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    Method for patterning organic materials or combinations of organic and inorganic materials
    1.
    发明申请
    Method for patterning organic materials or combinations of organic and inorganic materials 审中-公开
    有机材料或有机和无机材料组合的图案化方法

    公开(公告)号：US20050048414A1

    公开(公告)日：2005-03-03

    申请号：US10925082

    申请日：2004-08-24

    Applicant: Oliver Harnack ,  Isabelle Raible ,  Akio Yasuda ,  Tobias Vossmeyer

    Inventor： Oliver Harnack ,  Isabelle Raible ,  Akio Yasuda ,  Tobias Vossmeyer

    IPC: H05B33/10 ,  G03F7/00 ,  H01L21/28 ,  H01L21/306 ,  H01L21/3205 ,  H01L29/06 ,  H01L51/50 ,  H05K3/02 ,  H05K3/04

    CPC classification number: B82Y30/00 ,  G03F7/0035 ,  H05K3/048

    Abstract: The present application refers to a method of patterning organic materials or organic/inorganic materials onto a substrate, comprising the following steps: (1) patterning of a water-soluble material “A” onto a surface of the substrate, thereby forming a substrate/material “A” surface; (2) depositing organic or organic/inorganic material “B” onto the substrate/material “A” surface; (3) lifting-off material “A” in aqueous solution; wherein, step (1) comprises the following steps: (1a) patterning of a photoresist material onto the substrate surface, thereby forming a substrate/photoresist material surface; (1b) depositing the water soluble material “A” onto the substrate/photoresist material surface; (1c) lifting-off the photoresist material in an organic solvent; or, alternatively, step (1) comprises the following steps: (1a′) depositing the water-soluble material “A” onto the substrate surface, thereby forming a substrate/material “A” surface; (1b′) patterning the photoresist material onto the substrate/material “A” surface; (1c′) etching the unmasked material “A” in aqueous solution; (1d′) lifting-off the photoresist material in an organic solvent. The present application also refers to the use of said method, to a pattern of organic materials or organic/inorganic materials prepared by said method, and to a substrate carrying such patterns. The application also refers to the use of a patterned nanoparticle film.

    Abstract translation: 本申请是指将有机材料或有机/无机材料图案化到基材上的方法，包括以下步骤：（1）将水溶性材料“A”图案化到基材的表面上，由此形成基材/ 材料“A”表面; （2）将有机或有机/无机材料“B”沉积在基材/材料“A”表面上; （3）脱水材料“A”在水溶液中; 其中，步骤（1）包括以下步骤：（1a）将光致抗蚀剂材料图案化到衬底表面上，从而形成衬底/光致抗蚀剂材料表面; （1b）将水溶性材料“A”沉积到基材/光致抗蚀剂材料表面上; （1c）在有机溶剂中剥离光致抗蚀剂材料; 或者可选地，步骤（1）包括以下步骤：（1a'）将水溶性材料“A”沉积到基材表面上，从而形成基材/材料“A”表面; （1b'）将光致抗蚀剂材料图案化到衬底/材料“A”表面上; （1c'）在水溶液中蚀刻未掩蔽材料“A” （1d'）在有机溶剂中剥离光致抗蚀剂材料。 本申请还涉及使用所述方法，通过所述方法制备的有机材料或有机/无机材料的图案以及携带这种图案的基材。 该应用还涉及使用图案化的纳米颗粒膜。

    METAL NANOPARTICLE ORGANIC COMPOSITE FILM AND METHOD FOR ITS PREPARATION
    4.
    发明申请
    METAL NANOPARTICLE ORGANIC COMPOSITE FILM AND METHOD FOR ITS PREPARATION 审中-公开
    金属纳米材料有机复合膜及其制备方法

    公开(公告)号：US20130210679A1

    公开(公告)日：2013-08-15

    申请号：US13587256

    申请日：2012-08-16

    Applicant: Yvonne JOSEPH ,  Isabelle Raible ,  Nadejda Krasteva ,  Gabriele Nelles

    Inventor： Yvonne JOSEPH ,  Isabelle Raible ,  Nadejda Krasteva ,  Gabriele Nelles

    IPC: H01C17/00 ,  G01N27/12

    CPC classification number: H01C17/00 ,  G01N27/127

    Abstract: The present invention relates to method for preparing a metal nanoparticle organic composite film, preferably a metal nanoparticle organic composite film of a chemical sensing device, to a metal nanoparticle organic composite film obtained by said method, and to a chemical sensing device comprising a metal nanoparticle organic composite film or an array of different metal nanoparticle organic composite films obtained by said method.

    Abstract translation: 本发明涉及通过所述方法制备金属纳米颗粒有机复合膜，优选化学感测装置的金属纳米颗粒有机复合膜的方法，以及包含金属纳米颗粒的化学感测装置 有机复合膜或通过所述方法获得的不同金属纳米颗粒有机复合膜的阵列。

    FEATURE EXTRACTION AND PROCESSING FROM SIGNALS OF SENSOR ARRAYS
    5.
    发明申请
    FEATURE EXTRACTION AND PROCESSING FROM SIGNALS OF SENSOR ARRAYS 审中-公开
    特征提取和处理从传感器阵列的信号

    公开(公告)号：US20130064423A1

    公开(公告)日：2013-03-14

    申请号：US13587306

    申请日：2012-08-16

    Applicant: Yvonne JOSEPH ,  Isabelle RAIBLE ,  Mustafa SARPASAN ,  Nadejda KRASTEVA ,  Gabriele NELLES

    Inventor： Yvonne JOSEPH ,  Isabelle RAIBLE ,  Mustafa SARPASAN ,  Nadejda KRASTEVA ,  Gabriele NELLES

    IPC: G06K9/46

    CPC classification number: G06K9/38 ,  G06K9/40 ,  G06K9/6232 ,  G06K9/629

    Abstract: Feature extraction includes extracting features from signals of a plurality of sensors of a sensor array, including, for each sensor, obtaining a signal of the sensor corresponding to responses of the sensor during one or more exposures to samples, computing a baseline function from the signal, and computing the features based on the baseline function and values corresponding to responses of the sensor during each exposure. Feature vectors are formed from the features of the sensors. The features in each feature vector correspond to the same exposure. At least one of computing the baseline function by interpolating baseline values corresponding to responses of the sensor prior to each exposure, and forming the feature vectors by combining features of at least one sensor with features of at least one redundant sensor of the sensor array in the feature vectors is performed.

    Abstract translation: 特征提取包括从传感器阵列的多个传感器的信号中提取特征，包括针对每个传感器，在一个或多个曝光样本期间获得对应于传感器的响应的传感器的信号，从该信号计算基线函数 ，并且基于在每次曝光期间对应于传感器的响应的基线功能和值来计算特征。 特征向量由传感器的特征形成。 每个特征矢量中的特征对应于相同的曝光。 通过在每次曝光之前内插与传感器的响应相对应的基线值，以及通过将至少一个传感器的特征与传感器阵列的至少一个冗余传感器的特征相组合来形成特征向量中的至少一个， 执行特征向量。

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