公开(公告)号：US20100190276A1

公开(公告)日：2010-07-29

申请号：US12753214

申请日：2010-04-02

申请人： Mitsuru Nakata ,  Hirofumi Shimamoto ,  Hiroshi Kanoh

发明人： Mitsuru Nakata ,  Hirofumi Shimamoto ,  Hiroshi Kanoh

IPC分类号： H01L21/66

CPC分类号： G01N21/8422 ,  H01L21/02532 ,  H01L21/02675 ,  H01L21/2026 ,  H01L27/1285 ,  H01L27/1296

摘要： A laser irradiation process includes: scanning a substrate with laser having a predetermined lasing frequency at different irradiation intensities to form a plurality of first irradiation areas corresponding to the irradiation intensities; illuminating the first irradiation areas to reflected light receive from the first irradiation areas; determining microcrystallization intensity based on the received reflected light; and determining irradiation intensity based on the thus determined microcrystallization intensity. The laser irradiation process uses the irradiation intensity for irradiating a polycrystalline film in a product semiconductor device.

摘要翻译： 激光照射处理包括：以不同照射强度的具有预定的激光频率的激光扫描基板，以形成与照射强度对应的多个第一照射区域; 将第一照射区域照射到从第一照射区域接收的反射光; 基于所接收的反射光确定微结晶强度; 并根据如此确定的微结晶强度确定照射强度。 激光照射方法使用照射强度来照射产品半导体器件中的多晶膜。

公开(公告)号：US07579222B2

公开(公告)日：2009-08-25

申请号：US11503286

申请日：2006-08-14

申请人： Mitsuru Nakata ,  Kazushige Takechi ,  Hiroshi Kanoh

发明人： Mitsuru Nakata ,  Kazushige Takechi ,  Hiroshi Kanoh

IPC分类号： H01L21/00

CPC分类号： H01L27/1266 ,  H01L21/76256 ,  H01L27/1214 ,  H01L29/66757 ,  H01L2221/6835 ,  H01L2221/68363

摘要： Method of manufacturing a thin film device substrate wherein no trench fabrication is required to be applied onto the substrate surface, and a material which is impervious to light can be used, and the substrate can be peeled off quickly. Firstly, a peeling-off film, a silicon oxide film and an amorphous silicon film are formed in succession on a glass substrate, and the amorphous silicon film is irradiated from above to obtain a polycrystalline silicon film. Subsequently, using the polycrystalline silicon film as an active layer, a TFT is formed, and then a plastic substrate is bonded thereon, and finally the glass substrate is peeled off with the peeling-off film, to complete transfer of the TFT. Because the peeling-off film has a gap space, its etching rate is high. Therefore, it is unnecessary to form a trench for supplying an etchant on the surface of the glass substrate.

摘要翻译： 可以使用不需要在基板表面上施加沟槽加工的​​薄膜器件基板的制造方法，并且可以使用不透光的材料，并且可以快速地剥离基板。 首先，在玻璃基板上依次形成剥离膜，氧化硅膜和非晶硅膜，从上方照射非晶硅膜，得到多晶硅膜。 随后，使用多晶硅膜作为有源层，形成TFT，然后将塑料基板接合在其上，最后用剥离膜剥离玻璃基板，完成TFT的转印。 由于剥离膜具有间隙空间，因此其蚀刻速率高。 因此，不需要在玻璃基板的表面上形成用于供给蚀刻剂的沟槽。

公开(公告)号：US07514303B2

公开(公告)日：2009-04-07

申请号：US11636441

申请日：2006-12-11

申请人： Yuichi Yamaguchi ,  Hironori Kikkawa ,  Hiroshi Kanoh ,  Teruaki Suzuki ,  Hidenori Ikeno

发明人： Yuichi Yamaguchi ,  Hironori Kikkawa ,  Hiroshi Kanoh ,  Teruaki Suzuki ,  Hidenori Ikeno

IPC分类号： H01L21/84

CPC分类号： G02F1/133553 ,  G02F1/133504 ,  G02F1/136286 ,  G02F2001/133357 ,  G02F2201/122 ,  G02F2202/40

摘要： A liquid crystal display device includes (a) a first substrate, (b) a second substrate spaced away from and facing the first substrate, (c) a liquid crystal layer sandwiched between the first and second substrates, (d) a transistor formed on the first substrate, (e) a wiring layer formed on the first substrate and electrically connected to the transistor, (f) a reflection electrode formed on the first substrate, an external incident light being reflected at the reflection electrode towards a viewer, and (g) a compensation layer formed directly on the wiring layer. The reflection electrode does not cover the wiring layer therewith, and the compensation layer has almost the same height as a height of the reflection electrode, the height being measured from a surface of the first substrate.

