公开(公告)号：US20050286041A1

公开(公告)日：2005-12-29

申请号：US10874690

申请日：2004-06-24

申请人： Erik Ham ,  Robert Gabriel Lansbergen ,  Ellart Meijer ,  Hendricus Johannes Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Gert-Jan Heerens

发明人： Erik Ham ,  Robert Gabriel Lansbergen ,  Ellart Meijer ,  Hendricus Johannes Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Gert-Jan Heerens

IPC分类号： G03B27/52 ,  G03B27/62

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.

摘要翻译： 本发明涉及一种用于输送平版印刷图案形成装置的盒子，该盒子被布置为与光刻设备配合。 输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。 该箱还包括用于封闭开口的封闭部分，以及用于将气体从盒子内部空间排出和/或送入箱体的内部空间的通道系统。 本发明还涉及一种被配置为与传送箱配合的光刻设备。

公开(公告)号：US20060131682A1

公开(公告)日：2006-06-22

申请号：US11015770

申请日：2004-12-20

申请人： Johannes Hubertus Moors ,  Erik Ham ,  Gert-Jan Heerens ,  Paulus Martinus Liebregts ,  Erik Loopstra ,  Henri Gerard Werij

发明人： Johannes Hubertus Moors ,  Erik Ham ,  Gert-Jan Heerens ,  Paulus Martinus Liebregts ,  Erik Loopstra ,  Henri Gerard Werij

IPC分类号： H01L31/0232

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

公开(公告)号：US20070085984A1

公开(公告)日：2007-04-19

申请号：US11252240

申请日：2005-10-18

申请人： Vadim Banine ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Bastiaan Wolschrijn

发明人： Vadim Banine ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Bastiaan Wolschrijn

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70841 ,  G03F7/70908

摘要： A lithographic projection apparatus includes a radiation system configured to supply a beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system configured to image an irradiated portion of the mask onto a target portion of the substrate, wherein the projection system is separated from the substrate table by an intervening space that is at least partially evacuated and is delimited at the location of the projection system by a solid surface from which the employed radiation is directed toward the substrate table; the intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of the beam of radiation, the tube being configured such that beam of radiation focused by the projection system onto the substrate table does not intercept a wall of the hollow tube; a flushing system is configure to continually flush the inside of the hollow tube with a flow of gas, wherein the gas is hydrogen, the flow of the gas is opposed to the flow of contaminants from the substrate and/or the hollow tube is in fluid communication with the intervening space.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的辐射系统; 设置有用于保持面罩的面罩座的面罩台; 设置有用于保持基板的基板保持器的基板台; 投影系统，被配置为将所述掩模的照射部分成像到所述基板的目标部分上，其中所述投影系统通过至少部分抽真空并且在所述投影系统的位置处界定的中间空间与所述基板台分离 通过使用的辐射从该表面朝向衬底台的固体表面; 中间空间包含位于固体表面和基底台之间的中空管，并且位于辐射束的路径周围，该管被配置成使得由投影系统聚焦到衬底台上的辐射束不会拦截壁 的中空管; 冲洗系统被配置为以气流连续冲洗中空管的内部，其中气体是氢气，气体的流动与来自基底和/或中空管的污染物的流动相对流体 与中间空间的沟通。

公开(公告)号：US20050128459A1

公开(公告)日：2005-06-16

申请号：US10734642

申请日：2003-12-15

申请人： Erwin Zwet ,  Jan Elp ,  Johannes Hubertus Moors ,  Hendrik Neerhof ,  Joost Ottens ,  Adrianus Mathijs De Groof ,  Leo Wilhelmus Kuipers ,  Peter Theodorus Giesen ,  Marco Le Kluse

发明人： Erwin Zwet ,  Jan Elp ,  Johannes Hubertus Moors ,  Hendrik Neerhof ,  Joost Ottens ,  Adrianus Mathijs De Groof ,  Leo Wilhelmus Kuipers ,  Peter Theodorus Giesen ,  Marco Le Kluse

IPC分类号： G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00 ,  G03B27/58

CPC分类号： H01L21/67259 ,  G03F7/707 ,  G03F7/70741 ,  G03F7/7075

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.

摘要翻译： 公开了一种光刻设备。 光刻设备包括用于在要放置在辐射束的光束路径中的平坦物品上提供辐射束的照明系统，以及用于在放置或移除物品期间处理物品的物品处理器。 物品处理器包括电极和电介质层，以形成用于静电夹紧物品的静电夹。

公开(公告)号：US20050134828A1

公开(公告)日：2005-06-23

申请号：US10736778

申请日：2003-12-17

申请人： Joost Ottens ,  Johannes Hubertus Moors ,  Peter Theodorus Giesen

发明人： Joost Ottens ,  Johannes Hubertus Moors ,  Peter Theodorus Giesen

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/62

CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70875

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article support by an electrostatic field during projection, and a recessed backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support. According to one aspect of the invention, the recessed backfill gas feed includes a shielding layer for shielding the backfill gas in the recessed backfill gas feed from the electrostatic field.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，用于将物品夹紧在物品支撑件上的静电夹具 通过在投影期间的静电场，以及设置在物品支撑件中的凹进的回填气体进料，用于当由物品支撑件支撑时将回填气体供给到物品的背面。 根据本发明的一个方面，凹入的回填气体进料包括用于屏蔽来自静电场的凹进的回填气体进料中的回填气体的屏蔽层。

公开(公告)号：US20060289811A1

公开(公告)日：2006-12-28

申请号：US11451601

申请日：2006-06-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Klunder ,  Johannes Hubertus Moors

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Klunder ,  Johannes Hubertus Moors

IPC分类号： G01J3/10

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

公开(公告)号：US20060072084A1

公开(公告)日：2006-04-06

申请号：US10956344

申请日：2004-10-04

申请人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Johannes Hubertus Moors ,  Carolus Ida Spee ,  Derk Jan Klunder

发明人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Johannes Hubertus Moors ,  Carolus Ida Spee ,  Derk Jan Klunder

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的设备的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US20050133727A1

公开(公告)日：2005-06-23

申请号：US10740829

申请日：2003-12-22

申请人： Vadim Banine ,  Levinus Bakker ,  Johannes Hubertus Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Sidelnikov ,  Marcel Mathijs Dierichs ,  Marius Ravensbergen

发明人： Vadim Banine ,  Levinus Bakker ,  Johannes Hubertus Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Sidelnikov ,  Marcel Mathijs Dierichs ,  Marius Ravensbergen

IPC分类号： G03F7/20 ,  H01J3/14

CPC分类号： G03F7/70916 ,  G03F7/7085

摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。