-02-22

申请号：US11371235

申请日：2006-03-09

Applicant: Joeri Lof ,  Joannes De Smit ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Hendricus Johannes Meijer ,  Erik Roelof Loopstra

Inventor： Joeri Lof ,  Joannes De Smit ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Hendricus Johannes Meijer ,  Erik Roelof Loopstra

IPC: G01N21/86 ,  G01V8/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract translation: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。