摘要翻译： 液晶显示装置包括：（a）第一基板，（b）与第一基板间隔开并面对第一基板的第二基板，（c）夹在第一和第二基板之间的液晶层，（d） 所述第一基板，（e）形成在所述第一基板上并电连接到所述晶体管的布线层，（f）形成在所述第一基板上的反射电极，在所述反射电极朝向观察者反射的外部入射光，以及 g）直接形成在布线层上的补偿层。 反射电极不覆盖布线层，并且补偿层具有与反射电极的高度几乎相同的高度，高度是从第一基板的表面测量的。

公开(公告)号：US07212270B2

公开(公告)日：2007-05-01

申请号：US10948614

申请日：2004-09-23

申请人： Ken-Ichi Takatori ,  Masayoshi Suzuki ,  Toshiya Ishii ,  Teruaki Suzuki ,  Hiroshi Kanoh ,  Ken Sumiyoshi ,  Michiaki Sakamoto ,  Mamoru Okamoto ,  Yuji Yamamoto ,  Hiroaki Matsuyama ,  Kiyomi Kawada ,  Seiji Suzuki ,  Yoshihiko Hirai

发明人： Ken-Ichi Takatori ,  Masayoshi Suzuki ,  Toshiya Ishii ,  Teruaki Suzuki ,  Hiroshi Kanoh ,  Ken Sumiyoshi ,  Michiaki Sakamoto ,  Mamoru Okamoto ,  Yuji Yamamoto ,  Hiroaki Matsuyama ,  Kiyomi Kawada ,  Seiji Suzuki ,  Yoshihiko Hirai

IPC分类号： G02F1/1343

CPC分类号： G02F1/133707 ,  G02F1/13394 ,  G02F1/134336 ,  G02F2001/13373 ,  G02F2001/136218 ,  G02F2201/121 ,  G02F2201/122

摘要： A liquid crystal display having a wide viewing angle and easily manufactured. The liquid crystal display comprises an upper substrate and a lower substrate, and a liquid crystal material disposed between the upper substrate and the lower substrate. The liquid crystal display has a conductive protrusion disposed on the surface of the upper substrate opposing to the lower substrate. The conductive protrusion is disposed over a scanning electrode line or a signal electrode line and has the same potential as that of the upper electrode. As another structure, each of pixel electrodes on the lower substrate has a smaller area than that of a common electrode on the upper substrate and is covered by the common electrode, and each of the pixel electrodes comprises an electrode portion having approximately symmetrical shape.

摘要翻译： 一种具有宽视角并易于制造的液晶显示器。 液晶显示器包括上基板和下基板，以及设置在上基板和下基板之间的液晶材料。 液晶显示器具有设置在上基板的与下基板相对的表面上的导电突起。 导电突起设置在扫描电极线或信号电极线上，并且具有与上电极相同的电位。 作为另一结构，下基板上的每个像素电极具有比上基板上的公共电极的面积小的区域，并且被公共电极覆盖，并且每个像素电极包括具有大致对称形状的电极部分。

公开(公告)号：US20070082436A1

公开(公告)日：2007-04-12

申请号：US11636441

申请日：2006-12-11

申请人： Yuichi Yamaguchi ,  Hironori Kikkawa ,  Hiroshi Kanoh ,  Teruaki Suzuki ,  Hidenori Ikeno

发明人： Yuichi Yamaguchi ,  Hironori Kikkawa ,  Hiroshi Kanoh ,  Teruaki Suzuki ,  Hidenori Ikeno

IPC分类号： H01L21/84

CPC分类号： G02F1/133553 ,  G02F1/133504 ,  G02F1/136286 ,  G02F2001/133357 ,  G02F2201/122 ,  G02F2202/40

摘要： A liquid crystal display device includes (a) a first substrate, (b) a second substrate spaced away from and facing the first substrate, (c) a liquid crystal layer sandwiched between the first and second substrates, (d) a transistor formed on the first substrate, (e) a wiring layer formed on the first substrate and electrically connected to the transistor, (f) a reflection electrode formed on the first substrate, an external incident light being reflected at the reflection electrode towards a viewer, and (g) a compensation layer formed directly on the wiring layer. The reflection electrode does not cover the wiring layer therewith, and the compensation layer has almost the same height as a height of the reflection electrode, the height being measured from a surface of the first substrate.

