摘要:
The present invention relates to a golf club reference system having improved performance in accurate hitting of a golf ball by providing the most ideal, accurate angle of a golf club at a starting point, by matching a lie angle and a socket angle when addressing. The golf club reference system of the present invention installed on a hosel installed on a club head having a hitting surface or a shaft having a handle formed in an upper portion and connected to the hosel in an lower portion, the reference system comprising: a fixing ring surrounding the hosel or the shaft, a fixing screw shaft protruding from the fixing ring in one direction; a fixing nut fixing the fixing screw shaft; a display part connected to the fixing ring through a bridge, and a color crosshair formed on an upper portion of the display part.
摘要:
Embodiments for forming an ultrasound spatial compound image by correcting refraction of ultrasound signals in an ultrasound system are disclosed herein. An ultrasound data acquisition unit forms a first set of ultrasound frame data and a second set of ultrasound frame data by using non-steered scan lines and steered scan lines, respectively. The processor, which is coupled to the ultrasound data acquisition unit, forms a plurality of sets of resampled ultrasound frame data based on the second set of ultrasound frame data, selects one particular set of ultrasound frame data from the group consisting of the second set of ultrasound frame data and the plurality of sets of resampled ultrasound frame data based on the first set of ultrasound frame data and spatially compounds the one particular set of ultrasound frame data and the first set of ultrasound frame data to form an ultrasound spatial compound image.
摘要:
Disclosed is a method for manufacturing fine patterns of semiconductor devices using a double exposure patterning process for manufacturing the second photoresist patterns by simply exposing without an exposure mask. The method comprises the steps of: forming a first photoresist pattern on a semiconductor substrate on which a layer to be etched is formed; coating a composition for a mirror interlayer on the first photoresist pattern to form a mirror interlayer; forming a photoresist layer on the resultant; and forming a second photoresist pattern which is made by a scattered reflection of the mirror-interlayer and positioned between the first photoresist patterns, by exposing the photoresist layer to a light having energy which is lower than a threshold energy (Eth) of the photoresist layer without an exposure mask, and then developing the same.
摘要:
Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an united body, alkyl or cycloalkyl group of 1-20 carbon atoms or arylalkyl group of 7-20 carbon atoms which are doubly bonded to nitrogen atom.
摘要:
Provided are an ultrasound system and a method for operating the ultrasound system, which may calculate a direction of an ultrasonic beam in real time and may adjust the ultrasonic beam based on the calculation result. The ultrasound system may include a probe to emit an ultrasonic beam to an object, a processor to measure a first reflection angle of the ultrasonic beam at a predetermined point in the object, a mapping table to map the measured first reflection angle to the predetermined point and to record mapping data, and a controller to determine an emission angle of the ultrasonic beam to the predetermined point based on the first reflection angle recorded in the mapping table, and to control the probe to emit the ultrasonic beam at the determined emission angle.
摘要:
Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an united body, alkyl or cycloalkyl group of 1-20 carbon atoms or arylalkyl group of 7-20 carbon atoms which are doubly bonded to nitrogen atom.
摘要:
A method of providing a motion vector is disclosed. The method according to embodiments of the present disclosure comprises: acquiring ultrasound data corresponding to a region of interest within a brightness mode (B-mode) image of a target object; forming a color Doppler mode image of the target object based on the ultrasound data; forming a motion vector of the target object based on the ultrasound data and the color Doppler mode image; and setting the motion vector on the color Doppler mode image.
摘要:
Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.
摘要:
A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula wherein, R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a C1˜C20 alkylene group, a C3˜C20 cycloalkylene group or a C6˜C20 aromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.
摘要:
There are provided embodiments for enhancing the quality of an ultrasound image are disclosed. In one embodiment, by way of non-limiting example, an ultrasound system comprises: an ultrasound data acquisition unit configured to acquire ultrasound data corresponding to at least one ultrasound image; a storage unit for storing at least one beam profile indicating a spreading degree of an ultrasound beam according to depth based on at least one focusing point; and a processing unit configured to set an amount of blurring corresponding to spreading of the ultrasound beam according to the depth based on the at least one beam profile, and perform a filtering process for compensating the blurring by the spreading of the ultrasound beam based on the ultrasound data and the amount of blurring to enhance quality of the at least one ultrasound image.