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公开(公告)号:US20090130463A1
公开(公告)日:2009-05-21
申请号:US11992871
申请日:2006-09-18
申请人: John Dean Albaugh , Masaaki Amako , Robert Charles Camilletti , Dong Choi , William Weidner , Ludmil Zambov
发明人: John Dean Albaugh , Masaaki Amako , Robert Charles Camilletti , Dong Choi , William Weidner , Ludmil Zambov
CPC分类号: H01L21/3122 , C08J7/045 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/3124 , H01L21/318 , H01L51/5256 , Y10T428/31663
摘要: Coated substrates comprising an inorganic barrier coating and an interfacial coating, wherein the interfacial coating comprises a cured product of a silicone resin having silicon-bonded radiation-sensitive groups; and methods of preparing the coated substrates.
摘要翻译: 包括无机阻隔涂层和界面涂层的涂覆基材,其中所述界面涂层包含具有硅键合的辐射敏感基团的硅树脂的固化产物; 以及制备涂覆的基材的方法。
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公开(公告)号:US06596404B1
公开(公告)日:2003-07-22
申请号:US10121971
申请日:2002-04-15
申请人: John Dean Albaugh , Ronald Paul Boisvert , Duane Raymond Bujalski , Pierre Maurice Chevalier , Russell Keith King , Duan Li Ou , Kai Su , Katsuya Eguchi
发明人: John Dean Albaugh , Ronald Paul Boisvert , Duane Raymond Bujalski , Pierre Maurice Chevalier , Russell Keith King , Duan Li Ou , Kai Su , Katsuya Eguchi
IPC分类号: B32B518
CPC分类号: C09D183/04 , C08G77/12 , C08G77/16 , C08G77/18 , C08G77/24 , C08L83/04 , C09D4/00 , Y10T428/31663 , C08G77/04
摘要: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.
摘要翻译: 本发明涉及包含R1SiO3 / 2硅氧烷单元,R2SiO3 / 2硅氧烷单元和(R3O)bSiO(4-b)/ 2硅氧烷单元的硅氧烷树脂组合物,其中R 1是具有1至5个碳的烷基,氢或其混合物 的; R2是碳原子数为6〜30的一价有机基团, R3为碳数为3〜30的支链烷基,b为1〜3, 硅氧烷树脂含有2.5〜85摩尔%的R 1 SiO 3/2单元,2.5〜50摩尔%的R 2 SiO 3/2单元和5〜95摩尔%(R3O)bSiO(4-b)/ 2单元。 硅氧烷树脂可用于制造不溶性多孔树脂和不溶性多孔涂层。 加热涂有硅氧烷树脂的基材在足够的温度下除去R2和R3O基团,形成孔隙率为1至60体积%和介电常数在1.5至3.0范围内的不溶性不溶性多孔涂层。
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公开(公告)号:US20090004606A1
公开(公告)日:2009-01-01
申请号:US11579347
申请日:2005-06-03
申请人: John Dean Albaugh , Gregory Scott Becker , Sina Magshoodi , Eric Scott Moyer , Sheng Wang , Craig Rollin Yeakle
发明人: John Dean Albaugh , Gregory Scott Becker , Sina Magshoodi , Eric Scott Moyer , Sheng Wang , Craig Rollin Yeakle
CPC分类号: C08G77/20 , C08K5/0025 , C09D183/04 , C08L83/06
摘要: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
摘要翻译: 本发明涉及丙烯酸类功能性树脂组合物。 更具体地说,本发明涉及在用光引发剂暴露于紫外线辐射下或在有或无自由基发生剂加热时可固化的聚[有机 - 共 - (甲基)丙烯酰氧基有机基]硅氧烷树脂。 树脂组合物在室温下具有高的储存稳定性,并产生可用作平坦化层,层间电介质,钝化层,透气层,负性光致抗蚀剂,抗反射涂层,保形涂层和IC封装的膜。
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公开(公告)号:US08377634B2
公开(公告)日:2013-02-19
申请号:US11579347
申请日:2005-06-03
申请人: John Dean Albaugh , Gregory Scott Becker , Sina Maghsoodi , Eric Scott Moyer , Sheng Wang , Craig Rollin Yeakle
发明人: John Dean Albaugh , Gregory Scott Becker , Sina Maghsoodi , Eric Scott Moyer , Sheng Wang , Craig Rollin Yeakle
CPC分类号: C08G77/20 , C08K5/0025 , C09D183/04 , C08L83/06
摘要: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
摘要翻译: 本发明涉及丙烯酸类功能性树脂组合物。 更具体地说,本发明涉及在用光引发剂暴露于紫外线辐射下或在有或无自由基发生剂加热时可固化的聚[有机 - 共 - (甲基)丙烯酰氧基有机基]硅氧烷树脂。 树脂组合物在室温下具有高的储存稳定性,并产生可用作平坦化层,层间电介质,钝化层,透气层,负性光致抗蚀剂,抗反射涂层,保形涂层和IC封装的膜。
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