公开(公告)号：US07122444B2

公开(公告)日：2006-10-17

申请号：US10974932

申请日：2004-10-28

申请人： Mitsura Nakata ,  Kazushige Takechi ,  Hiroshi Kanoh

发明人： Mitsura Nakata ,  Kazushige Takechi ,  Hiroshi Kanoh

IPC分类号： H01L21/30 ,  H01L21/46

CPC分类号： H01L27/1266 ,  H01L21/76256 ,  H01L27/1214 ,  H01L29/66757 ,  H01L2221/6835 ,  H01L2221/68363

摘要： Method of manufacturing a thin film device substrate wherein no trench fabrication is required to be applied onto the substrate surface, and a material which is impervious to light can be used, and the substrate can be peeled off quickly. Firstly, a peeling-off film, a silicon oxide film and an amorphous silicon film are formed in succession on a glass substrate, and the amorphous silicon film is irradiated from above to obtain a polycrystalline silicon film. Subsequently, using the polycrystalline silicon film as an active layer, a TFT is formed, and then a plastic substrate is bonded thereon, and finally the glass substrate is peeled off with the peeling-off film, to complete transfer of the TFT. Because the peeling-off film has a gap space, its etching rate is high. Therefore, it is unnecessary to form a trench for supplying an etchant on the surface of the glass substrate.

公开(公告)号：US5796455A

公开(公告)日：1998-08-18

申请号：US852521

申请日：1997-05-07

申请人： Eishi Mizobata ,  Hidenori Ikeno ,  Hiroshi Kanoh

发明人： Eishi Mizobata ,  Hidenori Ikeno ,  Hiroshi Kanoh

IPC分类号： G02F1/1335 ,  G02F1/139 ,  G02F1/1333 ,  G02F1/1343

CPC分类号： G02F1/133553 ,  G02F1/133504 ,  G02F1/13725 ,  G02F2001/133562 ,  G02F2001/133565 ,  G02F2203/02

摘要： In a reflective liquid crystal display comprising a first insulative plate having a reflector, a second insulative plate having a transparent electrode, and a liquid crystal layer sandwiched between the reflector and the transparent electrode, a convex-concave surface is provided at the side of the second insulative plate. With this arrangement, a desired light scattering characteristics is realized with a high image quality and a high brightness, with neither a fuzziness of displayed characters nor a double image. On the other hand, since no thin film transistor is formed at the side of the second insulative plate, the convex-concave surface can be simply formed with no necessity of depositing an insulating film covering the thin film transistor and patterning the deposited insulating film.

摘要翻译： 在包括具有反射器的第一绝缘板和具有透明电极的第二绝缘板和夹在反射器和透明电极之间的液晶层的反射型液晶显示器中，在凹凸表面 第二绝缘板。 通过这种布置，以高图像质量和高亮度实现期望的光散射特性，既不显示字符的模糊性也不具有双重图像。 另一方面，由于在第二绝缘板的侧面没有形成薄膜晶体管，所以可以简单地形成凸凹面，而不需要沉积覆盖薄膜晶体管的绝缘膜，并对沉积的绝缘膜进行图案化。

公开(公告)号：US07851807B2

公开(公告)日：2010-12-14

申请号：US12490790

申请日：2009-06-24

申请人： Jun Tanaka ,  Hiroshi Kanoh

发明人： Jun Tanaka ,  Hiroshi Kanoh

IPC分类号： H01L29/15

CPC分类号： H01L29/4908 ,  H01L29/66757

摘要： A layer-stacked wiring made up of a microcrystalline silicon thin film and a metal thin film is provided which is capable of suppressing an excessive silicide formation reaction between the microcrystalline silicon thin film and metal thin film, thereby preventing peeling of the thin film. In a polycrystalline silicon TFT (Thin Film Transistor) using the layer-stacked wiring, the microcrystalline silicon thin film is so configured that its crystal grains each having a length of the microcrystalline silicon thin film in a direction of a film thickness being 60% or more of a film thickness of the microcrystalline silicon thin film amount to 15% or less of total number of crystal grains or that its crystal grains each having a length of the microcrystalline silicon thin film in a direction of a film thickness being 50% or less of a film thickness of the microcrystalline silicon thin film amount to 85% or more of the total number of crystal grains making up the microcrystalline silicon thin film.

