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    Imaging and measuring apparatus for surface and internal interface of object
    2.
    发明授权
    Imaging and measuring apparatus for surface and internal interface of object 有权
    物体表面和内部界面的成像和测量装置

    公开(公告)号：US08379220B2

    公开(公告)日：2013-02-19

    申请号：US12778363

    申请日：2010-05-12

    申请人： I-Jen Hsu ,  Chun-Wei Chang

    发明人： I-Jen Hsu ,  Chun-Wei Chang

    IPC分类号： G01B11/02

    CPC分类号： G01B11/2441

    摘要： The present invention provides an imaging and measuring apparatus for the surface and the internal interface of an object, which comprises a broadband wave source, a wave-splitting structure, a wave-delaying device, a reflecting component, and a sensor. The broadband wave source transmits a broadband incident wave. The wave-splitting structure splits the broadband incident wave into a first incident beam, a second incident beam, and a third incident beam. The first incident beam is illuminated on an object under test, which reflects a measuring beam. The wave-delaying device receives the second incident beam and reflects a reference beam. The reflecting component receives the third incident beam and reflects a calibration beam. The sensor receives a first interference signal of the measuring beam and the reference beam, and a second interference signal of the reference beam and the calibration beam. By means of the broadband incident wave, the morphologies of the surface and the internal interface of the object can be imaged and measured in a non-destructive way. In addition, by means of the calibration beam, the accuracy of imaging and measuring the surface and the internal interface of the object can be improved.

    摘要翻译： 本发明提供一种用于物体的表面和内部界面的成像和测量装置，其包括宽带波源，波分解结构，波延迟装置，反射部件和传感器。 宽带波源传输宽带入射波。 波分解结构将宽带入射波分为第一入射光束，第二入射光束和第三入射光束。 第一个入射光束被照射在被测物体上，反射一个测量光束。 波延迟装置接收第二入射光束并反射参考光束。 反射部件接收第三入射光并反射校准光束。 传感器接收测量光束和参考光束的第一干涉信号，以及参考光束和校准光束的第二干涉信号。 通过宽带入射波，可以以非破坏性的方式对物体的表面和内部界面的形态进行成像和测量。 此外，通过校准光束，可以提高成像和测量物体的表面和内部界面的精度。

    System and Method for Measuring Interferences
    3.
    发明申请
    System and Method for Measuring Interferences 有权
    测量干扰的系统和方法

    公开(公告)号：US20090033916A1

    公开(公告)日：2009-02-05

    申请号：US11833440

    申请日：2007-08-03

    申请人： I-Jen Hsu ,  Cheng-Chung Lai

    发明人： I-Jen Hsu ,  Cheng-Chung Lai

    IPC分类号： G01N21/00 ,  G01B11/02

    CPC分类号： G01B9/02027 ,  G01B9/02007 ,  G01B2290/40 ,  G01B2290/45 ,  G01B2290/70

    摘要： A system and method for measuring interferences are disclosed. The system is based on the concept of a composite interferometer. The sample is measured while a simultaneous compensation of the phase deviation due to the relative displacement of the optical delay component between the measurements at different pixels of the sample is performed. In the application of profilometry, the information of the surface profile of a material is obtained from the phase shift of the interference signal. By using the proposed compensation mechanism, an axial resolution at nanometer scale can be achieved. For the measurement of a thin film, a polarized probe beam is oblique incident on the sample. The system can perform a simultaneous measurement of the refractive index and the thickness of the thin film. From the ratio of the intensities of the interferograms of TE and TM waves as well as the phase shifts of the interferograms, the refractive index and the thickness of the thin film can then be obtained simultaneously.

    摘要翻译： 公开了一种用于测量干扰的系统和方法。 该系统是基于复合干涉仪的概念。 测量样本，同时补偿由于样品的不同像素处的测量之间的光学延迟分量的相对位移引起的相位偏差。 在轮廓测量的应用中，从干涉信号的相移中获得材料的表面轮廓的信息。 通过使用提出的补偿机制，可以实现纳米尺度的轴向分辨率。 对于薄膜的测量，偏振探测光束倾斜入射到样品上。 该系统可以同时测量薄膜的折射率和厚度。 从TE和TM波的干涉图的强度比以及干涉图的相移的比例可以同时获得薄膜的折射率和厚度。

    OPTICAL TOMOGRAPHY SYSTEM
    4.
    发明申请
    OPTICAL TOMOGRAPHY SYSTEM 审中-公开
    光学造影系统

    公开(公告)号：US20130010304A1

    公开(公告)日：2013-01-10

    申请号：US13238868

    申请日：2011-09-21

    申请人： I-Jen HSU

    发明人： I-Jen HSU

    IPC分类号： G01B9/02

    CPC分类号： G01B9/02091 ,  G01B9/02028 ,  G01B9/02043 ,  G01B2290/35

    摘要： An optical tomography system is provided. The optical tomography system includes a light source emitting a light beam. A beamsplitter splits the light beam into a first reference light beam and a first sample light beam. The first reference light beam is incident to an optical delay device, and the first sample light beam is incident to a focusing device, focused to a sample. A second reference light beam reflected from the optical delay device and a second sample light beam reflected from the sample are incident through the beamsplitter to a detection device. Different portions of the second reference light beam along a first dimension have different optical path lengths.

