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    Lift pin driving device and a flat panel display manufacturing apparatus having same
    1.
    发明授权
    Lift pin driving device and a flat panel display manufacturing apparatus having same 有权
    升降销驱动装置和具有该升降销驱动装置的平板显示器制造装置

    公开(公告)号：US07988817B2

    公开(公告)日：2011-08-02

    申请号：US11874272

    申请日：2007-10-18

    申请人： Hyoung Kyu Son

    发明人： Hyoung Kyu Son

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： H01L21/68742 ,  H01L21/68778 ,  Y10T74/2101

    摘要： A lift pin driving device and a flat panel display (FPD) manufacturing apparatus having the device are provided. The lift pin driving device can precisely move a plurality of lift pins using one motor, thus realizing a simple lift pin driving structure and a simple motor control structure. This allows a space below a chamber body of the manufacturing apparatus to be configured in a variety of ways, thus reducing the cost of equipment and the production cost of products.

    摘要翻译： 提供具有该装置的升降销驱动装置和平板显示器（FPD）制造装置。 提升销驱动装置可以使用一个电动机精确地移动多个提升销，从而实现简单的升降销驱动结构和简单的电机控制结构。 这允许以各种方式构造制造装置的室主体下方的空间，从而降低设备的成本和产品的生产成本。

    Apparatus and method for measuring chuck attachment force
    2.
    发明授权
    Apparatus and method for measuring chuck attachment force 有权
    用于测量卡盘附着力的装置和方法

    公开(公告)号：US07770478B2

    公开(公告)日：2010-08-10

    申请号：US12342535

    申请日：2008-12-23

    申请人： Hyoung Kyu Son

    发明人： Hyoung Kyu Son

    IPC分类号： G01N19/04 ,  H01L21/683

    CPC分类号： H01L21/6831 ,  H01L21/67253

    摘要： An apparatus and method for measuring a chuck attachment force are provided. The apparatus is capable of measuring loads applied to a measurement substrate, while the measurement substrate is detached from a chuck, and precisely calculating necessary force through a process of comparing and analyzing values of the measured loads. This may prevent errors in the application of attachment force during a semiconductor manufacturing process. In the semiconductor manufacturing process, when the substrate is detached from a chuck, the substrate may be prevented from being deformed or cracked.

    摘要翻译： 提供一种用于测量卡盘附着力的装置和方法。 该装置能够测量施加到测量基板上的载荷，同时将测量基板从卡盘上拆下，并通过比较和分析所测量载荷的值的过程精确计算必要的力。 这可以防止在半导体制造过程中施加附接力的误差。 在半导体制造过程中，当基板从卡盘脱离时，可以防止基板变形或破裂。

    APPARATUS AMD METHOD FOR MEASURING CHUCK ATTACHMENT FORCE
    4.
    发明申请
    APPARATUS AMD METHOD FOR MEASURING CHUCK ATTACHMENT FORCE 有权
    装置测量卡车附件力的方法

    公开(公告)号：US20090107250A1

    公开(公告)日：2009-04-30

    申请号：US12342535

    申请日：2008-12-23

    申请人： Hyoung Kyu SON

    发明人： Hyoung Kyu SON

    IPC分类号： G01N3/00 ,  G01L5/00 ,  H01L21/683

    CPC分类号： H01L21/6831 ,  H01L21/67253

    摘要： An apparatus and method for measuring a chuck attachment force are provided. The apparatus is capable of measuring loads applied to a measurement substrate, while the measurement substrate is detached from a chuck, and precisely calculating necessary force through a process of comparing and analyzing values of the measured loads. This may prevent errors in the application of attachment force during a semiconductor manufacturing process. In the semiconductor manufacturing process, when the substrate is detached from a chuck, the substrate may be prevented from being deformed or cracked.

