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1.发明申请Focus Sensor, Inspection Apparatus, Lithographic Apparatus and Control System 审中-公开聚焦传感器，检测仪器，平版印刷设备和控制系统公开(公告)号：US20110102774A1
公开(公告)日：2011-05-05
申请号：US12921557
申请日：2009-03-30
Applicant: Arnold Sinke , Johan Maria Van Boxmeer
Inventor： Arnold Sinke , Johan Maria Van Boxmeer
CPC classification number: G03F9/7026 , G02B7/28 , G02B27/40
Abstract: A focus sensor comprises a confocal sensor. Within the confocal sensor there are a plurality of aperture plates positioned in front of a plurality of detectors. Rather than a conventional pinhole aperture shape there is a central aperture surrounded by a plurality of outer aperture portions.
Abstract translation: 焦点传感器包括共焦传感器。 在共聚焦传感器内有多个孔板，位于多个检测器前面。 不是传统的针孔孔形状，而是由多个外孔部分包围的中心孔。
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Patent Agency Ranking
2.发明授权Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby 失效平版印刷设备，曝光基板的方法，测量方法，器件制造方法以及由此制造的器件公开(公告)号：US07835017B2
公开(公告)日：2010-11-16
申请号：US10583985
申请日：2004-12-22
Applicant: Theodorus Marinus Modderman , Nicolaas Antonius Allegondus Johannes Van Asten , Johan Maria Van Boxmeer , Gerrit Johannes Nijmeijer
Inventor： Theodorus Marinus Modderman , Nicolaas Antonius Allegondus Johannes Van Asten , Johan Maria Van Boxmeer , Gerrit Johannes Nijmeijer
IPC: G01B11/28
CPC classification number: G03B27/42 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7034
Abstract: A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).
Abstract translation: 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。
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3.发明授权Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system 有权检测方法和设备光刻设备，光刻处理单元，器件制造方法和距离测量系统公开(公告)号：US07869022B2
公开(公告)日：2011-01-11
申请号：US11826830
申请日：2007-07-18
Applicant: Johan Maria Van Boxmeer , Henricus Petrus Maria Pellemans , Robert Franken
CPC classification number: G03F7/70641 , G02B7/28
Abstract: A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.
Abstract translation: 散射仪具有焦点传感器，其布置成检测被测量的目标是否在正确的焦平面中。 对焦点传感器或散射仪的分量施加调制，使得由聚焦传感器测量的散焦根据某种功能而变化。 根据调制知识，可以校准传感器的增益。
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公开(公告)号：US08994921B2
公开(公告)日：2015-03-31
申请号：US13126917
申请日：2009-10-12
Applicant: Johan Maria Van Boxmeer , Nicolass Antonius Allegondus Johannes Van Asten , Arnold Sinke , Marnix Aldert Tas , Johannes Cornelis Maria Timmermans , Jascha Van Pommeren
Inventor： Johan Maria Van Boxmeer , Nicolass Antonius Allegondus Johannes Van Asten , Arnold Sinke , Marnix Aldert Tas , Johannes Cornelis Maria Timmermans , Jascha Van Pommeren
CPC classification number: G03F7/70616 , G01N21/956
Abstract: A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement (65) that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement (61). A focus controller (67) provides control signals representative of the relative positions of the focusing arrangement (15, 69) and the substrate (W), which are required to focus the first beam of radiation on the substrate. An actuator arrangement adjusts the position of the focusing arrangement dependent on the control signals. An irradiation arrangement directs a second beam of radiation onto the substrate using the focusing arrangement, a measurement detector (18) detecting the second radiation beam after reflection from the substrate. A focus offset arrangement adjusts the focus produced by the focusing arrangement to compensate for an offset between the focusing of the first beam of radiation and the second beam of radiation.
Abstract translation: 用于测量衬底的性质的散射仪包括焦点感测装置，其包括将第一辐射束引导到聚焦装置上的装置（65），以由聚焦传感器装置（61）检测。 聚焦控制器（67）提供表示聚焦装置（15,69）和基板（W）的相对位置的控制信号，其将第一辐射束聚焦在基板上。 致动器装置根据控制信号调整聚焦装置的位置。 照射装置使用聚焦装置将第二辐射束引导到基板上，测量检测器（18）在从基板反射之后检测第二辐射束。 聚焦偏移布置调整由聚焦装置产生的聚焦以补偿第一辐射束与第二辐射束的聚焦之间的偏移。
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公开(公告)号：US20110261339A1
公开(公告)日：2011-10-27
申请号：US13126917
申请日：2009-10-12
Applicant: Johan Maria Van Boxmeer , Nicolass Antonius Allegondus Johannes Van Asten , Arnold Sinke , Marnix Aldert Tas , Johannes Cornelis Maria Timmermans , Jascha Van Pommeren
Inventor： Johan Maria Van Boxmeer , Nicolass Antonius Allegondus Johannes Van Asten , Arnold Sinke , Marnix Aldert Tas , Johannes Cornelis Maria Timmermans , Jascha Van Pommeren
CPC classification number: G03F7/70616 , G01N21/956
Abstract: A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement (65) that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement (61). A focus controller (67) provides control signals representative of the relative positions of the focusing arrangement (15, 69) and the substrate (W), which are required to focus the first beam of radiation on the substrate. An actuator arrangement adjusts the position of the focusing arrangement dependent on the control signals. An irradiation arrangement directs a second beam of radiation onto the substrate using the focusing arrangement, a measurement detector (18) detecting the second radiation beam after reflection from the substrate. A focus offset arrangement adjusts the focus produced by the focusing arrangement to compensate for an offset between the focusing of the first beam of radiation and the second beam of radiation.
Abstract translation: 用于测量衬底的性质的散射仪包括焦点感测装置，其包括将第一辐射束引导到聚焦装置上的装置（65），以由聚焦传感器装置（61）检测。 聚焦控制器（67）提供表示聚焦装置（15,69）和基板（W）的相对位置的控制信号，其将第一辐射束聚焦在基板上。 致动器装置根据控制信号调整聚焦装置的位置。 照射装置使用聚焦装置将第二辐射束引导到基板上，测量检测器（18）在从基板反射之后检测第二辐射束。 聚焦偏移布置调整由聚焦装置产生的聚焦以补偿第一辐射束与第二辐射束的聚焦之间的偏移。
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6.发明申请Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system 有权检测方法和设备光刻设备，光刻处理单元，器件制造方法和距离测量系统公开(公告)号：US20090021708A1
公开(公告)日：2009-01-22
申请号：US11826830
申请日：2007-07-18
Applicant: Johan Maria Van Boxmeer , Henricus Petrus Maria Pellemans , Robert Franken
CPC classification number: G03F7/70641 , G02B7/28
Abstract: A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.
Abstract translation: 散射仪具有焦点传感器，其布置成检测被测量的目标是否在正确的焦平面中。 对焦点传感器或散射仪的分量施加调制，使得由聚焦传感器测量的散焦根据某种功能而变化。 根据调制知识，可以校准传感器的增益。
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