X-ray microanalyzer for thin films
    1.
    发明授权
    X-ray microanalyzer for thin films 有权
    用于薄膜的X射线微量分析仪

    公开(公告)号:US06381303B1

    公开(公告)日:2002-04-30

    申请号:US09408894

    申请日:1999-09-29

    CPC classification number: G01N23/20

    Abstract: Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 &mgr;m on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot.

    Abstract translation: 用于样品的X射线微量分析的装置包括X射线源,其在样品的表面上照射尺寸小于500μm的斑点。 第一X射线检测器相对于样品的表面以高角度捕获从样品发射的荧光X射线,其响应于照射。 第二个X射线检测器以相对于样品表面的掠角捕获来自斑点的X射线。 处理电路响应于由此捕获的X射线,从第一和第二X射线检测器接收相应的信号,并组合分析信号以确定样品在斑点区域内的表面层的性质。

    Detection of voids in semiconductor wafer processing
    2.
    发明授权
    Detection of voids in semiconductor wafer processing 有权
    检测半导体晶片加工中的空隙

    公开(公告)号:US06351516B1

    公开(公告)日:2002-02-26

    申请号:US09461670

    申请日:1999-12-14

    Inventor: Isaac Mazor Long Vu

    Abstract: A method for testing the deposition and/or the removal of a material within a recess on the surface of a sample. An excitation beam is directed onto a region of the sample in a vicinity of the recess, and an intensity of X-ray fluorescence, emitted from the region in a spectral range in which the material is known to fluoresce, is measured. A quantity of the material that is deposited within the recess is determined responsive to the measured intensity.

    Abstract translation: 一种用于测试在样品表面上的凹槽内的材料的沉积和/或去除的方法。 激发光束被引导到在凹部附近的样品的区域上,并且测量从该材料已知发荧光的光谱范围内的区域发射的X射线荧光强度。 根据测量的强度确定沉积在凹部内的一定量的材料。

    Multifunction X-ray analysis system
    5.
    发明授权
    Multifunction X-ray analysis system 有权
    多功能X射线分析系统

    公开(公告)号:US07551719B2

    公开(公告)日:2009-06-23

    申请号:US11200857

    申请日:2005-08-10

    CPC classification number: G01N23/20008

    Abstract: Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. A motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.

    Abstract translation: 用于分析样品的装置包括辐射源,其适于将X射线的第一收敛束指向样品的表面,并将X射线的第二准直光束引向样品的表面 。 运动组件使辐射源在X射线以掠射角指向样品表面的第一源位置和第二源位置之间移动,在该第二源位置,X射线朝向表面 样品的布拉格角附近。 检测器组件在辐射源处于第一和第二源配置中的任一个中以及在第一和第二源位置中的任一个中时,感测从样品散射的X射线作为角度的函数。 信号处理器接收并处理来自检测器组件的输出信号,以便确定样品的特性。

    Automated selection of X-ray reflectometry measurement locations
    6.
    发明申请
    Automated selection of X-ray reflectometry measurement locations 审中-公开
    自动选择X射线反射测量位置

    公开(公告)号:US20070274447A1

    公开(公告)日:2007-11-29

    申请号:US11798617

    申请日:2007-05-15

    CPC classification number: G01N23/201 G01N2223/052

    Abstract: A computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective locations. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected locations.

    Abstract translation: 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置,用X射线照射每个位置处的表面,并测量X射线的角度分布, 响应于光束从表面发射,以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质指数,表示在各个位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置,并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

    Enhancement of X-ray reflectometry by measurement of diffuse reflections
    7.
    发明授权
    Enhancement of X-ray reflectometry by measurement of diffuse reflections 有权
    通过测量漫反射增强X射线反射率

    公开(公告)号:US07068753B2

    公开(公告)日:2006-06-27

    申请号:US10902177

    申请日:2004-07-30

    CPC classification number: G01N23/203 G01B15/02

    Abstract: A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

    Abstract translation: 一种用于检查具有表面层的样品的方法。 该方法包括在准直的X射线束照射样品时获取样品的第一反射光谱,并且处理第一反射光谱以测量样品的漫反射特性。 在用X射线的会聚束照射样品的同时获取样品的第二反射光谱。 使用漫反射特性分析第二反射光谱,以确定样品的表面层的特性。

    Multifunction X-ray analysis system
    8.
    发明申请
    Multifunction X-ray analysis system 有权
    多功能X射线分析系统

    公开(公告)号:US20060062351A1

    公开(公告)日:2006-03-23

    申请号:US11200857

    申请日:2005-08-10

    CPC classification number: G01N23/20008

    Abstract: Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. a motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.

    Abstract translation: 用于分析样品的装置包括辐射源,其适于将X射线的第一收敛束指向样品的表面,并将X射线的第二准直光束引向样品的表面 。 运动组件将辐射源移动在X射线以掠射角指向样品表面的第一源位置和X射线朝向表面的第二源位置 样品的布拉格角附近。 检测器组件在辐射源处于第一和第二源配置中的任一个中以及在第一和第二源位置中的任一个中时,感测从样品散射的X射线作为角度的函数。 信号处理器接收并处理来自检测器组件的输出信号,以便确定样品的特性。

    Combined X-ray reflectometer and diffractometer
    9.
    发明申请
    Combined X-ray reflectometer and diffractometer 有权
    组合X射线反射计和衍射仪

    公开(公告)号:US20060062350A1

    公开(公告)日:2006-03-23

    申请号:US10946426

    申请日:2004-09-21

    CPC classification number: G01N23/20008

    Abstract: Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a converging beam of X-rays toward a surface of the sample. At least one detector array is arranged to sense the X-rays scattered from the sample as a function of elevation angle over a range of elevation angles simultaneously, and to generate output signals responsively to the scattered X-rays. The detector array has a first configuration in which the detector array senses the X-rays that are reflected from the surface of the sample at a grazing angle, and a second configuration in which the detector array senses the X-rays that are diffracted from the surface in a vicinity of a Bragg angle of the sample. A signal processor processes the output signals so as to determine a characteristic of the surface layer of the sample.

    Abstract translation: 用于分析样品的装置包括辐射源,其适于将X射线的会聚束引导到样品的表面。 至少一个检测器阵列布置成同时检测从样品散射的X射线作为仰角范围上的仰角的函数,并且响应于散射的X射线产生输出信号。 检测器阵列具有第一配置,其中检测器阵列以掠射角度感测从样品表面反射的X射线,以及第二配置,其中检测器阵列感测从衍射的X射线衍射的X射线 表面在样品的布拉格角附近。 信号处理器处理输出信号,以便确定样品的表面层的特性。

    XRR detector readout processing
    10.
    发明授权
    XRR detector readout processing 有权
    XRR检测器读出处理

    公开(公告)号:US06895071B2

    公开(公告)日:2005-05-17

    申请号:US10635365

    申请日:2003-08-06

    CPC classification number: G01T1/36

    Abstract: Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

    Abstract translation: 反射仪装置包括:辐射源,其适于在相对于样品表面的一定范围的角度范围内辐射样品;以及检测器组件,其定位成在角度范围内接收从样品反射的辐射,并产生 响应于此的信号。 快门可调节地定位以拦截辐射,快门具有阻挡位置,其中阻挡在角度范围的下部的辐射,从而允许反射的辐射基本上仅在其中的较高部分 范围和清晰的位置,其中该范围的下部的辐射基本上没有阻塞地达到阵列。

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