摘要翻译： 提供了由微晶硅薄膜和金属薄膜构成的层叠布线，其能够抑制微晶硅薄膜和金属薄膜之间的过度的硅化物形成反应，从而防止薄膜的剥离。 在使用层叠布线的多晶硅TFT（Thin Film Transistor，多晶硅TFT）中，微晶硅薄膜的结构使得其晶粒各自具有薄膜厚度为60％的微晶硅薄膜的长度， 微晶硅薄膜的膜厚更多为15个以下的晶粒总数，或者其晶粒尺寸为50％以下，每个微晶硅薄膜的长度均为50％以下 的微晶硅薄膜的膜厚的总和为构成微晶硅薄膜的晶粒总数的85％以上。

公开(公告)号：US20090322757A1

公开(公告)日：2009-12-31

申请号：US12462710

申请日：2009-08-07

申请人： Hiroshi Kanoh ,  Teruaki Suzuki

发明人： Hiroshi Kanoh ,  Teruaki Suzuki

IPC分类号： G06T11/20

CPC分类号： G02B5/10 ,  G02F1/133553 ,  G03F1/00

摘要： A device is disclosed for generating pattern data for unevenness that is randomly arranged on the surface of the reflective substrate of a reflective liquid crystal display device. The number of coordinates, a basic pitch, a movable range, and a dot diameter are entered from a data entry unit. An array generation unit regularly arranges base coordinates in two dimensions in accordance with the basic pitch. Coordinate displacement unit randomly displaces within the movable range at a portion of the basic coordinates to generate a multiplicity of displaced coordinates. Pattern generation unit arranges dot patterns with the dot diameter entered at each of the displaced coordinates generated to generate pattern data.

摘要翻译： 公开了一种用于产生随机地布置在反射型液晶显示装置的反射基板的表面上的不均匀图案数据的装置。 从数据输入单元输入坐标数，基准间距，可移动范围和点直径。 阵列生成单元根据基本间距规则地排列基准坐标二维。 坐标位移单元在基本坐标的一部分的可移动范围内随机移位，以产生多个位移坐标。 图案生成单元布置具有在生成的每个位移坐标处输入的点直径的点图案以生成图案数据。

公开(公告)号：US07612847B2

公开(公告)日：2009-11-03

申请号：US10487496

申请日：2002-09-05

申请人： Hiroshi Kanoh ,  Teruaki Suzuki

发明人： Hiroshi Kanoh ,  Teruaki Suzuki

IPC分类号： G02F1/1335

CPC分类号： G02B5/10 ,  G02F1/133553 ,  G03F1/00

摘要： A device is disclosed for generating pattern data for unevenness that is randomly arranged on the surface of the reflective substrate of a reflective liquid crystal display device. The number of coordinates, a basic pitch, a movable range, and a dot diameter are entered from a data entry unit. An array generation unit regularly arranges base coordinates in two dimensions in accordance with the basic pitch. Coordinate displacement unit randomly displaces within the movable range at a portion of the basic coordinates to generate a multiplicity of displaced coordinates. Pattern generation unit arranges dot patterns with the dot diameter entered at each of the displaced coordinates generated to generate pattern data.

摘要翻译： 公开了一种用于产生随机地布置在反射型液晶显示装置的反射基板的表面上的不均匀图案数据的装置。 从数据输入单元输入坐标数，基准间距，可移动范围和点直径。 阵列生成单元根据基本间距规则地排列基准坐标二维。 坐标位移单元在基本坐标的一部分的可移动范围内随机移位，以产生多个位移坐标。 图案生成单元布置具有在生成的每个位移坐标处输入的点直径的点图案以生成图案数据。