    摘要翻译： 提供一种用于测量卡盘附着力的装置和方法。 该装置能够测量施加到测量基板上的载荷，同时将测量基板从卡盘上拆下，并通过比较和分析所测量载荷的值的过程精确计算必要的力。 这可以防止在半导体制造过程中施加附接力的误差。 在半导体制造过程中，当基板从卡盘脱离时，可以防止基板变形或破裂。

    Electrostatic chuck, substrate processing apparatus having the same, and substrate processing method using the same
    5.
    发明申请
    Electrostatic chuck, substrate processing apparatus having the same, and substrate processing method using the same 审中-公开
    静电吸盘，具有该静电吸盘的基板处理装置以及使用其的基板处理方法

    公开(公告)号：US20080055813A1

    公开(公告)日：2008-03-06

    申请号：US11892628

    申请日：2007-08-24

    申请人： Hyoung-Kyu Son

    发明人： Hyoung-Kyu Son

    IPC分类号： H01L21/683 ,  H01L21/67

    CPC分类号： H01L21/6833

    摘要： An electrostatic chuck includes both a DC power supply and an AC power supply. DC power is supplied to an electrode of the chuck to generate an electrostatic holding force that holds a substrate on the chuck during substrate processing steps. When it is time to remove the substrate from the chuck, the DC power is cut off, and an AC power is applied to help eliminate any residual charge left on the chuck after the DC power has been cut off.

    摘要翻译： 静电卡盘包括直流电源和交流电源。 DC电源被提供给卡盘的电极，以产生在基板处理步骤期间将基板保持在卡盘上的静电保持力。 当要从卡盘中取出基板的时候，直流电源被切断，并且在直流电源被切断之后，施加交流电力以帮助消除卡盘上残留的剩余电荷。

    LIFT PIN DRIVING DEVICE AND A FLAT PANEL DISPLAY MANUFACTURING APPARATUS HAVING SAME
    9.
    发明申请
    LIFT PIN DRIVING DEVICE AND A FLAT PANEL DISPLAY MANUFACTURING APPARATUS HAVING SAME 有权
    提升针驱动装置和平板显示器制造设备

    公开(公告)号：US20080110397A1

    公开(公告)日：2008-05-15

    申请号：US11874272

    申请日：2007-10-18

    申请人： Hyoung Kyu SON

    发明人： Hyoung Kyu SON

    IPC分类号： B05C13/00 ,  F16H53/00

    CPC分类号： H01L21/68742 ,  H01L21/68778 ,  Y10T74/2101

    摘要： A lift pin driving device and a flat panel display (FPD) manufacturing apparatus having the device are provided. The lift pin driving device can precisely move a plurality of lift pins using one motor, thus realizing a simple lift pin driving structure and a simple motor control structure. This allows a space below a chamber body of the manufacturing apparatus to be configured in a variety of ways, thus reducing the cost of equipment and the production cost of products.

    摘要翻译： 提供具有该装置的升降销驱动装置和平板显示器（FPD）制造装置。 提升销驱动装置可以使用一个电动机精确地移动多个提升销，从而实现简单的升降销驱动结构和简单的电机控制结构。 这允许以各种方式构造制造装置的室主体下方的空间，从而降低设备的成本和产品的生产成本。

    Process chamber having gate slit opening and closing apparatus
    10.
    发明授权
    Process chamber having gate slit opening and closing apparatus 有权
    具有门狭缝开闭装置的处理室

    公开(公告)号：US08834673B2

    公开(公告)日：2014-09-16

    申请号：US11869878

    申请日：2007-10-10

    申请人： Hyoung Kyu Son

    发明人： Hyoung Kyu Son

    IPC分类号： C23F1/00 ,  C23C16/00 ,  H01J37/32 ,  H01L21/67

    CPC分类号： H01L21/67126 ,  H01J37/185 ,  H01J37/32458 ,  H01J2237/184

    摘要： A process chamber is provided for an etching apparatus that etches a substrate, such as a liquid crystal display (LCD) substrate, using plasma. The process chamber may include a chamber body, in one wall of which a gate slit is formed, a rotary inner door that opens and closes an inner opening of the gate slit, and a door driving mechanism that rotates the inner door. When the substrate is etched, the inner door is closed preventing an interior of the chamber body from communicating with the gate slit. Thereby, a space in which the plasma is formed may be maintained symmetrical, so that the plasma may be uniformly distributed in an interior of the chamber body.

    摘要翻译： 为使用等离子体蚀刻诸如液晶显示器（LCD）衬底的衬底的蚀刻装置提供处理室。 处理室可以包括在其一个壁中形成有栅极狭缝的室主体，打开和关闭栅极狭缝的内部开口的旋转内门以及使内部门旋转的门驱动机构。 当衬底被蚀刻时，内门被关闭，防止室主体的内部与门狭缝连通。 因此，形成等离子体的空间可以保持对称，使得等离子体可以均匀地分布在室主体的内部。