    摘要翻译： 提供了一种光学层析成像系统。 光学断层摄影系统包括发射光束的光源。 分束器将光束分成第一参考光束和第一样本光束。 第一参考光束入射到光学延迟装置，并且第一采样光束入射到聚焦装置，聚焦到样品。 从光学延迟装置反射的第二参考光束和从样本反射的第二样本光束通过分光镜入射到检测装置。 沿着第一尺寸的第二参考光束的不同部分具有不同的光程长度。

    IMAGING AND MEASURING APPARATUS FOR SURFACE AND INTERNAL INTERFACE OF OBJECT
    5.
    发明申请
    IMAGING AND MEASURING APPARATUS FOR SURFACE AND INTERNAL INTERFACE OF OBJECT 有权
    成像和测量装置对象的表面和内部界面

    公开(公告)号：US20110181890A1

    公开(公告)日：2011-07-28

    申请号：US12778363

    申请日：2010-05-12

    申请人： I-JEN HSU ,  CHUN-WEI CHANG

    发明人： I-JEN HSU ,  CHUN-WEI CHANG

    IPC分类号： G01B11/02

    CPC分类号： G01B11/2441

    摘要： The present invention provides an imaging and measuring apparatus for the surface and the internal interface of an object, which comprises a broadband wave source, a wave-splitting structure, a wave-delaying device, a reflecting component, and a sensor. The broadband wave source transmits a broadband incident wave. The wave-splitting structure splits the broadband incident wave into a first incident beam, a second incident beam, and a third incident beam. The first incident beam is illuminated on an object under test, which reflects a measuring beam. The wave-delaying device receives the second incident beam and reflects a reference beam. The reflecting component receives the third incident beam and reflects a calibration beam. The sensor receives a first interference signal of the measuring beam and the reference beam, and a second interference signal of the reference beam and the calibration beam. By means of the broadband incident wave, the morphologies of the surface and the internal interface of the object can be imaged and measured in a non-destructive way. In addition, by means of the calibration beam, the accuracy of imaging and measuring the surface and the internal interface of the object can be improved.

    摘要翻译： 本发明提供一种用于物体的表面和内部界面的成像和测量装置，其包括宽带波源，波分解结构，波延迟装置，反射部件和传感器。 宽带波源传输宽带入射波。 波分解结构将宽带入射波分为第一入射光束，第二入射光束和第三入射光束。 第一个入射光束被照射在被测物体上，反射一个测量光束。 波延迟装置接收第二入射光束并反射参考光束。 反射部件接收第三入射光并反射校准光束。 传感器接收测量光束和参考光束的第一干涉信号，以及参考光束和校准光束的第二干涉信号。 通过宽带入射波，可以以非破坏性的方式对物体的表面和内部界面的形态进行成像和测量。 此外，通过校准光束，可以提高成像和测量物体的表面和内部界面的精度。

    System and method for measuring interferences
    6.
    发明授权
    System and method for measuring interferences 有权
    用于测量干扰的系统和方法

    公开(公告)号：US07920269B2

    公开(公告)日：2011-04-05

    申请号：US11833440

    申请日：2007-08-03

    申请人： I-Jen Hsu ,  Cheng-Chung Lai

    发明人： I-Jen Hsu ,  Cheng-Chung Lai

    IPC分类号： G01B9/02 ,  G01B11/02

    CPC分类号： G01B9/02027 ,  G01B9/02007 ,  G01B2290/40 ,  G01B2290/45 ,  G01B2290/70

    摘要： A system and method for measuring interferences are disclosed. The system is based on the concept of a composite interferometer. The sample is measured while a simultaneous compensation of the phase deviation due to the relative displacement of the optical delay component between the measurements at different pixels of the sample is performed. In the application of profilometry, the information of the surface profile of a material is obtained from the phase shift of the interference signal. By using the proposed compensation mechanism, an axial resolution at nanometer scale can be achieved. For the measurement of a thin film, a polarized probe beam is oblique incident on the sample. The system can perform a simultaneous measurement of the refractive index and the thickness of the thin film. From the ratio of the intensities of the interferograms of TE and TM waves as well as the phase shifts of the interferograms, the refractive index and the thickness of the thin film can then be obtained simultaneously.

    摘要翻译： 公开了一种用于测量干扰的系统和方法。 该系统是基于复合干涉仪的概念。 测量样本，同时补偿由于样品的不同像素处的测量之间的光学延迟分量的相对位移引起的相位偏差。 在轮廓测量的应用中，从干涉信号的相移中获得材料的表面轮廓的信息。 通过使用提出的补偿机制，可以实现纳米级的轴向分辨率。 对于薄膜的测量，偏振探测光束倾斜入射到样品上。 该系统可以同时测量薄膜的折射率和厚度。 从TE和TM波的干涉图的强度比以及干涉图的相移的比例可以同时获得薄膜的折射率和厚度。